Patent Application
20200234990
The various aspects and embodiments described herein pertain generally to a transfer device, a substrate processing system, a transfer method and a substrate processing method.
Recently, to cope with a demand for reducing a size and a weight of a semiconductor device, a substrate such as a semiconductor wafer is thinned by grinding a second main surface of the substrate opposite to a first main surface on which an element, a circuit, a terminal or the like is formed.
A grinding apparatus described in Patent Document 1 is equipped with a supply cassette table, a recovery cassette table and a carry-in/out robot. A supply cassette is detachably placed on the supply cassette table, and a recovery cassette is detachably placed on the recovery cassette table.
The supply cassette and the recovery cassette have the same configuration. Multiple pairs of left and right shelf plates are vertically arranged on inner surfaces of both sidewalls of the supply cassette with an opening therebetween. A work unit is disposed on each pair of left and right shelf plates. Here, the work unit is a whole structure in which a wafer is supported by a frame with an adhesive tape therebetween.
The carry-in/out robot has a fork member configured to support the work unit from below. The fork member is of a plate shape and is biforked from a base end thereof. The work unit is taken out from the supply cassette by being supported on the fork member. Then, after grinding, cleaning, drying and so forth are performed on the wafer, the work unit is accommodated in the recovery cassette by the carry-in/out robot.
The fork member of the carry-in/out robot of Patent Document 1 is inserted between a plurality of work units arranged in a vertical direction within the supply cassette to take out the work units one by one. Therefore, a size of the fork member in the vertical direction is set to be thinner than a distance between the plurality of work units which are arranged in the vertical direction within the supply cassette. Thus, as strength of the fork member is not enough, the frame may be bent due to gravity, resulting in deformation of the substrate.
In view of the foregoing, exemplary embodiments provide a transfer device capable of suppressing bending of an annular frame that might be caused by gravity, and thus capable of suppressing deformation of a substrate mounted to the frame with a tape therebetween.
In one exemplary embodiment, there is provided a transfer device configured to hold a substrate to be thinned and configured to be moved along a transfer path through which the substrate is transferred. The transfer device includes a grip member configured to hold a frame to which the substrate is mounted with a tape therebetween; a guide member configured to be moved along the transfer path together with the grip member and configured to place thereon the frame held by the grip member; and a moving mechanism configured to move the grip member with respect to the guide member to move the frame held by the grip member along the guide member.
According to the exemplary embodiment, it is possible to provide the transfer device capable of suppressing bending of the frame that might be caused by gravity, and thus capable of suppressing deformation of the substrate mounted to the frame with the tape therebetween.
Hereinafter, exemplary embodiments of the present disclosure will be described in detail with reference to the accompanying drawings. In the various drawings, same or corresponding parts will be assigned same reference numerals, and redundant description may be omitted. In the following description, the X direction, the Y direction and the Z direction are orthogonal to each other, and the X and Y directions are horizontal directions whereas the Z direction is a vertical direction. A rotational direction around a vertical axis is also referred to as “θ direction.” In the present specification, below means vertically below, and above means vertically above.
<Substrate Before being Processed by Substrate Processing System>
A protection tape 14 is bonded to the first main surface 11 of the substrate 10. The protection tape 14 is configured to protect the first main surface 11 of the substrate 10 while processings such as dicing and thinning are being performed, thus protecting the elements, the circuits, the terminals and so forth which are formed on the first main surface 11 in advance.
The protection tape 14 includes a sheet member and an adhesive coated on a surface of the sheet member. The adhesive may be hardened if an ultraviolet ray is irradiated thereto, so that adhesive strength thereof may be reduced. After the adhesive strength is weakened, the protection tape 14 can be peeled off from the substrate 10 in a simple manner through a peeling operation.
<Substrate after being Processed by Substrate Processing System>
The adhesive tape 18 includes a sheet member and an adhesive coated on a surface of the sheet member. The adhesive tape 18 is mounted to the frame 19 to cover an opening of the frame 19 having an annular shape, and is bonded to the substrate 10 in the opening of the frame 19. Accordingly, it is possible to transfer the substrate 10 while holding the frame 19, so that handling of the substrate 10 can be eased.
A DAF (Die Attach Film) 15 may be provided between the adhesive tape 18 and the substrate 10, as illustrated in
The DAF 15 is formed to be smaller than the opening of the frame 19 and is disposed at an inner side of the frame 19. The DAF 15 covers an entire second main surface 12 of the substrate 10. If stacking of the chips 13 is not performed, the DAF 15 is not necessary. In such a case, the substrate 10 may be fixed to the frame 19 with only the adhesive tape 18 therebetween.
<Substrate Processing System>
The substrate processing system 1 performs various processings such as dicing of the substrate 10, thinning of the substrate 10, ultraviolet irradiation to the protection tape 14, mounting of the substrate 10, peeling of the protection tape 14 from the substrate 10, ID attachment to the frame 19, and so forth.
The substrate processing system 1 is equipped with a controller 20, a carry-in unit 30, a carry-out unit 40, a transfer path 50, a transfer unit 58 (transfer device), and various kinds of processing units. The processing units may include, by way of example, a dicing unit 100, a thinning unit 200, an ultraviolet irradiating unit 400, a mounting unit 500, a peeling unit 600 and an ID attaching unit 700, though not particularly limited.
The controller 20 is implemented by, for example, a computer, and includes, as illustrated in
The program of the controller 20 is stored in information recording medium and installed from the information recording medium. The information recording medium may be, by way of non-limiting example, a hard disk (HD), a flexible disk (FD), a compact disk (CD), a magnet optical disk (MO), a memory card, or the like. Further, the program may be installed by being downloaded from a server through Internet.
The carry-in cassettes 35 each accommodating therein substrates 10 before being processed are carried into the carry-in unit 30. Each carry-in cassette 35 accommodates therein a multiple number of substrates 10, which are not yet mounted to the frame 19 with the adhesive tape 18 therebetween, before being thinned while maintaining a regular distance therebetween in the Z direction.
To accommodate the multiple number of substrates 10 at the regular distance therebetween in the Z direction, the carry-in cassette 35 has multiple pairs of horizontally placed accommodation plates 36 arranged in the Z direction at a regular distance therebetween. Each pair of accommodation plates 36 supports both ends of the substrate 10 in the Y direction, as illustrated in
The carry-in unit 30 is equipped with multiple placing plates 31 on which the carry-in cassettes 35 are placed. The placing plates 31 are arranged in a row in the Y direction. The number of the placing plates 31 is not limited to the shown example.
The carry-out cassettes 45 each accommodating therein the substrates 10 after being processed are carried out from the carry-out unit 40. Each carry-out cassette 45 accommodates therein a multiple number of substrates 10, which are mounted to the frame 19 with the adhesive tape 18 therebetween, after being thinned while maintaining a regular distance therebetween in the Z direction.
To accommodate the multiple number of substrates 10 at the regular distance therebetween in the Z direction, the carry-out cassette 45 has multiple pairs of horizontally placed accommodation plates 46 arranged in the Z direction at a regular distance therebetween. Each pair of accommodation plates 46 supports both ends of the frame 19 in the Y direction, as illustrated in
The carry-out unit 40 is equipped with multiple placing plates 41 on which the carry-out cassettes 45 are placed. The placing plates 41 are arranged in a row in the Y direction. The number of the placing plates 41 is not limited to the shown example.
The transfer path 50 is a path through which the transfer unit 58 transfers the substrate 10 into/from the carry-in unit 30, the carry-out unit 40 and the plurality of processing units, and extends in, for example, the Y direction. A Y-axis guide 51 extending in the Y direction is provided in the transfer path 50, and a Y-axis slider 52 is configured to be movable along the Y-axis guide 51.
The transfer unit 58 is configured to hold the substrate 10 and be moved along the transfer path 50 to deliver the substrate 10 to the carry-in unit 30, the carry-out unit 40 and the plurality of processing units. The transfer unit 58 includes the Y-axis slider 52 as a transfer base body, and so forth.
The carry-in unit 30, the carry-out unit 40 and the plurality of processing units are disposed adjacent to the transfer path 50. By way of example, the transfer path 50 extends in the Y direction, and the carry-in unit 30 and the carry-out unit 40 are provided adjacent to one side of the transfer path 50 in the X direction, and the dicing unit 100, the thinning unit 200, the ultraviolet irradiating unit 400, the mounting unit 500 and the peeling unit 600 are provided adjacent to the opposite side of the transfer path 50 in the X direction. Further, the ID attaching unit 700 is provided adjacent to one side of the transfer path 50 in the Y direction.
