BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a perspective view showing a typical example of a semiconductor wafer used in the method of the present invention.
FIG. 2 a perspective view showing a state in which a circular concavity is formed in the back of the semiconductor wafer of FIG. 1.
FIG. 3 is an enlarged partial sectional view showing a state in which via contact means and bumps are formed at required positions of the semiconductor wafer of FIG. 2.
FIG. 4 is a perspective view showing a state in which three subsidiary semiconductor chips are stacked in each of required regions of the circular concavity of the semiconductor wafer of FIG. 3.
FIG. 5 is an enlarged partial sectional view showing a state in which the three subsidiary semiconductor chips are stacked in each of the required regions of the-circular concavity of the semiconductor wafer of FIG. 3, and required wires are further disposed.
FIG. 6 is a perspective view showing a state in which an encapsulation resin is formed in the circular concavity of the semiconductor wafer of FIG. 5.
FIG. 7 is an enlarged partial sectional view of the semiconductor wafer of FIG. 6.
FIG. 8 is an enlarged sectional view showing a semiconductor package produced by cutting the semiconductor wafer of FIGS. 6 and 7, together with the encapsulation resin, along streets.