In many three-dimensional (3D) die complexes, a base die is provided and one or more top dies (e.g., chiplets) are provided over the base die. In some instances, the 3D die complex may be communicatively coupled to additional modules, such as a memory module. The connection between the 3D die complex and the additional module is typically made with a bridge die or bridge chiplet. The bridge die can be embedded in the package substrate or within the multi-tiered 3D complex itself. The bridge die is positioned below an edge region of the 3D die complex and for this case does not include a vertical power delivery path (such as a through silicon via (TSV)). This generates problems with power delivery.
The bridge die blocks power delivery paths to the overlying edge region of the 3D die complex. As such, a cantilevered power delivery architecture may be necessary to supply power to the edge region. Cantilevering the power delivery across the top of the bridge die comes with the cost of increased loadline resistance, which negatively impacts available power density within the edge region.
In order to mitigate the power delivery issues, some solutions are to provide low power density circuits in the edge region, or simply provide dummy silicon (i.e., bare silicon without any circuitry) in the edge region. This is less than ideal, especially considering the top die is often fabricated at advanced processing nodes, and it is important to optimize performance by including as many compute cores as possible on the top dies within the base die area.
or more memory modules and a multi-die module with a base die and one or more top dies, in accordance with an embodiment.
Described herein are electronic systems, and more particularly, three-dimensional (3D) die complexes with improved power delivery above bridge chiplets, in accordance with various embodiments. In the following description, various aspects of the illustrative implementations will be described using terms commonly employed by those skilled in the art to convey the substance of their work to others skilled in the art. However, it will be apparent to those skilled in the art that the present disclosure may be practiced with only some of the described aspects. For purposes of explanation, specific numbers, materials and configurations are set forth in order to provide a thorough understanding of the illustrative implementations. However, it will be apparent to one skilled in the art that the present disclosure may be practiced without the specific details. In other instances, well-known features are omitted or simplified in order not to obscure the illustrative implementations.
Various operations will be described as multiple discrete operations, in turn, in a manner that is most helpful in understanding the present disclosure, however, the order of description should not be construed to imply that these operations are necessarily order dependent. In particular, these operations need not be performed in the order of presentation.
As noted above, the integration of multiple dies and modules (e.g., three-dimensional (3D) die complexes and memory modules) comes with significant integration challenges. One particularly important challenge is the ability to provide power to edge regions of the top dies of a 3D die complex. More specifically, an underlying bridge die that couples the 3D die complex to the memory module blocks access to vertical power delivery. As such, cantilevered power (which increases loadline resistance), dummy silicon, or expensive through silicon via (TSV) architectures are needed for power delivery accommodation.
An example of such a power delivery issue is shown in
The first module 110 may include a memory module such as a high bandwidth memory (HBM) module. The second module 130 may be a 3D die complex. For example, the second module 130 may include a base die 131 and one or more overlying top dies 132. The top dies 132 may be compute chiplets with processing cores and related circuitry. The top die 132 may be coupled to the base die 131 with interconnects 133, such as copper bumps, solder, hybrid bonding interconnects (HBI), or the like.
The first module 110 may be communicatively coupled to the second module 130 by a die 120, such as a bridge die 120. The die 120 may include high density routing in order to provide high bandwidth signal transmission between the first module 110 and the second module 130. The die 120 may be embedded in the package substrate 101. Though, other architectures may include a bridge die 120 that is provided above the package substrate 101. The die 120 may be coupled to the first module 110 and the second module 130 through interconnects that may include solder interconnects 115 and 125, respectively.
The die 120 may be provided under an edge region of the second module 130. Since the die 120 is present below the edge region of the second module 130, there is no vertical access for power to reach the top die 132. Accordingly, a power delivery path 105 must start outside of the die 120 and cantilever over the die 120 before being routed up into the top die 132. This cantilevering results in a significant loadline resistance increase along the power delivery path 105. As such, the power density of the edge region of the second module 130 must be decreased. In some instances, a dummy silicon piece may replace the top die 132 in the edge region.
