Claims
- 1. An apparatus for supporting a wafer during wafer processing in a process chamber and for preventing deposition on a fronside peripheral region and edge of the wafer comprising:
- a platen having a wafer contact to support the wafer, having a deposition control gas pathway, and having a periphery surface region surrounding the wafer contact; and
- an exclusion guard having a platform surface removably positioned on the periphery surface region, having an extension extending over a frontside peripheral region of the wafer, wherein the exclusion guard includes a plurality of openings extending from a top surface of the exclusion ring to the deposition control gas pathway and is separated from the wafer frontside peripheral region by a restrictive opening during wafer processing.
- 2. An apparatus as in claim 1 wherein the openings are restrictive openings.
CROSS-REFERENCE TO RELATED APPLICATION
This application is a continuation of application Ser. No. 08/485,191, filed Jun. 07, 1995, which is a continuation-in-part of and commonly assigned and application Ser. No. 08/294,514, filed Aug. 23, 1994, now U.S. Pat. No. 5,578,532; which is a continuation-in-part of application Ser. No. 08/007,457, filed Jan. 22, 1993, now U.S. Pat. No. 5,374,594; which is a division of application Ser. No. 07/554,225, filed Jul. 16, 1990, now U.S. Pat. No. 5,230,741. These prior applications are incorporated herein in their entirety by reference thereto.
US Referenced Citations (51)
Foreign Referenced Citations (1)
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Divisions (1)
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554225 |
Jul 1990 |
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Continuations (1)
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485191 |
Jun 1995 |
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Continuation in Parts (2)
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07457 |
Jan 1993 |
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