Hyman J. Levinstein

Person

Berkeley Heights, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Stand-off pad for supporting a wafer on a substrate support chuck
- Patent number 6,217,655
- Issue date Apr 17, 2001
- Applied Materials, Inc.
- Ananda H. Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide etch process with high selectivity to nitride suitable for us...
- Patent number 6,184,150
- Issue date Feb 6, 2001
- Applied Materials Inc.
- Chan-Lon Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming titanium silicide in situ
- Patent number 6,110,821
- Issue date Aug 29, 2000
- Applied Materials, Inc.
- Gene Y. Kohara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Puncture resistant electrostatic chuck
- Patent number 5,986,875
- Issue date Nov 16, 1999
- Applied Materials, Inc.
- Arik Donde
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Hybrid Johnsen-Rahbek electrostatic chuck having highly resistive m...
- Patent number 5,903,428
- Issue date May 11, 1999
- Applied Materials, Inc.
- Dennis S. Grimard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making electrostatic chuck with conformal insulator film
- Patent number 5,753,132
- Issue date May 19, 1998
- Applied Materials, Inc.
- Shamouil Shamouilian
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Electrostatic chuck with conformal insulator film
- Patent number 5,745,331
- Issue date Apr 28, 1998
- Applied Materials, Inc.
- Shamouil Shamouilian
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Puncture resistant electrostatic chuck
- Patent number 5,729,423
- Issue date Mar 17, 1998
- Applied Materials, Inc.
- Arik Donde
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Self-cleaning polymer-free top electrode for parallel electrode etc...
- Patent number 5,585,012
- Issue date Dec 17, 1996
- Applied Materials Inc.
- Robert Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining a dechucking voltage which nullifies a residu...
- Patent number 5,491,603
- Issue date Feb 13, 1996
- Applied Materials, Inc.
- Manoocher Birang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for planarization of submicron vias and the manufacture of s...
- Patent number 5,360,524
- Issue date Nov 1, 1994
- Rudi Hendel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple insulating layer for two-level interconnected metallizatio...
- Patent number 4,985,373
- Issue date Jan 15, 1991
- AT&T Bell Laboratories
- Hyman J. Levinstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices having tantalum silicide structures
- Patent number 4,937,643
- Issue date Jun 26, 1990
- American Telephone and Telegraph Company
- Jean S. Deslauriers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making integrated semiconductor circuit structure with f...
- Patent number RE32207
- Issue date Jul 15, 1986
- AT&T Bell Laboratories
- Hyman J. Levinstein
- 427 - Coating processes
Information Patent Grant
Method of fabricating VLSI CMOS devices having complementary thresh...
- Patent number 4,555,842
- Issue date Dec 3, 1985
- AT&T Bell Laboratories
- Hyman J. Levinstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Boron nitride X-ray masks with controlled stress
- Patent number 4,522,842
- Issue date Jun 11, 1985
- AT&T Bell Laboratories
- Hyman J. Levinstein
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reactive ion etching of tantalum and silicon
- Patent number 4,472,237
- Issue date Sep 18, 1984
- AT&T Bell Laboratories
- Jean S. Deslauriers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma-assisted etching of wafers
- Patent number 4,427,516
- Issue date Jan 24, 1984
- Bell Telephone Laboratories, Incorporated
- Hyman J. Levinstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma-assisted etching of wafers
- Patent number 4,419,201
- Issue date Dec 6, 1983
- Bell Telephone Laboratories, Incorporated
- Hyman J. Levinstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cobalt silicide metallization for semiconductor integrated circuits
- Patent number 4,378,628
- Issue date Apr 5, 1983
- Bell Telephone Laboratories, Incorporated
- Hyman J. Levinstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for patterning films using reactive ion etching thereof
- Patent number 4,343,677
- Issue date Aug 10, 1982
- Bell Telephone Laboratories, Incorporated
- Eliezer Kinsbron
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing silicon dioxide/polycrystalline silicon interf...
- Patent number 4,341,818
- Issue date Jul 27, 1982
- Bell Telephone Laboratories, Incorporated
- Arthur C. Adams
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Method for making integrated semiconductor circuit structure with f...
- Patent number 4,332,839
- Issue date Jun 1, 1982
- Bell Telephone Laboratories, Incorporated
- Hyman J. Levinstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing charging effects in charged-particle-beam lithography
- Patent number 4,323,638
- Issue date Apr 6, 1982
- Bell Telephone Laboratories, Incorporated
- Arthur C. Adams
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated semiconductor circuit structure and method for making it
- Patent number 4,276,557
- Issue date Jun 30, 1981
- Bell Telephone Laboratories, Incorporated
- Hyman J. Levinstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device fabrication by plasma etching
- Patent number 4,256,534
- Issue date Mar 17, 1981
- Bell Telephone Laboratories, Incorporated
- Hyman J. Levinstein
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask structure for x-ray lithography
- Patent number 4,253,029
- Issue date Feb 24, 1981
- Bell Telephone Laboratories, Incorporated
- Martin P. Lepselter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device fabrication by plasma etching
- Patent number 4,208,241
- Issue date Jun 17, 1980
- Bell Telephone Laboratories, Incorporated
- William R. Harshbarger
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radial flow reactor including glow discharge limitting shield
- Patent number RE30244
- Issue date Apr 1, 1980
- Bell Telephone Laboratories, Incorporated
- Frank B. Alexander
- 118 - Coating apparatus
Information Patent Grant
Radiation mask structure
- Patent number 4,171,489
- Issue date Oct 16, 1979
- Bell Telephone Laboratories, Incorporated
- Arthur C. Adams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hyman J. Levinstein

Person

Patents Grantslast 30 patents

Stand-off pad for supporting a wafer on a substrate support chuck

Oxide etch process with high selectivity to nitride suitable for us...

Method for forming titanium silicide in situ

Puncture resistant electrostatic chuck

Hybrid Johnsen-Rahbek electrostatic chuck having highly resistive m...

Method of making electrostatic chuck with conformal insulator film

Electrostatic chuck with conformal insulator film

Puncture resistant electrostatic chuck

Self-cleaning polymer-free top electrode for parallel electrode etc...

Method of determining a dechucking voltage which nullifies a residu...

Method for planarization of submicron vias and the manufacture of s...

Multiple insulating layer for two-level interconnected metallizatio...

Devices having tantalum silicide structures

Method for making integrated semiconductor circuit structure with f...

Method of fabricating VLSI CMOS devices having complementary thresh...

Boron nitride X-ray masks with controlled stress

Reactive ion etching of tantalum and silicon

Apparatus and method for plasma-assisted etching of wafers

Apparatus and method for plasma-assisted etching of wafers

Cobalt silicide metallization for semiconductor integrated circuits

Method for patterning films using reactive ion etching thereof

Method for producing silicon dioxide/polycrystalline silicon interf...

Method for making integrated semiconductor circuit structure with f...

Reducing charging effects in charged-particle-beam lithography

Integrated semiconductor circuit structure and method for making it

Device fabrication by plasma etching

Mask structure for x-ray lithography

Device fabrication by plasma etching

Radial flow reactor including glow discharge limitting shield

Radiation mask structure