This application is a continuation of U.S. patent application Ser. No. 09/379,996, filed on Aug. 24, 1999 now U.S. Pat. No. 6,294,814, which claims priority from U.S. Provisional Patent Application No. 60/046,276, filed May 12, 1997.
Number | Name | Date | Kind |
---|---|---|---|
2614055 | Senarelens | Oct 1952 | A |
3117022 | Bronson et al. | Jan 1964 | A |
3225820 | Riordan | Dec 1965 | A |
3390033 | Brown | Jun 1968 | A |
3551213 | Boyle | Dec 1970 | A |
3770499 | Crowe et al. | Nov 1973 | A |
3786359 | King | Jan 1974 | A |
3806380 | Kitada et al. | Apr 1974 | A |
3832219 | Nelson et al. | Aug 1974 | A |
3900636 | Curry et al. | Aug 1975 | A |
3901423 | Hillberry et al. | Aug 1975 | A |
3915757 | Engel | Oct 1975 | A |
3957107 | Altoz et al. | May 1976 | A |
3993909 | Drews et al. | Nov 1976 | A |
4006340 | Gorinas | Feb 1977 | A |
4039416 | White | Aug 1977 | A |
4053335 | Hu | Oct 1977 | A |
4074139 | Pankove | Feb 1978 | A |
4107350 | Berg et al. | Aug 1978 | A |
4108751 | King | Aug 1978 | A |
4116751 | Zaromb | Sep 1978 | A |
4121334 | Wallis | Oct 1978 | A |
4170662 | Weiss et al. | Oct 1979 | A |
4216906 | Olsen et al. | Aug 1980 | A |
4237601 | Woolhouse et al. | Dec 1980 | A |
4244348 | Wilkes | Jan 1981 | A |
4252837 | Auton | Feb 1981 | A |
4274004 | Kanai | Jun 1981 | A |
4342631 | White et al. | Aug 1982 | A |
4346123 | Kaufmann | Aug 1982 | A |
4361600 | Brown | Nov 1982 | A |
4368083 | Bruel et al. | Jan 1983 | A |
4375125 | Byatt | Mar 1983 | A |
4412868 | Brown et al. | Nov 1983 | A |
4452644 | Bruel et al. | Jun 1984 | A |
4468309 | White | Aug 1984 | A |
4471003 | Cann | Sep 1984 | A |
4486247 | Ecer et al. | Dec 1984 | A |
4490190 | Speri | Dec 1984 | A |
4500563 | Ellenberger et al. | Feb 1985 | A |
4508056 | Bruel et al. | Apr 1985 | A |
4536657 | Bruel | Aug 1985 | A |
4539050 | Kramler et al. | Sep 1985 | A |
4566403 | Fournier | Jan 1986 | A |
4567505 | Pease et al. | Jan 1986 | A |
4568563 | Jackson et al. | Feb 1986 | A |
4585945 | Bruel et al. | Apr 1986 | A |
4645546 | Matsushita | Feb 1987 | A |
4684535 | Heinecke et al. | Aug 1987 | A |
4704302 | Bruel et al. | Nov 1987 | A |
4706377 | Shuskus | Nov 1987 | A |
4717683 | Parrillo et al. | Jan 1988 | A |
4727047 | Bozler et al. | Feb 1988 | A |
4764394 | Conrad | Aug 1988 | A |
4766086 | Ohshima et al. | Aug 1988 | A |
4837172 | Mizuno et al. | Jun 1989 | A |
4846928 | Dolins et al. | Jul 1989 | A |
4847792 | Barna et al. | Jul 1989 | A |
4853250 | Boulos et al. | Aug 1989 | A |
4883561 | Gmitter et al. | Nov 1989 | A |
4887005 | Rough et al. | Dec 1989 | A |
4894709 | Phillips et al. | Jan 1990 | A |
4931405 | Kamijo et al. | Jun 1990 | A |
4948458 | Ogle | Aug 1990 | A |
4952273 | Popov | Aug 1990 | A |
