As semiconductor packaging architectures continue towards more complex and more compact systems, new material solutions may be used to enable such architectures. One promising candidate for use in packaging substrates is a glass core layer. In such substrates, a glass core is sandwiched between overlying and underlying buildup layers. Electrically conductive vias are provided through the glass core in order to provide electrical coupling between the overlying and underlying buildup layers. Glass cores are beneficial because they can provide high density vias. Glass is also s high modulus material, which provides desirable stiffness to the overall package substrate.
However, glass cores are not without issue. For example, the electrically conductive material for the via (e.g., copper or a copper alloy) has a different coefficient of thermal expansion (CTE) than the glass core. During reflow processes, annealing processes, or any other temperature cycling, the via expands more than the glass core. This induces significant stress into the glass core and can result in cracking or other damage. In some instances, the damage is significant and can lead to complete device failure.
Described herein are electronic systems, and more particularly, liners for through glass vias (TGVs) that provide self-healing for one or both of the liner and the adjacent glass, in accordance with various embodiments. In the following description, various aspects of the illustrative implementations will be described using terms commonly employed by those skilled in the art to convey the substance of their work to others skilled in the art. However, it will be apparent to those skilled in the art that the present disclosure may be practiced with only some of the described aspects. For purposes of explanation, specific numbers, materials and configurations are set forth in order to provide a thorough understanding of the illustrative implementations. However, it will be apparent to one skilled in the art that the present disclosure may be practiced without the specific details. In other instances, well-known features are omitted or simplified in order not to obscure the illustrative implementations.
Various operations will be described as multiple discrete operations, in turn, in a manner that is most helpful in understanding the present disclosure, however, the order of description should not be construed to imply that these operations are necessarily order dependent. In particular, these operations need not be performed in the order of presentation.
As noted above, glass core architectures are of growing interest in the semiconductor packaging industry. Glass substrates provide improved mechanical performance and allow for higher density via formation. However, one challenge that has arisen from the use of glass substrates is the coefficient of thermal expansion (CTE) mismatch between the glass material and the electrically conductive via. For example, the CTE of many suitable glass materials is typically approximately 5 parts per million/° C. (ppm/° C.) or less, whereas the CTE of copper is around 16 ppm/° C.
One solution that has been proposed to mitigate the CTE mismatch has been to include a compliant liner between the via and the glass layer. Typically, the liner is a low modulus material. For example, proposed liner materials may include organic materials, such as polymers, organo-metallic materials, and the like. Despite the presence of the liners, cracks and other defects can still be generated in the glass or even in the liner itself. Accordingly, additional solutions are desired in order to mitigate these defects.
Embodiments disclosed herein enable a self-healing solution for defects in and around the via in glass substrates. As used, herein, “self-healing” may refer to a process of repairing defects within the structure using components that are pre-existing in the structure. In some applications, “self-healing” may also rely (at least partially) on the external application of thermal energy (e.g., heat) or the external application of a magnetic field. Though, the external application of energy is not necessary in all self-healing applications.
Particularly, embodiments disclosed herein include at least two classes of different self-healing approaches. A first approach involves the presence of self-healing capsules. The capsules can be distributed throughout the liner between the via and the glass. The capsules may include a solid shell that is filled with an organic liquid. Upon application of sufficient pressure, the shell fractures to release the liquid. The liquid can then flow to the defect and ultimately be solidified by curing. A second approach involves the presence of self-healing nanoparticles. The nanoparticles may be paramagnetic. As such, the application of a magnetic field can result in rapid vibrations that can melt materials (e.g., the liner matrix or the glass) in order to cure defects.
The structures disclosed herein are generally described as being glass cores for package substrates. In such instances, the glass layer may have a geometry and dimensions suitable for use as a core between two opposing organic layers. For example, a glass core may have a thickness between approximately 100 μm and approximately 2,000 μm. Though, larger or smaller cores may also be used. As used herein, “approximately” may refer to a range of values within ten percent of the stated value. For example, approximately 100 μm may refer to a range between 90 μm and 110 μm.
