Conductive structures for electrically conductive pads of circuit board and fabrication method thereof

Abstract

Conductive structures for electrically conductive pads of a circuit board and fabrication method thereof are proposed. The fabrication method includes: providing a circuit board with a plurality of first, second and third electrically conductive pads; forming first and second conductive layers on the circuit board; forming first and second resist layers respectively on the first and second conductive layers, the resist layers having a plurality of openings for exposing the conductive layers on the pads; forming a metal layer in the openings of the first and second resist layers; and forming a first connecting layer on the metal layer; forming third and fourth resist layers on the first and second resist layers respectively, the third resist layer having a plurality of openings for exposing the first connecting layer on the metal layer on the second electrically

Description

BRIEF DESCRIPTION OF DRAWINGS

FIGS. 1A to 1E are sectional diagrams showing a conventional method of forming different conductive structures for electrically conductive pads of a circuit board;

FIGS. 2A to 2I are sectional diagrams showing a fabrication method of forming conductive structures for electrically conductive pads of a circuit board according to a first embodiment of the present invention; and

FIGS. 3A to 3D are sectional diagrams showing a fabrication method of forming conductive structures for electrically conductive pads of a circuit board according to a second embodiment of the present invention.

Claims

1. A fabrication method of conductive structures for electrically conductive pads of a circuit board, comprising the steps of: providing a circuit board with a plurality of first and second electrically conductive pads on a first surface thereof and a plurality of third electrically conductive pads on a second surface thereof, and respectively forming a first insulating protection layer and a second insulating protection layer on the first and second surfaces of the circuit board, the first and second insulating protection layers having formed therein a plurality of openings for exposing the first, second and third electrically conductive pads;forming a first conductive layer on the first insulating protection layer and in the openings of the first insulating protection layer, and forming a second conductive layer on the second insulating protection layer and in the openings of the second insulating protection layer;respectively forming a first resist layer and a second resist layer on surfaces of the first and second conductive layers, the first and second resist layers having a plurality of openings so as to respectively expose the first and second conductive layers on surfaces of the first, second and third electrically conductive pads, and forming a first connecting layer in the openings of the first and second resist layers;respectively forming a third resist layer and a fourth resist layer on surfaces of the first and second resist layers to cover the first and third electrically conductive pads, and forming a plurality of openings in the third resist layer so as to expose the first connecting layer on the second electrically conductive pads; andforming a second connecting layer on the first connecting layer on the second electrically conductive pads.

2. The fabrication method of claim 1, further comprising forming a metal layer on surfaces of the first and second conductive layers on the first, second and third electrically conductive pads exposed from the openings of the first and second resist layers.

3. The fabrication method of claim 2, wherein the metal layer is made of an electroplated copper material.

4. The fabrication method of claim 1, wherein the first connecting layer is made of an electroplated metal adhesion layer.

5. The fabrication method of claim 4, wherein, the metal adhesion layer is one of the group consisting of Sn, Ag, Au, Sn/Ag, Sn/Ag/Cu, and Ni/Au.

6. The fabrication method of claim 1, wherein the second connecting layer is made of an electroplated solder material.

7. The fabrication method of claim 6, wherein the solder material is one of the group consisting of Sn, Ag, Au, Bi, Pb and Zn.

8. The fabrication method of claim 1, further comprising removing the third and fourth resist layers, the first and second resist layers, and the first and second conductive layers covered by the first and second resist layers.

9. The fabrication method of claim 8, wherein the third and fourth resist layers are removed by one of a physical method and a chemical method.

10. The fabrication method of claim 8, wherein the first and second resist layers are removed by one of a physical method and a chemical method.

11. The fabrication method of claim 8, wherein the first and second conductive layers covered by the first and second resist layers are removed by micro-etching.

12. The fabrication method of claim 8, further comprising reflowing the second connecting layer so as to form pre-solder bumps.

13. The fabrication method of claim 2, wherein the first connecting layer on the metal layer on the second electrically conductive pads is removed first and then the second connecting layer is formed on the metal layer.

14. Conductive structures for electrically conductive pads of a circuit board, comprising: a circuit board having a first surface and a second surface, a plurality of first and second electrically conductive pads being formed on the first surface of the circuit board;a metal layer formed on the first and second electrically conductive pads; a first connecting layer formed on the metal layer over the first electrically connecting pads; anda second connecting layer formed on the metal layer over the second electrically connecting pads.

15. The conductive structures of claim 14, further comprising a plurality of third electrically conductive pads formed on the second surface of the circuit board, wherein a metal layer and a first connecting layer are formed on the third electrically conductive pads.

16. The conductive structures of claim 14, further comprising a first connecting layer formed between the metal layer and the second connecting layer on the second electrically conductive pads.

17. The conductive structures of claim 14, wherein the metal layer is made of an electroplated copper material.

18. The conductive structures of claim 14, wherein the first connecting layer is made of an electroplated metal adhesion layer.

19. The conductive structures of claim 18, wherein the metal adhesion layer is one of the group consisting of Sn, Ag, Au, Sn/Ag, Sn/Ag/Cu, and Ni/Au.

20. The conductive structures of claim 14, wherein the second connecting layer is made of an electroplated solder material.

21. The conductive structures of claim 20, wherein the solder material is one of the group consisting of Sn, Ag, Au, Bi, Pb and Zn.

22. The conductive structures of claim 14, wherein the second connecting layer on the second electrically conductive pads is reflowed so as to form pre-solder bumps covering the metal layer.

23. The conductive structures of claim 16, wherein the second connecting layer on the second electrically conductive pads is reflowed so as to form pre-solder bumps covering the metal layer.