4956693 | Sawahata et al. | Sep 1990 | A |
4960073 | Suzuki et al. | Oct 1990 | A |
4982090 | Wittmaack | Jan 1991 | A |
4996077 | Moslehi et al. | Feb 1991 | A |
5015353 | Hubler et al. | May 1991 | A |
5034343 | Rouse et al. | Jul 1991 | A |
5070040 | Pankove | Dec 1991 | A |
5082793 | Li | Jan 1992 | A |
5110748 | Sarma | May 1992 | A |
5133826 | Dandl | Jul 1992 | A |
5162241 | Mori et al. | Nov 1992 | A |
5196355 | Wittkower | Mar 1993 | A |
5198371 | Li | Mar 1993 | A |
5202095 | Houchin et al. | Apr 1993 | A |
5203960 | Dandl | Apr 1993 | A |
5213451 | Frank | May 1993 | A |
5234529 | Johnson | Aug 1993 | A |
5234535 | Beyer et al. | Aug 1993 | A |
5242861 | Inaba | Sep 1993 | A |
5250328 | Otto | Oct 1993 | A |
5252178 | Moslehi | Oct 1993 | A |
5269880 | Jolly et al. | Dec 1993 | A |
5273610 | Thomas, III et al. | Dec 1993 | A |
5303574 | Matossian et al. | Apr 1994 | A |
5304509 | Sopori | Apr 1994 | A |
5342472 | Imahashi et al. | Aug 1994 | A |
5354381 | Sheng | Oct 1994 | A |
5363603 | Miller et al. | Nov 1994 | A |
5368710 | Chen et al. | Nov 1994 | A |
5370765 | Dandl | Dec 1994 | A |
5374564 | Bruel | Dec 1994 | A |
5376560 | Aronowitz et al. | Dec 1994 | A |
5404079 | Ohkuni et al. | Apr 1995 | A |
5405480 | Benzing et al. | Apr 1995 | A |
5411592 | Ovshinsky et al. | May 1995 | A |
5435880 | Minato et al. | Jul 1995 | A |
5443661 | Oguro et al. | Aug 1995 | A |
5476691 | Komvopoulos et al. | Dec 1995 | A |
5487785 | Horiike et al. | Jan 1996 | A |
5494835 | Bruel | Feb 1996 | A |
5504328 | Bonser | Apr 1996 | A |
5558718 | Leung | Sep 1996 | A |
5559043 | Bruel | Sep 1996 | A |
5585304 | Hayashi et al. | Dec 1996 | A |
5611855 | Wijaranakula | Mar 1997 | A |
5643834 | Harada et al. | Jul 1997 | A |
5653811 | Chan | Aug 1997 | A |
5705421 | Matsushita et al. | Jan 1998 | A |
5710057 | Kenney | Jan 1998 | A |
5714395 | Bruel | Feb 1998 | A |
5753560 | Hong et al. | May 1998 | A |
5755914 | Yonehara | May 1998 | A |
5783022 | Cha et al. | Jul 1998 | A |
5804086 | Bruel | Sep 1998 | A |
5821158 | Shishiguchi | Oct 1998 | A |
5840590 | Myers, Jr. et al. | Nov 1998 | A |
5854123 | Sato et al. | Dec 1998 | A |
5869387 | Sato et al. | Feb 1999 | A |
5877070 | Goesele et al. | Mar 1999 | A |
5882987 | Srikrishnan | Mar 1999 | A |
5909627 | Egloff | Jun 1999 | A |
5920764 | Hanson et al. | Jul 1999 | A |
5953622 | Lee et al. | Sep 1999 | A |
5966620 | Sakaguchi et al. | Oct 1999 | A |
5993677 | Biasse et al. | Nov 1999 | A |
6010579 | Henley et al. | Jan 2000 | A |
6077383 | Laporte | Jun 2000 | A |
6083324 | Henley et al. | Jul 2000 | A |
6184111 | Henley et al. | Feb 2001 | B1 |
6190998 | Bruel et al. | Feb 2001 | B1 |
6191007 | Matsui et al. | Feb 2001 | B1 |
6225192 | Aspar et al. | May 2001 | B1 |
