The invention pertains to voltage regulation in electronic systems, and more specifically to integrating voltage regulators and associated passive components into semiconductor packages with at least a portion of the circuits whose voltage(s) they are regulating.
Active components (as opposed to passive components) are considered to be circuits or circuit elements that provide electrical gain and/or switching. Examples of active components are, for example, transistors, amplifiers, oscillators, pass transistors, transmission gates, etc.
Passive components are circuits or circuit elements that do not provide electrical gain. The common acronym RLC stands for Resistors, Inductors and Capacitors, all of which are examples of passive components. (Since “I” is by convention an abbreviation for current in electrical engineering, the letter “L” is by convention used as an abbreviation for inductance, hence “RLC” instead of “RIC.”) RLC may be, and herein is, used as a generic stand-in for one or more passive components regardless what mix of components are actually present. Other examples of passive components may include, for example, fuses or antifuses, resistors through-silicon vias (TSVs), etc., and may be included along with resistors, inductors, and capacitors in any combination as part of generic phrases like, for example, “RLC passive components” or “RLC passives” or “RLC components” or simply “RLC.”
PMIC 120 may be coupled to DPIC 112, the optional battery 114, the external connector 116, and the RLC passives 118. External connector 116 may be one of many types known in the art. It may supply one or more power and ground connections to other components and/or to PMIC 120 which in turn may regulate or supply power to some or all of the other components on PCB 110.
The RLC passive components 118 may perform a variety of different functions for system 100. They may, for example, provide diodes to protect PCB 110 from power surges, hot insertions, and electrostatic discharge (ESD) events related to the external connector 116. They may also provide decoupling capacitors for DPIC 112, PMIC 120, and other chips in the system not shown in
PMIC 120 may have a variety of circuits providing different sorts of power control to different parts of the system. For example, battery tender circuit 122 may control the battery charging, discharging, leakage, and maintenance as is known in the art in systems where battery 114 is present.
Also present may be any of a variety of power supplies and/or regulators known in the art like, for example, switching supply 124 and Low Drop Out regulators (LDOs) 126 and 128. Switching supply 124 may be any of a number of types known in the art like, for example, a buck converter, a boost converter, a switched capacitor converter, etc. These circuits often require external capacitors and inductors with values larger than may be practical to implement as a portion of PMIC 120. They may also generate significant noise so care must be taken in their design and use.
Low Drop Out (LDO) regulators like 126 and 128 are known in the art. They are a type of linear regulator that provides a small step down from a power supply voltage to a regulated lower voltage. They may also be present in PMIC 120 to provide different voltages to DPIC 112 and/or other integrated circuits in system 100 not shown in
Package 130 may comprise DPIC 112 which may be bonded to a package substrate 132 with solder bumps 138. Data processing integrated circuit 112 may be surrounded by die seal 134 to protect it from physical, chemical and/or electrical damage, but this may not be the case in some applications. In some technologies die seal 134 may not be present at all like, for example, in a die scale package. In other technologies, die seal 134 may be present as a layer between DPIC 112 and the package substrate 132 (and is known as under-fill). Package 130 itself may be bonded to PCB 110 by means of solder balls 136 coupled to the package substrate 132.
PMIC 120 is also shown in the figure, but without any internal package detail. It may be bonded to PCB 110 by solder bumps 140, and coupled to package 130 though metal traces 142 present in PCB 110, though many other configurations are possible.
It is highly desirable for the circuitry comprising PMIC 120 and RLC passives 118 (not shown in
Those of ordinary skill in the art will realize that the following figures and descriptions of exemplary embodiments and methods of the present invention are illustrative only and not in any way limiting. Other embodiments will readily suggest themselves to such skilled persons after reviewing this disclosure.
Reference numbers are generally keyed to the figure in which they first appear. For example, a reference number in the range 700-799 will typically appear first in
Top integrated circuit 212-A may be both physically and electrically coupled to bottom integrated circuit 214-A at interface 250-A using, for example, a die-to-die or wafer-to-wafer bonding technology. Dies or wafers may be bonded in a stacked arrangement using various bonding techniques like, for example, DBI®, a hybrid direct bonding technology that allows semiconductor wafers or dies to be bonded with exceptionally fine pitch 3D electrical interconnect, available from Invensas Bonding Technologies, Inc. (formerly Ziptronix, Inc.), an Xperi company (see for example, U.S. Pat. Nos. 6,864,585 and 7,485,968, which are incorporated herein in their entirety). Thus a high density of power and signal interconnections may be available between integrated circuits 212-A and 214-A.
The two integrated circuits 212-A and 214-A bonded together at interface 250-A may be mounted on package substrate 232 by solder bumps 238, and may be surrounded by die seal 234 to protect them from physical, chemical, and electrical damage. Coupling between the circuit portions 212-U and 214-U (of the bonded integrated circuits 212-A and 214-A, respectively) and the solder bumps 238 may be made by, for example, through-silicon vias (TSVs) passing through integrated circuit 214-A (not shown in
The circuit portion 212-U further comprises an integrated voltage regulator (IVR) circuit 216-A, while circuit portion 214-U further comprises integrated RLC passive components 215. IVR circuit 216-A may comprise some, all, or different regulatory circuitry, partially or completely replacing similar circuits like, for example, portions of a chip like, for example, PMIC 120 in
Integrated circuits 212-A and 214-A may be manufactured using different semiconductor fabrication processes. For example, integrated circuit 212-A might be manufactured in a process more favorable for producing circuits like those found, for example, in data processing integrated circuit 112 and/or PMIC 120 in
The two integrated circuits 212-B and 214-B bonded together at interface 250-B may be mounted on package substrate 232 by solder bumps 238, and may be surrounded by die seal 234 to protect them from physical, chemical, and electrical damage. Coupling between the circuit portions 212-W and 214-W (of the bonded integrated circuits 212-B and 214-B, respectively) and the solder bumps 238 may be made by, for example, through-silicon vias (TSVs) passing through integrated circuit 214-B (not shown in
The circuit portion 212-W further comprises an integrated voltage regulator (IVR) circuit 216-B and RLC passive components 217. IVR circuit 216-B comprises some, all, or different regulatory circuitry, partially or completely replacing similar circuits like, for example, those comprising portions of a chip like, for example, PMIC 120 in
Integrated circuits 212-B and 214-B may be manufactured using different semiconductor fabrication processes. For example, integrated circuit 212-B might be manufactured in a process more favorable for producing both analog circuits like those found, for example, in PMIC 120 in
The two integrated circuits 212-C and 214-C bonded together at interface 250-C may be mounted on package substrate 232 by solder bumps 238, and may be surrounded by die seal 234 to protect them from physical, chemical, and electrical damage. Coupling between the circuit portions 212-Y and 214-Y (of the bonded integrated circuits 212-C and 214-C, respectively) and the solder bumps 238 may be made by, for example, through-silicon vias (TSVs) passing through integrated circuit 214-C (not shown in
The circuit portion 212-Y further comprises an integrated voltage regulator (IVR) circuit 216-C and RLC passive components 218, while the circuit portion 214-Y further comprises RLC passive components 219. IVR circuit 216-C comprises some, all, or different regulatory circuitry, partially or completely replacing similar circuits like, for example, those comprising portions of a chip like PMIC 120 in
Integrated circuits 212-C and 214-C may be manufactured using different semiconductor fabrication processes. For example, integrated circuit 212-C might be manufactured in a process more favorable for producing both analog circuits like those found, for example, in PMIC 120 in
In this configuration, individual passive components may be formed in two parts via the connections at the interface 250-C between RLC 218 and RLC 219. This approach has the advantage over the background art of saving space on PCB 210 as well better electrical performance by placing IVR 216-C and RLCs 218 and 219 closer to the circuits they are coupled to. In addition, the interface 250-C can be made extremely thin to enhance the electric and/or magnetic coupling to more efficiently make passive components formed in two parts.
