Adjust work parameter as function of other cell

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G05B2219/32053

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GPHYSICS G05Controlling systems G05BCONTROL OR REGULATING SYSTEMS IN GENERAL FUNCTIONAL ELEMENTS OF SUCH SYSTEMS MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS G05B2219/00Program-control systems

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G05B2219/32053Adjust work parameter as function of other cell

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Patents Grantslast 30 patents

Information Patent Grant
Control device for a production module, production module having a...
- Patent number 10,671,035
- Issue date Jun 2, 2020
- Siemens Aktiengesellshaft
- Wendelin Feiten
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Automatic parameter adjustment device for adjusting parameter corre...
- Patent number 10,216,169
- Issue date Feb 26, 2019
- FANUC CORPORATION
- Hajime Ogawa
- G05 - CONTROLLING REGULATING
Information Patent Grant
Feedback control of a chemical mechanical polishing device providin...
- Patent number 8,694,145
- Issue date Apr 8, 2014
- Applied Materials, Inc.
- Arulkumar P. Shanmugasundram
- B24 - GRINDING POLISHING
Information Patent Grant
Method and system for estimating context offsets for run-to-run con...
- Patent number 8,355,810
- Issue date Jan 15, 2013
- Applied Materials, Inc.
- Jianping Zou
- G05 - CONTROLLING REGULATING
Information Patent Grant
Feedback control of chemical mechanical polishing device providing...
- Patent number 8,070,909
- Issue date Dec 6, 2011
- Applied Materials, Inc.
- Arulkumar P. Shanmugasundram
- B24 - GRINDING POLISHING
Information Patent Grant
Dynamic metrology schemes and sampling schemes for advanced process...
- Patent number 7,783,375
- Issue date Aug 24, 2010
- Applied Materials, Inc.
- Arulkumar P. Shanmugasundram
- B24 - GRINDING POLISHING
Information Patent Grant
Dynamic metrology schemes and sampling schemes for advanced process...
- Patent number 7,725,208
- Issue date May 25, 2010
- Applied Materials, Inc.
- Arulkumar P. Shanmugasundram
- B24 - GRINDING POLISHING
Information Patent Grant
Dynamic metrology schemes and sampling schemes for advanced process...
- Patent number 7,698,012
- Issue date Apr 13, 2010
- Applied Materials, Inc.
- Arulkumar P. Shanmugasundram
- B24 - GRINDING POLISHING
Information Patent Grant
Time weighted moving average filter
- Patent number 7,542,880
- Issue date Jun 2, 2009
- Advanced Micro Devices, Inc.
- Richard P. Good
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Feedforward and feedback control for conditioning of chemical mecha...
- Patent number 7,413,986
- Issue date Aug 19, 2008
- Applied Materials, Inc.
- Young Joseph Paik
- B24 - GRINDING POLISHING
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 7,376,479
- Issue date May 20, 2008
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method of feedback control of sub-atmospheric chemical vapor deposi...
- Patent number 7,201,936
- Issue date Apr 10, 2007
- Applied Materials, Inc.
- Alexander T. Schwarm
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for data stackification for run-to-run control
- Patent number 7,181,354
- Issue date Feb 20, 2007
- Advanced Micro Devices, Inc.
- Christopher A. Bone
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Feedback control of a chemical mechanical polishing device providin...
- Patent number 7,160,739
- Issue date Jan 9, 2007
- Applied Materials, Inc.
- Arulkumar P. Shanmugasundram
- B24 - GRINDING POLISHING
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 7,158,848
- Issue date Jan 2, 2007
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Feedforward and feedback control for conditioning of chemical mecha...
- Patent number 7,101,799
- Issue date Sep 5, 2006
- Applied Materials, Inc.
- Young Joseph Paik
- B24 - GRINDING POLISHING
Information Patent Grant
Method, system and medium for process control for the matching of t...
- Patent number 7,082,345
- Issue date Jul 25, 2006
- Applied Materials, Inc.
- Arulkumar P. Shanmugasundram
- B24 - GRINDING POLISHING
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 7,058,467
- Issue date Jun 6, 2006
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Integrating tool, module, and fab level control
- Patent number 7,047,099
- Issue date May 16, 2006
- Applied Materials Inc.
- Arulkumar P. Shanmugasundram
- B24 - GRINDING POLISHING
Information Patent Grant
Control of chemical mechanical polishing pad conditioner directiona...
- Patent number 7,040,956
- Issue date May 9, 2006
- Applied Materials, Inc.
- Young Joseph Paik
- B24 - GRINDING POLISHING
Information Patent Grant
Feedback control of plasma-enhanced chemical vapor deposition proce...
- Patent number 6,913,938
- Issue date Jul 5, 2005
- Applied Materials, Inc.
- Arulkumar P. Shanmugasundram
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control of chemical mechanical polishing pad conditioner directiona...
- Patent number 6,910,947
- Issue date Jun 28, 2005
- Applied Materials, Inc.
- Young Joseph Paik
- B24 - GRINDING POLISHING
Information Patent Grant
Method for adjusting processing parameters of at least one plate-sh...
- Patent number 6,892,108
- Issue date May 10, 2005
- Infineon Technologies SC300 GmbH & Co. KG
- Karl Mautz
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 6,879,867
- Issue date Apr 12, 2005
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method of manufacturing a semiconductor device and manufacturing sy...
- Patent number 6,842,658
- Issue date Jan 11, 2005
- Hitachi, Ltd.
- Masaru Izawa
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method for global automated process control
- Patent number 6,728,587
- Issue date Apr 27, 2004
- Insyst Ltd.
- Arnold J. Goldman
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method for identifying and applying families of part shape variations
- Patent number 6,594,538
- Issue date Jul 15, 2003
- General Electric Company
- Michael E. Graham
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for data stackification for run-to-run control
- Patent number 6,460,002
- Issue date Oct 1, 2002
- Advanced Micro Devices, Inc.
- Christopher A. Bone
- G05 - CONTROLLING REGULATING
Information Patent Grant
Automated manufacture line
- Patent number 5,262,954
- Issue date Nov 16, 1993
- Hitachi, Ltd.
- Motoaki Fujino
- G05 - CONTROLLING REGULATING

