This application claims the benefit under 35 U.S.C. § 119(a) of European Application No. 22203855.6 filed Oct. 26, 2022, the contents of which are incorporated by reference herein in their entirety.
The present disclosure relates to heat dissipation control in power packages. Accordingly, a novel method for manufacturing a semiconductor device is provided, as well as such novel semiconductor device having an improved heat dissipation.
Power package poses concern on heat dissipation, and the majority of MOSFET devices are using either drain or source terminals as exposed heatsink elements attached on a printed circuit board, PCB. Continuous operation of this package will lead to over fatigue on either package or PCB. Mitigating this concern however are already available and various methods has been introduced through dual side cooling (top and bottom part of the package), preventing too much heat absorbed on the PCB through ambient heat dissipation.
US 2017/047274A1 discloses a system, a method, and a silicon chip package for providing structural strength, heat dissipation and electrical connectivity using a “W” shaped frame bonded to the one or more dies, wherein the “W” shaped frame provides compression strength to the silicon chip package when the one or more dies are bonded, and electrically conductivity between for the one or more dies to leads of silicon chip package, and heat dissipation for the silicon chip package.
Accordingly, it is a goal of the present disclosure to provide a novel power package with an improved heat dissipation.
According to a first example of the disclosure, a semiconductor device is proposed as outlined below. It comprises a lead frame comprising a first lead frame surface and a second lead frame surface, opposite the first lead frame surface, as well as a semiconductor die comprising a first semiconductor die surface and a second semiconductor die surface, opposite the first semiconductor die surface as well as a clip comprising a flat part and a corrugated part, wherein the corrugated part comprises at least two peaks and at least one valley.
In particular, the second lead frame surface of the lead frame is connected to the first semiconductor die surface of the semiconductor die, and the second semiconductor die surface of the semiconductor die is connected to the corrugated part of the clip, and a mold compound is used to encapsulate the semiconductor die, and the at least one valley of the corrugated part of the clip, such that the mold compound forms an outer surface of the semiconductor device with at least two peaks of the corrugated part of the clip, at least part of the flat part of the clip, and the first lead frame surface of the lead frame being exposed.
The exposed corrugated part and flat part of the clip effectively function as an enlarged heat dissipation surface, in particular at an upper or top face of the semiconductor device. Usually, heat generated during operating the semiconductor device is dissipated from an area with a high (hot) temperature towards an area with a lower (colder) temperature. Thus, the presence of additional heat sink functionality formed by the exposed corrugated part and flat part of the clip provides an additional heat dissipation at the upper surface of the semiconductor device aside from the commonly used heat sink formed by the drain terminal tab. Accordingly, this configuration results in an improved electrical efficiency of the semiconductor device, e.g. formed as a MOSFET or transistor.
In a preferred example, the second lead frame surface of the lead frame is connected to the first semiconductor die surface of the semiconductor die, and/or the second semiconductor die surface of the semiconductor die is connected to the corrugated part of the clip by means of soldering, sintering, or ultrasonic bonding. Soldering is the recommended process according to the example, as this allows for applying a required uniform solder volume, which prevents solder voids and/or insufficient soldering material.
Preferably, the mold compound and the at least one peak of the corrugated part of the clip forms a single planar surface, thus constituting an optimal heat sink surface with improved heat dissipation.
In preferred examples according to the disclosure, the lead frame and/or the clip are made of a conductive metal sheet, for example copper or aluminum.
In particular, wherein the clip is made of a metal sheet, preferably with a width or thickness of 200 μm. Preferably, a width or thickness of the corrugated part is two times the width of the metal sheet. This will provide a clip profile close to the top of the package, and allow the mold compound to penetrate on the corrugated part to prevent voiding or delamination.
In order to enlarge the heat dissipating surface of the clip, the corrugated part of the clip comprises three or four peaks.
The disclosure also pertains to a method of manufacturing a semiconductor device according to the disclosure as defined in claim 7. The method may comprise the steps of:
These method steps result in a semiconductor device wherein the exposed corrugated part and flat part of the clip effectively function as an enlarged heat dissipation surface, in particular at an upper or top face of the semiconductor device.
In a preferred example of the method according to the disclosure, the connecting steps ii) and iii) further comprise the sub-step of:
Preferably, a soldering connection is performed, as soldering is the recommended process according to the example, as this allows for applying a required uniform solder volume, which prevents solder voids and/or insufficient soldering material.
In a preferred example, the encapsulating step iv) is followed by the step of:
In examples of the method according to the disclosure, the clip is made by punching a metal sheet or by forming a metal sheet.