Top IC 312-A, RLC 318-A, and bottom IC 314-A may be manufactured using different semiconductor fabrication processes appropriate to the circuitry therein. For example, IC 312-A may be manufactured in a process tuned to produce ICs like, for example, PMIC 120 in
This approach improves over the background art because in many embodiments it allows a system like system 100 in
RLC 318-B, top IC 312-B, and bottom IC 314-B may be manufactured using different semiconductor fabrication processes appropriate to the circuitry therein. For example, RLC 318-B may be manufactured in a process tuned to produce passive components, while IC 312-B may be manufactured in a process tuned to produce ICs like, for example, PMIC 120 in
This approach improves over the background art because in many embodiments it allows a system like system 100 in
Top IC 312-C, bottom IC 314-C, and RLC 318-C, may be manufactured using different semiconductor fabrication processes appropriate to the circuitry therein. For example, IC 312-C may be manufactured in a process tuned to produce ICs like, for example, data processing integrated circuit 112 in
This approach improves over the background art because in many embodiments it allows a system like system 100 in
Top integrated circuit 412-A may be both physically and electrically coupled to RLC 415-A at interface 450-K using, for example, a die-to-die or wafer-to-wafer bonding technology like, for example, DBI®. a hybrid direct bonding technology available from Invensas Bonding Technologies, Inc. Similarly, RLC 415-A may also be both physically and electrically coupled to bottom integrated circuit 414-A at interface 450-L using, for example, DBI®.
The circuit portion 412-U of top IC 412-A further comprises integrated voltage regulator (IVR) 416-A. This allows better electrical performance because of the proximity of IVR 416-A to a select portion of the components of RLC 415-A that are directly coupled between them at interface 450-K, while other passive components with less critical layout constraints may be placed elsewhere on RLC 415-A. Further, it allows IVR 416-A to be placed in a location that is optimal for the circuits it regulates power for in either IC 412-A or IC 414-A.
Top integrated circuit 412-B may be both physically and electrically coupled to RLC 415-B at interface 450-M using, for example, a die-to-die or wafer-to-wafer bonding technology like, for example, DBI®. Similarly, RLC 415-B may also be both physically and electrically coupled to bottom integrated circuit 414-B at interface 450-N using, for example, a die-to-die or wafer-to-wafer bonding technology like, for example, DBI®.
The circuit portion 412-W of top IC 412-B further comprises integrated voltage regulator (IVR) 416-B and RLC passives 418-B. This allows better electrical performance because of the proximity of IVR 416-B to a select portion of the components of RLC 415-B that are directly coupled between them at interface 450-M, while other components with less critical layout constraints may be placed elsewhere on RLC 415-B. Further, it allows IVR 416-A to be placed in a location that is optimal for the circuits it regulates power for in either IC 412-A or IC 414-A. The proximity of RLC passives 418-B on IC 412-B to RLC die 415-B further allows the creation of unique passive components having two portions coupled together at interface 450-M. Such unique two-die passive components may have advantages over components formed in a single die due to the reduced complexity of processing one or both of IC 412-B and RLC 415-B.
Top integrated circuit 412-C may be both physically and electrically coupled to RLC 415-C at interface 450-O using, for example, a die-to-die or wafer-to-wafer bonding technology like, for example, DBI®, a hybrid direct bonding technology available from Invensas Bonding Technologies, Inc. Similarly, RLC 415-C may also be both physically and electrically coupled to bottom integrated circuit 414-C at interface 450-P using, for example, a die-to-die or wafer-to-wafer bonding technology like, for example, DBI®.
The circuit portion 412-Y of top IC 412-C further comprises integrated voltage regulator (IVR) 416-C and RLC passives 418-C. This allows better electrical performance because of the proximity of IVR 416-C to a select portion of the components of RLC 415-C that are directly coupled between them at interface 450-O, while other components with less critical layout constraints may be placed elsewhere on RLC 415-C. The proximity of RLC passives 418-C on IC 412-C to RLC die 415-C allows the creation of unique passive components having two portions coupled together at interface 450-O. Such unique two-die passive components may have advantages over components formed in a single die like, for example, due to reduced complexity of processing one or both of IC 412-C and RLC 415-C.
Further, the proximity of RLC passives 418-C on IC 412-C to RLC passives 419-C on IC 414-C opposite each other across RLC die 415-C allows the creation of unique passive components having three portions coupled together at interfaces 450-O and 450-P. Such unique three-die passive components may have advantages over components formed in a single die like, for example, due to reduced complexity of processing one, two, or all three of IC 412-C, RLC 415-C, and IC 412-C.
