The subject matter herein generally relates to a semiconductor device, in particular to a thin semiconductor device and method of manufacturing thin semiconductor device.
Referring to
In order to protect the chip 56 on the lower surface of the first wiring board 52, a second wiring board 58 is disposed under the first wiring board 52. The way to dispose the second wiring board 58 is to dispose the plurality of connecting units 59 on the lower surface of the first wiring board 52. The plurality of connecting units 59 can be plurality of solder balls. The first wiring board 52 and the second wiring board 58 are connected through the plurality of connecting units 59 to complete the semiconductor device 50. The semiconductor device 50 can be mounted on another circuit board by soldering or other methods to connect other devices such as controllers.
The semiconductor device 50 of the traditional antenna needs to be provided with two wiring boards (the first wiring board 52 and the second wiring board 58) for stacking, the thickness of the semiconductor device 50 cannot be effectively reduced, and the production program is also complicated.
If a semiconductor device with simple and fast manufacturing process, simple structure and thinner structure can be designed, the above problems can be effectively improved.
Many aspects of the present disclosure are better understood with reference to the following drawings. The components in the drawings are not necessarily drawn to scale, the emphasis instead being placed upon clearly illustrating the principles of the present disclosure. It will be appreciated that for simplicity and clarity of illustration, where appropriate, reference numerals have been repeated among the different figures to indicate corresponding or analogous elements.
It will be appreciated that for simplicity and clarity of illustration, where appropriate, reference numerals have been repeated among the different figures to indicate corresponding or analogous elements. In addition, numerous specific details are set forth in order to provide a thorough understanding of the embodiments described herein. However, it will be understood by those of ordinary skill in the art that the embodiments described herein can be practiced without these specific details. In other instances, methods, procedures, and components have not been described in detail so as not to obscure the related relevant feature being described. Also, the description is not to be considered as limiting the scope of the embodiments described herein. The drawings are not necessarily to scale and the proportions of certain parts have been exaggerated to better illustrate details and features of the present disclosure.
The disclosure is illustrated by way of example and not by way of limitation in the figures of the accompanying drawings, in which like references indicate similar elements. It should be noted that references to “an” or “one” embodiment in this disclosure are not necessarily to the same embodiment, and such references mean “at least one”.
The term “coupled” is defined as connected, whether directly or indirectly through intervening components, and is not necessarily limited to physical connections. The connection can be such that the objects are permanently connected or releasably connected. The term “comprising,” when utilized, means “including, but not necessarily limited to;” it specifically indicates open-ended inclusion or membership in the so-described combination, group, series, and the like.
First, the structure of the thin semiconductor device of the embodiment is described. As shown in
In this embodiment, the thin semiconductor device 1 can be a patch antenna device. The electronic device 12 may be a radio frequency transceiver (RF transceiver). The antenna unit 18 can be a conductive pattern, and a plurality of conductive patterns is disposed on the sealing layer 16 to form an antenna.
In this embodiment, the substrate 10 may be a wiring board, and the formation of the substrate 10 may involve multiple deposition or coating processes, patterning processes, and planarization processes. The deposition or coating processes can be used to form insulating layers or the circuit layers 104. The deposition or coating processes may comprise a spin coating process, an electroplating process, an electroless process, a chemical vapor deposition (CVD) process, a physical vapor deposition (PVD) process, an atomic layer deposition (ALD) process, and other applicable processes and combinations thereof. The patterning process can be used to pattern the insulating layers and circuit layers 104. The patterning process may comprise a photolithography process, an energy beam drilling process (for example, a laser beam drilling process, an ion beam drilling process, or an electron beam drilling process), an etching process, a mechanical drilling process, or other applicable processes and combinations. The planarization process can be used to provide a flat top surface for the insulating layers and circuit layers 104 to facilitate subsequent processes. The planarization process may comprise a mechanical polishing process, a chemical mechanical polishing (CMP) process, or other applicable processes and combinations thereof.
