Claims
- 1. A radiation-sensitive composition comprising an admixture of (1) a resole resin, (2) a novolac resin, (3) a latent Bronsted acid, and (4) an infrared absorber, in amounts such that imagewise exposure of said composition to activating radiation followed by heating brings about a catalyzed reaction between said resole resin and said novolac resin and renders exposed composition less soluble in aqueous alkaline solution and unexposed composition more soluble in aqueous alkaline solution.
- 2. A radiation-sensitive composition as claimed in claim 1, wherein said resole resin is derived from bis-phenol A and formaldehyde.
- 3. A radiation-sensitive composition as claimed in claim 1, wherein said novolac resin is derived from m-cresol and formaldehyde.
- 4. A radiation-sensitive composition as claimed in claim 1, wherein said latent Bronsted acid is an ionic latent Bronsted acid.
- 5. A radiation-sensitive composition as claimed in claim 1, whereas said latent Bronsted acid is a non-ionic latent Bronsted acid.
- 6. A radiation-sensitive composition as claimed in claim 1, wherein said latent Bronsted acid is an iodonium, sulfonium, phosphonium, selenonium, diazonium or arsonium salt.
- 7. A radiation-sensitive composition as claimed in claim 1, wherein said latent Bronsted acid is diphenyliodonium hexafluorophosphate.
- 8. A radiation-sensitive composition as claimed in claim 1, wherein said latent Bronsted acid is 2-methoxy-4-aminophenyl diazonium hexafluroophosphate.
- 9. A radiation-sensitive composition is claimed in claim 1, wherein said infrared absorber is a squarylium, croconate, cyanine, merocyanine, indolizine, pyrylium or metal dithiolene dye or pigment.
- 10. A lithographic printing plate comprising a support and an imaging layer that is sensitive to both ultraviolet and infrared radiation and capable of functioning in either a positive-working or negative-working manner, said imaging layer comprising an admixture of (1) a resole resin, (2) a novolac resin, (3) a latent Bronsted acid and (4) an infrared absorber, in amounts such that imagewise exposure of said imaging layer to activating radiation followed by heating brings about a catalyzed reaction between said resole resin and said novolac resin and renders exposed areas of said imaging layer less soluble in aqueous alkaline solution and unexposed areas of said imaging layer more soluble in aqueous alkaline solution.
- 11. A lithographic printing plate as claimed in claim 10, wherein said imaging layer has a dry thickness in the range of from about 0.5 to about 2 micrometers.
- 12. A lithographic printing plate as claimed in claim 10, wherein said resole resin is derived from bis-phenol A and formaldehyde.
- 13. A lithographic printing plate as claimed in claim 10, wherein said novolac resin is derived from m-cresol and formaldehyde.
- 14. A lithographic printing plate as claimed in claim 10, wherein said latent Bronsted acid is an ionic latent Bronsted acid.
- 15. A lithographic printing plate as claimed in claim 10, wherein said latent Bronsted acid is a non-ionic latent Bronsted acid.
- 16. A lithographic printing plate as claimed in claim 10, wherein said latent Bronsted acid is an iodonium, sulfonium, phosphonium, selenonium, diazonium or arsonium salt.
- 17. A lithographic printing plate as claimed in claim 10, wherein said latent Bronsted acid is diphenyliodonium hexafluorophosphate.
- 18. A lithographic printing plate as claimed in claim 10, wherein said latent Bronsted acid is 2-methoxy-4-aminophenyl diazonium hexafluorophosphate.
- 19. A lithographic printing plate as claimed in claim 10, wherein said infrared absorber is a squarylium, croconate, cyanine, merocyanine, indolizine, pyrylium or metal dithiolene dye or pigment.
- 20. A lithographic printing plate as claimed in claim 10, wherein said support is a polyester film.
- 21. A lithographic printing plate as claimed in claim 10, wherein said support is comprised of grained and anodized aluminum.
Parent Case Info
This is a continuation of U.S. application Ser. No. 065,103, filed 19 May 1993, now abandoned.
US Referenced Citations (5)
Foreign Referenced Citations (1)
Number |
Date |
Country |
2082339A |
Mar 1982 |
GBX |
Continuations (1)
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Number |
Date |
Country |
Parent |
65103 |
May 1993 |
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