Returning to
Returning to
When assembled, inductor 540 comprises a magnetically enhanced material 542, wires on a bottom metal layer 544, wires on a top metal layer 546, and via contacts 548, which couple together the wires on metal layers 544 and 546. Inductor 540 has three terminals T1, T2, and T3 which may be used to couple it to other electronic components and circuits not shown in
Inverter 540 is shown in two parts in
In
Inductor 500 in
In
Embedded annular inductor 620 comprises a circular ring 622 of magnetically enhanced material, wires on a bottom metal layer 624, wires on a top metal layer 626, and vias 628 coupling together the wires on metal layers 624 and 626. Embedded annular inductor 620 has two terminals T1 and T2 (not shown in
Embedded annular inductor 620 is an example of the three-die passive components discussed previously in regards to
Ring 622 is illustrated as completely spanning RLC 632 from top to bottom. This can be accomplished by etching a circular trench and filling it with the magnetically enhanced material. This has the advantage of allowing the top and bottom of ring 622 to be extremely close to top metal 626 and bottom metal 624 respectively with little more than, for example, the thin bonding oxide used as part of the DBI® process previously discussed. As persons skilled in the art will appreciate, both metal layer 624 and metal layer 626 can be implemented using the thick top metal layers typically present in IC 634 and IC 630, respectively. Such skilled persons will also appreciate that the final thickness of RLC die 632 is less than its thickness when the magnetically enhanced ring 622 is defined and the circular trench is etched. This prevents the material in the center of ring 622 from detaching. Ultimately, RLC die 632 is then thinned to its final thickness later in the manufacturing process.
Embedded annular inductor 640 comprises a circular ring 642 of magnetically enhanced material, wires on a bottom metal layer 644, wires on a top metal layer 646, and vias 648 coupling together the wires on metal layers 644 and 646. Embedded annular inductor 640 has two terminals T1 and T2 (not shown in
Embedded annular inductor 640 is another example of the three-die passive components discussed previously in regards to
Embedded annular inductor 660 comprises a ring 662 of magnetically enhanced material, wires on a bottom metal layer 664, wires on a top metal layer 666, and vias 668 coupling together the wires on metal layers 664 and 666. Embedded annular inductor 660 has two terminals T1 and T2 (not shown in
Embedded annular inductor 660 is an example of the two-die passive components discussed previously in regards to
Embedded annular inductor 680 comprises a ring 682 of magnetically enhanced material, wires on a bottom metal layer 684, wires on a top metal layer 686, and vias 688 coupling together the wires on metal layers 684 and 686. Embedded annular inductor 680 has two terminals T1 and T2 (not shown in
Embedded annular inductor 680 is an example of the two-die passive components discussed previously in regards to
The schematic symbol for capacitor 710 is present in
The schematic symbol for capacitor 720 is present in
The schematic symbol for resistor 730 is present in
The schematic symbol for fuse 740 is present in
A fuse is normally conductive until it is programmed, so fuse layer 746 will initially be a conductive material electrically coupling top metal plate 742 and bottom metal plate 744. When programmed, fuse layer 746 will disintegrate or change in some other way breaking the connection between top metal plate 742 and bottom metal plate 744 creating an open circuit as is known in the art.
An antifuse is normally non-conductive until it is programmed, so fuse layer 746 will initially be an insulating material electrically isolating top metal plate 742 and bottom metal plate 744. When programmed, metal from top metal plate 742 and bottom metal plate 744 will fuse together into a conductive filament through fuse layer 746 making an electrical connection between top metal plate 742 and bottom metal plate 744 as is known in the art.
Through silicon via (TSV) 810 may allow electrical coupling through RLC 800-A between solder bump 806 and bottom circuit die 802-A. TSV 810 comprises lower bond pad 812, upper bond pad 814, and via 816. Lower bond pad 812 is metal that may couple solder bump 806 to via 816, and upper bond pad 814 is metal may couple bottom die 802-A to via 816.
TSV 818 may allow electrical coupling through bottom circuit die 802-A between RLC die 800-A and top circuit die 804 A. TSV 818 comprises upper bond pad 820, lower bond pad 822, and via 824. Lower bond pad 822 is metal that may couple bond pad 814 to via 824, and upper bond pad 820 is metal that may couple via to 824 top die 804-A. Lower bond pad 826 may be present in top die 804-A to electrically couple to upper bond pad 820.
Circuit 830 is present in the diagram and coupled to solder bumps 832 and 834 through two TSVs 831 and 833 (shown as wires for simplicity in
Diode 836 has its cathode terminal coupled to circuit 830, solder bump 832, and a first terminal of optional capacitor 840, while its anode terminal is coupled to circuit 830, solder bump 834 and an internal ground node 838. Optional capacitor 840 has a second terminal coupled to solder bump 834.
When a negative ESD event occurs at solder bump 832, the voltage on the cathode goes negative (i.e., below ground) until diode 836 turns on and safely steers the ESD current from ground by means of solder bump 834 and out of the device through solder bump 832.
When a positive ESD event occurs at solder bump 832, the voltage on the cathode goes positive (i.e., above ground) until diode 836 breaks down and safely steers the ESD current from solder bump 832 and out of the device to ground through solder bump 834.
In a typical ESD protection scheme, an ESD event on any pin will have the current (positive or negative depending on the positive or negative voltage polarity of the ESD event) steered to or from the internal ground 838 which is coupled to solder bump 834 in the figure. Thus, any event between any two pins is treated as a positive ESD event on one pin and a negative ESD event on the other. Typically, internal ground node 838 is present near every bond pad and/or ESD device like diode 836 and provides a low resistance path (typically through both thick metal and/or the substrate) between all pairs of pins to prevent the ESD current from damaging the device.
Optional capacitor 840 may provide a temporary current source or sink during an ESD event on solder bump 832. By sourcing or sinking some of the ESD current during the initial stages of an ESD event, it provides additional time for diode 836 to turn on or break down before the voltage on solder bump 832 can rise or fall to a level where circuit 830 or other internal components are damaged.
Also present in
Also present in
Solder bump 858 is coupled to a second terminal of capacitor 854. Switching power supply 850 is further coupled to a second terminal of capacitor 856. Also present in the figure is solder bump 862 coupled to external ground, internal ground 864, and to switching power supply 850 by means of TSV 866. Also shown is solder ball 868 coupled to an external power supply and switching power supply 850 by means of TSV 869
Capacitor 860 is present in RLC die 800-B having a first terminal coupled to switching power supply 850 and a second terminal coupled to external ground by means of solder bump 862. In this embodiment, RLC die has two different layers of embedded capacitors with capacitors 854 and 860 on a lower layer and capacitor 856 on an upper layer. Persons skilled in the art will appreciate that more than two layers of capacitors (or resistors, inductors, or any other passive component) may be present as a matter of design choice.
Programming circuit 870 is present in bottom circuit die 802 C. It is coupled to external power and external ground by means of solder bumps 872 and 874 respectively, in series with TSVs 876 and 878 respectively.
Also coupled to programming circuit are both terminals of the fuses 880 and 882. Programming circuit 870 is configured apply the necessary electrical signals to program and read the contents of fuses 800 and 882. The data stored in the fuses may be used for a variety of functions like, for example, operating or configuration parameters of any circuitry in RLC die 800-C, bottom circuit die 802-C and top circuit die 804-C.
