Claims
- 1. A thin and durable integrated circuit package comprising:
- an integrated circuit element comprising an integrated circuit formed in a semiconductor substrate;
- a protective casing layer surrounding said integrated circuit element, said protective casing layer having an upper surface, a lower surface and a perimeter wall; and
- a moisture-barrier layer, comprising a layer of silicon nitride, applied using a low temperature plasma deposit process to either said entire upper surface or said entire lower surface of said protective casing layer.
- 2. A thin and durable integrated circuit package comprising:
- an integrated circuit element comprising an integrated circuit formed in a semiconductor substrate;
- a protective casing layer surrounding said integrated circuit element, said protective casing layer having an upper surface, a lower surface and a perimeter wall; and
- a moisture-barrier layer, comprising a layer of silicon nitride, applied using a low temperature plasma deposit process to said entire upper surface and said entire lower surface of said protective casing layer.
- 3. A thin and durable integrated circuit package, comprising:
- an integrated circuit element comprising an integrated circuit formed in a semiconductor substrate; and
- a protective casing layer, comprising a moisture resistant molding compound, surrounding said integrated circuit element, said protective casing layer having an upper surface, a lower surface and a perimeter wall; and
- a moisture-barrier layer, comprising a layer of silicon nitride, applied using a low temperature plasma deposit process to either said entire upper surface or said entire lower surface of said protective casing layer.
- 4. A thin and durable integrated circuit package, comprising:
- an integrated circuit element comprising an integrated circuit formed in a semiconductor substrate; and
- a protective casing layer, comprising a moisture resistant molding compound, surrounding said integrated circuit element, said protective casing layer having an upper surface, a lower surface and a perimeter wall; and
- a moisture-barrier layer, comprising a layer of silicon nitride, applied using a low temperature plasma deposit process to said entire upper surface and said entire lower surface of said protective casing layer.
- 5. A method of manufacturing an integrated circuit package of the type having an exterior moisture barrier, comprising the steps of:
- providing an integrated circuit element within said package;
- applying a moisture-barrier layer, comprising silicon nitride, to the entire upper surface or entire lower surface of said package.
- 6. The method of claim 5, wherein said moisture barrier layer is applied using a low temperature plasma deposit process.
- 7. A thin and durable integrated circuit package of the type having an exterior moisture barrier layer, comprising:
- an integrated circuit element disposed substantially within said package; and
- a moisture-barrier layer disposed on the upper or lower surface of said package, said moisture-barrier layer comprising silicon nitride.
Parent Case Info
This application is a continuation of application Ser. No. 08/186,827, filed Jan. 24, 1994, now abandoned, which is a continuation of Ser. No. 07/884,066 filed May 15, 1992, now abandoned, which is a continuation-in-part of Ser. No. 07/561,417 filed Aug. 1, 1990, now abandoned.
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Entry |
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Continuations (2)
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Number |
Date |
Country |
Parent |
186827 |
Jan 1994 |
|
Parent |
884066 |
May 1992 |
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
561417 |
Aug 1990 |
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