According to the present exemplary embodiment, the carry-in unit 30 and the plurality of processing units are disposed adjacent to the transfer path 50. Accordingly, the transfer unit 58 is capable of delivering the substrate 10 to the carry-in unit 30 and the plurality of processing units. Thus, the transfer unit 58 can be multi-functionalized and a work amount of the transfer unit 58 can be increased. Therefore, an operating rate of the transfer unit 58 can be improved.
Further, according to the present exemplary embodiment, the carry-out unit 40 is also disposed adjacent to the transfer path 50. Accordingly, the transfer unit 58 is capable of delivering the substrate 10 to the carry-out unit 40. Thus, the transfer unit 58 can be further multi-functionalized and the work amount of the transfer unit 58 can be further increased. Therefore, the operating rate of the transfer unit 58 can be further improved. Moreover, since the plurality of processing units and the carry-out unit 40 are disposed adjacent to the transfer path 50, if there is an abnormal substrate 10 in one processing unit, this abnormal substrate 10 can be transferred to the carry-out unit 40 promptly without being transferred to another processing unit.
Further, the layout and the number of the processing units are not limited to the example shown in
<Dicing Unit>
The dicing table 110 holds the substrate 10 with the protection tape 14 therebetween. By way of example, the dicing table 110 holds the substrate 10 horizontally with the second main surface 12 of the substrate 10 facing upwards. The dicing table 110 may be, for example, a vacuum chuck, an electrostatic chuck, or the like.
The substrate processing unit 120 is configured to perform the dicing of the substrate 10 held on the dicing table 110, for example. The substrate processing unit 120 includes, by way of example, a laser oscillator 121 and an optical system 122 configured to irradiate a laser beam from the laser oscillator 121 to the substrate 10. The optical system 122 is composed of, for example, a condensing lens configured to concentrate the laser beam from the laser oscillator 121 toward the substrate 10.
The moving mechanism 130 is configured to allow the dicing table 110 and the substrate processing unit 120 to be moved relative to each other. For example, the moving mechanism 130 may be composed of a XYZO stage configured to move the dicing table 110 in the X direction, the Y direction, the Z direction and the 0 direction.
The controller 20 controls the substrate processing unit 120 and the moving mechanism 130 to perform the dicing of the substrate 10 along the streets of the substrate 10. As shown in
In case of forming the modified layer 2 within the substrate 10, a laser beam having permeability for the substrate 10 is used. The modified layer 2 may be formed by, for example, melting and solidifying an inside of the substrate 10 locally. Meanwhile, in case of forming the laser processing groove on the laser irradiation surface of the substrate 10, a laser beam having absorptivity for the substrate 10 is used.
Furthermore, though the substrate processing unit 120 has the laser oscillator 121 configured to irradiate the laser beam to the substrate 10 in the present exemplary embodiment, the substrate processing unit 120 may have a cutting blade configured to cut the substrate 10 or a scrubber configured to form a scribe groove on the surface of the substrate 10.
In addition, in the present exemplary embodiment, the dicing unit 100 is provided as a part of the substrate processing system 1. However, the dicing unit 100 may be provided outside the substrate processing system 1. In such a case, the substrate 10 is carried into the carry-in unit 30 from the outside after being diced, and is then transferred into the thinning unit 200 instead of the dicing unit 100 after being taken out from the carry-in cassette 35 in the carry-in unit 30.
<Thinning Unit>
The thinning unit 200 (see
In case that the division point is formed in the dicing unit 100, a processing stress acts on the substrate 10 in the thinning unit 200, and a crack develops from the division point in the plate thickness direction, so that the substrate 10 is divided into the multiple chips 13.
Further, in case that the modified layer 2 is formed within the substrate 10 in the dicing unit 100, the modified layer 2 is removed as the substrate 10 is thinned in the thinning unit 200.
The thinning unit 200 includes, as illustrated in
The rotary table 201 is pivoted on a central line thereof. A plurality of (e.g., four in
The chuck tables 202 are pivoted on the central line of the rotary table 201 along with the rotary table 201. The central line of the rotary table 201 is vertical. Whenever the rotary table 201 is rotated, the chuck tables 202 facing the rough grinding unit 210, the fine grinding unit 220 and the damage layer removing unit 230 are changed.
Each chuck table 202 is configured to hold the substrate 10 with the protection tape 14 therebetween. The chuck table 202 holds the substrate 10 horizontally with the second main surface 12 of the substrate 10 facing upwards. The chuck table 202 may be, by way of example, a vacuum chuck, an electrostatic chuck, or the like.
The fine grinding unit 220 is configured to perform fine grinding of the substrate 10. A configuration of the fine grinding unit 220 is substantially the same as the configuration of the rough grinding unit 210. However, an average diameter of grinding particles of a rotary whetstone of the fine grinding unit 220 is smaller than an average diameter of grinding particles of the rotary whetstone of the rough grinding unit 210.
The damage layer removing unit 230 is configured to remove a damage layer formed on the second main surface 12 of the substrate 10 due to the rough grinding and the fine grinding. By way of example, the damage layer removing unit 230 removes the damage layer by supplying a processing liquid onto the substrate 10 and performing a wet etching processing. Here, however, a method for removing the damage layer is not particularly limited.
Further, the thinning unit 200 may have a polishing unit configured to polish the substrate 10. A configuration of the polishing unit is substantially the same as that of the rough grinding unit 210. For the polishing of the substrate 10, CMP (Chemical Mechanical Polishing) may be used, for example. Furthermore, the thinning unit 200 may have a gettering unit configured to form a gettering site (for example, a crystal defect or distortion) for capturing an impurity. Though the number of the chuck tables 202 is four in
<Ultraviolet Irradiating Unit>
The ultraviolet irradiating unit 400 has a UV lamp 410 within a housing into which the substrate 10 protected by the protection tape 14 is carried in. The UV lamp 410 irradiates the ultraviolet ray to the protection tape 14 from an opposite side to the substrate 10 with the protection tape 14 therebetween.
<Mounting Unit>
In the mounting unit 500, the substrate 10 after being diced and thinned may be mounted to the frame 19 with only the adhesive tape 18 therebetween. In
The mounting unit 500 is equipped with, for example, a mounting table 510 configured to hold the substrate 10 and the frame 19; and an attaching member 520 configured to attach the substrate 10 to the frame 19 held by the mounting table 510 with the adhesive tape 18 therebetween.
The mounting table 510 holds the frame 19 and the substrate 10 placed in the opening of the frame 19 in parallel to each other. The frame 19 and the substrate 10 may be held horizontally. A top surface of the frame 19 and the top surface of the substrate 10 may have a height difference equal to a thickness of the DAF 15. Further, when the DAF 15 is not used, the top surface of the frame 19 and the top surface of the substrate 10 may be placed on the same plane.
The attaching member 520 may be, by way of example, a laminate roller.
The adhesive tape 18 or the like are supplied while being wound around a core and is used by being unwound from the core. The adhesive tape 18 passes through a gap between the laminate roller and the substrate 10 while sticking to the laminate roller due to a tension, and is thus stacked on the substrate 10. Further, the adhesive tape 18 passes through the gap between the laminate roller and the frame 19 while sticking to the laminate roller due to the tension, and is thus stacked on the frame 19.
The mounting unit 500 allows the adhesive tape 18 to be attached to the frame 19 and the substrate 10 from one side of the frame 19 toward the other side thereof in sequence, as depicted in
<Peeling Unit>
The protection tape 14 passes through a gap between the peeling roller 620 and the substrate 10 while sticking to the peeling roller 620 due to a tension, and is thus peeled off the substrate 10. In the meantime, the peeling table 610 maintains the substrate 10 and the frame 19 flat with the adhesive tape 18 or the like therebetween. The protection tape 14 peeled off the substrate 10 is wound around a non-illustrated winding core.
The peeling unit 600 peels the protection tape 14 off the substrate 10 while transforming the protection tape 14 from one end of the substrate 10 toward the other end thereof in sequence, as illustrated in
Moreover, the peeling unit 600 may peel the protection tape 14 off the substrate 10 in parallel to each other.
<ID Attaching Unit>
The ID attaching unit 700 includes, for example, an ID attachment table 710, a reader 720 and a label printing device 730. The ID attachment table 710 holds the substrate 10 and the frame 19 with the adhesive tape 18 or the like therebetween. The reader 720 reads the identification information 16 previously formed on the substrate 10. The label printing device 730 prints, on the label 17, the identification information 16 read by the reader 720, and attaches the printed label 17 to the frame 19 by a laminator or the like.
<Substrate Processing Method>
Now, a substrate processing method using the substrate processing system 1 having the above-described configuration will be explained.