Also present in the figure is switching power supply 884, two-part inductor 886, two-part capacitors 888, lower-layer capacitors 890, solder bumps 892 and 896, and TSVs 894 and 898. Switching power supply 884 may be of a type known in the art like, for example, a buck converter. Two-part inductor 886 may be partially formed in bottom circuit die 802-D and partially formed in RLC passives die 800-D in a manner similar to the inductors disclosed in
Switching power supply 884 is coupled to a first terminal of two-part inductor 886, the first terminals of two-part capacitors 888, the first terminals of lower-layer capacitors 890, to an external ground by means of solder bump 892 and TSV 894, and to an external power source by means of solder bump 896 and TSV 898. The second terminal of two-part inductor 886 is coupled to switching power supply 884 and the first terminals of two-part capacitors 888 and the first terminals of lower-layer capacitors 890. The second terminals of two-part capacitors 888 and the second terminals of lower-layer capacitors 890 are coupled to external ground by means solder bump 892.
The advantages of the circuit configuration of
Package 900 comprises package substrate 932, solder bumps 938, bottom die 914, RLC dies 918-A and 918-B, top die 912 and die seal 934. These structures are roughly analogous to their counterparts substrate 332, solder bumps 338, bottom die 314, RLC passives die 318, top die 312 and die seal 334 respectively in package 330-A, allowing for differences in design goals and choices.
Package 900 has two RLC dies 918-A and 918-B bonded together between top die 912 and bottom die 914. All four die are bonded together in a manner similar to that discussed with respect to other embodiments. Together they are coupled to package substrate 932 by means of solder bumps 938.
RLC dies 918-A and 918-B may be manufactured with different fabrication processes allowing a greater variety of RLC passive components to be present in package 900 than in the device in package 330-A.
Package 902 comprises package substrate 932, solder bumps 938, bottom die 914, RLC dies 918-A and 918-B, top die 912 and die seal 934 though the reference numerals are not shown in the figure. These structures are roughly analogous to their counterparts in package 900. The primary difference is that RLC dies 918-A and 918-B are bonded together at the top of the stack above top die 912 and bottom die 914.
Package 904 comprises package substrate 932, solder bumps 938, bottom die 914, RLC dies 918-A and 918-B, top die 912 and die seal 934 though the reference numerals are not shown in the figure. These structures are roughly analogous to their counterparts in packages 900 and 902. The primary difference is that RLC dies 918-A and 918-B are bonded together at the bottom of the die stack below top die 912 and bottom die 914.
Likewise, package 906 comprises package substrate 932, solder bumps 938, bottom die 914, RLC dies 918-A and 918-B, top die 912 and die seal 934 though the reference numerals are not shown in the figure. These structures are roughly analogous to their counterparts in packages 900, 902, and 904. The primary difference is that top die 912 and bottom die 914 are bonded together in the middle of the die stack, and bonded together with RLC dies 918-A and 918-B at the top and bottom of the stack respectively.
Persons skilled in the art will recognize that other combinations are possible and fall within the scope of the present invention. For example, such skilled persons will realize that more than four dies may be present as shown in package 908.
Package 908 comprises package substrate 932, solder bumps 938, bottom die 914, RLC die 918-A, middle die 913, RLC die 918-B, top die 912 and die seal 934 though (except for middle die 913) the reference numerals are not shown in the figure. These structures are roughly analogous to their counterparts in packages 900, 902, 904, and 906. Persons skilled in the art will realize that more than five die may be present and that many different combinations are available and within the scope of the present.
Those of ordinary skill in the art will realize that the above figures and descriptions are exemplary only. Many other embodiments will readily suggest themselves to such skilled persons after reviewing this disclosure. Thus, the invention is not to be limited in any way except by the issued claims.
This application claims priority to U.S. provisional patent application No. 62/723,897 filed on Aug. 28, 2018, which is hereby included by reference herein in its entirety.
Number | Name | Date | Kind |
---|---|---|---|
4998665 | Hayashi | Mar 1991 | A |
5087585 | Hayashi | Feb 1992 | A |
5322593 | Hasegawa et al. | Jun 1994 | A |
5408053 | Young | Apr 1995 | A |
5471090 | Deutsch et al. | Nov 1995 | A |
5753536 | Sugiyama et al. | May 1998 | A |
5771555 | Eda et al. | Jun 1998 | A |
5985739 | Plettner et al. | Nov 1999 | A |
5998808 | Matsushita | Dec 1999 | A |
6008126 | Leedy | Dec 1999 | A |
6080640 | Gardner et al. | Jun 2000 | A |
6115264 | Nosaka | Sep 2000 | A |
6265775 | Seyyedy | Jul 2001 | B1 |
6300161 | Goetz et al. | Oct 2001 | B1 |
6374770 | Lee et al. | Apr 2002 | B1 |
6418029 | McKee et al. | Jul 2002 | B1 |
6423640 | Lee et al. | Jul 2002 | B1 |
6465892 | Suga | Oct 2002 | B1 |
6638808 | Ochi | Oct 2003 | B1 |
6713871 | Searls et al. | Mar 2004 | B2 |
