Claims
- 1. A method of creating one of a dual damascene and a damascene structure in combination with reactive ion etching, on a substrate on which a stack is fabricated, said stack including a low resistivity metal layer including one of Al, Cu, Al--Cu, Al--Cu--Ge, and Al--Ge having a hardness, said method comprising the steps of:
- removing said low resistivity metal layer having said hardness, by chemical and mechanical polishing using slurries having a hardness at least twice that of said low resistivity metal layer to be removed wherein said low resistivity metal layer has a hard cap comprising a tungsten and germanium alloy.
- 2. A method according to claim 1, wherein said slurry hardness is two to three times as hard as said low resistivity metal layer to be removed.
- 3. A method of creating one of a dual damascene and a damascene structure in combination with reactive ion etching, on a substrate on which a stack is fabricated, said stack including a metal layer having a hardness, said method comprising the steps of:
- removing said metal layer having said hardness, by chemical and mechanical polishing using slurries having a hardness at least twice that of said metal layer to be removed,
- wherein said metal layer has a hard cap comprising a tungsten-germanium alloy and said step of removing including chemical and mechanical polishing employing a slurry including alumina.
Parent Case Info
This application is a divisional of application Ser. No. 08/479,406, filed on Jun. 7, 1995, which is a divisional of application Ser. No. 08/286,605, now abandoned, filed on Aug. 5, 1994.
US Referenced Citations (20)
Foreign Referenced Citations (2)
Number |
Date |
Country |
0499050A1 |
Aug 1992 |
EPX |
01-107558 |
Apr 1989 |
JPX |
Non-Patent Literature Citations (5)
Entry |
"A1-Ge Reflow Sputtering for Submicron-Contact Hole Filling"; K. Kikuta et al.; VMIC Conference, Jun. 11-12, 1991, pp. 163-169. |
"0.25um Contact Hole Filling by A1-Ge Reflow Sputtering"; K. Kikuta et al.; 1991 Symposium on VLSI Technology, Digest of Technical Papers, May 28-30, 1991. |
"Binary Alloy Phase Diagrams"; Thaddeus B. Massalski et al.; American Society for Metals; TN 690 .B5, 1986; vol. 1. |
"Constitution of Binary Alloys"; Max Hansen; Second Edition; Armour Research Foundation, Chicago, IL; 1958. |
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Divisions (2)
|
Number |
Date |
Country |
Parent |
479406 |
Jun 1995 |
|
Parent |
286605 |
Aug 1994 |
|