As depicted in
In the carry-in process S101, the transfer unit 58 takes out the substrate 10 from the carry-in cassette 35 placed in the carry-in unit 30, and then transfers the taken substrate 10 into the dicing unit 100.
In the dicing process S102, the dicing unit 100 performs the dicing of the substrate 10, as shown in
In the thinning process S103, the thinning unit 200 processes the second main surface 12 of the substrate 10 to thereby thin the substrate 10, as illustrated in
In the ultraviolet irradiating process S104, the ultraviolet irradiating unit 400 irradiates the ultraviolet ray to the protection tape 14, as illustrated in
Though the ultraviolet irradiating process S104 may be performed after the mounting process S105, the ultraviolet irradiating process S104 is performed before the mounting process S105 in the present exemplary embodiment. Accordingly, the adhesive tape 18 bonded to the substrate 10 in the mounting process S105 can be suppressed from being degraded due to the irradiation of the ultraviolet ray. The substrate 10 to which the protection tape 14 to which the ultraviolet ray is irradiated in the ultraviolet irradiating unit 400 is attached is transferred into the mounting unit 500 by the transfer unit 58.
In the mounting process S105, the mounting unit 500 mounts the substrate 10 after being diced and thinned to the frame 19 with the adhesive tape 18 therebetween, as depicted in
In the peeling process S106, the peeling unit 600 peels the protection tape 14 off the substrate 10 which is mounted to the frame 19 with the adhesive tape 18 therebetween by the mounting unit 500, as depicted in
In the ID attaching process S107, as illustrated in
In the carry-out process S108, the transfer unit 58 transfers the substrate 10 from the ID attaching unit 700 into the carry-out unit 40 to accommodate the substrate 10 within the carry-out cassette 45 in the carry-out unit 40. The carry-out cassette 45 is carried to the outside from the carry-out unit 40. The chips 13 are individually picked from the substrate 10 which is carried to the outside by being carried in the carry-out cassette 45, so that the chips 13 are obtained.
<Transfer Unit>
The transfer unit 58 is equipped with the first holder 60, the second holder 70 and the third holder 80. The first holder 60 holds the substrate 10 when the substrate 10 is transferred from the carry-in unit 30 into the processing unit (for example, the dicing unit 100). The second holder 70 holds the substrate 10 when the substrate 10 is transferred from the processing unit (for example, the dicing unit 100) to another processing unit (for example, the thinning unit 200). The third holder 80 holds the substrate 10 when the substrate 10 is transferred from the processing unit (for example, the ID attaching unit 700) into the carry-out unit 40.
The first holder 60, the second holder 70 and the third holder 80 are arranged at a distance therebetween in the Z direction, as shown in
<First Holder>
First, the first holder 60 will be described with reference to
The transfer unit 58 is equipped with, as illustrated in
By way of example, a Z-axis guide 53 is fixed to the Y-axis slider 52. A rotary plate 55 is rotatably provided at a Z-axis slider 54 which is configured to be moved along the Z-axis guide 53. An X-axis guide 56 is provided at the rotary plate 55, and the first holder 60 is movable along the X-axis guide 56.
Basically, the X-axis guide 56 guides the first holder 60 in the X direction. However, as it is moved along with the rotary plate 55, the X-axis guide 56 is capable of guiding the first holder 60 in a direction (for example, the Y direction) different from the X direction.
For example, the first holder 60 holds the substrate 10 when the substrate 10 is taken out from the carry-in cassette 35 placed in the carry-in unit 30 and is transferred from the carry-in unit 30 into a first processing unit (for example, the dicing unit 100). Further, in case that the dicing unit 100 is provided at an outside of the substrate processing system 1 and the substrate 10 after being diced in advance is accommodated in the carry-in cassette 35, the first processing unit may be the thinning unit 200.
The first holder 60 is equipped with an attracting portion 63 configured to attract the substrate 10. The attracting portion 63 has, for example, a suction hole, and a gas in the suction hole is sucked in by a suction source such as, by way of example, a vacuum pump. By generating a negative pressure in the attracting portion 63 by operating the suction source, the attracting portion 63 vacuum-attracts the substrate 10. Meanwhile, by stopping the operation of the suction source and opening the suction hole of the attracting portion 63 to the atmosphere, the attracting portion 63 releases the vacuum attraction of the substrate 10. When the vacuum attraction is released, a positive pressure may be generated in the attracting portion 63. In the present specification, the negative pressure refers to a pressure lower than an atmospheric pressure, and the positive pressure refers to a pressure higher than the atmospheric pressure.
For example, the first holder 60 is formed to have a plate shape bi-forked from a base end portion toward a leading end portion thereof. The first holder 60 may have the attracting portion 63 at each of the base end portion and two leading end portions thereof. Further, the number of the attracting portions 63 is not limited to three, and one, two or more than three attracting portions 63 may be provided.
When taking the substrate 10 before being processed from the carry-in cassette 35, the transfer unit 58 first moves the first holder 60 from a position indicated by a dashed double-dotted line in
Now, referring to
First, the transfer unit 58 adjusts a position of the first holder 60 with respect to the carry-in cassette 35 in the Z direction, and then moves the first holder 60 in the X direction from the position indicated by the dashed double-dotted line in
Then, the transfer unit 58 moves the first holder 60 inserted into the carry-in cassette 35 upwards to allow the first holder 60 to be inserted between the pair of accommodation plates 36, thus allowing the substrate 10 to be held by the first holder 60. Accordingly, a width Y1 of the first holder 60 is set to be smaller than a distance Y2 between the pair of accommodation plates 36. Since the distance Y2 between the pair of accommodation plates 36 is smaller than a diameter of the main surface (for example, the second main surface 12) of the substrate 10, the width Y1 of the first holder 60 is set to be smaller than the diameter of the main surface of the substrate 10.
Then, the transfer unit 58 moves the first holder 60 in the X direction from the position indicated by the solid line in
Here, to suppress deformation, such as peeling, of the protection tape 14, the carry-in cassette 35 accommodates the substrate 10 horizontally with the protection tape 14 facing upwards. Meanwhile, since the dicing unit 100 and the thinning unit 200 process the substrate 10, not the protection tape 14, the substrate 10 is horizontally accommodated in the dicing unit 100 and the thinning unit 200 with the protection tape 14 facing downwards.
Thus, to invert the substrate 10 upside down while the substrate 10 is being carried from the carry-in unit 30 to the corresponding processing unit (for example, the dicing unit 100 or the thinning unit 200), the transfer unit 58 is equipped with an inverting unit 65 configured to invert the substrate 10 which is held horizontally by the first holder 60. The inverting unit 65 includes, for example, a motor 66 and a timing belt configured to deliver a rotary motion of the motor 66 to the first holder 60. The inverting unit 65 inverts the substrate 10, which is horizontally held by the first holder 60, by rotating the first holder 60 by 180 degrees around a rotation axis extending in the X direction, for example.
The first holder 60 may have a plurality of (for example, three) attracting portions 63 for attracting the substrate 10 to hold the substrate 10 stably when the substrate 10 is inverted upside down. Further, though the first holder 60 vacuum-attracts the substrate 10 in the present exemplary embodiment, the first holder 60 may attract the substrate 10 electrostatically.
In addition, though the first holder 60 is used only for the transfer of the substrate 10 from the carry-in unit 30 to the first processing unit (for example, the dicing unit 100) in the present exemplary embodiment, the first holder 60 may also be used for a transfer of the substrate 10 from the dicing unit 100 to the thinning unit 200. That is, the first holder 60 may also be used to transfer the substrate 10 from one processing unit to another processing unit.
<Second Holder>
Now, the second holder 70 will be explained with reference to
The transfer unit 58 is equipped with, as illustrated in
By way of example, the Z-axis guide 53 is fixed to the Y-axis slider 52. The rotary plate 55 is rotatably provided at the Z-axis slider 54 configured to be moved along the Z-axis guide 53. The X-axis guide 56 is provided at the rotary plate 55, and the second holder 70 is configured to be movable along the X-axis guide 56 independently from the first holder 60.
Basically, the X-axis guide 56 guides the second holder 70 in the X direction. However, as the X-axis guide 56 is rotated along with the rotary plate 55, it is capable of guiding the second holder 70 in a direction (for example, Y direction) different from the X direction.
Both the first holder 60 and the second holder 70 are mounted to the Y-axis slider 52. Accordingly, it is possible to hold the substrate 10 by selectively using, between the first holder 60 and the second holder 70, an appropriate one for a processing stage of the substrate 10.
The second holder 70 holds the substrate 10 when the substrate 10 is transferred from the dicing unit 100 to the mounting unit 500 via the thinning unit 200 and the ultraviolet irradiating unit 400, for example. The second holder 70 holds the substrate 10 whose strength is reduced by the processings such as the dicing and the thinning.
