This is a continuation of U.S. application Ser. No. 08/289,336 filed Aug. 11, 1994, now abandoned, which is a continuation of U.S. application Ser. No. 07/084,045 filed Dec. 1, 1992 now abandoned.
Number | Name | Date | Kind |
---|---|---|---|
4350578 | Frieser et al. | Sep 1982 | |
4427516 | Levinstein et al. | Jan 1984 | |
4675073 | Douglas | Jun 1987 | |
4711698 | Douglas | Dec 1987 | |
4756810 | Lamont, Jr. et al. | Jul 1988 | |
4786359 | Stark et al. | Nov 1988 | |
4793897 | Dunfield et al. | Dec 1988 | |
4793975 | Drage | Dec 1988 | |
4807016 | Douglas | Feb 1989 | |
4855017 | Douglas | Aug 1989 | |
4918031 | Flamm et al. | Apr 1990 | |
4948458 | Ogle | Aug 1990 | |
4990229 | Campbell et al. | Feb 1991 | |
5006220 | Hijikata et al. | Apr 1991 | |
5085727 | Steger | Feb 1992 | |
5169487 | Langley et al. | Dec 1992 | |
5176790 | Arleo et al. | Jan 1993 | |
5423945 | Marks et al. | Jun 1995 | |
6090303 | Collins et al. | Jul 2000 |
Number | Date | Country |
---|---|---|
552491 | Jul 1993 | EP |
155732 | Sep 1982 | JP |
60-201632 | Oct 1985 | JP |
254428 | Nov 1987 | JP |
64-15930 | Jan 1989 | JP |
Entry |
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Coburn, “Increasing the etch rate ratios of SiO2/Si in fluorocarbon plasma etching,” IBM Technical Disclosure Bulletin, vol. 19, No. 10, Mar. 1977, 1 p. |
Matsuo, “Selective Etching of SiO2 relative to Si by plasma reactive sputter etching,” Journal of Vacuum Science and Technology, vol. 17, 1980, pp. 587-594. |
Bariya et al., “The etching of CHF3 plasma in fluorine-containing discharges,” Journal of Vacuum Science and Technology, vol. B9, 1991, pp. 1-7. |
“Reactive ion etching related Si surface residues and subsurface damage: Their relationship to fundamental etching mechanisms” Gottlieb S. Oehrlein and Young H. Lee; J. Vac. Sci. Technol. A5(4), Jul./Aug. 1987; pp. 1585-1594. |
Marks et al, “Introduction to a new high density plasma reactor . . . ” Proceedings of SPIE vol. 1803, 1992, pp 235-247. |
Number | Date | Country | |
---|---|---|---|
Parent | 08/289336 | Aug 1994 | US |
Child | 08/762464 | US | |
Parent | 07/084045 | Dec 1992 | US |
Child | 08/289336 | US |