Patents Applicationslast 30 patents

Information Patent Application
FREQUENCY DOMAIN-EMBEDDED, STATE SPACE METHOD AND SYSTEM FOR DECENT...
- Publication number 20240077853
- Publication date Mar 7, 2024
- KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS
- Ahmad A. MASOUD
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM FOR ADJUSTING INPUT VALUES WHEN OPERATING A MACHINE
- Publication number 20220206478
- Publication date Jun 30, 2022
- HOMAG GMBH
- Eckhard BEILHARZ
- B27 - WORKING OR PRESERVING WOOD OR SIMILAR MATERIAL NAILING OR STAPLING MACH...
Information Patent Application
AUTOMATIC PARAMETER ADJUSTMENT DEVICE FOR ADJUSTING PARAMETER CORRE...
- Publication number 20160202688
- Publication date Jul 14, 2016
- FANUC CORPORATION
- Hajime Ogawa
- G05 - CONTROLLING REGULATING
Information Patent Application
FEEDBACK CONTROL OF A CHEMICAL MECHANICAL POLISHING DEVICE PROVIDIN...
- Publication number 20120053721
- Publication date Mar 1, 2012
- Arulkumar P. Shanmugasundram
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM FOR ESTIMATING CONTEXT OFFSETS FOR RUN-TO-RUN CON...
- Publication number 20100191363
- Publication date Jul 29, 2010
- Applied Materials, Inc.
- Jianping Zou
- G05 - CONTROLLING REGULATING
Information Patent Application
Dynamic metrology schemes and sampling schemes for advanced process...
- Publication number 20080133163
- Publication date Jun 5, 2008
- Arulkumar P. Shanmugasundram
- G05 - CONTROLLING REGULATING
Information Patent Application
Dynamic metrology schemes and sampling schemes for advanced process...
- Publication number 20080109089
- Publication date May 8, 2008
- Arulkumar P. Shanmugasundram
- G05 - CONTROLLING REGULATING
Information Patent Application
TIME WEIGHTED MOVING AVERAGE FILTER
- Publication number 20070239285
- Publication date Oct 11, 2007
- Richard P. Good
- G05 - CONTROLLING REGULATING
Information Patent Application
Feedback control of sub-atmospheric chemical vapor deposition proce...
- Publication number 20070169694
- Publication date Jul 26, 2007
- Applied Materials, Inc.
- Alexander T. Schwarm
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process monitoring device for sample processing apparatus and contr...
- Publication number 20070162172
- Publication date Jul 12, 2007
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Feedback control of chemical mechanical polishing device providing...
- Publication number 20070102116
- Publication date May 10, 2007
- APPLIED MATERIALS, INC.
- Arulkumar P. Shanmugasundram
- G05 - CONTROLLING REGULATING
Information Patent Application
Process monitoring device for sample processing apparatus and contr...
- Publication number 20060142888
- Publication date Jun 29, 2006
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Feedforward and feedback control for conditioning of chemical mecha...
- Publication number 20060009129
- Publication date Jan 12, 2006
- Applied Materials, Inc.
- Young Joseph Paik
- G05 - CONTROLLING REGULATING
Information Patent Application
Control of chemical mechanical polishing pad conditioner directiona...
- Publication number 20050208879
- Publication date Sep 22, 2005
- Applied Materials
- Young Joseph Paik
- G05 - CONTROLLING REGULATING
Information Patent Application
Process monitoring device for sample processing apparatus and contr...
- Publication number 20050090914