To suppress a deformation and a damage of the substrate 10, the second holder 70 has an attracting surface 71 (see
As depicted in
The base 74 has a suction hole 75 which communicates with the porous body 72 through the suction grooves of the disc 73, and a gas of this suction hole is sucked in by a suction source such as, by way of example, a vacuum pump. By generating a negative pressure in the porous body 72 by operating the suction source, the porous body 72 vacuum-attracts the substrate 10. Meanwhile, by stopping the operation of the suction source and opening the porous body 72 to the atmosphere, the porous body 72 releases the vacuum attraction of the substrate 10. When releasing the vacuum attraction, a positive pressure may be generated in the porous body 72.
Further, though the second holder 70 vacuum-attracts the substrate 10 in the present exemplary embodiment, the second holder 70 may attract the substrate 10 electrostatically.
The second holder 70 holds the substrate 10 after being thinned in the thinning unit 200. Thus, a processing residue caused by the thinning of the substrate 10 may adhere to the second holder 70.
To remove the processing residue adhering to the second holder 70 after the holding of the substrate 10 by the second holder 70 is released, the substrate processing system 1 is equipped with a cleaning unit 800 (see
To clean the second holder 70 in the cleaning unit 800, the transfer unit 58 moves the second holder 70 from a position indicated by a dashed double-dotted line in
The brush 810 has a nozzle for supplying a cleaning liquid such as water. The nozzle may be provided separately from the brush 810 to supply the cleaning liquid to the brush 810. The cleaning liquid supplied to the brush 810 is collected by a recovery fan 820.
The cleaning unit 800 cleans the attracting surface 71 of the second holder 70 with the brush 810 by moving the brush 810 and the second holder 70 relative to each other as indicated by arrows in
<Third Holder>
Now, the third holder 80 will be discussed with reference to
The transfer unit 58 is equipped with, as illustrated in
By way of example, the Z-axis guide 53 is fixed to the Y-axis slider 52. The rotary plate 55 is rotatably provided at the Z-axis slider 54 configured to be moved along the Z-axis guide 53. The X-axis guide 56 is provided at the rotary plate 55, and the third holder 80 is configured to be movable along the X-axis guide 56 independently from the first holder 60 and the second holder 70.
Basically, the X-axis guide 56 guides the third holder 80 in the X direction. However, as the X-axis guide 56 is rotated along with the rotary plate 55, the X-axis guide 56 is capable of guiding the third holder 80 in a direction (for example, Y direction) different from the X direction.
Only a part (a grip member 81 to be describe later) of the third holder 80 may be movable along the X-axis guide 56. The rest part (a guide member 85 to be descried later) of the third holder 80 may be configured to be movable along the X-axis guide 56 or not to be movable along the X-axis guide 56.
The first holder 60, the second holder 70 and the third holder 80 are mounted to the Y-axis slider 52. Accordingly, it is possible to hold the substrate 10 by selectively using, among the first holder 60, the second holder 70 and the third holder 80, an appropriate one for a processing stage of the substrate 10.
The third holder 80 holds the substrate 10 when the substrate 10 is transferred from the mounting unit 500 to the carry-out unit 40 via the peeling unit 600 and the ID attaching unit 700, for example. The third holder 80 holds the substrate 10 which is mounted to the frame 19 with the adhesive tape 18 therebetween.
By holding the frame 19, the third holder 80 holds the substrate 10 which is bonded, in the opening of the frame 19, to the adhesive tape 18 mounted to the frame 19. The deformation and the damage of the substrate 10 after being subjected to the processings such as the dicing and the thinning can be suppressed.
The third holder 80 has the grip member 81 configured to hold the frame 19 to which the substrate 10 is mounted with the adhesive tape 18 therebetween; and guide members 85 on which the frame 19 held by the grip member 81 is placed. The guide members 85 are moved along the transfer path 50 together with the grip member 81. Since the guide members 85 are not fixed, it is possible to support the frame 19 with the guide members 85 in a wide range of the transfer path 50, and bending of the frame 19 due to gravity can be suppressed. Thus, the deformation of the substrate 10 can be suppressed.
The grip member 81 holds an end portion of the frame 19 in the X direction between a pair of guide members 85 arranged at a distance therebetween in the Y direction, for example. Each guide member 85 has a L-shaped cross sectional shape, and comes into contact with a bottom surface of the frame 19 in the Z direction and end surfaces of the frame 19 in the Y direction when guiding the frame 19 in the X direction.
The transfer unit 58 is equipped with a moving mechanism configured to move the frame 19, which is held by the grip member 81, along the guide member 85 by moving the grip member 81 with respect to the guide member 85. The moving mechanism is composed of, by way of example, the X-axis guide 56 and a motor configured to move the grip member 81 along the X-axis guide 56.
To accommodate the substrate 10 after being processed in the carry-out cassette 45, the transfer unit 58 releases the holding of the substrate 10 with the grip member 81 by moving the grip member 81 from a position indicated by a dashed double-dotted line in
Now, referring to
First, the transfer unit 58 adjusts a position of the third holder 80 in the Z direction at an outside of the carry-out cassette 45, and places a placing surface 86 of the guide member 85, on which the frame 19 is placed, on a horizontal plane substantially level with top surfaces of the accommodation plates 46 of the carry-out cassette 45 in the Z direction. The frame 19 may be placed on the placing surface 86 of the guide member 85 with the adhesive tape 18.
Subsequently, by moving the grip member 81 in the X direction from the position indicated by the dashed double-dotted line of
Then, the transfer unit 58 releases the holding of the frame 19 by the grip member 81, and separates the grip member 81 from the frame 19 by moving the grip member 81 downwards. Thereafter, the transfer unit 58 moves the grip member 81 in the X direction from the position indicated by the solid line of
In the present exemplary embodiment, the frame 19 held with the grip member 81 is moved along the guide member 85 by moving the grip member 81 with respect to the guide member 85. Accordingly, as illustrated in
The grip member 81 includes, by way of example, a base member 82, a frame attracting member 83 and a frame pushing member 84. The base member 82 is formed to have a plate shape, and the frame attracting member 83 and the frame pushing member 84 are provided on a top surface of the base member 82.
The frame attracting member 83 has, for example, a suction hole, and a gas in the suction hole is sucked in by a suction source such as, but not limited to, a vacuum pump. By generating a negative pressure in the frame attracting member 83 by operating the suction source, the frame attracting member 83 vacuum-attracts the frame 19. Meanwhile, by stopping the operation of the suction source and opening the suction hole of the frame attracting member 83 to the atmosphere, the frame attracting member 83 releases the vacuum attraction of the frame 19. When the vacuum attraction is released, a positive pressure may be generated in the frame attracting member 83.
Further, though the frame attracting member 83 vacuum-attracts the frame 19 in the present exemplary embodiment, it may attracted the frame 19 electrostatically.
The frame attracting member 83 may be an elastic body such as rubber. The frame attracting member 83 may be elastically transformed to allow a step between the guide member 85 and the accommodation plates 46 when the frame 19 is loaded onto the accommodation plates 46 from the guide members 85. Thus, a tolerance error in the adjustment of the third holder 80 in the Z direction performed for the first time can be reduced.
The frame pushing member 84 pushes the end portion of the frame 19 in the X direction when the frame 19 is moved with respect to the guide member 85. Here, a plurality of frame pushing members 84 may be arranged in the Y direction at a regular distance therebetween to push the frame 19 in the X direction stably.
Furthermore, the grip member 81 has both the frame attracting member 83 and the frame pushing member 84 in the present exemplary embodiment. However, if the grip member 81 has at least one of the frame attracting member 83 or the frame pushing member 84, the frame 19 can be moved onto the accommodation plates 46 from the guide member 85.
In addition, though the grip member 81 holds the frame 19 from below in the present exemplary embodiment, the grip member 81 may hold the frame 19 from above. In this case, the grip member 81 and the guide member 85 holds the frame 19 therebetween in the vertical direction.
The transfer unit 58 of the above-described exemplary embodiment always moves the first holder 60 and the second holder 70 along the transfer path 50 at the same time. In contrast, a transfer unit of a first modification example moves a first holder 60A and the second holder 70 along the transfer path 50 at the same time only when the second holder 70 is being attracted by the first holder 60A. The first holder 60A and the second holder 70 are mounted to the Y-axis slider 52. Below, description will be provided mainly focusing on distinctive features.
