The present disclosure relates to the technical field of power semiconductor module packaging and, in particular, to a power semiconductor module.
Power semiconductor devices (such as an insulated gate bipolar transistor (IGBT), a metal-oxide-semiconductor field-effect transistor (MOSFET), silicon carbide (SiC), gallium nitride (GaN), and the like) are widely applied to power supplies and power electronic converters. Therefore, module packaging is generally used in a high-power scenario. A power module mainly includes a metal bottom plate, a welding layer, double-sided direct bonding copper (DBC) ceramic substrate, active metal bonding (AMB) ceramic substrate, an insulating heat dissipation resin film or other insulating heat dissipation materials, a copper frame, an outer housing, and silica gel, as shown in
The present disclosure provides a power semiconductor module to resolve the prior-art problem of mechanical stress generated on a chip in the case of a temperature change when a relatively thick copper frame is applied to the packaging of the power semiconductor module.
To resolve the above technical problem, the present disclosure provides a power semiconductor module, including a metal bottom plate, an insulating heat dissipation material layer, a chip, a binding plate, silica gel, and an outer housing. The binding plate includes a copper plate and a copper strap, where the copper plate is connected to the copper strap through welding and the binding plate is configured to connect circuits of various components. The metal bottom plate is connected to the insulating heat dissipation material layer through tin soldering. The chip is connected to the insulating heat dissipation material layer through tin soldering. The chip is connected to the copper strap, and the copper strap is connected to the insulating heat dissipation material layer.
The outer housing is connected to the metal bottom plate by using a dispensing process.
The silica gel is filled in the outer housing to prevent corrosion and moisture, protect an internal circuit, and isolate internal components with a high voltage.
The copper plate is connected to the copper strap through laser welding and ultrasonic welding.
The chip is connected to the copper strap through welding or sintering, and the copper strap is connected to the insulating heat dissipation material layer through welding or sintering.
The present disclosure has the following beneficial effects: 1. Compared with the prior art, in the power semiconductor module in the present disclosure, the copper strap in contact with the chip generates small mechanical stress on the chip when a temperature change occurs on the copper strap so it does not break or damage the chip. Most of the current of the circuit passes through the relatively thick copper plate, which greatly reduces turn-on resistance and parasitic inductance. 2. The position deviation of the chip can be compensated for by adjusting the position of the copper strap, thus lowering the requirement for a positioning process. This simplifies the processing technology and improves the yield of products.
Reference numerals: 1: metal bottom plate; 2: insulating heat dissipation material layer; 3: chip; 4: binding plate; 5: silica gel; 6: outer housing; 7: copper plate; 8: copper strap.
To make the objective, technical solutions, and advantages of the present disclosure clear, the present disclosure will be further described in detail below by referring to the accompanying drawings and specific embodiments.
As shown in
Further, the outer housing 6 is connected to the metal bottom plate 1 by using a dispensing process.
Further, the silica gel 5 fills the outer housing 6 to prevent corrosion and moisture, protect an internal circuit, and isolate internal components with a high voltage.
Further, the copper plate 7 is connected to the copper strap 8 through laser welding and ultrasonic welding.
Further, the chip 3 is connected to the copper strap 8 through welding or sintering, and the copper strap 8 is connected to the insulating heat dissipation material layer 2 through welding or sintering.
The thickness of the copper plate 7 ranges from 1 mm to 2 mm, and the thickness of the copper strap 8 ranges from 0.3 mm to 0.8 mm.
As shown in
Further, the outer housing 6 is connected to the metal bottom plate 1 by using a dispensing process.
Further, the silica gel 5 fills the outer housing 6 to prevent corrosion and moisture, protect an internal circuit, and isolate internal components with a high voltage.
Further, the copper plate 7 is connected to the copper strap 8 through laser welding and ultrasonic welding.
Further, the chip 3 is connected to the copper strap 8 through welding or sintering, and the copper strap 8 is connected to the insulating heat dissipation material layer 2 through welding or sintering.
The thickness of the copper plate 7 ranges from 1 mm to 2 mm, and the thickness of the copper strap 8 ranges from 0.5 mm to 1 mm.
A contact surface between the copper strap 8 and the chip 3 is ground to eliminate a deviation, thereby increasing the contact area between the copper strap 8 and the chip 3. In addition, the thickness of the copper strap 8 on the contact surface between the copper strap 8 and the chip 3 is further reduced to reduce mechanical stress when the copper strap 8 is combined with the chip 3, thereby further improving reliability.
As shown in
Further, the outer housing 6 is connected to the metal bottom plate 1 by using a dispensing process.
Further, the silica gel 5 fills the outer housing 6 to prevent corrosion and moisture, protect an internal circuit, and isolate internal components with a high voltage.
Further, the copper plate 7 is connected to the copper strap 8 through laser welding and ultrasonic welding.
Further, the chip 3 is connected to the copper strap 8 through welding or sintering, and the copper strap 8 is connected to the insulating heat dissipation material layer 2 through welding or sintering.
The thickness of the copper plate 7 ranges from 1 mm to 2 mm, and the thickness of the copper strap 8 ranges from 0.3 mm to 0.8 mm.
The copper plate 7 and a main electrode terminal form an integrated structure.
In
As shown in
Further, the copper plate 7 is connected to the copper strap 8 through laser welding and ultrasonic welding.
Further, the chip 3 is connected to the copper strap 8 through welding or sintering, and the copper strap 8 is connected to the insulating heat dissipation material layer 2 through welding or sintering.
The thickness of the copper plate 7 ranges from 1 mm to 2 mm, and the thickness of the copper strap 8 ranges from 0.3 mm to 0.8 mm.
The semiconductor module is plastically packaged using a resin material. Based on the shape and parameter design needs, a special die is used to fill the resin into the semiconductor module. The chip 3, the insulating heat dissipation material layer 2, and the binding plate 4 of the semiconductor module are packaged and fixed, for example, 5 and 6 in
In conclusion, in the power semiconductor module in the present disclosure, the copper strap in contact with the chip generates small mechanical stress on the chip when a temperature change occurs on the copper strap so it does not break or damage the chip. Most of the current of the circuit passes through the relatively thick copper plate, which greatly reduces turn-on resistance and parasitic inductance. In addition, the position deviation of the chip can be compensated for by adjusting the position of the copper strap, thus lowering the requirement for a positioning process. This simplifies the processing technology and improves the yield of the product.
The above description describes merely preferred embodiments of the present disclosure and is not intended to limit the present disclosure, and various changes and modifications of the present disclosure may be made by those skilled in the art. Any modification, equivalent substitution, and improvement made within the spirit and principle of the present disclosure should fall within the protection scope of the claims of the present disclosure.
Number | Date | Country | Kind |
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202010535948.2 | Jun 2020 | CN | national |
This application is the national phase entry of International Application No. PCT/CN2021/080899, filed on Mar. 16, 2021, which is based upon and claims priority to Chinese Patent Application No. 202010535948.2, filed on Jun. 12, 2020, the entire contents of which are incorporated herein by reference.
Filing Document | Filing Date | Country | Kind |
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PCT/CN2021/080899 | 3/16/2021 | WO |