The substrate 10 can also be formed by an additive buildup process. The additive buildup process may comprise the alternating stacking of one or more dielectric layers and corresponding conductive patterns or traces of the circuit layers 104. The conductive patterns or traces allow electrical traces out of the occupied space of the electronic device, or are in a fan-shaped layout allowing the electrical traces into the occupied space of the electronic device 12. The conductive patterns can be formed by a plating process such as an electroplating process or an electroless plating process. The conductive pattern may comprise a conductive material, such as copper or other plateable metals. The dielectric layer of the substrate 10 can be made of a photo-definable organic dielectric such as polyimide (PI), benzocyclobutene (BCB), or polybenzoxazole (PBO). In other embodiments, the dielectric material of the substrate 10 may also be an inorganic dielectric layer. The inorganic dielectric layer may comprise silicon nitride (Si3N4), silicon oxide (SiO2), or SiON. The inorganic dielectric layer can be formed by growing an inorganic dielectric layer using an oxidation or nitridation process.
According to the embodiment of the disclosure, the substrate 10 may further comprise a carrier, for example, a printed circuit board (PCB) or a laminated substrate. The carrier can be formed by laminating and build-up methods, which are wholly conventional and will be fully appreciated by those of ordinary skill in the art. The material of the dielectric structure inside the carrier may comprise epoxy resin, phenolic resin, glass epoxy resin, polyimide, polyester, epoxy molding compound, or ceramic. The material of the wires inside the carrier may comprise copper, iron, nickel, gold, silver, palladium, or tin.
In
In this embodiment, when the electronic device 12 is disposed on the first surface 100, the electronic device 12 can be coupled to the circuit layer 104 of the substrate 10. Before installing the electronic device 12, a soldering layer can be disposed on the first surface 100 to assist in installing the electronic device 12 on the first surface 100. In this embodiment, the soldering layer may be Flux, and in one embodiment, the flux may be one of three types of fluxes: inorganic flux, organic flux, or rosin flux. Inorganic flux can be added with hydrochloric acid, hydrofluoric acid, zinc chloride or ammonium chloride and other inorganic acids and inorganic salt flux. The organic flux can be a weakly acidic organic acid flux such as lactic acid or citric acid. Rosin-based fluxes are fluxes with rosin added. In addition, the electronic device 12 can be coupled to the circuit layer 104 of the substrate 10 via conductive wires such as gold wires, copper wires or aluminum wires.
In this embodiment, the wire 14 can be a conductive wire such as gold wire, copper wire or aluminum wire, so as to connect to the circuit layer 104 of the substrate 10. In this embodiment, the wire 14 can be coupled to the circuit layer 104 of the substrate 10 through wire bonding.
In this embodiment, the molding layer 16 can be Epoxy Molding Compound, (EMC). In other embodiment, the material of the molding layer 16 can be epoxy resin, cyanate resin, bismaleimide triazine, glass fiber, polybenzoxazole, polyimide, nitride (for example, silicon nitride), oxide (for example, silicon oxide), silicon oxynitride, or similar insulating materials, insulating organic material mixed with epoxy resin and glass fiber, or ceramic material.
The plurality of antenna units 18 can be fixed on the sealing layer 16 through an adhesive layer 17. In this embodiment, the adhesive layer 17 can be silver glue, which is laid on the molding layer 16 by screen printing silver glue, so as to provide the effect of fixing the antenna unit 18.
The plurality of connecting units 20 can be implanted on the second surface 102 of the substrate 10 through Ball Implantation, and the thin semiconductor device 1 according to an embodiment of the present application can utilize the plurality of connecting units 20 and external devices (such as printed circuit boards) are electrically connected. In this embodiment, the plurality of connecting units 20 is solder balls, and the material may be the plurality of tin balls.
After the structure of the thin semiconductor device 1 has been described above, the method for manufacturing the thin semiconductor device 1 of the embodiment will be described next. Please refer to
Next, as shown in
After the step of installing the electronic device 12 on the substrate 10, please refer to
Please refer to
Please refer to
Finally, referring to
The thin semiconductor device 1 in this embodiment can be fabricated through the sequential steps disclosed in the above-mentioned
Many details are often found in the relevant art and many such details are neither shown nor described. Even though numerous characteristics and advantages of the present technology have been set forth in the foregoing description, together with details of the structure and function of the present disclosure, the disclosure is illustrative only, and changes may be made in the detail, especially in matters of shape, size, and arrangement of the parts within the principles of the present disclosure, up to and including the full extent established by the broad general meaning of the terms used in the claims. It will therefore be appreciated that the embodiments described above may be modified within the scope of the claims.
Number | Date | Country | Kind |
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202310426168.8 | Apr 2023 | CN | national |