The first holder 60A includes, as depicted in
The first holder 60A is equipped with, as illustrated in
The attracting force supply 93A has, for example, a first suction path 94A configured to generate a negative pressure in the first attracting portions 61A by sucking in the gas from suction holes of the first attracting portions 61A; and a second suction path 95A configured to generate a negative pressure in the second attracting portion 62A by sucking in the gas from a suction hole of the second attracting portion 62A. As the first suction path 94A generates the negative pressure in the first attracting portions 61A, the first attracting portions 61A vacuum-attract the second holder 70. Further, as the second suction path 95A generates the negative pressure in the second attracting portion 62A, the second holder 70 vacuum-attracted to the first attracting portions 61A vacuum-attracts the substrate 10.
The first suction path 94A is connected with a first suction source 97A via a first pipeline which is equipped with a first leak valve 96A or the like. A vacuum pump or the like is used as the first suction source 97A. Further, by closing the first leak valve 96A and operating the first suction source 97A, the negative pressure is generated in the first attracting portions 61A. Meanwhile, by opening the first leak valve 96A and stopping the operation of the first suction source 97A, the negative pressure generated in the first attracting portions 61A is removed. Furthermore, it may be possible to stop the operation of the first suction source 97A and generate a positive pressure in the first attracting portions 61A.
The second suction path 95A is connected with a second suction source 99A via a second pipeline which is equipped with a second leak valve 98A or the like. A vacuum pump or the like is used as the second suction source 99A. Further, by closing the second leak valve 98A and operating the second suction source 99A, the negative pressure is generated in the second attracting portion 62A. Meanwhile, by opening the second leak valve 98A and stopping the operation of the second suction source 99A, the negative pressure generated in the second attracting portion 62A is removed. Furthermore, it may be possible to stop the operation of the second suction source 99A and generate a positive pressure in the second attracting portion 62A.
When the first attracting portions 61A are attracting the second holder 70, the suction hole of the second attracting portion 62A communicates with the suction hole 75 (see
Here, when transferring the substrate 10 from the carry-in unit 30 into one processing unit, the first holder 60A may attract the substrate 10 by the first attracting portions 61A. In the present exemplary embodiment, however, the substrate 10 (see
The third suction path 67A is connected with a third suction source 69A via a third pipeline which is equipped with a third leak valve 68A or the like. A vacuum pump or the like is used as the third suction source 69A. By closing the third leak valve 68A and operating the third suction source 69A, the negative pressure is generated in the third attracting portions 63A. Meanwhile, by opening the third leak valve 68A and stopping the operation of the third suction source 69A, the negative pressure generated in the third attracting portions 63A is removed. Furthermore, it may be possible to stop the operation of the third suction source 69A and generate a positive pressure in the third attracting portions 63A.
Like the transfer unit 58 of the above-described first exemplary embodiment, the transfer unit of the present modification example may be equipped with the inverting unit 65 (see
Furthermore, though the first attracting portions 61A vacuum-attract the second holder 70 in the present exemplary embodiment, the first attracting portions 61A may attract the second holder 70 electrostatically. In addition, though the second attracting portion 62A vacuum-attracts the substrate 10 via the second holder 70 attracted by the first attracting portions 61A in the present exemplary embodiment, the second attracting portion 62A may attract the substrate 10 electrostatically.
The transfer unit of the first modification example detachably attracts the second holder 70 to the first holder 60A which is moved along with the Y-axis slider 52. In a second modification example, however, a transfer unit attracts a first holder 60B and the second holder 70 selectively to a replacement unit 90B which is moved along with the Y-axis slider 52. The first holder 60B and the second holder 70 are mounted to the Y-axis slider 52. Below, description will be provided mainly focusing on distinctive features.
The replacement unit 90B has, as depicted in
The replacement unit 90B is equipped with an attracting force supply 93B (see
The attracting force supply 93B has, for example, a first suction path 94B configured to generate a negative pressure in the first attracting portions 91B by sucking in the gas from suction holes of the first attracting portions 91B; and a second suction path 95B configured to generate a negative pressure in the second attracting portion 92B by sucking in the gas from a suction hole of the second attracting portion 92B. As the first suction path 94B generates the negative pressure in the first attracting portions 91B, the first attracting portions 91B vacuum-attract the first holder 60B or the second holder 70. Further, as the second suction path 95B generates the negative pressure in the second attracting portion 92B, the first holder 60B or the second holder 70 vacuum-attracted to the first attracting portions 91B vacuum-attracts the substrate 10.
The first suction path 94B is connected with a first suction source 97B via a first pipeline which is equipped with a first leak valve 96B or the like. A vacuum pump or the like is used as the first suction source 97B. By closing the first leak valve 96B and operating the first suction source 97B, the negative pressure is generated in the first attracting portions 91B. Meanwhile, by opening the first leak valve 96B and stopping the operation of the first suction source 97B, the negative pressure generated in the first attracting portions 91B is removed. Furthermore, it may be possible to stop the operation of the first suction source 97B and generate a positive pressure in the first attracting portions 91B.
The second suction path 95B is connected with a second suction source 99B via a second pipeline which is equipped with a second leak valve 98B or the like. A vacuum pump or the like is used as the second suction source 99B. By closing the second leak valve 98B and operating the second suction source 99B, the negative pressure is generated in the second attracting portion 92B. Meanwhile, by opening the second leak valve 98B and stopping the operation of the second suction source 99B, the negative pressure generated in the second attracting portion 92B is removed. Furthermore, it may be possible to stop the operation of the second suction source 99B and generate a positive pressure in the second attracting portion 92B.
When the first attracting portions 91B are attracting the first holder 60B, the suction hole of the second attracting portion 92B communicates with suction holes of third attracting portions 63B (see
Further, when the first attracting portions 91B are attracting the second holder 70, the suction hole of the second attracting portion 92B communicates with the suction hole 75 (see
Like the transfer unit 58 of the above-described first exemplary embodiment, the transfer unit of the present modification example may be equipped with the inverting unit 65 (see
Furthermore, though the first attracting portions 91B vacuum-attract the first holder 60B and the second holder 70 selectively in the present exemplary embodiment, the first attracting portions 91B may attract the first holder 60B and the second holder 70 electrostatically. Likewise, though the second attracting portion 92B vacuum-attracts the substrate 10 via the first holder 60B or the second holder 70 attracted to the first attracting portions 91B, the second attracting portion 92B may attract the substrate 10 electrostatically.
In the transfer unit 58 according to the first exemplary embodiment, the Y-axis slider 52 to which the first holder 60 and the second holder 70 are mounted and the Y-axis slider 52 to which the third holder 80 is mounted are one and same. This is the same in the first modification example and the second modification example. In contrast, in a transfer unit 58C according to a third modification example, a Y-axis slider 52 to which the first holder 60 and the second holder 70 are mounted and a Y-axis slider 52 to which the third holder 80 is mounted are different. Below, distinctive features will be mainly described.
Like the transfer unit 58 of the above-described first exemplary embodiment, the transfer unit 58C of the third modification example is equipped with the first holder 60, the second holder 70 and the third holder 80.
The first holder 60 and the second holder 70 are moved along with the Y-axis slider 52. Accordingly, it is possible to hold the substrate 10 by selectively using, between the first holder 60 and the second holder 70, an appropriate one for a processing stage of the substrate 10. The first holder 60 and the second holder 70 may be moved at the same time in the Y direction, the Z direction and the 0 direction, and be moved independently in the X direction.
Further, the first holder 60 and the second holder 70 need to be moved along with the Y-axis slider 52. Here, as in the first modification example, the second holder 70 may be detachably attracted to the first holder 60A. Further, as in the second modification example, the first holder 60B and the second holder 70 may be selectively attracted to the replacement unit 90B.
The first holder 60 and the second holder 70 holds a substrate 10 before being mounted to the frame 19, whereas the third holder 80 holds a substrate 10 after being mounted to the frame 19. Thus, a region where the substrate 10 is transferred by the first holder 60 and the second holder 70 and a region where the substrate 10 is transferred by the third holder 80 are different except a region near the mounting unit 500.
Accordingly, unlike in the transfer unit 58 of the above-described exemplary embodiment, a Y-axis slider 52 to which the first holder 60 and the second holder 70 are mounted and a Y-axis slider 52 to which the third holder 80 is mounted are different in the transfer unit 58C of the present modification example. Since the first holder 60/the second holder 70 and the third holder 80 can be moved independently in the Y direction, the substrate 10 before being mounted to the frame 19 and the substrate 10 after being mounted to the frame 19 can be transferred at the same time.
In the above-described first exemplary embodiment and modification examples thereof, the substrate 10 before being thinned and before being mounted to the frame 19 with the adhesive tape 18 therebetween is accommodated in the carry-in cassette 35. In a second exemplary embodiment, a substrate 10 before being thinned and after being mounted to the frame 19 with the protection tape 14 therebetween is accommodated in a carry-in cassette 35D. Below, distinctive features will be mainly described.