It is to be appreciated that such power delivery issues arise with many different bridge die architectures. For example, an alternative architecture is shown in
Additional 3D packaging architectures may also suffer from power delivery issues similar to those described above. For example,
Another example of a problematic 3D integration solution is shown in
It is to be appreciated that simplified architectures of the interconnects between the modules 110 and 130 and the package substrate 101, and between the modules 110 and 130 and the die 120 are shown for ease of illustration and improved understand of aspects disclosed herein. In reality, additional layers (e.g., solder resists, redistribution layers, barrier layers, etc.) may be include in the interconnect architectures between components described herein. Further, while certain architectures are shown in
In view of the issues with power delivery described above, embodiments disclosed herein include improved bridge die architectures. In some embodiments, a power delivery region is interleaved among a bump field that connects to the second module. The power delivery region may include one or more rows of bumps dedicated to power delivery in order to provide vertical power paths to the edge region of the overlying second module. As such, power density can be improved and a number of compute cores in the top die can be optimized.
However, it is to be appreciated that simply adding an extra row of power delivery bumps is not without issue. Particularly, the bump field under the first module may have a preset bump field shoreline height. For reduction in assembly complexity, the bump field shoreline of the bump field under the second module should match the bump field shoreline height of the bump field under the first module.
Accordingly, embodiments include a bridge die with a first side (under the first module) and a second side (under the second module). The first side includes a bump field with a standard shoreline height. This is enabled by spacing the bumps with a first Y-pitch. The second side includes a bump field with a reduced shoreline height enabled by spacing the bumps with a second (smaller) Y-pitch. The second side also includes a power deliver region running perpendicular to the bump field shoreline. The combined shoreline height of the bump field on the second side and the height of the power delivery region equals the height of the bump field shoreline on the first side.
Referring now to
In an embodiment, one or more first modules 210 are provided over the package substrate 201. The first module 210 may comprise a memory device. For example, the first module 210 may include a stack of two or more memory dies, such as an HBM module. While embodiments disclosed herein often refer to the first module 210 as a memory device, it is to be appreciated that embodiments are not limited to such structures. For example, the first module 210 may be another compute die or another 3D die complex.
In an embodiment a second module 230 is provided over the package substrate 201. The second module 230 may be adjacent to one or more of the first modules 210. In a particular embodiment, the second module 230 may comprise a 3D die complex. For example, the second module 230 may include a base die 231 with one or more overlying top dies 232. The base die 231 and the top dies 232 may be fabricated at different processing nodes, with the top dies 232 being at a more advanced process node. The top dies 232 may include compute functionality, such as compute cores, graphics cores, or the like.
The top dies 232 may sometimes be referred to as chiplets or tiles. The top dies 232 may be communicatively coupled to each other (or stitched together) through the base die 231. The smaller top dies 232 can be fabricated at advanced processing nodes with higher yields compared to a single large die. As such, improved computing power can be provided without sacrificing yield when a 3D die complex is used.
Referring now to
In an embodiment, the electronic package 200 may include dies 220 that are embedded in the package substrate 201. The dies 220 may be bridge dies 220 (sometimes referred to as bridge chiplets). While shown as being embedded in the package substrate 201, the die 220 may also be provided above the package substrate 201 in some packaging architectures. Regardless of location, the die 220 may include bumping solutions similar to those described in greater below. The die 220 may comprise silicon or other semiconductor materials. The die 220 may also be a glass die 220 in other embodiments.
In an embodiment, the die 220 may provide coupling between the first module 210 and the second module 230. The coupling may be considered electrical coupling, communicative coupling, or the like. More generally, the die 220 includes high density routing (e.g., traces, pads, etc.) that provide a path to propagate signals between the first module 210 and the second module 230.
As shown, the die 220 is provided below an edge region of the second module 230, which includes an edge region of the base die 231 and an edge region of the overlying top die 232. Accordingly, power delivery vertically to the edge region is blocked by the die 220. That is, power originating from the package substrate 201 does not have a path vertically through the die 220 to reach the edge region of the second module 230.
