Number | Date | Country | Kind |
---|---|---|---|
6-327889 | Dec 1994 | JPX |
Number | Name | Date | Kind |
---|---|---|---|
4647361 | Bauer | Mar 1987 | |
5130172 | Hicks et al. | Jul 1992 | |
5372850 | Uchikawa et al. | Dec 1994 | |
5403434 | Moslehi | Apr 1995 | |
5403620 | Kaesz et al. | Apr 1995 | |
5478780 | Koezner et al. | Dec 1995 | |
5563100 | Matsubara | Oct 1996 |
Number | Date | Country |
---|---|---|
2114809 | Aug 1983 | GBX |
Entry |
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Search Report of GB 9526450 3. |
"A Manufacturable Process for the Formation of Self Aligned Cobalt Silicide in a Sub Micrometer CMOS Technology", Berti, C., et al., Jun. 9-10, 1992, VMIC Conf., pp. 267-273. |
"Formation of Self-Aligned TiN/CoSi2 Bilayer from Co/Ti/Si and Its Applications in Salicide, Diffusion Barrier and Contact Fill", Wei, C. S., et al., Jun. 12-13, 1990, VMIC Conf., pp. 233-239. |