<Substrate Before being Processed by Substrate Processing System>
The protection tape 14 is attached to an annular frame 19 to cover an opening of the frame 19 and bonded to the substrate 10 in the opening of the frame 19. Accordingly, it is possible to transfer the substrate 10 while holding the frame 19, so that handling of the substrate 10 can be improved.
<Substrate after being Processed by Substrate Processing System>
Further, though the substrate 10 after being processed is mounted to the frame 19 with the protection tape 14 therebetween in the present exemplary embodiment, the substrate 10 may be mounted to the frame 19 with an adhesive tape 18 (see
The adhesive tape 18 is bonded to a second main surface 12 of the substrate 10 after being thinned. A DAF 15 (see
The frame 19 to which the adhesive tape 18 is attached and the frame 19 to which the protection tape 14 is attached may be same or different. In the former, the number of the used frame 19 can be reduced. In this case, after the thinning of the substrate is performed, the frame 19 is sufficiently cleaned, so that a processing residue is removed from the frame 19. Then, the adhesive tape 18 is attached to the frame 19. Meanwhile, in the latter, a process of cleaning the frame 19 after the thinning of the substrate need not be performed.
<Substrate Processing System>
A substrate processing system 1D performs various processings such as dicing of the substrate 10, thinning of the substrate 10, and so forth. The substrate processing system 1D is equipped with a controller 20, a carry-in unit 30D, a carry-out unit 40D, a transfer path 50D, a transfer unit 58D, and various kinds of processing units. The processing units are not particularly limited. By way of example, the processing units include a dicing unit 100D and a thinning unit 200D.
The carry-in cassettes 35D each accommodating therein substrates 10 before being processed are carried into the carry-in unit 30D. Each carry-in cassette 35D accommodates therein a multiple number of substrates 10 before being thinned while maintaining a regular distance therebetween in the Z direction. Here, each substrate 10 is already mounted to the frame 19 with the protection tape 14 therebetween.
To accommodate the multiple number of substrates 10 at the regular distance therebetween in the Z direction, the carry-in cassette 35D has multiple pairs of horizontally placed accommodation plates 36D arranged in the Z direction at a regular distance therebetween. Each pair of accommodation plates 36D supports both ends of the frame 19 in the Y direction, as illustrated in
The carry-in unit 30D is equipped with multiple placing plates 31D on which the carry-in cassettes 35D are placed. The placing plates 31D are arranged in a row in the Y direction. The number of the placing plates 31D is not limited to the shown example.
The carry-out cassettes 45D each accommodating therein the substrates 10 after being processed are carried out from the carry-out unit 40D. Each carry-out cassette 45D accommodates therein a multiple number of substrates 10 after being thinned while maintaining a regular distance therebetween in the Z direction. Here, each substrate 10 is accommodated while being mounted to the frame 19 with the protection tape 14 therebetween.
To accommodate the multiple number of substrates 10 at the regular distance therebetween in the Z direction, the carry-out cassette 45D has multiple pairs of horizontally placed accommodation plates 46D arranged in the Z direction at a regular distance therebetween. Each pair of accommodation plates 46D supports both ends of the frame 19 in the Y direction, as illustrated in
The carry-out unit 40D is equipped with multiple placing plates 41D on which the carry-out cassettes 45D are placed. The placing plates 41D are arranged in a row in the Y direction. The number of the placing plates 41D is not limited to the shown example.
The transfer path 50D is a path through which the transfer unit 58D transfers the substrate 10 into/from the carry-in unit 30D, the carry-out unit 40D and the plurality of processing units, and extends in, for example, the Y direction. A Y-axis guide 51D extending in the Y direction is provided in the transfer path 50D, and a Y-axis slider 52D is configured to be movable along the Y-axis guide 51D.
The transfer unit 58D is configured to hold the substrate 10 and be moved along the transfer path 50D to deliver the substrate 10 to the carry-in unit 30D, the carry-out unit 40D and the plurality of processing units. The transfer unit 58D includes the Y-axis slider 52D as a transfer base body, and so forth.
The carry-in unit 30D, the carry-out unit 40D and the plurality of processing units are disposed adjacent to the transfer path 50D. By way of example, the transfer path 50D extends in the Y direction, and the carry-in unit 30D and the carry-out unit 40D are provided adjacent to one side of the transfer path 50D in the X direction, and the dicing unit 100D and the thinning unit 200D are provided adjacent to the opposite side of the transfer path 50D in the X direction.
According to the present exemplary embodiment, the carry-in unit 30D and the plurality of processing units are disposed adjacent to the transfer path 50D. Accordingly, the transfer unit 58D is capable of delivering the substrate 10 to the carry-in unit 30D and the plurality of processing units. Thus, the transfer unit 58D can be multi-functionalized and a work amount of the transfer unit 58D can be increased. Therefore, an operating rate of the transfer unit 58D can be improved.
Further, according to the present exemplary embodiment, the carry-out unit 40D is also disposed adjacent to the transfer path 50D. Accordingly, the transfer unit 58D is capable of delivering the substrate 10 to the carry-out unit 40D. Thus, the transfer unit 58D can be further multi-functionalized and the work amount of the transfer unit 58D can be further increased. Therefore, the operating rate of the transfer unit 58D can be further improved. Moreover, since the plurality of processing units and the carry-out unit 40D are disposed adjacent to the transfer path 50D, if there is an abnormal substrate 10 in one processing unit, this abnormal substrate 10 can be transferred to the carry-out unit 40D promptly without being transferred to another processing unit.
Further, the layout and the number of the processing units are not limited to the example shown in
<Dicing Unit>
Further, though the dicing unit 100D is provided as a part of the substrate processing system 1D in the present exemplary embodiment, the dicing unit 100D may be provided at an outside of the substrate processing system 1D. In such a case, the substrate 10 is carried into the carry-in unit 30D from the outside after being diced, and is then transferred into the thinning unit 200D instead of the dicing unit 100D after being taken out from the carry-in cassette 35D in the carry-in unit 30D.
<Thinning Unit>
The thinning unit 200D (see
When viewed from a direction perpendicular to an attracting surface (for example, a top surface in
<Substrate Processing Method>
Now, a substrate processing method using the substrate processing system 1D having the above-described configuration will be explained.
As depicted in
In the carry-in process S201, the transfer unit 58D takes out the substrate 10 from the carry-in cassette 35D placed in the placing unit 30D, and then transfers the taken substrate 10 into the dicing unit 100D.
In the dicing process S202, the dicing unit 100D performs the dicing of the substrate 10, as shown in
In the thinning process S203, the thinning unit 200D processes the second main surface 12 of the substrate 10 to thereby thin the substrate 10, as illustrated in
In the carry-out process S204, the transfer unit 58D transfers the substrate 10 from the thinning unit 200D into the carry-out unit 40D to accommodate the substrate 10 within the carry-out cassette 45D in the carry-out unit 40D. The carry-out cassette 45D is carried to the outside from the carry-out unit 40D. The chips 13 are individually picked from the substrate 10 which is carried to the outside along with the carry-out cassette 45D, so that the chips 13 are obtained.
<Transfer Unit>
A configuration of the transfer unit 58D is the same as the configuration of the transfer unit 58 of the first exemplary embodiment except that the transfer unit 58D does not have the first holder 60 and the second holder 70 illustrated in
The holder 80 is configured to hold the substrate 10 when the substrate 10 is transferred from the carry-in unit 30D into the carry-out unit 40D via the dicing unit 100D and the thinning unit 200D, for example. The holder 80 holds the substrate 10 which is mounted to the frame 19 with the protection tape 14 therebetween.
By holding the frame 19, the holder 80 holds the substrate 10 which is bonded, in an opening of the frame 19, to the protection tape 14 which is attached to the frame 19. Thus, deformation and damage of the substrate 10 after being subjected to processings such as dicing and thinning can be suppressed.
The holder 80 has a grip member 81 configured to hold the frame 19 to which the substrate 10 is mounted with the protection tape 14 therebetween; and a guide member 85 on which the frame 19 held by the grip member 81 is placed. The guide member 85 is moved along the transfer path 50D together with the grip member 81. Since the guide member 85 is not fixed, it is possible to support the frame 19 with the guide member 85 in a wide range of the transfer path 50D, and bending (deformation) of the frame 19 due to gravity can be suppressed. Thus, a deformation of the substrate 10 can be suppressed.