- Publication date Apr 28, 2005
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Method for adjusting processing parameters of at least one plate-sh...
- Publication number 20040125191
- Publication date Jul 1, 2004
- Karl Mautz
- G05 - CONTROLLING REGULATING
Information Patent Application
Feedback control of sub-atmospheric chemical vapor deposition proce...
- Publication number 20030049376
- Publication date Mar 13, 2003
- Applied Materials, Inc.
- Alexander T. Schwarm
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Feedback control of plasma-enhanced chemical vapor deposition proce...
- Publication number 20030049390
- Publication date Mar 13, 2003
- Applied Materials, Inc.
- Arulkumar P. Shanmugasundram
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Feedforward and feedback control for conditioning of chemical mecha...
- Publication number 20030027424
- Publication date Feb 6, 2003
- Young Joseph Paik
- B24 - GRINDING POLISHING
Information Patent Application
Feedback control of a chemical mechanical polishing device providin...
- Publication number 20020197745
- Publication date Dec 26, 2002
- Arulkumar P. Shanmugasundram
- B24 - GRINDING POLISHING
Information Patent Application
Control of chemical mechanical polishing pad conditioner directiona...
- Publication number 20020197934
- Publication date Dec 26, 2002
- Young Joseph Paik
- B24 - GRINDING POLISHING
Information Patent Application
Method, system and medium for process control for the matching of t...
- Publication number 20020199082
- Publication date Dec 26, 2002
- APPLIED MATERIALS, INC.
- Arulkumar P. Shanmugasundram
- B24 - GRINDING POLISHING
Information Patent Application
In situ sensor based control of semiconductor processing procedure
- Publication number 20020192966
- Publication date Dec 19, 2002
- Arulkumar P. Shanmugasundram
- B24 - GRINDING POLISHING
Information Patent Application
Dynamic metrology schemes and sampling schemes for advanced process...
- Publication number 20020193899
- Publication date Dec 19, 2002
- APPLIED MATERIALS, INC.
- Arulkumar P. Shanmugasundram
- B24 - GRINDING POLISHING
Information Patent Application
Integrating tool, module, and fab level control
- Publication number 20020193902
- Publication date Dec 19, 2002
- APPLIED MATERIALS, INC.
- Arulkumar P. Shanmugasundram
- B24 - GRINDING POLISHING
Information Patent Application
Process monitoring device for sample processing apparatus and contr...
- Publication number 20020123816
- Publication date Sep 5, 2002
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Method of manufacturing a semiconductor device and manufacturing sy...
- Publication number 20020103563
- Publication date Aug 1, 2002
- Masaru Izawa
- G05 - CONTROLLING REGULATING
Information Patent Application
Use of endpoint system to match individual processing stations wirh...
- Publication number 20020087229
- Publication date Jul 4, 2002
- Alexander J. Pasadyn
- G05 - CONTROLLING REGULATING
Information Patent Application
Method for global automated process control
- Publication number 20020082738
- Publication date Jun 27, 2002
- INSYST LTD.
- Arnold J. Goldman
- G05 - CONTROLLING REGULATING

Adjust work parameter as function of other cell

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Control device for a production module, production module having a...

