Claims
- 1. A projection exposure apparatus comprising:
a projection optical system having a plurality of optical elements arranged along an optical axis to project an image of a pattern illuminated with light onto a substrate; a plurality of optical plates of which optical characteristics are different from each other, one of the plurality of optical plates being interposed between the pattern and the substrate depending on the pattern; and an adjusting system associated with the projection optical system so that a characteristic of the projected image is adjusted based on a calculation using one of a plurality of parameters corresponding to the optical plates, said one parameter being selected in accordance with the one optical plate to compensate for a change in an optical property of the projection optical system caused by the change of the optical plate.
- 2. A projection exposure apparatus comprising:
a projection optical system having a plurality of optical elements arranged along an optical axis to project an image of a pattern illuminated with light onto a substrate; a plurality of optical plates of which optical characteristics are different from each other, one of the plurality of optical plates selected in accordance with the pattern being interposed between the pattern and the substrate; and an adjusting system associated with the projection optical system, that adjusts a characteristics of the projected image to compensate for a change in an optical property of the projection optical system caused by the change of the optical plate.
- 3. An apparatus according to claim 2, wherein said adjusting system includes a memory to store a plurality of constants corresponding to said optical plates and selects a constant in accordance with said one optical plate to adjust said characteristic of said projected image based on the selected constant.
- 4. A projection exposure apparatus comprising:
a projection optical system to project an image of a pattern illuminated with light onto a substrate; a plurality of optical plates of which optical characteristics are different from each other, one of the plurality of optical plates selected in accordance with the pattern being interposed between the pattern and the substrate; and a processor that calculates an optical property of the projection optical system using a parameter changed in accordance with the exchange of the optical plate.
- 5. A projection exposure apparatus comprising:
a projection optical system having an optical plate to project an image of a pattern illuminated with light onto a substrate; and an adjusting system associated with the projection optical system to adjust an optical property of the projection optical system in response to the change of the optical plate.
- 6. A method of exposing a substrate with an image of a pattern illuminated with light through a projection optical system, comprising the steps of:
disposing an optical plate between the pattern and the substrate based on the pattern; changing a parameter for calculating an optical property of the projection optical system in accordance with the optical plate; and adjusting an image aberration or magnification based on the optical property calculated using the changed parameter.
- 7. A method of exposing a substrate with an image of a pattern illuminated with light through a projection optical system, comprising the steps of:
disposing an optical plate between the pattern and the substrate based on the pattern; selecting a constant for correcting an error in an image formation of the pattern, said error being caused by the optical plate; and adjusting an image aberration or magnification based on the selected constant.
- 8. A method of exposing a substrate with an image of a pattern illuminated with, light through a projection optical system, comprising the steps of:
disposing an optical plate between the pattern and the substrate based on the pattern; selecting a parameter for correcting an error in an image formation of the pattern, said error being caused by the optical plate; and calculating an optical property of the projection optical system based on the selected parameter.
- 9. A method of exposing a substrate with an image of a pattern illuminated with light through a projection optical system, comprising the steps of:
disposing an optical plate between the pattern and the substrate to make light beams passing through first and second portions on a Fourier transform plane of the projection optical system different from each other in phase or transmittance, or to reduce coherence between the light beams; and adjusting an image aberration or magnification to compensate for a change in an optical property of the projection optical system caused by the optical plate.
- 10. A projection exposure apparatus comprising:
an illumination optical system having a plurality of stops that form secondary light sources of which shapes are different from each other to illuminate a pattern with light from a secondary light source formed by a stop selected in accordance with a pattern; and a projection optical system having a plurality of optical plates of which optical properties are different from each other to project an image of the illuminated pattern on a predetermine plane through an optical plate selected in accordance with the pattern.