Therefore, embodiments disclosed herein include a die 220 that includes an integrated power delivery lane. Further, embodiments allow for the inclusion of a power delivery lane without increasing total bump field height along the die 220 edge. This ensures simple integration with the bump field under the first die module 210, as will be described below. The additional space for the power delivery lane is provided by shrinking a Y-pitch within the bump field below the second module 230.
Referring now to
In an embodiment, the bump field 340 may have a height H along a die edge of the bridge die. The height H may sometimes be referred to as a shoreline height. The height H may be set by standards or other design parameters. For example, in the case of a HBM first module, the bump field 340 may be a DWORD bump field. In HBM3 standards, the height H may be approximately 385 μm. Though, larger or smaller heights H may be used in some embodiments. While referred to as “height”, it is to be appreciated that the height H is not in the thickness direction (i.e., the Z-height). Instead, the height H is in a direction that is substantially parallel to a major direction of the die edge.
In the case of an HBM3 application, the Y-pitch may be approximately 110 μm and the X-pitch may be approximately 96 μm. This provides a diagonal pitch P of approximately 73 μm. While four rows of bump pads 345 are shown at the edge of the bump field 340, it is to be appreciated that each DWORD comprises 3.5 bump pads 345. That is, the fourth bump pad 345 is shared with a neighboring DWORD bump field 340. As such, the total height H (385 μm) is equal to 110 μm*3.5=385 μm. While a specific example of the HBM3 standard layout is provided, it is to be appreciated that embodiments may scale to other standards (e.g., HBM4 or beyond), or the layout may conform to other standards. More generally, the bump field 340 may have any pitches (i.e., Y-pitch, X-pitch, or diagonal pitch P) and/or any height H.
The bump field 340 in
Referring now to
In an embodiment, the space saved by the reduction of the Y-pitch is used by the inclusion of a power delivery region 342. The power delivery region 342 may include a height HP. The height HP plus the height of the bump field 340 may be equal to the height H that was set by the bump field 340 in
In one instance, the Y-pitch may be reduced to approximately 96.25 μm (though a perfect hexagonal compression is typically 95.26 μm). This provides a total height of the bump field 340 that is approximately 336.875 μm (i.e., 96.25 μm*3.5). With a height H of 385 uμm, this allows for a height HP of the power delivery region 342 to be approximately 48.125 μm. In an embodiment, the bump pitches of power delivery bumps may be different than those of the bump field 340.
Referring now to
Referring now to
In an embodiment, a plurality of power delivery regions 442 may be interleaved with the bump fields 440A-440D. The power delivery regions 442 may extend in a direction perpendicular to the edge of the substrate 421. In an embodiment, the combination of the height of an individual bump field 440 with an adjacent power delivery region 442 may be equal to the height H. The height H may be the same height as is used on the opposite side of the die 420 under the first module.
In an embodiment, each bump field 440A-440D may correspond to a DWORD region of a link between a 3D die complex and a HBM module. In a particular embodiment, the height H may be approximately 385 μm. Though, larger or smaller heights H may be used in other embodiments in order to match the localized AWORD/DWORD heights or total height H set by the HBM side of the die 420. In an embodiment, the power delivery regions 442 may comprise power delivery bump pads (not shown).
Referring now to
In an embodiment, the first bump field 540A may have a height HA and a Y-pitch (YA). In an embodiment, the second bump field 540B may have a Y-pitch (YB) that is smaller than the Y-pitch (YA). The compressed second bump field 540B provides room for the power delivery region 542. The combined height of the second bump field 540B and the power delivery region 542 may be height HB. In an embodiment, height HB is substantially equal to height HA. For example, the heights HA and HB may be approximately 385 μm.
In an embodiment, the X-pitch of the first bump field 540A and the second bump field 540B are substantially equal to each other. As such, depths into the die 520 of each bump field 540A and 540B are substantially equal to each other. In other embodiments, X-pitches may be different between the bump fields 540A and 540B. For example, the X-pitch of second bump field 540B may be smaller than the X-pitch of the first bump field 540A. As such, the second bump field 540B may have a depth into the die 520 that is smaller than a depth into the die 520 of the first bump field 540A. In an embodiment, the depth of the power delivery region 542 may be substantially equal to the depth of the second bump field 540B.
