3679497

Information

• Patent Grant
• 3679497

• References
• Source

• Patent Number

  3,679,497

• Date Filed

  Not available

• Date Issued

  Tuesday, July 25, 1972
  53 years ago

• CPC

  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • F15C5/00 - Manufacture of fluid circuit elements Manufacture of assemblages of such elements integrated circuits
  • G03F7/2059 - using a scanning corpuscular radiation beam
  • H01J37/3023 - Programme control
  • H01L23/293 - Organic
  • H01L2924/0002 - Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
  • Y10S148/026 - Deposition thru hole in mask
  • Y10S148/05 - Etch and refill
  • Y10S148/051 - Etching
  • Y10S148/102 - Mask alignment
  • Y10S204/06 - Unusual non-204 uses of electrolysis
  • Y10S428/901 - Printed circuit
  • Y10S438/949 - Energy beam treating radiation resist on semiconductor

• US Classifications

  • 430 - Radiation imagery chemistry: process, composition, or product thereof
  • 148 - Metal treatment
  • 204 - Chemistry: electrical and wave energy
  • 216 - Etching a substrate: processes
  • 219 - Electric heating
  • 250 - Radiant energy
  • 427 - Coating processes
  • 428 - Stock material or miscellaneous articles
  • 438 - Semiconductor device manufacturing: process
  • 850 - Scanning-probe techniques or apparatus