- 11. A projection exposure apparatus comprising:
an illumination system for irradiating a mask having a pattern with illumination light; a projection optical system for receiving light from the pattern of the mask to project an image of the pattern onto a photosensitive substrate with predetermined image-forming characteristics; an adjusting system for adjusting an image-forming condition of the projection optical system, the adjustment being achieved in a space betweem the mask and the substrate and in accordance with a condition of the light from the pattern of the mask in a Fourier transform plane of the projection optical system or in the vicinity thereof.
- 12. An apparatus according to claim 11 further comprising a plurality of optical plates of which optical characteristics are different from each other, the apparatus being adapted so that one of the plurality of optical plates can be inserted in the Fourier transform plane of the projection optical system or in the vicinity thereof.
- 13. An apparatus according to claim 12 further comprising an aperture system disposed in the optical path of the illumination system for setting an illumination condition of the mask.
- 14. An apparatus according to claim 11, wherein the adjustment provided by the adjusting system is achieved in response to a change in distribution of the light from the pattern of the mask in the Fourier transform plane of the projection optical system or in the vicinity thereof.
- 15. An apparatus according to claim 11, wherein the adjustment provided by the adjusting system is achieved in response to a change in coherence of the light from the pattern of the mask taking place in the Fourier transform plane of the projection optical system or in the vicinity thereof between a central portion and a peripheral portion of the light.
- 16. A method of exposing a photosensitive substrate with light directed from a pattern of a mask through a projection optical system comprising:
irradiating the mask; and adjusting an image-forming condition of the projection optical system, the adjustment being achieved in a space between the mask and the photosensitive substrate and in accordance with a condition of the light from the pattern of the mask in a Fourier transform plane of the projection optical system or in the vicinity thereof.
- 17. A method according to claim 16, wherein said adjusting step is achieved in an area which does not include the Fourier transform plane of the projection optical system and the vicinities thereof.
- 18. A method according to claim 16, wherein said step for irradiating the mask includes a step of setting an illumination condition of the mask by an aperture of a predetermined configuration.
- 19. A projection exposure apparatus comprising:
an illuminating system for irradiating a mask with illuminating light; a projection optical system for projecting an image of a pattern formed on said mask onto a substrate; an optical filter for making light passing through a partial area centered at an optical axis of said projection optical system and light passing through an area other than said partial area different from each other in phase or transmittance, or for reducing coherence between light passing through said two areas; and a transparent plate having an optical thickness which is approximately equal to that of said optical filter, wherein one of the optical filter and the transparent plate is disposed on a pupil plate of said projection optical system or a plane in the neighborhood of said pupil plane during exposure.
- 20. An apparatus according to claim 19, further comprising:
a device for adjusting an image-forming condition for said pattern image in accordance with an exchange between said optical filter and said transparent plate.
- 21. An apparatus according to claim 19, further comprising:
a member for retaining said transparent plate so that said transparent plate is disposed on the pupil plane of said projection optical system or the neighboring plane when said optical filter is taken out of an image-forming optical path of said projection optical system.
Priority Claims (4)
Number |
Date |
Country |
Kind |
20190/1994 |
Feb 1994 |
JP |
|
58932/1994 |
Mar 1994 |
JP |
|
134007/1994 |
Jun 1994 |
JP |
|
175165/1993 |
Jul 1993 |
JP |
|
Parent Case Info
[0001] This application is a Continuation-In-Part of U.S. application Ser. No. 08/385,876, filed Feb. 9, 1995, and of U.S. application Ser. No. 08/411,306, filed Mar. 27, 1995.
Divisions (1)
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Number |
Date |
Country |
Parent |
08798003 |
Feb 1997 |
US |
Child |
09938731 |
Aug 2001 |
US |
Continuation in Parts (3)
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Number |
Date |
Country |
Parent |
08274752 |
Jul 1994 |
US |
Child |
08798003 |
Feb 1997 |
US |
Parent |
08385876 |
Feb 1995 |
US |
Child |
08798003 |
Feb 1997 |
US |
Parent |
08411306 |
Mar 1995 |
US |
Child |
08798003 |
Feb 1997 |
US |