6759692 | Ochi | Jul 2004 | B1 |
6864585 | Enquist | Mar 2005 | B2 |
6887769 | Kellar et al. | May 2005 | B2 |
6908027 | Tolchinsky et al. | Jun 2005 | B2 |
7045453 | Canaperi et al. | May 2006 | B2 |
7078811 | Suga | Jul 2006 | B2 |
7105980 | Abbott et al. | Sep 2006 | B2 |
7126212 | Enquist et al. | Oct 2006 | B2 |
7193423 | Dalton et al. | Mar 2007 | B1 |
7339798 | Chakravorty | Mar 2008 | B2 |
7354798 | Pogge et al. | Apr 2008 | B2 |
7355836 | Radhakrishnan et al. | Apr 2008 | B2 |
7485968 | Enquist et al. | Feb 2009 | B2 |
7705691 | Lu et al. | Apr 2010 | B2 |
7741724 | Morikawa et al. | Jun 2010 | B2 |
7746663 | Hashimoto | Jun 2010 | B2 |
7750488 | Patti et al. | Jul 2010 | B2 |
7803693 | Trezza | Sep 2010 | B2 |
8009763 | Risk et al. | Aug 2011 | B2 |
8130821 | Hopkins et al. | Mar 2012 | B2 |
8183127 | Patti et al. | May 2012 | B2 |
8241961 | Kim et al. | Aug 2012 | B2 |
8314007 | Vaufredaz | Nov 2012 | B2 |
8349635 | Gan et al. | Jan 2013 | B1 |
8357931 | Schieck et al. | Jan 2013 | B2 |
8377798 | Peng et al. | Feb 2013 | B2 |
8441131 | Ryan | May 2013 | B2 |
8476146 | Chen et al. | Jul 2013 | B2 |
8476165 | Trickett et al. | Jul 2013 | B2 |
8482132 | Yang et al. | Jul 2013 | B2 |
8483253 | Budd et al. | Jul 2013 | B2 |
8501537 | Sadaka et al. | Aug 2013 | B2 |
8524533 | Tong et al. | Sep 2013 | B2 |
8558636 | Shin et al. | Oct 2013 | B2 |
8620164 | Heck et al. | Dec 2013 | B2 |
8647987 | Yang et al. | Feb 2014 | B2 |
8697493 | Sadaka | Apr 2014 | B2 |
8698323 | Mohammed et al. | Apr 2014 | B2 |
8716105 | Sadaka et al. | May 2014 | B2 |
8802538 | Liu et al. | Aug 2014 | B1 |
8809123 | Liu et al. | Aug 2014 | B2 |
8841002 | Tong | Sep 2014 | B2 |
8916448 | Cheng et al. | Dec 2014 | B2 |
8988299 | Kam et al. | Mar 2015 | B2 |
9093350 | Endo et al. | Jul 2015 | B2 |
9142517 | Liu et al. | Sep 2015 | B2 |
9171756 | Enquist et al. | Oct 2015 | B2 |
9179584 | La Porta et al. | Nov 2015 | B2 |
9184125 | Enquist et al. | Nov 2015 | B2 |
9224704 | Landru | Dec 2015 | B2 |
9230941 | Chen et al. | Jan 2016 | B2 |
9257399 | Kuang et al. | Feb 2016 | B2 |
9263186 | Li et al. | Feb 2016 | B2 |
9299736 | Chen et al. | Mar 2016 | B2 |
9312229 | Chen et al. | Apr 2016 | B2 |
9331149 | Tong et al. | May 2016 | B2 |
9337235 | Chen et al. | May 2016 | B2 |
9368866 | Yu | Jun 2016 | B2 |
9385024 | Tong et al. | Jul 2016 | B2 |
9391143 | Tong et al. | Jul 2016 | B2 |
9394161 | Cheng et al. | Jul 2016 | B2 |
9431368 | Enquist et al. | Aug 2016 | B2 |
9437572 | Chen et al. | Sep 2016 | B2 |
9443796 | Chou et al. | Sep 2016 | B2 |
9461007 | Chun et al. | Oct 2016 | B2 |
9496202 | Hashimoto | Nov 2016 | B2 |
9496239 | Edelstein et al. | Nov 2016 | B1 |
9536848 | England et al. | Jan 2017 | B2 |
9537199 | Dang et al. | Jan 2017 | B2 |
9559081 | Lai et al. | Jan 2017 | B1 |
9620481 | Edelstein et al. | Apr 2017 | B2 |
9656852 | Cheng et al. | May 2017 | B2 |
9671572 | Decker et al. | Jun 2017 | B2 |
9723716 | Meinhold | Aug 2017 | B2 |
9728521 | Tsai et al. | Aug 2017 | B2 |
9741620 | Uzoh et al. | Aug 2017 | B2 |
9799587 | Fujii et al. | Oct 2017 | B2 |
9852988 | Enquist et al. | Dec 2017 | B2 |
9881882 | Hsu et al. | Jan 2018 | B2 |
9893004 | Yazdani | Feb 2018 | B2 |
9929050 | Lin | Mar 2018 | B2 |
9941241 | Edelstein et al. | Apr 2018 | B2 |
9941243 | Kim et al. | Apr 2018 | B2 |
9953941 | Enquist | Apr 2018 | B2 |
9960142 | Chen | May 2018 | B2 |
10002844 | Wang et al. | Jun 2018 | B1 |
10026605 | Doub et al. | Jul 2018 | B2 |
10095657 | Kasahara et al. | Oct 2018 | B2 |
10204893 | Uzoh et al. | Feb 2019 | B2 |
10269756 | Uzoh | Apr 2019 | B2 |
10276619 | Kao et al. | Apr 2019 | B2 |
10276909 | Huang et al. | Apr 2019 | B2 |
10446487 | Huang et al. | Oct 2019 | B2 |
20020000328 | Motomura et al. | Jan 2002 | A1 |
20020003307 | Suga | Jan 2002 | A1 |
20020131715 | Brady | Sep 2002 | A1 |
20030081906 | Filhaber et al. | May 2003 | A1 |
20030168716 | Lee et al. | Sep 2003 | A1 |
20040084414 | Sakai et al. | May 2004 | A1 |
20040149991 | Won | Aug 2004 | A1 |
20040155692 | Ochi | Aug 2004 | A1 |
20040207043 | Matsunaga et al. | Oct 2004 | A1 |
20050063134 | Kim et al. | Mar 2005 | A1 |
20050135041 | Kang et al. | Jun 2005 | A1 |
20050190808 | Yonekura et al. | Sep 2005 | A1 |
20050231303 | Chang et al. | Oct 2005 | A1 |
20060012966 | Chakravorty | Jan 2006 | A1 |
20060017144 | Uematsu et al. | Jan 2006 | A1 |
20060057945 | Hsu et al. | Mar 2006 | A1 |
20060145778 | Pleva et al. | Jul 2006 | A1 |
20070045814 | Yamamoto et al. | Mar 2007 | A1 |
20070085165 | Oh et al. | Apr 2007 | A1 |
20070096294 | Ikeda et al. | May 2007 | A1 |
20070111386 | Kim et al. | May 2007 | A1 |
20070147014 | Chang et al. | Jun 2007 | A1 |
20070222048 | Huang | Sep 2007 | A1 |
20070295456 | Gudeman et al. | Dec 2007 | A1 |
20080124835 | Chen et al. | May 2008 | A1 |
20080241667 | Kohn | Oct 2008 | A1 |
20090206962 | Chou et al. | Aug 2009 | A1 |
20090242252 | Tanaka | Oct 2009 | A1 |
20110115579 | Rofougaran | May 2011 | A1 |
20110290552 | Palmateer et al. | Dec 2011 | A1 |
20120013499 | Hayata | Jan 2012 | A1 |
20120147516 | Kim et al. | Jun 2012 | A1 |
20120168217 | Hsu et al. | Jul 2012 | A1 |
20120212384 | Kam et al. | Aug 2012 | A1 |
20130009325 | Mori et al. | Jan 2013 | A1 |
20130063863 | Timler et al. | Mar 2013 | A1 |
20130105943 | Lai et al. | May 2013 | A1 |
20130207234 | Ikeda et al. | Aug 2013 | A1 |
20130265733 | Herbsommer et al. | Oct 2013 | A1 |
20130286544 | Azais | Oct 2013 | A1 |
