Patent Application
20130330571
The prior art design for providing backside contacts to semi-conductor devices uses nickel (Ni) or nickel-cobalt (Ni—Co) as a contact layer to adhere a silicon carbide (SiC) die (which is cut into individual die from a SiC wafer) to the package.
The problem with the prior art design is the incorporation of Ni into the Au—Si eutectic solder 210, which affects the homogeneity of the Au—Si eutectic solder 210, impedes the Au—Si eutectic formation, and impacts the solder flow and wetting on the ceramic package 112. The Ni incorporation creates new intermetallic or ternary compounds, which has higher melting points compared to Au—Si. As a result, the Ni incorporation increases the melting point of Au—Si, which causes the Au—Si eutectic solder 210 to freeze before the completion of the bonding of the SiC die 120 to the ceramic package 112. Such solder freezing causes localized or patchy joints between the SiC die 120 and the ceramic package 112, which is one of the root causes of solder voids 220 (shown in
An embodiment of a method is disclosed for providing improved backside metal contacts to silicon carbide. The method includes depositing a barrier layer on a bottom surface of a silicon carbide wafer. The barrier layer is located between the silicon carbide wafer and a silicon layer. The silicon carbide wafer is separated into individual silicon carbide dies. The method further includes mechanically scrubbing each silicon carbide die on the top surface of a package to form a gold-silicon eutectic solder that bonds the silicon carbide dies to the package. The barrier layer reduces or eliminates diffusion of species into the gold-silicon eutectic solder to reduce or eliminate voids in the gold-silicon eutectic solder.
Another embodiment of a method is disclosed for providing improved backside metal contacts to silicon carbide. The method includes depositing a contact layer on the bottom surface of a silicon carbide wafer. The contact layer includes a top surface and a bottom surface, and the top surface of the contact layer is attached to the bottom surface of the silicon carbide wafer. The method further includes depositing a barrier layer on the bottom surface of the contact layer. The barrier layer includes a top surface and a bottom surface. The method further includes depositing a silicon layer on the bottom surface of the barrier layer, separating the silicon carbide wafer into individual silicon carbide dies, mechanically scrubbing each silicon carbide die on the top surface of a package to form a gold-silicon eutectic solder that bonds the silicon carbide dies to the package. The barrier layer reduces or eliminates diffusion of species into the gold-silicon eutectic solder to reduce or eliminate voids in the gold-silicon eutectic solder.
An embodiment of an apparatus is disclosed for providing improved backside metal contacts to silicon carbide. The apparatus includes a silicon carbide wafer that includes a top surface and a bottom surface, and a contact layer deposited on the bottom surface of the silicon carbide wafer. The contact layer includes a top surface and a bottom surface, and the top surface of the contact layer is attached to the bottom surface of the silicon carbide wafer. The apparatus further includes a barrier layer deposited on the bottom surface of the contact layer. The barrier layer includes a top surface and a bottom surface. The apparatus further includes a silicon layer deposited on the bottom surface of the barrier layer. The silicon carbide wafer is separated into individual silicon carbide dies. A gold-silicon eutectic solder is formed by mechanically scrubbing each silicon carbide die on a top surface of a package. The gold-silicon eutectic solder bonds the silicon carbide dies to the package. The barrier layer reduces or eliminates diffusion of species, into the gold-silicon eutectic solder to reduce or eliminate voids in the gold-silicon eutectic solder.
The detailed description will refer to the following drawings, wherein like numerals refer to like elements, and wherein:
As noted above, the design used currently for providing backside metal contacts uses titanium (Ti) and nickel (Ni) or titanium (Ti) and nickel-cobalt (Ni—Co) as a contact layer to adhere a silicon carbide (SiC) die (which is cut into individual dies from a SiC wafer) to a package. Specifically, the contact layer is located between a silicon (Si) layer and the SiC wafer, which is cut (or diced) and separated into individual dies. Each SiC die is mechanically scrubbed on top of the heated package, which includes a copper-tungsten flange or heat sink at the bottom and a gold (Au) layer on the top surface. Si in the Si layer and Au in the Au layer reacts as a result of the thermo-mechanical energy from the scrubbing and heat on the package, forming a gold-silicon (Au—Si) eutectic solder. The Au—Si eutectic solder bonds the SiC die to the package.
However, as also noted above, the current design involves diffusion or incorporation of Ni or Ni—Co into a gold-silicon (Au—Si) eutectic solder, which increases the melting point of the Au—Si eutectic solder, and causes the Au—Si eutectic solder to freeze before the completion of the bonding of the SiC die to the package. Such solder freezing causes localized or patchy joints between the SiC die and the package, which is one of the root causes of solder voids. Solder voids impede heat transfer and create hot spots. Such hot spots degrade the performance and reliability of, for example, SiC static induction transistor (SIT) devices, particularly in high power and temperature applications.
Embodiments of a method and apparatus are disclosed for providing improved backside metal contacts to silicon carbide. One skilled in the art will appreciate that backside can also be referred to as bottom-side, bottom surface, and the like. Embodiments provide a barrier layer between the SiC wafer and the Si layer to reduce or eliminate the incorporation of species, such as Ni or Ni—Co, in the Au—Si eutectic solder. The material used for the barrier layer may be, for example, titanium-platinum (Ti—Pt) or titanium-tungsten (Ti—W). Embodiments may reduce or eliminate undesirable Ni to Au—Si solder joint voids, thus improving the performance of SiC SIT devices.
As shown in
An embodiment provides a barrier layer 326 composed of barrier material, such as platinum (Pt) or tungsten (W), between the Ni—Co layer 306 and the Si layer 308 using adhesive material in an adhesion layer 324, such as a second Ti layer. The SiC wafer 302 may be, for example, three inches or more in diameter. The SiC wafer 302 is cut (or diced) and separated into individual dies and each SiC die 320 is than mechanically scrubbed on top of a ceramic package 312 at, for example, 400° C. The ceramic package 312 includes a ceramic substrate 316, has a copper-tungsten flange or heat sink 314 at the bottom, and has a gold layer 310 on the top surface to serve as an eutectic solder formation layer. As a result of the thermo-mechanical energy from the scrubbing, Si in the Si layer 308 and Au in the Au layer 310 reacts, forming a gold-silicon (Au—Si) eutectic solder 410, which is a binary compound (shown in
The barrier layer 326 may include barrier metals, such as Ti—Pt or Ti—W, and may improve the interface between the SiC die 320 and the ceramic package 312 by reducing the diffusion or incorporation of Ni or Ni—Co into the Au—Si eutectic solder 410, and thus reducing or eliminating voids formed in the Au—Si eutectic solder 410.
Specifically, metal Pt, for example, in the barrier layer 326 does not allow species, such as Ni or Ni—Co to diffuse through. Since Ni or Ni—Co does not diffuse into the Au—Si eutectic solder 410 during eutectic melting (e.g., reaction between Au and Si), the eutectic solder 410 remains pure or binary. One skilled in the art will appreciate that the barrier layer 326 may include barrier materials other than Ti—Pt or Ti—W to reduce the diffusion or incorporation of Ni or Ni—Co into the Au—Si eutectic solder 410.
The terms and descriptions used herein are set forth by way of illustration only and are not meant as limitations. Those skilled in the art will recognize that many variations are possible within the spirit and scope of the invention as defined in the following claims, and their equivalents, in which all terms are to be understood in their broadest possible sense unless otherwise indicated.