However, it is to be appreciated that embodiments disclosed herein are not solely limited to cored package substrate applications. That is, other form factors and applications (e.g., glass interposers, etc.) may also benefit from self-healing solutions in order to mitigate defects generated by CTE mismatch between glass and a metallic via through the glass.
As used in embodiments disclosed herein, glass layers may be substantially all glass. The glass layer may be a solid material with an amorphous crystal structure. More particularly, the glass layer may be any suitable glass formulation that has the necessary mechanical robustness and compatibility with semiconductor packaging manufacturing and assembly processes. For example, the glass layer may comprise aluminosilicate glass, borosilicate glass, alumino-borosilicate glass, silica, fused silica, or the like. In some embodiments, the glass layer may include one or more additives, such as, but not limited to, Al2O3, B2O3, MgO, CaO, SrO, BaO, SnO2, Na2O, K2O, SrO, P2O3, ZrO2, Li2O, Ti, and Zn. More generally, the glass layer may comprise silicon and oxygen, as well as any one or more of aluminum, boron, magnesium, calcium, barium, tin, sodium, potassium, strontium, phosphorus, zirconium, lithium, titanium, and zinc. In an embodiment, the glass layer may comprise at least 23 percent silicon (by weight) and at least 26 percent oxygen (by weight). In some embodiments, the glass layer may further comprise at least 5 percent aluminum (by weight).
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In an embodiment, a via 120 is provided through a thickness of the glass layer 101. The via 120 is an electrically conductive material. For example, the via 120 may comprise copper, copper and any suitable alloying element, silver, aluminum, or any other electrically conductive material. Further, while shown as a single continuous layer, the via 120 may be formed by multiple layers. For example, a seed layer (not shown) may be used in order to plate the remainder of the via 120. In an embodiment the via 120 may have a minimum diameter that is approximately 15 μm or larger. In some embodiments, the via 120 may have a minimum diameter that is between approximately 25 μm and approximately 200 μm. Though, smaller or larger diameters may also be used for the via 120.
In an embodiment, the via 120 may have sidewalls with any suitable profile. In the example shown in
In an embodiment, the via 120 may be spaced away from the glass layer 101 by a liner 130. The liner 130 may be a compliant material that is used to decouple the expansion of the via 120 from the expansion of the glass layer 101. The liner 130 may be a low modulus polymer or the like. The liner 130 may have any suitable thickness. For example, the thickness of the liner 130 may be between approximately 1 μm and approximately 30 μm. Though thinner or thicker liners 130 may also be used in some embodiments.
In the illustrated embodiment, the liner 130 is shown as a single monolithic structure. As will be described in greater detail below, embodiments are not limited to a single material structure. Instead, embodiments may include a self-healing component that is integrated into the liner 130. For example, composite capsules may be used in some embodiments, and other embodiments may include superparamagnetic nanoparticles.
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In some embodiments, the defect 115 may be considered as being at (or near) the interface between the glass layer 101 and the liner 130. In an embodiment, the defect 115 is entirely within the glass layer 101. In another embodiment, the defect 115 may be entirely within the liner 130. Embodiments may also include defects 115 that are within the liner 130 and the glass layer 101. Further, while a single defect 115 is shown in
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In the illustrated embodiment, the defect 115 is filled by a filler 117. The filler 117 can be a cured and/or cross-linked polymer. That is, a solid material is inserted into the defect 115. This can reduce the stress at the high energy points of the defect 115, which can mitigate or prevent further propagation of the defect 115 deeper into the glass layer 101. In other embodiments, portions of the glass layer 101 are melted in order to reform a solid and substantially uniform region of glass material, essentially erasing the defect 115. As such, there is no further risk of defect 115 propagation.