20140001568 | Wang et al. | Jan 2014 | A1 |
20140048908 | Chen et al. | Feb 2014 | A1 |
20140116761 | Lee et al. | May 2014 | A1 |
20140145338 | Fujii et al. | May 2014 | A1 |
20140175629 | Sun et al. | Jun 2014 | A1 |
20140175655 | Chen et al. | Jun 2014 | A1 |
20140177189 | Liu et al. | Jun 2014 | A1 |
20140184351 | Bae et al. | Jul 2014 | A1 |
20140225795 | Yu | Aug 2014 | A1 |
20140252635 | Tran | Sep 2014 | A1 |
20140264751 | Chen et al. | Sep 2014 | A1 |
20140264948 | Chou et al. | Sep 2014 | A1 |
20140370658 | Tong et al. | Dec 2014 | A1 |
20140377946 | Cha et al. | Dec 2014 | A1 |
20150064498 | Tong | Mar 2015 | A1 |
20150097298 | Chen et al. | Apr 2015 | A1 |
20150194379 | Chen et al. | Jul 2015 | A1 |
20150206902 | Cheng et al. | Jul 2015 | A1 |
20150221571 | Chaparala et al. | Aug 2015 | A1 |
20150235952 | Pan et al. | Aug 2015 | A1 |
20150270209 | Woychik et al. | Sep 2015 | A1 |
20150318618 | Chen et al. | Nov 2015 | A1 |
20160077294 | Jou et al. | Mar 2016 | A1 |
20160111404 | Sanders et al. | Apr 2016 | A1 |
20160155677 | Bonart et al. | Jun 2016 | A1 |
20160190113 | Sharan | Jun 2016 | A1 |
20160197630 | Kawasaki | Jul 2016 | A1 |
20160201265 | Kosonen et al. | Jul 2016 | A1 |
20160233195 | Nagai | Aug 2016 | A1 |
20160254345 | Singh et al. | Sep 2016 | A1 |
20160309578 | Park | Oct 2016 | A1 |
20160343682 | Kawasaki | Nov 2016 | A1 |
20160372449 | Rusu et al. | Dec 2016 | A1 |
20170019086 | Dueweke | Jan 2017 | A1 |
20170062366 | Enquist | Mar 2017 | A1 |
20170062409 | Basker et al. | Mar 2017 | A1 |
20170179029 | Enquist et al. | Jun 2017 | A1 |
20170194271 | Hsu et al. | Jul 2017 | A1 |
20170200711 | Uzoh et al. | Jul 2017 | A1 |
20170315299 | Mathai et al. | Nov 2017 | A1 |
20170338214 | Uzoh et al. | Nov 2017 | A1 |
20170343498 | Kalnitsky et al. | Nov 2017 | A1 |
20180096931 | Huang et al. | Apr 2018 | A1 |
20180174995 | Wang et al. | Jun 2018 | A1 |
20180175012 | Wu et al. | Jun 2018 | A1 |
20180182639 | Uzoh et al. | Jun 2018 | A1 |
20180182666 | Uzoh et al. | Jun 2018 | A1 |
20180190580 | Haba et al. | Jul 2018 | A1 |
20180190583 | DeLaCruz et al. | Jul 2018 | A1 |
20180191047 | Huang et al. | Jul 2018 | A1 |
20180219038 | Gambino et al. | Aug 2018 | A1 |
20180226375 | Enquist et al. | Aug 2018 | A1 |
20180273377 | Katkar et al. | Sep 2018 | A1 |
20180286805 | Huang et al. | Oct 2018 | A1 |
20180323177 | Yu et al. | Nov 2018 | A1 |
20180323227 | Zhang et al. | Nov 2018 | A1 |
20180331066 | Uzoh et al. | Nov 2018 | A1 |
20190096741 | Uzoh et al. | Mar 2019 | A1 |
20190096842 | Fountain, Jr. et al. | Mar 2019 | A1 |
20190115277 | Yu et al. | Apr 2019 | A1 |
20190131277 | Yang et al. | May 2019 | A1 |
20190198407 | Huang et al. | Jun 2019 | A1 |
20190198409 | Katkar et al. | Jun 2019 | A1 |
20190265411 | Huang et al. | Aug 2019 | A1 |
20190333550 | Fisch | Oct 2019 | A1 |
20190348336 | Katkar et al. | Nov 2019 | A1 |
20190385966 | Gao et al. | Dec 2019 | A1 |
20200013637 | Haba | Jan 2020 | A1 |
20200043817 | Shen et al. | Feb 2020 | A1 |
20200075534 | Gao et al. | Mar 2020 | A1 |
20200227367 | Haba et al. | Jul 2020 | A1 |
20200294908 | Haba et al. | Sep 2020 | A1 |
20200328162 | Haba et al. | Oct 2020 | A1 |
20200328164 | DeLaCruz et al. | Oct 2020 | A1 |
20200328165 | DeLaCruz et al. | Oct 2020 | A1 |
20200365575 | Uzoh et al. | Nov 2020 | A1 |
20200371154 | DeLaCruz et al. | Nov 2020 | A1 |
Number | Date | Country |
---|---|---|
1441410 | Jul 2004 | EP |
2000100679 | Apr 2000 | JP |
2001102479 | Apr 2001 | JP |
2002353416 | Dec 2002 | JP |
2003043281 | Feb 2003 | JP |
2008258258 | Oct 2008 | JP |
2013033786 | Feb 2013 | JP |
2018160519 | Oct 2018 | JP |
20080105797 | Oct 2006 | KR |
20150097798 | Aug 2015 | KR |
WO2002043584 | May 2005 | WO |
W02005064646 | Jul 2005 | WO |
WO2006100444 | Sep 2006 | WO |
WO2012125237 | Sep 2012 | WO |
WO2017151442 | Sep 2017 | WO |
Entry |
---|
Amirfeiz et ai., “Formation of Silicon Structures by Plasma-Activated Wafer Bonding”, Journal of the Electrochernical Society, 2000, vol. 147, No. 7, pp. 2693-3698. |
Chung et al., “Room temperature GaAs—Si and InP—Si wafer direct bonding by teh surface activate bonding method,” Nuclear Instruments and Methods in Physics Research B121, 1997, pp. 203-206. |
Chung et al., “Room temperature GaAseu + Si and InPeu + Si wafer direct bonding by teh surface active bonding method,” Nuclear Instruments and Methods in Physics Research Section B: Bean Interactions with Materials and Atoms, Jan. 2, 1997, vol. 121, issues 1-4, pp. 203-206. |
Chung et al., “Wafer direct bonding of compound semiconductors and silicon at room temperature by the surface activated bonding method”, Applied Surface Science, Jun. 2, 1997, vol. 117-118, pp. 808-812. |
Farrens et al., “Chemical Free Room Tempreature Wafer to Wafer Direct Bonding”, Journal of Electrochemical Society., col. 142, No. 11, Nov. 1995, pp. 3949-pp. 3955. |
Gosele et al., “Semiconductor Wafer Bonding: A flexible approach to materials combinations in microelectronics; micromechanics and optoelectronics,” IEEE, 1997, pp. 23-32. |
Hosoda et al., “Effect of the surface treatment on the room-temperature bonding of Al to Si and SiO2”, Journal of Materials Science, Jan. 1, 1998, vol. 33, issue 1, pp. 253-258. |
Howlader et al., “A novel method for bonding of ionic wafers,” Electronics Components and Technology Conference, 2006, IEEE, pp, 7-pp. |