Referring now to
Referring now to
In an embodiment, the first module 610 is communicatively coupled to the second module 630 through a die 620, such as a bridge die 620. The die 620 may include a first side under the first module 610 and a second side under the second module 630. The first side may include bump pads 645A and the second side may include bump pads 645B. In an embodiment, the Y-pitch (into and out of the plane of
Referring now to
While an example of two different die 620 architectures are shown in
Referring now to
In an embodiment, a first module 710 and a second module 730 are coupled to the package substrate 701. The first module 710 may be an HBM module, and the second module 730 may be a 3D die complex including a base die 731 and top dies 732. Dies 720, such as bridge dies 720, may communicatively couple the first module 710 to the second module 730. In the illustrated embodiment, the first module 710, the second module 730, and the die 720 are shown as being directly on each other. However, it is to be appreciated that interconnects (e.g., solder balls, copper bumps, etc.) may be provided between components, similar to embodiments described in greater detail above.
In an embodiment, the die 720 may include a first side under the first module 710 and a second side under the second module 730. A first bump field on the first side may have a first height with bump pads having a first Y-pitch. A second bump field on the second side may be adjacent to a power delivery region. The combined height of the second bump field and the power delivery region may be equal to the first height. In order to provide space savings, the second bump field may have a second Y-pitch that is smaller than the first Y-pitch.
These other components include, but are not limited to, volatile memory (e.g., DRAM), non-volatile memory (e.g., ROM), flash memory, a graphics processor, a digital signal processor, a crypto processor, a chipset, an antenna, a display, a touchscreen display, a touchscreen controller, a battery, an audio codec, a video codec, a power amplifier, a global positioning system (GPS) device, a compass, an accelerometer, a gyroscope, a speaker, a camera, and a mass storage device (such as hard disk drive, compact disk (CD), digital versatile disk (DVD), and so forth).
The communication chip 806 enables wireless communications for the transfer of data to and from the computing device 800. The term “wireless” and its derivatives may be used to describe circuits, devices, systems, methods, techniques, communications channels, etc., that may communicate data through the use of modulated electromagnetic radiation through a non-solid medium. The term does not imply that the associated devices do not contain any wires, although in some embodiments they might not. The communication chip 806 may implement any of a number of wireless standards or protocols, including but not limited to Wi-Fi (IEEE 802.11 family), WiMAX (IEEE 802.16 family), IEEE 802.20, long term evolution (LTE), Ev-DO, HSPA+, HSDPA+, HSUPA+, EDGE, GSM, GPRS, CDMA, TDMA, DECT, Bluetooth, derivatives thereof, as well as any other wireless protocols that are designated as 3G, 4G, 5G, and beyond. The computing device 800 may include a plurality of communication chips 806. For instance, a first communication chip 806 may be dedicated to shorter range wireless communications such as Wi-Fi and Bluetooth and a second communication chip 806 may be dedicated to longer range wireless communications such as GPS, EDGE, GPRS, CDMA, WiMAX, LTE, Ev-DO, and others.
The processor 804 of the computing device 800 includes an integrated circuit die packaged within the processor 804. In some implementations of the disclosure, the integrated circuit die of the processor may be part of an electronic package that includes a bridge die that includes a first bump field with a first Y-pitch, and a second bump field with a second Y-pitch that is adjacent to a power delivery region, in accordance with embodiments described herein. The term “processor” may refer to any device or portion of a device that processes electronic data from registers and/or memory to transform that electronic data into other electronic data that may be stored in registers and/or memory.
The communication chip 806 also includes an integrated circuit die packaged within the communication chip 806. In accordance with another implementation of the disclosure, the integrated circuit die of the communication chip may be part of an electronic package that includes a bridge die that includes a first bump field with a first Y-pitch, and a second bump field with a second Y-pitch that is adjacent to a power delivery region, in accordance with embodiments described herein.
In an embodiment, the computing device 800 may be part of any apparatus. For example, the computing device may be part of a personal computer, a server, a mobile device, a tablet, an automobile, or the like. That is, the computing device 800 is not limited to being used for any particular type of system, and the computing device 800 may be included in any apparatus that may benefit from computing functionality.