Number | Date | Country |
---|---|---|
834363 | Mar 1952 | DE |
0112230 | Apr 1987 | EP |
0181249 | Jun 1989 | EP |
0504714 | Sep 1992 | EP |
0533551 | Mar 1993 | EP |
0355913 | Dec 1993 | EP |
0665588 | Feb 1995 | EP |
0660140 | Jun 1995 | EP |
0665587 | Aug 1995 | EP |
0379828 | Sep 1995 | EP |
0459177 | Dec 1995 | EP |
0703609 | Mar 1996 | EP |
0763849 | Mar 1997 | EP |
807 970 | Nov 1997 | EP |
0867921 | Mar 1998 | EP |
0 867 917 | Sep 1998 | EP |
961 312 | Dec 1999 | EP |
1558881 | Jan 1969 | FR |
2261802 | Feb 1974 | FR |
2235474 | Apr 1974 | FR |
2298880 | Jan 1975 | FR |
2266304 | Apr 1975 | FR |
2519437 | Jan 1982 | FR |
2529383 | Jun 1982 | FR |
2537768 | Aug 1982 | FR |
2537777 | Dec 1982 | FR |
2715502 | Jan 1984 | FR |
2560426 | Feb 1984 | FR |
2563377 | Apr 1984 | FR |
2575601 | Dec 1984 | FR |
2681472 | Sep 1991 | FR |
2714524 | Dec 1993 | FR |
2715501 | Jan 1994 | FR |
2715503 | Jan 1994 | FR |
2720189 | May 1994 | FR |
2725074 | Sep 1994 | FR |
WO99-35674 | Jul 1999 | FR |
2221991 | Jul 1989 | GB |
2 231 197 | Nov 1990 | GB |
60-235434 | Nov 1958 | JP |
53-104156 | Sep 1978 | JP |
58-144475 | Aug 1983 | JP |
60-83591 | Oct 1983 | JP |
59-19394 | Jan 1984 | JP |
59-46750 | Mar 1984 | JP |
59-54217 | Mar 1984 | JP |
59-114744 | Jul 1984 | JP |
59-139539 | Aug 1984 | JP |
59-193904 | Nov 1984 | JP |
60-207237 | Oct 1985 | JP |
4-76503 | Jul 1990 | JP |
2901031 | Jan 1992 | JP |
2910001 | Jan 1992 | JP |
4-246594 | Sep 1992 | JP |
4-298023 | Oct 1992 | JP |
5-211128 | Aug 1993 | JP |
7-215800 | Aug 1995 | JP |
7-254690 | Oct 1995 | JP |
7-263291 | Oct 1995 | JP |
8-97389 | Apr 1996 | JP |
28-077800 | Mar 1998 | JP |
2000-94317 | Apr 2000 | JP |
WO 9510718 | Apr 1995 | WO |
WO 9520824 | Aug 1995 | WO |
WO 9531825 | Nov 1995 | WO |
WO 9935674 | Jul 1999 | WO |
Entry |
---|
Mahajan et al., Principles of Growth and Processing of Semiconductors, WCB McGraw-Hill, chapter 6, pp. 262-269. |
Smith, D.L., Thin-Film Deposition, McGraw-Hill, Inc., pp. 185-196, 278-293. |
Tong et al., Semiconductor Wafer Bonding: Science and Technology, John Wiley & Sons, Inc., pp. 152-171. |
Grovenor, C.R.M., Microelectronic Materials, pp. 73-75 (1989). |
Sze, S.M., VLSI Technology, 2nd Edition, pp. 9-10, (1988). |
Basta, Nicholas, “Ion-Beam Implantation,” High Technology, (1985). |
Burggraff, Peter, “Advanced Plasma Source: What's Working?” Semiconductor International, pp. 56-59 (May 1994). |
Garter, G. et al., “The Collection of Ions Implanted in Semiconductors Radiation Effects,” Abstract only, vol. 16, No. 1-2, pp. 107-114 (Sep. 1972). |
Cassidy, Victor M., “Ion Implantation Process Toughens Metalworking Tools,” Modern Metals, pp. 65-67 (1984). |