Howlader et al., “Bonding of p-Si/n-InP wafers through surface activated bonding method at room temperature,” Indium Phosphide and Related Materiais, 2001, IEEE International Conference On, pp. 272-275. |
Howlader et al., “Characterization of the bonding strength and interface current of p-SiÖn-InP wafers bonded by surface activated bonding method at room temperature”, Journal of Applied Physics, Mar. 1, 2002, vol. 91, No. 5. pp. 3062-3066. |
Howlader et al., “Investigation of the bonding strength and interface current”, J. Vac. Sci. Technol. B 19(6) Nov/Dec 2001. pp. 2114-2118. |
International Search Report and Written Opinion dated Jan. 9, 2018, issued in International Application No. PCT/US2017/052409, 17 pages. |
International Search Report and Written Opinion dated Mar. 22, 2018, issued in International Application No. PCT/US2017/064735, 13 pages. |
International Search Report and Written Opinion dated Mar. 7, 2019, in International Application No. PCT/US2018/060044, 9 pages. |
International Search Report and Written Opinion dated Apr. 22, 2019, in international Application No. PCT/US2018/064982, 11 pages. |
International Search Report and Written Oinion dated Apr. 23, 2018, issued in International Application No. PCT/US2017/068788, 11 pages. |
International Search Report and Written Opinion dated May 29, 2017, issued in International Application No. PCT/US2016/067132, 11 pp. |
International Search Report and Written Opinion dated Jul. 17, 2018, issued in International Application No, PCT/US2018/025241, 13 pages. |
Itoh et al., “Room temperature vacuum sealing using surface activated bonding method,” the 12th International Conference on Solid State Sensors, Actuators and Microsystems, Boston, Jun. 8-12, 2003, 2003 IEEE, pp. 1828-1831. |
Itoh et al., “Characteristics of fritting contacts utilized for rnicromachined wafer probe cards”, 2000, American Institute of Physics, AIP Review of Scientific Instuments, vol. 71, 2000, pp. 2224-2227. |
Itch et al., “Characteristics of low force contact process for MEMS probe cards,” Sensors and Actuators A: Physical, vols. 9x 98, 2002, pp. 462-467, ISSN 0924-4247, https://doi.org/10.1016/S0924-4247(01)00822-6 (https://www. sciencedirect.com/sciencelarticle/pii/S0924424701008226). |
Itoh T., Kataoka K., Suga T. (2002) Development of Mems IC Probe Card Utilizing Fritting Contact. In: Inasaki I. (eds) Initiatives of Precision Engineering at the Beginning of a Millennium. Springer, Boston, MA. https://doi.org/10.1007/0-306-47000-4_61, pp. 314-318. |
Jeon et al., “Design of an on-interposer passive equalizer for high bandwidth memory (HBM) with 30Gbps data transmission,” Electronic Components and Technology Conference (ECTC), 2016 IEEE 66th, Aug. 18, 2016. |
Ker et al., “Fully process-compatible layout design on bond pad to improve wire bond reliability in CMOS lcs,” IEEE Transactions on Components and Packaging Technologies, Jun. 2002, vol. 25, No. 2, pp. 309-316. |
Kim et al., “A wideband on-interposer passive equalizer design for chip-to-chip 30-Gb/s serial data transmission,” IEEE Transactions on Components, Packaging and Manufacturing Technology, Jan. 2015, vol. 5, Issue 1, pp. 28-39. |
Kim et al., “Low temperature direct Cu—Cu bonding with low energy ion activation method,” Electronic Materials and Packaging, 2001, IEEE, pp. 193-195. |
Kim, et al., “Room temperature Cu—Cu direct bonding using surface activated bonding method,” Journal of Vacuum Science and Technology, Mar./Apr. 2003, vol. 21, No. 2, pp. 449-453. |
Kim et al., “Wafer—Scale Surface Activated Bonding of Cuu -Cu, Cu—Si, and Cu—SiO2 at Low Temperature”, Proceeding of the Electochemical Socitey, 2003, vol. 19, pp. 239-247. |
Lee, H. et al., “Signal integrity of bump-less high-speed through silicon via channel for terabyte/s bandwidth 2.5D IC,” 2016 IEEE 66th Electronic Components and Technology Conference, Aug. 18, 2016. |
Matsuzawa et al., “Room-temperature interconnection of electroplated Au microbump by means of surface activated bonding method,” Electornic Components and Technology Confererence, 2001, 51st Proceedings, IEEE, pp. 384-387. |
Moriceau, H. et al., “overview of recent direct wafer bonding advances and applications,” Advances in Natural Sciences-Nanoscience and Nanotechnology, 2010, 12 pages. |
Nakanishi, H. et al., “Studies on SiO2—SiO2 bonding with hydrofluoric acid. Room temperature and low stress bonding technique for MEMS,” Sensors and Actuators, 2000, vol. 79, pp. 237-244. |
Oberhammer, J. et al., “Sealing of adhesive bonded devices on wafer level,” Sensors and Actuators A, 2004, Vol, 110, No. 1-3, pp. 407-412, and Figures 1(a)-1(l), 7 pages. |
Onodera et al., “The effect of prebonding heat treatment on the separability of Au wire from Ag-plated Cu alloy substrate,” Electronics Packaging Manufacturing, IEEE Transactions, Jan. 2002, vol. 25, Issue 1, pp. 5-12. |
Plobi, A. et al., “Wafer direct bonding: tailoring adhesion between brittle materials,” Materials Science and Engineering Review Journal, 1999, R25, 88 pages. |
Reiche et al., “The effect of a plasma pretreatment on the Si/Si bonding behaviouir,” Electochemical Society Proceedings, 1998, Vol, 97-36, pp. 437-444. |
Roberds et al., “Low temperature, in situ, plasma activated wafer bonding.” Electrochemical Society Proceedings, 1997, vol. 97-36, pp. 437-444. |
Shigetou et al., “Room-temperature direct bonding of CMP-Cu film for burnpless interconnection,” Electronic Components and Technology Corifererence, 51st Proceedings, 2001, IEEE, pp. 755-760. |
