Semiconductor Device

Information

  • Patent Application
  • 20080001673
  • Publication Number
    20080001673
  • Date Filed
    June 30, 2006
    18 years ago
  • Date Published
    January 03, 2008
    17 years ago
Abstract
An inductively degenerated low noise amplifier arrangement is shown having a transistor and a bonding pad connected to the input terminal of the transistor, wherein the bonding pad has parasitic capacitance, and wherein the bonding pad includes a metal layer connected to a second terminal of the transistor. In case of a field-effect transistor the second terminal may be the source and in case of a bipolar transistor the second terminal may be the emitter. The metal layer may be the ground plane of the bonding pad or an additional, intermediate layer.
Description

BRIEF DESCRIPTION OF THE DRAWINGS

In the following, the invention is described in more detail by reference to the attached drawings, wherein



FIG. 1 illustrates various LNA configurations.



FIG. 2A discloses an inductively degenerated LNA configuration.



FIG. 2B provides insight to the bonding pad of the LNA shown in FIG. 2A.



FIG. 3 visualizes the first embodiment of the invention, wherein the ground plane of the bonding pad that is connected to the source of the LNA transistor.



FIG. 4 visualizes the second embodiment of the invention, wherein the additional metal layer is connected to the LNA source.





DETAILED DESCRIPTION OF THE EXEMPLARY EMBODIMENTS


FIGS. 1, 2A, and 2B were already reviewed above in conjunction with the analysis of problems relating to the usage of LNAs.



FIG. 3 represents, by way of example only, one possible embodiment of the invention. With reference to the upper sketch 302, the depicted LNA comprises a bonding pad with an upper layer 310, e.g. a top layer adapted to receive the bondwire, and a lower layer, e.g. a ground shield (˜plane) 312. The figure further shows a transistor 304, being in this particular example a FET, a gate-source capacitance 306 and a source inductance 308. As the ground shield 312 is connected to the source, the parasitic capacitance 316 can actually be used to form at least a part of a gate-source or base-emitter capacitor. Publications [1] and [2] generally disclose how an additional gate-source (or base-emitter) capacitor may be utilized but so far these kinds of capacitors have been implemented via IC (integrated circuit) capacitors. The current invention cleverly brings in a possibility to capitalize the pad parasitic capacitance for the purpose. Element 314 indicates the substrate in the figure.


In a lower sketch 330 a corresponding circuit model is shown. Inductor 332 represents e.g. the bonding wire. The additional parasitics including a capacitor 318 and a resistor 320 (substrate resistance) are connected to a node that joins the source of the transistor 304. However, the parasitic at this node are not as crucial as in the gate node, i.e. this parasitic can be considered in a similar manner with the parasitic from the source inductor. Therefore, the effect of this parasitic is minor.


The ESD protection diodes 334 remain unaltered. Thus, the parasitic from these may still degrade LNA performance. However, the effect thereof is somewhat minimal compared to the pad parasitic capacitance.


When the parasitic capacitance limits the maximum operation frequency, which may take place e.g. in UWB (ultra-wideband) LNA applications, the invented configuration can be used to widen the LNA operation band. Likewise, the pad capacitance can be used to achieve a smaller NF. For example, the minimum NF can be achieved in WCDMA LNA applications. Thus, the embodiments of this invention may be utilized, in addition to mere UWB LNAs, also in many other applications including most wireless systems such as GSM (Global System for Mobile Communications), WCDMA (Wideband Code Division Multiple Access), Bluetooth, etc.



FIG. 4 discloses a further potential embodiment of the current invention. The upper sketch 402 visualizes a bonding pad structure with upper 410 and lower (aground shield) 413 layers. Further, a transistor 404, a gate-source capacitor 406, an inductance 408 and substrate 414 are shown. This time an additional, intermediate metal layer 412 is added to the bonding pad configuration of FIG. 3. Such intermediate layer 412, instead of the ground shield 413, is connected to the source of the transistor 404. Accordingly, the effect of substrate resistance can be neutralized, but both the parasitic capacitors 416 and 418 are slightly larger in contrast to the bonding pad of FIG. 3.