Cheung, N.W., “Plasma Immersion Ion Implanation for Semiconductor Processing,” Material Chemistry and Physics, 46(2-3): 132-139 (1996). |
Choyke et al., “Mechanical Response of Single Crystal Si to Very High Fluence H+ Implantation,” Nuc. Instr. Meth., 209-210:407-412 (1983). |
Choyke et al., “Implanted Hydrogen Effects at High Concentrations in Model Low Z Shielding Materials,” J. Nuc. Mtrls., 122-23:1585-86 (1984). |
Choyke et al., “A Comparative Study of Near-Surface Effects Due to Very High Fluence H+ Implantation in Single Crystal FZ, OZ, and Web SI,” Mat. Res. Soc. Symp. Proc., 27:359-364 (1984). |
Chu, P.K. et al. “Plasma Immersion Ion Implantation—A Fledgling Technique for Semiconductor Processing,” Materials Science and Engineering Reports: A Review Journal, R17(6-7): 207-280 (1996). |
Corbett et al., “Embrittlement of Materials: Si(H) as a Model System,” J. Nuc. Mtrls., 169: 179-184 (1984). |
Hulett, D.M., et al., “Ion Nitriding and Ion Implantation: A Comparison,” Metal Progress, pp. 18-21 (1985). |
I.B.M. Technical Disclosure Bulletin, vol. 29: No. 3, p. 1416 (Aug. 1986). |
Johnson et al., “Hydrogen-Induced Platelets in Silicon: Separation of Nucleation and Growth,” Mtrls. Sci. Forum, 83-87:33-38 (1992). |
Li, J., “Novel Semiconductor Substrate Formed by Hydrogen Ion Implantation into Silicon,” Appl. Phys. Lett., 55(21):2223-2224 (1989). |
Lu, X. et al., “SOI Material Technology Using Plasma Immersion Ion Implantation,” Proceedings 1996 IEEE International SOI Conference (Oct. 1996). |
Matsuda et al., “Large Diameter Ion Beam Implantation System,” Nuclear Instruments and Methods, B21:314-316 (1987). |
Milnes et al., “Peeled Film Technology for solar Cells,” pp. 338-341. |
Moreau, Wayne M., Semiconductor Lithography, Principles, Practices, and Materials, Plenum Press (1988). |
Oshima et al., “Defects in Si irradiated with D-T neutrons, D and He ions,” J. Nuc. Mtrls., 179-181:947-950 (1991). |
Patent Abstracts of Japan, vol. 7, No. 107 (E-174), (May 11, 1993) JP-58-030145 (Feb. 22, 1983). |
Renier, M., et al., “A New Low-Energy Ion Implanter for Bombardment of Cylindrical Surfaces,” Vacuum, 35(12):577-578 (1985). |
Sioshansi, Piran, “Ion Beam Modification of Materials for Industry,” Thin Solid Film, 118:61-71 (1984). |
Wolf, Stanley Ph.D., Silicon Processing for the VLSI Era vol. 2, pp. 66-79, Lattice Press (1990). |
U.S. Dept. of Energy, “The Fusion Connection: . . . ”, Plasma Coating, pp. 6-7 (1985). |
Veldkamp, W.B. et al., Binary Optics, Scientific American, pp. 50-55 (May 1992). |
Number | Date | Country | |
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60/046276 | May 1997 | US |
Number | Date | Country | |
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Parent | 09/379996 | Aug 1999 | US |
Child | 09/483393 | US |