The transfer unit 58D is equipped with a moving mechanism configured to move the frame 19, which is held by the grip member 81, along the guide member 85 by moving the grip member 81 with respect to the guide member 85. Thus, the frame 19 can be taken out of the carry-in cassette 35D in the state that the guide member 85 is disposed at an outside of the carry-in cassette 35D. Further, the frame 19 can be accommodated into the carry-out cassette 45D in the state that the guide member 85 is disposed at an outside of the carry-out cassette 45D. In this way, since the guide member 85 is not inserted into the carry-in cassette 35D or the carry-out cassette 45D, a size of the guide member 85 in the Z direction can be designed without needing to consider an internal structure of the carry-in cassette 35D or the carry-out cassette 45D. Therefore, strength of the guide member 85 can be enhanced, so that bending (deformation) of the guide member 85 by gravity can be suppressed. As a result, the bending (deformation) of the frame 19 by the gravity can be suppressed, so that the deformation of the substrate 10 can be suppressed.
Now, an operation of the transfer unit 58D to take out the substrate 10 before being processed from the carry-in cassette 35D will be explained. Since an operation of the transfer unit 58D to accommodate the substrate 10 after being processed into the carry-out cassette 45D is the same as that of the first exemplary embodiment, redundant description thereof will be omitted.
First, the transfer unit 58D inserts the grip member 81 into the carry-in cassette 35D by moving the grip member 81 in the X direction with respect to the guide member 85 after adjusting a position of the holder 80 in the Z direction at the outside of the carry-in cassette 35D. The grip member 81 is inserted between a plurality of frames 19 arranged in the Z direction within the carry-in cassette 35D.
Then, by adjusting the position of the holder 80 in the Z direction, the transfer unit 58D places a placing surface 86 of the guide member 85, on which the frame 19 is placed, on a horizontal plane substantially level with a top surface of the accommodation plate 36D of the carry-in cassette 35D. The frame 19 may be placed on the placing surface 86 of the guide member 85 with the protection tape 14 therebetween. At this time, the transfer unit 58D holds the frame 19 with the grip member 81.
Thereafter, the transfer unit 58D takes out the grip member 81 from the inside of the carry-in cassette 35D by moving the grip member 81 in the X direction with respect to the guide member 85. Accordingly, the frame 19 is moved onto the guide member 85 from the accommodation plate 36D, so that the frame 19 and the substrate 10 are retreated from the inside of the carry-in cassette 35D.
The operation in which the transfer unit 58D delivers the substrate 10 into the carry-in cassette 35D or the carry-out cassette 45D and an operation in which the transfer unit 58D delivers the substrate 10 into each processing unit are same. Thus, description of the operation of the transfer unit 58D for delivering the substrate 10 into each processing unit will be omitted.
Though the transfer unit 58D has the single holder 80 in the present exemplary embodiment, the transfer unit 58D may have multiple holders 80. Further, these multiple holders 80 may be fastened to the same Y-axis slider 52D. With this configuration, it is possible to deliver a substrate 10 into one processing unit (for example, the dicing unit 100D) while concurrently receiving a substrate 10 from this one processing unit (for example, the dicing unit 100D).
Now, a third exemplary embodiment will be explained with reference to
As depicted in
The linear guides 181 extend in the X direction, and are disposed in parallel to each other. The linear guides 181 are connected to the grip member 182 and the auxiliary rail members 183, and configured to move the grip member 182 and the auxiliary rail members 183 in the X direction. This pair of linear guides 181 is connected to, for example, the rotary plate 55 shown in the first exemplary embodiment.
The grip member 182 holds an end portion of the frame 19 in the X direction between the pair of linear guides 181. By being moved in the X direction along the pair of linear guides 181, the grip member 182 is capable of moving the frame 19 held by the grip member 182 in the X direction.
The grip member 182 has a base 182A, a pair of sliding members 182B and a clamp 182C. The base 182A is disposed between the pair of linear guides 181. The sliding members 182B are disposed at both ends of the base 182A in the Y direction, respectively, and connected to the pair of linear guides 181, respectively. The clamp 182C is provided at an end portion of the base 182A at the negative X direction side and is positioned at a substantially central portion thereof in the Y direction. By way of example, the clamp 182C is a pair of plate members arranged to face each other in the Z direction. By changing a distance between the pair of plate members in the Z direction, the clamp 182C is capable of switching a state in which it clamps the frame 19 and a state in which it releases the clamping of the frame 19.
The auxiliary rail members 183 are disposed at outsides of the linear guides 181, respectively. The frame 19 held by the grip member 182 is placed on the auxiliary rail members 183. Further, the auxiliary rail members 183 guide the movement of the frame 19 held by the grip member 182 along the X direction.
Each of the pair of auxiliary rail members 183 has a rail 183A extending in the X direction and a sliding member 183B connected to the linear guide 181. The rail 183A has a L-shaped cross sectional shape and comes into contact with a bottom surface of the frame 19 in the Z direction and an end surface of the frame 19 in the Y direction when the frame 19 is moved in the X direction.
The sliding member 183B is disposed at a substantially midway position of the rail 183A. Thus, when viewed from the Z direction, the auxiliary rail member 183 has a substantially T shape. The auxiliary rail members 183 are respectively connected to the linear guides 181 via the sliding members 183B, and configured to be movable in the X direction along the linear guides 181. The sliding member 183B of the auxiliary rail member 183 is connected to the linear guide 181 at a negative X direction side, as compared to the sliding member 182B of the grip member 182.
The pair of auxiliary rail members 183 is configured to be advanced to an apparatus from which the frame 19 is received when the third holder 180 receives the frame 19 with the grip member 182 or to which the frame 19 is handed over when the third holder 180 hands over the frame 19 with the grip member 182.
The alignment unit 184 holds the frame 19 from both sides thereof in a width direction (Y direction) orthogonal to a moving direction (X direction) of the frame 19, thus determining a position of the frame 19 in the width direction. The alignment unit 184 has a pair of plate-shaped members 184A disposed to face each other in the Y direction, and these plate-shaped members 184A are configured to come into contact with the end portions of the frame 19 in the Y direction. Further, the alignment unit 184 is configured such that each of the pair of plate-shaped members 184A is moved between a position (shown in
A notch 183C recessed in the Y direction is formed at a central portion of the rail 183A of the auxiliary rail member 183 in the X direction (near a joint of the T shape), and an upwardly standing portion of the L-shaped cross section of the rail 183A does not exists in the corresponding portion. By being moved in the notch 183C of the auxiliary rail member 183 to an innermost position in the Y direction, the plate-shaped member 184A of the alignment unit 184 can be brought into contact with the frame 19 which is placed in the auxiliary rail members 183.
Further, as the plate-shaped member 184A of the alignment unit 184 is moved to the outer position in the Y direction, the plate-shaped member 184A does not overlap with the rail 183A of the auxiliary rail member 183 in the X direction. Thus, the auxiliary rail member 183 can be moved in the X direction.
Further, the third holder 180 is equipped with a sensor 185 configured to detect presence or absence of the frame 19. The sensor 185 is provided at an end portion of the third holder 180 at the negative X direction side to be located at a midway position between the pair of linear guides 181. When the frame 19 exists directly above the sensor 185, that is, when the frame 19 is normally placed at a preset position of the third holder 180, the sensor 185 is capable of detecting the presence of the frame 19.
The third holder 180 has the same driving system as that of the transfer unit 58 of the first exemplary embodiment as a driving source for the movements of the grip member 182 and the auxiliary rail members 183 in the X direction.
Now, referring to
At an initial position of the third holder 180 shown in
First, the auxiliary rail member 183 is advanced to the negative X direction side, and an end portion of the rail 183A at the negative X direction side faces an end portion of the rail R of the target object at a positive X direction side (see
Then, the grip member 182 is advanced toward the negative X direction side, and the end portion of the frame 19 enters the clamp 182C in the open state. Then, the clamp 182C is turned into the closed state, so that the frame 19 is clamped by the clamp 182C (see
Subsequently, the grip member 182 is retreated to a rear end at the positive X direction side while holding the frame 19 (see
Then, the clamp 182C of the grip member 182 is turned into the open state. Accordingly, the frame 19 is not clamped by the clamp 182C, and is just placed on the clamp 182C and the auxiliary rail member 183. In this state, the grip member 182 is moved to the negative X direction side by a preset amount (see
Then, the alignment unit 184 is moved toward the frame 19 and holds the frame 19 from both sides in the Y direction, so that the frame 19 is set to a preset standby position in the Y direction. Further, the clamp 182C is turned into the closed state to clamp the frame 19 (
Now, referring to
From the state in which the third holder 180 holds the frame 19 at the standby position as illustrated in
Subsequently, the clamp 182C of the grip member 182 is turned into the open state, and the grip member 182 is advanced toward the negative X direction side (
Then, in the state that the clamp 182C of the grip member 182 is moved down and distanced away from the frame 19 (
As stated above, in the third exemplary embodiment, the third holder 180 is equipped with the alignment unit 184 and performs the positioning of the frame 19 in the width direction by holding the frame 19, which is moved to the standby position for the transfer by the grip member 182, from both sides of the frame in the width direction (Y direction). Thus, positioning of the frame 19, which is held by the third holder 180, can be carried out accurately in the X direction and the Y direction. Therefore, when handing over the frame 19 to the target object from the third holder 180 in a subsequent processing, positioning of the frame 19 with respect to the target object is eased, so that the transfer of the frame 19 can be carried out more accurately.