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The capsule 270 may have any suitable dimensions compatible with integration into the matrix of the liner material. For example, the diameter D of the capsule 270 may be between approximately 500 nm and approximately 5,000 nm. Though, smaller diameters D and larger diameters D may also be used in some embodiments. The thickness T of the shell 271 may also be controllable. Larger thicknesses T will result in a capsule 270 that is harder to crack. In an embodiment, the thickness T of the shell 271 may be between approximately 10 nm and approximately 100 nm. Though larger or smaller thicknesses T may be used in alternative embodiments.
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In an embodiment, the liner 330 may comprise a matrix material and a filler material. The matrix material may be a low modulus polymer or any other suitable compliant material. The filler material may be composite capsules 370. The capsules 370 may include a solid outer shell with a liquid (or at least partially liquid) inner core. The core may be a low molecular weight polymer, and the shell may be an inorganic solid. The capsules 370 may be similar to the capsules 270 described above with respect to
The capsules 370 may be uniformly distributed throughout the matrix material of the liner 330. The capsules 370 may account for any volume percentage of the liner 330 that still allows for a compliable structure. For example, the capsules 370 may occupy up to approximately 20 percent of the volume of the liner 330, up to approximately 50 percent of the volume of the liner 330, or up to approximately 70 percent of the volume of the liner 330. Though, even higher volume percentages of the capsules 370 may be used in some embodiments.
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The defect 315 in
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It is to be appreciated that the pressure throughout the entire liner 330 may not be uniform. This may result in some of the capsules 370 cracking, while other capsules 370 remain intact. Additionally, the capsules 370 may have non-uniform dimensions, materials, or the like. For example, outer shells can have different thicknesses or be made from different materials. This allows for capsules 370 to crack at different pressures.
The pressure applied to the liner 330 may drive the released liquid cores 372 to the defect 315, which would typically be at a lower pressure than the surrounding areas. While the liquid cores 372 are shown as maintaining their circular shape in
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In the embodiment shown and described with respect to
Paramagnetic nanoparticles can be activated through the application of a magnetic field to the substrate. The magnetic field induces vibration in the nanoparticles, which in turn can be used to heat up and melt the surrounding material. The paramagnetic nanoparticles may sometimes be considered superparamagnetic nanoparticles. Such particles may be melt blended or solution mixed into a polymer matrix used to form the liner between the via and the glass layer. The nanoparticles may comprise iron and oxygen. In one instance the nanoparticles comprise at least 40 percent (by weight) iron and at least 40 percent (by weight) oxygen. For example, the nanoparticles may comprise Fe2O3 particles. Though, it is to be appreciated that other paramagnetic or superparamagnetic materials may also be used for the nanoparticles. The nanoparticles may also be surface-functionalized in some instances. The nanoparticles may have an average diameter that is between approximately 1 nm and approximately 500 nm. Though, smaller or larger nanoparticles may also be used in some embodiments. In some embodiments, the nanoparticles may comprise up to 5 percent (by volume) of the liner, up to 25 percent (by volume) of the liner, up to 40 percent (by volume) of the liner, or up to 80 percent (by volume) of the liner.
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In an embodiment, a defect 435 may be present within the liner 430. For example, the defect 435 in
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In an embodiment, a defect 515 may be located in the glass layer 501 at the interface between the glass layer 501 and the liner 530. The defect 515 may be attributable to the CTE mismatch between the via 520 and the glass layer 501. For example, different rates of expansion may lead to the formation of the defect 515. In the illustrated embodiment, the defect 515 is a simple crack that has an opening facing the liner 530 and which comes to a point within the glass layer 501. Though, it is to be appreciated that defect 515 may take any form, shape, or size. Further, while a single defect 515 is shown, embodiments may also include a plurality of defects 515 within the glass layer 501.
