Claims
- 1. An electrical component comprising:
a first semiconductor device having at least one first terminal on a first surface thereof; and a conductive layer having at least one first dimple extending from a first surface thereof, said first dimple being in electrical contact with said first terminal of said first semiconductor device.
- 2. The electrical component of claim 1, wherein said conductive layer has at least one second dimple extending from a second surface thereof.
- 3. The electrical component of claim 2, further comprising a second semiconductor device having at least one second terminal, said second terminal being in electrical contact with said second dimple of said conductive layer.
- 4. The electrical component of claim 2, wherein said first dimple extends toward substantially a first perpendicular direction to said conductive layer, and said second dimple is extending toward substantially a second perpendicular direction to said conductive layer.
- 5. The electrical component of claim 1, wherein said conductive layer is selected from the group consisting of a metal, a metal alloy, and a metal/insulator laminate material.
- 6. The electrical component of claim 1, wherein said conductive layer is selected from the group consisting of copper, aluminum, nickel, a copper alloy, an aluminum alloy, a nickel alloy, a copper/polymer laminate, an aluminum/polymer laminate, and a nickel/polymer laminate.
- 7. The electrical component of claim 1, wherein said conductive layer further comprising a plurality of through-holes formed thereon, said through-holes arranged surrounding said first dimples or evenly distributed on said conductively layer.
- 8. The electrical component of claim 3, wherein said first semiconductor device is a power device and said second semiconductor device is a driving circuit for driving and controlling said power device.
- 9. The electrical component of claim 8, further comprising a substrate being in electrical contact with a second terminal on a second surface of said first semiconductor device.
- 10. The electrical component of claim 1, wherein said conductive layer includes a plurality of dimples, each of said first dimples electrically contacting said first semiconductor device.
- 11. The electrical component of claim 3, wherein said first and second semiconductor devices are aligned linearly with said conductive layer therebetween.
- 12. A method for manufacturing an electrical component, the method comprising the steps of:
forming at least one first dimple on a conductive layer, said first dimple extending from a first main surface of said conductive layer; and electrically connecting said first dimple to at least one terminal of a first semiconductor device formed on a first main surface thereof, so that said conductive layer forms electrical contact with said first semiconductor device.
- 13. The method of claim 12, further comprising the steps of:
forming at least one second dimple on said conductive layer, said second dimple extending from a second main surface of said conductive layer; and electrically connecting said second dimple to at least one terminal of a second semiconductor device, so that said conductive layer forms electrical contact with said second semiconductor device.
- 14. The method of claim 13, further comprising the steps of electrically connecting a substrate to a second terminal of said first semiconductor device formed on a second main surface thereof.
- 15. The method of claim 13, wherein said first forming step forms said first dimple to extend toward substantially a first perpendicular direction to said conductive layer, and said second forming step forms said second dimple to extend toward substantially a second perpendicular direction to said conductive layer.
- 16. The method of claim 13, further comprising the step of forming a plurality of through-holes.
- 17. The method of claim 12, further comprising the step of filling a space between said first semiconductor device and said conductive layer with a heat dissipation material.
- 18. The method of claim 13, further comprising the step of filling a space between said conductive layer and said second semiconductor device with polymer.
- 19. The method of claim 13, wherein said first and second dimples are electrically connected by solder bonding or ultrasonic bonding.
CROSS REFERENCE TO RELATED APPLICATIONS
[0001] This application claims priority to U.S. Provisional Application Ser. No. 60/200,007, filed on Apr. 27, 2000, the entire contents of which are herein incorporated by reference.
GOVERNMENT INTERESTS
[0002] This invention was made with the United State Government support under government contract number 208-11-110F-104-352884-1 from the Office of Naval Research. The Government of the United States of America may have certain rights in the invention.
Provisional Applications (1)
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Number |
Date |
Country |
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60200007 |
Apr 2000 |
US |