Claims
- 1. A process to manufacture an electronic chip device, comprising the steps of:
providing an interface support film including a support film and at least one flat communication interface, said interface support film provided having such properties that it is capable of being creased or folded without deterioration; affixing at least one microcircuit on the interface support film; and connecting the microcircuit to the communication interface.
- 2. A process to manufacture an electronic chip device, comprising the steps of:
providing an interface support film including a support film and at least one flat communication interface; affixing at least one microcircuit on the interface support film; connecting the microcircuit to the communication interface; and affixing a compensation film on the support film, said compensation film having at least one recess corresponding to a place for a microcircuit.
- 3. The process according to claim 1, further including the step of affixing a compensation film on the support film, said compensation film having at least one recess corresponding to a place for a microcircuit.
- 4. The process according to claim 3, wherein the step of affixing the compensation film is carried out before the microcircuit is fixed to the support film.
- 5. The process according to claim 3, further including the step of depositing an encapsulating material only within the recess of the compensation film.
- 6. The process according to claim 3, wherein the step of affixing the compensation film is carried after the microcircuit is fixed to the support film.
- 7. The process according to claim 1, wherein the interface support film is provided in at least one strip on a roll, and the support film is transported to at least one work station by a transport means that is controlled by the tension of the support film.
- 8. The process according to claim 1, wherein the microcircuit is connected to the interface by ultrasonic welding of conductor wires.
- 9. The process according to claim 8, wherein said conductor wires are made of aluminum.
- 10. The process according to claim 8, wherein, during said welding, at least the area of the support film on which the microcircuit is located is placed on a firm reference surface.
- 11. The process according to claim 10, wherein the support film is placed on the reference surface by means of suction.
- 12. The process according to claim 1, wherein the communication interface is created on the support film by an aluminum engraving technique.
- 13. The process according to claim 1, further including the step of connecting interface elements to contact pads through the support film by mechanical perforations.
- 14. The process according to claim 1, further including the step of placing an encapsulating material at least over the microcircuit and its connections.
- 15. The process according to claim 1, further including the step of applying an adhesive layer with a peelable protection film on at least one face of the device.
- 16. The process according to claim 15, wherein the adhesive layer with the protection film is provided in a continuous strip, the support film comprises a strip with a plurality of interfaces, wherein the devices are cut from the strips while remaining fixed on the protection film, and a cleaning up operation is carried out between the devices.
- 17. The process according to claim 7, wherein each of the at least one strips has a plurality of communication interfaces formed thereon, and further including the step of cutting each device.
- 18. The process according to claim 1, wherein the support film and the interface can be creased or folded together with a curve radius of less than 2.5 mm without deterioration.
- 19. The process according to claim 1, wherein the support film and the interface can be creased or folded together with a curve radius of less than 1 mm without deterioration.
- 20. The process according to claim 2, wherein an encapsulating material is contained at least partly by said recess and covers the microcircuit and its connections.
- 21. The process according to claim 1, wherein the support film has a thickness of less than 75 μm.
- 22. The process according to claim 21, wherein the support film has a thickness between 10 μm and 30 μm.
- 23. The process according to claim 1, wherein the support film has at least one of an elongation at break of more than 80%, a Shore hardness of less than 80, a vitreous transition temperature Tg of less than 0°, and a fusion temperature of less than 130° C.
- 24. The process according to claim 1, wherein the flat communication interface is an antenna formed in a spiral by plural turns of a conductive material.
- 25. The process according to claim 1, comprising attaching a strap to a face of the support film opposite the microcircuit to pull back at least one end of the interface in a vicinity of the microcircuit.
- 26. The process according to claim 2, wherein the microcircuit, the communication interface, and the compensation film are located on a single side of the support film, and wherein the support film can be folded or creased upon itself without deterioration.
- 27. The process according to claim 26, comprising the step of placing an encapsulating material within the recess to cover at least the microcircuit and connections between the microcircuit and the communication interface.
- 28. A process for forming a chip card, comprising:
providing an interface support film including a support film and at least one flat communication interface, wherein the interface support film is capable of being creased or folded upon itself without deterioration; affixing at least one microcircuit on the interface support film; connecting the microcircuit to the communication interface; affixing a compensation film on the support film, said compensation film having at least one recess corresponding to a place for a microcircuit, said compensation film forming a card body of the chip card.
- 29. A process for forming a chip card according to claim 28, wherein the communication interface, the microcircuit, and the compensation film are located on a single side of the support film.
Priority Claims (2)
Number |
Date |
Country |
Kind |
97/12444 |
Sep 1997 |
FR |
|
97/14582 |
Nov 1997 |
FR |
|
Parent Case Info
[0001] This disclosure is a divisional application of U.S. application Ser. No. 09/533,825, filed Mar. 24, 2000, which was a national stage fiing under 35 U.S.C. §371 of PCT/FR98/02051, filed Sep. 23, 1998, and which claims priority from French Patent Application Nos. 97/12444 and 97/14582, filed Sep. 26, 1997 and Nov. 14, 1997, respectively, the entire contents of which are incorporated herein by reference.
Divisions (1)
|
Number |
Date |
Country |
Parent |
09533825 |
Mar 2000 |
US |
Child |
10161781 |
Jun 2002 |
US |
Continuations (1)
|
Number |
Date |
Country |
Parent |
PCT/FR98/02051 |
Sep 1998 |
US |
Child |
09533825 |
Mar 2000 |
US |