In a final step, the semiconductor device is singulated from the lead frame.
The disclosure will now be discussed with reference to the drawings, which show in:
For a proper understanding of the disclosure, in the detailed description below corresponding elements or parts of the disclosure will be denoted with identical reference numerals in the drawings.
As shown in the various partial views of
The corrugated part 4b comprises at least one peak 4b′ and at least one valley 4b″. As shown in the example of e.g.
The second lead frame surface 1b of the lead frame 1 is connected to the first semiconductor die surface 3a of the semiconductor die 3, and the second semiconductor die surface 3b of the semiconductor die 3 is connected to the corrugated part 4b of the clip 4, using a connection technique which will be outlined further in the detailed description.
The complete assembly formed by the semiconductor die 3, the at least one valley 4b″ of the corrugated part 4b of the clip 4, and the lead frame 1 are encapsulated by means of a mold compound 5. The encapsulated end product or package 10 is shown in
These exposed elements of the package 10 effectively function as an enlarged heat dissipation surface, in particular at an upper or top face 10b of the semiconductor device 10. Also the exposed first lead frame surface 1a of the lead frame 1 forms the (first) lower surface 10a of the semiconductor device 10 and effectively functions as a drain terminal tab (also denoted with 1a). Usually, heat generated during operating the semiconductor device 10 is dissipated from an area with a high (hot) temperature towards an area with a lower (colder) temperature. Thus, the presence of additional heat sink functionality formed by the exposed corrugated part 4b′ and flat part 4a of the clip 4 provides an additional heat dissipation at the upper surface 10b of the semiconductor device 10 aside from the commonly used heat sink formed by the drain terminal tab 1a. Accordingly, this configuration results in an improved electrical efficiency of the semiconductor device 10, e.g. formed as a MOSFET or transistor.
The second lead frame surface 1b of the lead frame 1 is connected to the first semiconductor die surface 3a of the semiconductor die 3, and/or the second semiconductor die surface 3b of the semiconductor die 3 is connected to the corrugated part 4b of the clip 4 by means of soldering, sintering, or ultrasonic bonding. Soldering is the recommended process according to the example, as this allows for applying a required uniform solder volume, which prevents solder voids and/or insufficient soldering material. The connection between the lead frame 1 and the semiconductor die 3, and between the semiconductor die 3 and the clip 4 is schematically shown by means of reference numeral 2 (denoting for example solder paste) in
As shown in more detail in
It is preferred that the lead frame 1 and/or the clip 4 are made of a conductive metal sheet, for example copper or aluminum. In particular, in the example of the clip 4 being made of a conductive metal sheet, the sheet has preferably a width of 200 μm, see
The method may comprise the steps of forming a clip 4 which comprises a flat part 4a and a corrugated part 4b, wherein the corrugated part comprises at least one peak 4b′ and at least one valley 4b″. The forming of such clip 4 is depicted in
Alternatively, and as shown in
With the preformed clip 4 thus obtained, the method of manufacturing the semiconductor device 10 continues with the step ii) of connecting a semiconductor die 3 to a lead frame 1. The lead frame 1 is shown in
As shown in the Figures, the lead frame 1 comprises a first lead frame surface 1a and a second lead frame surface 1b opposite the first lead frame surface 1a. Likewise, the semiconductor die 3 comprises a first semiconductor die surface 3a and a second semiconductor die surface 3b opposite first semiconductor die surface 3a. When mounting or connecting the semiconductor die 3, see
In a next step iii), shown in
The connecting steps ii) and iii) can be achieved by a multitude of connection techniques, such as soldering, sintering, or ultrasonic bonding between the second lead frame surface 1b of the lead frame 1 and the first semiconductor die surface 3a of the semiconductor die 3 and/or between the second semiconductor die surface 3b of the semiconductor die 3 and the corrugated part 4b of the clip 4.
In the
Usually, the encapsulating step iv) results in the at least one peak 4b′ of the corrugated part 4b of the clip 4 also being covered by the mold compound 5. This is depicted in
Accordingly, with the peaks 4b′ being encapsulated by the mold compound 5, no heat dissipation can be achieved. Thus, the encapsulating step iv) may be followed by a polishing step vi), see
In a final step, the semiconductor device is singulated from the lead frame matrix 1 and the clip matrix 400, through removal with known techniques of the excessive lead frame parts 1x and clip matrix parts 400x (see
Number | Date | Country | Kind |
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22203855.6 | Oct 2022 | EP | regional |