Automatic parameter adjustment device for adjusting parameter corre...

Feedback control of a chemical mechanical polishing device providin...

Method and system for estimating context offsets for run-to-run con...

Feedback control of chemical mechanical polishing device providing...

Dynamic metrology schemes and sampling schemes for advanced process...

Dynamic metrology schemes and sampling schemes for advanced process...

Dynamic metrology schemes and sampling schemes for advanced process...

Time weighted moving average filter

Feedforward and feedback control for conditioning of chemical mecha...

Process monitoring device for sample processing apparatus and contr...

Method of feedback control of sub-atmospheric chemical vapor deposi...

Method and apparatus for data stackification for run-to-run control

Feedback control of a chemical mechanical polishing device providin...

Process monitoring device for sample processing apparatus and contr...

Feedforward and feedback control for conditioning of chemical mecha...

Method, system and medium for process control for the matching of t...

Process monitoring device for sample processing apparatus and contr...

Integrating tool, module, and fab level control

Control of chemical mechanical polishing pad conditioner directiona...

Feedback control of plasma-enhanced chemical vapor deposition proce...

Control of chemical mechanical polishing pad conditioner directiona...

Method for adjusting processing parameters of at least one plate-sh...

Process monitoring device for sample processing apparatus and contr...

Method of manufacturing a semiconductor device and manufacturing sy...

Method for global automated process control

Method for identifying and applying families of part shape variations

Method and apparatus for data stackification for run-to-run control

Automated manufacture line

Patents Applicationslast 30 patents

FREQUENCY DOMAIN-EMBEDDED, STATE SPACE METHOD AND SYSTEM FOR DECENT...

METHOD AND SYSTEM FOR ADJUSTING INPUT VALUES WHEN OPERATING A MACHINE

AUTOMATIC PARAMETER ADJUSTMENT DEVICE FOR ADJUSTING PARAMETER CORRE...

FEEDBACK CONTROL OF A CHEMICAL MECHANICAL POLISHING DEVICE PROVIDIN...

METHOD AND SYSTEM FOR ESTIMATING CONTEXT OFFSETS FOR RUN-TO-RUN CON...

Dynamic metrology schemes and sampling schemes for advanced process...

Dynamic metrology schemes and sampling schemes for advanced process...

TIME WEIGHTED MOVING AVERAGE FILTER

Feedback control of sub-atmospheric chemical vapor deposition proce...

Process monitoring device for sample processing apparatus and contr...

Feedback control of chemical mechanical polishing device providing...

Process monitoring device for sample processing apparatus and contr...

Feedforward and feedback control for conditioning of chemical mecha...

Control of chemical mechanical polishing pad conditioner directiona...

Process monitoring device for sample processing apparatus and contr...

Method for adjusting processing parameters of at least one plate-sh...

Feedback control of sub-atmospheric chemical vapor deposition proce...

Feedback control of plasma-enhanced chemical vapor deposition proce...

Feedforward and feedback control for conditioning of chemical mecha...

Feedback control of a chemical mechanical polishing device providin...

Control of chemical mechanical polishing pad conditioner directiona...

Method, system and medium for process control for the matching of t...

In situ sensor based control of semiconductor processing procedure

Dynamic metrology schemes and sampling schemes for advanced process...

Integrating tool, module, and fab level control

Process monitoring device for sample processing apparatus and contr...

Method of manufacturing a semiconductor device and manufacturing sy...

Use of endpoint system to match individual processing stations wirh...

Method for global automated process control