Shigetou et al., “Room temperature bonding of ultra-fine pitch and low-profiled Cu electrodes for bump-less interconnect,” 2003 Electronic Components and Technology Conference, pp. 848-852. |
Shingo et al., “Design and fabrication of an electrostatically actuated MEMS probe card,” Tranducers, Solid-State Sensors, Actuators and Microsystems, 12th International Conference, Jun. 8-12, 2003, vol. 2, pp. 1522-1525. |
Suga et al., “A new approach to Cu—Cu direct bump bonding,” IEMT/IMC Symposium, 1997, Joint International Electronic Manufacturing Symposium and the International Microelectronics Conference, Apr. 16-18, 1997, IEEE, pp. 146-151. |
Suga et al., “A new bumping process using lead-free solder paste,” Electronics Packaging Manufacturing, IEEE Transactions on (vol. 25, Issue 4), IEEE, Oct. 2002, pp. 253-256. |
Suga et al., “A new wafer-bonder of ultra-high precision using surface activated bonding (SAB) concept,” Electronic Components and Technology Conference, 2001, IEEE, pp. 1013-1018. |
Suga et al., “Bump-less interconnect for next generation system packaging,” Electronic Components and Technology Conference, 2001, IEEE, pp. 1003-1008. |
Suga et al., “Surface activated bonding for new flip chip and bumpless interconnect systems,” Electronic Components and Technology Conference, 2002, IEEE, pp. 105-111. |
Suga, “Ceramic Microstructures: Contol at the Atomic Level”, Recent Progress in Surface Activated Bonding, Springer, 1998, pp. 385-389. |
Suga, T., “Room-temperature bonding on metals and ceramics,” Proceedingsof the Second International Symposium on Semiconductor Wafer Bonding: Science, Technology and Applications, the Electrochemical Society Proceedings, vol. 93-29 (1993), pp. 71-80. |
Suga, T., “Feasibility of surface activated bonding for ultra-fine pitch interconnection—A new concept of bump-less direct bonding for system level packaging,” the University of Tokyo, Research Center for Science and Technology, 2000 Electronic Components and Technology Conference, 2000 IEEE, pp. 702-705. |
Suga, “UHV room temperature joining by teh surface activated bonding method,” Advances in science and technology, Techna, Faenza, ltalie, 1999, C1079-1089 (Abstract). |
Takagi et al, “Wafer-scale room-temperature bonding between silicon and ceramic wafers by means of argon-beam surface activation,” Micro Electro Mechanical Systems, 2001, MEMS 2001, the 14th IEEE International Conference, Jan. 25, 2001, IEEE, pp. 60-63. |
Takagi et al., “Room temperature silicon wafer direct bonding in vacuum by Ar beam irradiation,” MicroElectro Mehcanical Systems. MEMS '97 Proceedings, 1997, IEEE, pp. 191-196. |
Takagi et al., “Effect of surface roughness on room-temperature wafer bonding by Ar Beam surface activation,” Japanese Journal of Applied Physics, 1998, vol. 37, Part 1, No. 1, pp. 4197. |
Takagi et al., “Low-temperature direct bonding of silicon and silicon dioxide by the surface activation method”, Solid State Sensors and Actuators, 1997, Transducers '97 Chicago, 1997 International Conference, vol. 1, pp. 657-660. |
Takagi et al., “Room-temperature bonding of lithium niobate and silicon wafers by argon-beam surface activation”, Applied Physicals Letters, vol. 74, No. 16, Apr. 16, 1999, pp. 2387-2389. |
Takagi et al., “Room-temperature wafer bonding of Si to LiNb03, LiTa03 and Gd3Ga5012 by Arbearn surface activation,” Journal of Micromechanics and Microengineering, 2001, vol. 11, No. 4, pp. 348. |
Takagiet al., “Surfaced activated bonding of silicon wafers at room temperature”, Appl. Phys. Lett. 68, Apr. 15, 1996, pp. 2222-2224. |
Takagi et al., “Wafer-scale spontaneous bonding of silicon wafers by argon-beam surface activation at room temperature”, Sensors and Actuators A: Physical, Jun. 15, 2003, Vol, 105, Issue 1. pp. 98-102. |
Takagi et al., “Room-Temperature Wafer Bonding of Silicon and Lithium Niobate by Means of Argon-Beam Surface Activation”, Integrated Ferroelectrics: an Internation Journal, 2002, vol. 50, Issue 1, pp. 53-59. |
Tong et al., “Low temperature wafer direct bonding”, Journal of Microelectomechanical systems, Mar. 1994, vol. 3, No. 1, pp. 29-pp. 35 |
Topol et al., “Enabling technologies for wafer-level bonding of 3D MEMS and integrated circuit structures,” 2004 Electronics Components and Technology Conference, 2004 IEEE, pp. 931-938. |
Wang et al., “Reliability and microstructure of Au—Al and Au—Cu direct bonding fabricated by the Surface Activated Bonding,” Electronic Components and Technology Conference, 2002, IEEE, pp. 915-919. |
Wang et al., “Reliability of Au bump—Cu direct interconnections fabricated by means of surface activated bonding method”, Microelectronics Reliability, May 2003, vol. 43, Issue 5, pp. 751-756. |
Weldon et al., “Physics and chemistry of silicon wafer bonding investigated by infrared absorption spectroscopy”, Journal of Vacuum Science & Technology, Jul./Aug. 1996, vol. 14, No. 4, pp. 3095-3106. |
Westphal et al., “Dielectric constant and loss data”, Air Force Materials Laboratory, Apr. 1972. |
Xu et al., “ New Au—Al interconnect technology and its reliability by surface activated bonding,” Electronic Packaging Technology Proceedings, Oct. 28-30, 2003, Shanghai, China, pp. 479-483. |
Number | Date | Country | |
---|---|---|---|
20200075553 A1 | Mar 2020 | US |
Number | Date | Country | |
---|---|---|---|
62723897 | Aug 2018 | US |