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In the embodiments above with respect to
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However, instead of relying on an external magnetic field, an internal magnetic field is supplied. Such an internal magnetic field may be generated through the use of an electrically conductive coil 610 or the like. In the illustrated embodiment, the conductive coil 610 is provided through the glass layer 601. In other embodiments, a conductive coil 610 may be provided above and/or below the glass layer 601. Accordingly, when repair is needed to mitigate or fix a defect 615, current can be passed through the conductive coil 610 in order to induce a magnetic field in the substrate 600.
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In an embodiment, the package substrate 800 may comprise a glass core 801 with organic buildup layers 860 above and/or below the glass core 801. The glass core 801 may have through glass vias (TGVs) 820. The TGVs 820 may be separated from the glass core 801 by a liner 830. The liner 830 may have filler particles suitable for implementing self-healing processes, such as those described in greater detail above. For example, the filler particles may be capsules with a shell and liquid core, or the filler particles may be superparamagnetic nanoparticles.
In an embodiment, the package substrate 800 may be coupled to one or more dies 895 by interconnects 893. The interconnects 893 may be any suitable first level interconnect (FLI) architecture, such as solder balls, copper bumps, hybrid bonding interfaces, or the like. In an embodiment, the dies 895 may comprise compute dies such as a central processing unit (CPU), a graphics processing unit (GPU), an XPU, a communications die, or the like. Dies 895 may also include memory dies or any other type of die that is beneficial for the electronic system 890.
These other components include, but are not limited to, volatile memory (e.g., DRAM), non-volatile memory (e.g., ROM), flash memory, a graphics processor, a digital signal processor, a crypto processor, a chipset, an antenna, a display, a touchscreen display, a touchscreen controller, a battery, an audio codec, a video codec, a power amplifier, a global positioning system (GPS) device, a compass, an accelerometer, a gyroscope, a speaker, a camera, and a mass storage device (such as hard disk drive, compact disk (CD), digital versatile disk (DVD), and so forth).
The communication chip 906 enables wireless communications for the transfer of data to and from the computing device 900. The term “wireless” and its derivatives may be used to describe circuits, devices, systems, methods, techniques, communications channels, etc., that may communicate data through the use of modulated electromagnetic radiation through a non-solid medium. The term does not imply that the associated devices do not contain any wires, although in some embodiments they might not. The communication chip 906 may implement any of a number of wireless standards or protocols, including but not limited to Wi-Fi (IEEE 802.11 family), WiMAX (IEEE 802.16 family), IEEE 802.20, long term evolution (LTE), Ev-DO, HSPA+, HSDPA+, HSUPA+, EDGE, GSM, GPRS, CDMA, TDMA, DECT, Bluetooth, derivatives thereof, as well as any other wireless protocols that are designated as 3G, 4G, 5G, and beyond. The computing device 900 may include a plurality of communication chips 906. For instance, a first communication chip 906 may be dedicated to shorter range wireless communications such as Wi-Fi and Bluetooth and a second communication chip 906 may be dedicated to longer range wireless communications such as GPS, EDGE, GPRS, CDMA, WiMAX, LTE, Ev-DO, and others.
The processor 904 of the computing device 900 includes an integrated circuit die packaged within the processor 904. In some implementations of the disclosure, the integrated circuit die of the processor may be part of an electronic package that includes a package substrate with a glass core that includes a liner around vias, where the liner includes particles for self-healing applications, in accordance with embodiments described herein. The term “processor” may refer to any device or portion of a device that processes electronic data from registers and/or memory to transform that electronic data into other electronic data that may be stored in registers and/or memory.
The communication chip 906 also includes an integrated circuit die packaged within the communication chip 906. In accordance with another implementation of the disclosure, the integrated circuit die of the communication chip may be part of an electronic package that includes a package substrate with a glass core that includes a liner around vias, where the liner includes particles for self-healing applications, in accordance with embodiments described herein.
