Number | Name | Date | Kind |
---|---|---|---|
3576478 | Watkins et al. | Apr 1971 | A |
3892891 | Goodman et al. | Jul 1975 | A |
3898105 | Mai et al. | Aug 1975 | A |
3899363 | Dennard et al. | Aug 1975 | A |
3909304 | Cho | Sep 1975 | A |
3913126 | Hooker et al. | Oct 1975 | A |
3913211 | Seeds et al. | Oct 1975 | A |
3943542 | Ho et al. | Mar 1976 | A |
3958323 | De La Moneda | May 1976 | A |
3966501 | Nomura et al. | Jun 1976 | A |
3996658 | Takei et al. | Dec 1976 | A |
4013484 | Boleky et al. | Mar 1977 | A |
4023195 | Richman | May 1977 | A |
4039359 | Nakamoto | Aug 1977 | A |
4045249 | Hotta | Aug 1977 | A |
4075045 | Rideout | Feb 1978 | A |
4092661 | Watrous, Jr. | May 1978 | A |
4112575 | Fu et al. | Sep 1978 | A |
4113533 | Okumura et al. | Sep 1978 | A |
4179311 | Athanas | Dec 1979 | A |
4322881 | Enomoto et al. | Apr 1982 | A |
4329773 | Geipel, Jr. et al. | May 1982 | A |
4438157 | Romano-Moran | Mar 1984 | A |
4553314 | Chan et al. | Nov 1985 | A |
4774197 | Haddad et al. | Sep 1988 | A |
4948742 | Nishimura et al. | Aug 1990 | A |
5100820 | Tsubone | Mar 1992 | A |
Number | Date | Country |
---|---|---|
1421363 | Jan 1976 | GB |
1428713 | Mar 1976 | GB |
51-12507 | Jul 1973 | JP |
51-41515 | Aug 1973 | JP |
51-39835 | Sep 1973 | JP |
52-42670 | Jul 1975 | JP |
60-785 | Apr 1977 | JP |
51-118392 | Oct 1978 | JP |
51-118393 | Oct 1978 | JP |
Entry |
---|
Wolf et al., “Silicon Processing for the VLSI Era vol. I: Process Technology”, pp. 57-58, 307-308, 1986.* |
Wolf et al., “Silicon Processing for the VLSI Era vol. 1: Process Technology”, Lattice Press, 1986, pp. 283-295.* |
C.R. Fritzsche, et al., “Thermal Oxidation of Silicon after Ion Implantation”, vol. 120, No. 11, pp. 1603-1605, 1973. |
K. Nomura, et al., “Enhanced Oxidation of Silicon by Ion Implantation and its Novel Applications”, 1974, pp. 681-688. |