The above description of illustrated implementations of the disclosure, including what is described in the Abstract, is not intended to be exhaustive or to limit the disclosure to the precise forms disclosed. While specific implementations of, and examples for, the disclosure are described herein for illustrative purposes, various equivalent modifications are possible within the scope of the disclosure, as those skilled in the relevant art will recognize.
These modifications may be made to the disclosure in light of the above detailed description. The terms used in the following claims should not be construed to limit the disclosure to the specific implementations disclosed in the specification and the claims. Rather, the scope of the disclosure is to be determined entirely by the following claims, which are to be construed in accordance with established doctrines of claim interpretation.
Example 1: an apparatus, comprising: a substrate; a first bump field with a first height and a first depth on the substrate, wherein the first depth is orthogonal to the first height, and wherein the first bump field further comprises a first pitch in a direction of the first height; a second bump field with a second height and a second depth on the substrate, wherein the second depth is orthogonal to the second height, and wherein the second bump field comprises a second pitch in a direction of the second height, wherein the second pitch is smaller than the first pitch; and a third bump field with a third height and the second depth, wherein a sum of the second height and the third height is equal to the first height.
Example 2: the apparatus of Example 1, wherein the first bump field has a first number of first rows, and wherein the second bump field has a second number of second rows, wherein the first number is equal to the second number.
Example 3: the apparatus of Example 1 or Example 2, wherein the third bump field comprises power delivery bump pads.
Example 4: the apparatus of Examples 1-3, wherein the first depth is different than the second depth.
Example 5: the apparatus of Examples 1-3, wherein the first depth is equal to the second depth.
Example 6: the apparatus of Examples 1-5, wherein the first height is approximately 385 μm or less.
Example 7: the apparatus of Example 6, wherein the first pitch is approximately 110 μm or less, and wherein the second pitch is approximately 96 μm or less.
Example 8: the apparatus of Examples 1-7, further comprising: a first module coupled to the first bump field; and a second module coupled to the second bump field and the third bump field, wherein the apparatus communicatively couples the first module to the second module.
Example 9: the apparatus of Example 8, wherein the first module is a memory, and wherein the second module is a multi-die module with a base die and one or more overlying top dies.
Example 10: the apparatus of Example 8 or Example 9, wherein the apparatus is embedded in a package substrate or is provided over a package substrate.
Example 11: an apparatus, comprising: a substrate; a first bump field on the substrate; a second bump field on the substrate; and a plurality of electrically conductive lanes interleaved with the second bump field.
Example 12: the apparatus of Example 11, wherein the first bump field has a height, and wherein the second bump field, including the electrically conductive lanes has the height.
Example 13: the apparatus of Example 11 or Example 12, wherein the plurality of electrically conductive lanes comprises a plurality of bump pads.
Example 14: the apparatus of Examples 11-13, wherein each electrically conductive lane has a height that is approximately 115 μm or less.
Example 15: the apparatus of Examples 11-14, wherein the first bump field comprises first bump pads with a first pitch, and wherein the second bump field comprises second bump pads with a second pitch that is smaller than the first pitch.
Example 16: the apparatus of Examples 11-15, further comprising: a first module coupled to the first bump field; and a second module coupled to the second bump field, wherein the substrate communicatively couples the first module to the second module.
Example 17: the apparatus of Example 16, wherein the first module comprises a memory, and wherein the second module comprises a base die with one or more overlying top dies.
Example 18: an apparatus, comprising: a board; a package substrate coupled to the board; a first module coupled to the package substrate; a second module coupled to the package substrate; and a bridge to communicatively couple the first module to the second module, wherein the bridge comprises: a first bump field with a first pitch coupled to the first module; a second bump field with a second pitch coupled to the second module; and a plurality of power delivery fields interleaved with the second bump field.
Example 19: the apparatus of Example 18, wherein the plurality of power delivery fields are configured to provide power to an edge region of the second module.
Example 20: the apparatus of Example 18 or Example 19, wherein the apparatus is part of a personal computer, a server, a mobile device, a tablet, or an automobile.