In an embodiment, the computing device 900 may be part of any apparatus. For example, the computing device may be part of a personal computer, a server, a mobile device, a tablet, an automobile, or the like. That is, the computing device 900 is not limited to being used for any particular type of system, and the computing device 900 may be included in any apparatus that may benefit from computing functionality.
The above description of illustrated implementations of the disclosure, including what is described in the Abstract, is not intended to be exhaustive or to limit the disclosure to the precise forms disclosed. While specific implementations of, and examples for, the disclosure are described herein for illustrative purposes, various equivalent modifications are possible within the scope of the disclosure, as those skilled in the relevant art will recognize.
These modifications may be made to the disclosure in light of the above detailed description. The terms used in the following claims should not be construed to limit the disclosure to the specific implementations disclosed in the specification and the claims. Rather, the scope of the disclosure is to be determined entirely by the following claims, which are to be construed in accordance with established doctrines of claim interpretation.
Example 1: an apparatus, comprising: a substrate, wherein the substrate comprises a solid glass layer; an opening through a thickness of the substrate; a liner in contact with a sidewall of the opening, wherein the liner comprises a polymer matrix with capsules distributed through the polymer matrix, wherein at least one of the capsules comprises: a shell; and a core within the shell, wherein the core comprises an organic material; and a via in the opening and in contact with the liner, wherein the via is electrically conductive.
Example 2: the apparatus of Example 1, wherein the shell comprises an inorganic material.
Example 3: the apparatus of Example 2, wherein the shell comprises silicon and oxygen.
Example 4: the apparatus of Examples 1-3, wherein the core comprises a polymer and one or both of a solvent and a cross-linking agent.
Example 5: the apparatus of Examples 1-4, wherein the core is a liquid.
Example 6: the apparatus of Examples 1-5, wherein the liner has a thickness that is between approximately 10 nm and approximately 100 nm.
Example 7: the apparatus of Examples 1-6, wherein a volume percentage of the capsules in the liner is up to approximately 50 percent.
Example 8: the apparatus of Examples 1-7, further comprising: a crack in the substrate adjacent to the liner, and wherein the crack contains a material with the same organic composition as the core material.
Example 9: the apparatus of Example 8, wherein the organic material of the cores in the crack is solid.
Example 10: an apparatus, comprising: a substrate, wherein the substrate comprises a solid glass layer; an opening through a thickness of the substrate; a liner in contact with a sidewall of the opening, wherein the liner comprises: a polymer matrix; and nanoparticles distributed in the polymer matrix, wherein the nanoparticles are paramagnetic; and a via in the opening, wherein the via is electrically conductive.
Example 11: the apparatus of Example 10, wherein the nanoparticles comprise iron and oxygen.
Example 12: the apparatus of Example 11, wherein the nanoparticles comprise at least 40 percent by weight iron and at least 40 percent by weight oxygen.
Example 13: the apparatus of Examples 10-12, wherein the nanoparticles are surface functionalized.
Example 14: the apparatus of Examples 10-13, wherein the nanoparticles have an average diameter that is approximately 100 nm or smaller.
Example 15: the apparatus of Examples 10-14, wherein the liner has a thickness between approximately 1 μm and approximately 30 μm.
Example 16: the apparatus of Examples 10-15, wherein nanoparticles comprise up to 40 percent by volume of the liner.
Example 17: an apparatus, comprising: a board; a package substrate over the board, wherein the package substrate comprises: a core, wherein the core is solid glass; a via through the core, wherein the via is electrically conductive; a liner between the via and the core, wherein the liner comprises: a matrix; and particles distributed within the matrix; and a die coupled to the package substrate.
Example 18: the apparatus of Example 17, wherein the particles are capsules with an inorganic shell and a liquid organic core.
Example 19: the apparatus of Example 17, wherein the particles are paramagnetic nanoparticles.
Example 20: the apparatus of Examples 17-19, wherein the apparatus is part of a personal computer, a server, a mobile device, a tablet, or an automobile.