Further, in the third exemplary embodiment, the third holder 180 is equipped with the auxiliary rail members 183. The auxiliary rail members 183 are configured to be advanced toward the rail R of the target object from which the frame 19 is received when the third holder 180 receives the frame 19 with the grip member 182 or to which the frame 19 is handed over when the third holder 180 hands over the frame 19 with the grip member 182. With this configuration, the auxiliary rail members 183 can be accommodated without being protruded from the third holder 180 except when the frame 19 is received or handed over. Thus, a space can be saved, and a turning radius of the third holder 180 can be secured.
Furthermore, in the present exemplary embodiment, the sensor 185 for detecting whether the frame 19 is placed at the preset standby position is provided at the midway position between the pair of linear guides 181 at the end portion of the third holder 180 at the negative X direction side. However, the location of the sensor 185 may not be limited thereto. By way of example, the sensor 185 may be placed at a contact portion between the auxiliary rail member 183 and frame 19 or a contact portion between the alignment unit 184 and the frame 19, or placed at the clamp 182C.
Now, referring to
The second holder 170 is equipped with an arm 171, an intermediate disk 172, a porous pad 173, alignment pins 174, suspension mechanism 175A and a suspension mechanism 175B.
The arm 171 moves the second holder 170 in the X, Y and Z directions by a transfer device such as the transfer unit 58.
The intermediate disk 172 is connected to a bottom portion of the arm 171. The intermediate disk 172 is a circular plate-shaped member having a diameter larger than that of the porous pad 173. The intermediate disk 172 is arranged to be concentric with the porous pad 173. The intermediate disk 172 is made of, for example, a metal.
The porous pad 173 is connected to a bottom portion of the intermediate disk 172. The porous pad 173 is a device capable of attracting and holding the substrate 10 by an attracting surface at a bottom portion thereof. Like the second holder 70 of the first exemplary embodiment, the porous pad 173 includes a disc-shaped porous body 72; a disk 73 having, on a surface in contact with the porous body 72, suction grooves formed in concentric circles and suction grooves formed in a radial shape; and a base 74 accommodating the porous body 72 and the disk 73.
The alignment pins 174 are protruded from a bottom surface of the intermediate disk 172 in a vertical direction. The alignment pins 174 are arranged at a regular distance therebetween in a circumferential direction to be respectively located at positions outer than the porous pad 173. Lengths of the alignment pins 174 in the Z direction are uniform. The alignment pins 174 are formed such that leading ends thereof are protruded below a bottom surface of the porous pad 173 when the third holder 180 is in a no-load state without being contact with another member (see
The suspension mechanisms 175A (first suspension mechanisms) connect the arm 171 and the intermediate disk 172. Each suspension mechanisms 175A is configured to allow the intermediate disk 172 to be suspended from the arm 171 by an elastic member such as a spring, and a movement of the suspension mechanism 175A except that in the Z direction is restricted. Accordingly, when an external force is applied from above or below, the suspension mechanism 175A is appropriately contracted or extended to shorten or increase a distance between the members. The suspension mechanisms 175A are arranged at a regular distance along the circumferential direction to be respectively placed at positions substantially equally spaced from a center of the circular intermediate disk 172 in a radial direction, as illustrated in
The suspension mechanism 175B (second suspension mechanism) connects the arm 171 and the porous pad 173 (see
The intermediate disk 172 is provided with a hole at a position where the pin 175B1 is disposed when viewed from the Z direction, and a sleeve 172A made of a resin is formed at an inner surface of this hole. In the state that the pin 175B1 penetrates the sleeve 172A, the pin 175B1 allows the porous pad 173 to be suspended from the arm 171. The pin 175B1 is made of a material, such as a metal, which is not elastically transformed in the Z direction. Further, the intermediate disk 172 is also made of, for example, a metal. Since the pin 175B1 is inserted through the sleeve 172A, abrasion (wear) of the pin 175 and the intermediate disk 172 due to a direct contact therebetween can be suppressed.
The elastic body 175B2 is disposed around the pin 175B1. By providing the elastic body 175B2, shaking or vibration of the pin 175B1 and the porous pad 173 with respect to the arm 171 can be reduced.
Further, although
The suspension mechanisms 175A and the elastic body 175B2 of the suspension mechanism 175B may be, by way of example, spring type cylinders or air cylinders. Further, in the present exemplary embodiment, the suspension mechanisms 175A and the elastic body 175B2 of the suspension mechanism 175B are schematically illustrated as spherical shapes as illustrated in
Referring to
As shown in
First, the alignment pins 174 collide with a top surface of the attracting device C (
As the arm 171 is moved downwards from this state, the suspension mechanisms 175A and the elastic body 175B2 of the suspension mechanism 175B are contracted. Accordingly, the pin 175B1 of the suspension mechanism 175B advances down below the intermediate disk 172, so that the porous pad 173 is moved down and comes into surface contact with the substrate 10 (
Subsequently, while maintaining the contact state between the porous pad 173 and the substrate 10, the attraction by the attracting device C of the target object in the downward direction is stopped (
Then, if the arm 171 is begun to be moved upwards, the contractions of the suspension mechanism 175A and the elastic body 175B2 of the suspension mechanism 175B are released, and the porous pad 173 is raised to an initial position in the state where it attracts the substrate 10 (
Now, referring to
As depicted in
First, the alignment pins 174 collide with the top surface of the attracting device C (
As the arm 171 is moved downwards from this state, the suspension mechanisms 175A and the elastic body 175B2 of the suspension mechanism 175B are contracted. Accordingly, the pin 175B1 of the suspension mechanism 175B advances down below the intermediate disk 172, so that the porous pad 173 and the substrate 10 are moved down, and the substrate 10 comes into surface contact with the top surface of the attracting device C (
Subsequently, while maintaining the contact state between the attracting device C and the substrate 10, the attraction by the porous pad 173 in the upward direction is stopped (
Then, if the arm 171 is begun to be moved upwards, the contractions of the suspension mechanisms 175A and the elastic body 175B2 of the suspension mechanism 175B are released, and the porous pad 173 is distanced away from the substrate 10 and raised to the initial position (
In the fourth exemplary embodiment, the alignment pins 174 are configured to protrude downwards below the attracting surface at the bottom portion of the porous pad 173 when they are in the no-load state. Thus, attracting surface can be adjusted to face the target object in parallel accurately before the porous pad 173 comes into contact with the target object. Further, by providing the intermediate disk 172 between the arm 171 and the porous pad 173 and providing the suspension mechanisms 175A and 175B between these respective members, a force from the arm 171 can be completely delivered to the entire surface of the porous pad 173 via the suspension mechanisms 175A and 175B in the state that the porous pad 173 and the attracting device C are aligned to be parallel to each other. Accordingly, the contact at the attracting surface can be further enhanced. Therefore, the attraction of the substrate 10 to the porous pad 173 and the handover of the substrate 10 from the porous pad 173 can be carried out more stably.
Further, if a descending distance (length) of the arm 171 after the alignment pins 174 come into contact (collide) with the attracting device C is varied depending on a thickness of the substrate 10, the attraction of the substrate 10 to the porous pad 173 and the handover of the substrate 10 from the porous pad 173 can be carried out even more stably.
So far, the exemplary embodiments of the transfer device, the substrate processing system, the transfer method and the substrate processing method have been described. However, the present disclosure is not limited to the above-described exemplary embodiments, and various changes and modifications may be made without departing from the scope of the present disclosure as claimed in the claims.
This international application claims priority to Japanese Patent Application No. 2017-136322, field on Jul. 12, 2017 and Japanese Patent Application No. 2018-007669, field on Jan. 19, 2018, which applications are hereby incorporated by reference in their entirety.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2017-136322 | Jul 2017 | JP | national |
| 2018-007669 | Jan 2018 | JP | national |
| Filing Document | Filing Date | Country | Kind |
|---|---|---|---|
| PCT/JP2018/024927 | 6/29/2018 | WO | 00 |