It shall be noted that the capacitor 416 is often modelled by circuit vendors but the capacitor 418 is not. Thus, the size of the capacitor 418 should be checked prior to usage by performing parasitic extraction from the layout. However, according to the simulations, the capacitor 418 has a small effect to the overall LNA performance.


The lower sketch 420 in FIG. 4 discloses a corresponding circuit model wherein an inductor with reference numeral 422 represents the bonding wire and a reference numeral 424 points at the ESD protection diodes.


The scope of the invention is found in the following claims. Although a few more or less focused examples were given in the text about the invention's applicability and feasible implementation, the purpose thereof was not to restrict the usage area of the actual fulcrum of the invention to any certain occasion, which should be evident to skilled readers. For example, although the above embodiments have been set forth using (MOS)FET transistors, the invention is applicable to also other transistor types including BJT transistors.


REFERENCES



  • [1] P. Andreani, H. Sjöland, “Noise optimization of an inductively degenerated CMOS low noise amplifier,” IEEE Trans. on Circuits and Systems—II: Analog and Digital Signal Processing, vol. 48, no. 9, September 2001, pp. 835-841.

  • [2] G. Girlando, G. Palmisano, “Noise Figure and Impedance Matching in RF Cascode Amplifiers,” IEEE Trans. on Circuits and Systems—II: Analog and Digital Signal Processing, vol. 46, no. 11, November 1999, pp. 1388-1396.


Claims
  • 1. A low noise amplifier arrangement comprising a transistor and a bonding pad connected to the input terminal of the transistor, said bonding pad having capacitive coupling to a metal layer connected to a second terminal of the transistor.
  • 2. The amplifier arrangement of claim 1, wherein said transistor is a field-effect transistor and said second terminal is a source of said field-effect transistor.
  • 3. The amplifier arrangement of claim 1, wherein said transistor is a bipolar junction transistor and said second terminal is an emitter of said bipolar junction transistor.
  • 4. The amplifier arrangement of claim 1, wherein said metal layer is a ground shield of the bonding pad.
  • 5. The amplifier arrangement of claim 1, wherein said metal layer is an intermediate layer between a ground shield of the bonding pad and at least one upper layer of the bonding pad.
  • 6. The amplifier arrangement of claim 1, wherein said metal layer is configured to form a capacitor between the input terminal and said second terminal, wherein said second terminal is selected from the group consisting of: the source of said transistor being a field-effect transistor, and the emitter of said transistor being a bipolar junction transistor.
  • 7. A semiconductor device comprising a semiconductor substrate,a transistor formed on the substrate, the transistor having an input terminal and a second terminal,a bonding pad connected to the input terminal of the transistor, said bonding pad comprising a metal layer connected to said second terminal of said transistor.
  • 8. The device of claim 7, wherein said transistor is a field-effect transistor and said second terminal is a source of said field-effect transistor.
  • 9. The device of claim 7, wherein said transistor is a bipolar junction transistor and said second terminal is an emitter of said bipolar junction transistor.
  • 10. The device of claim 7, wherein said metal layer is a ground shield of the bonding pad.
  • 11. The device of claim 10, wherein said metal layer is an intermediate layer between the ground shield of the bonding pad and at least one upper layer of the bonding pad.
  • 12. The device of claim 7, comprising an inductively degenerated low noise amplifier.
  • 13. The device of claim 7, comprising a resistively degenerated low noise amplifier.
  • 14. A receiver comprising the amplifier arrangement of claim 1.
  • 15. An integrated circuit comprising the amplifier arrangement of claim 1.
  • 16. The use of a parasitic bonding pad capacitance as a base-emitter capacitor in a low noise amplifier.
  • 17. The use of a parasitic bonding pad capacitance as a gate-source capacitor in a low noise amplifier.