Juan-Yuan Wu

Person

Hsinchu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
High density plasma chemical vapor deposition process
- Patent number 8,062,536
- Issue date Nov 22, 2011
- United Microelectronics Corp.
- Chih-Chien Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High density plasma chemical vapor deposition process
- Patent number 7,718,079
- Issue date May 18, 2010
- United Microelectronics Corporation
- Chih-Chien Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High density plasma chemical vapor deposition process
- Patent number 7,271,101
- Issue date Sep 18, 2007
- United Microelectronics Corporation
- Chih-Chien Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High density plasma chemical vapor deposition process
- Patent number 7,078,346
- Issue date Jul 18, 2006
- United Microelectronics Corporation
- Chih-Chien Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing in forming semiconductor device
- Patent number 7,037,802
- Issue date May 2, 2006
- United Microelectronics Corporation
- Ming-Sheng Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing for forming a shallow trench isolatio...
- Patent number 7,018,906
- Issue date Mar 28, 2006
- United Microelectronics Corporation
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming partial reverse active mask
- Patent number 7,001,713
- Issue date Feb 21, 2006
- United Microelectronics, Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing for forming a shallow trench isolatio...
- Patent number 6,838,357
- Issue date Jan 4, 2005
- United Microelectronics Corporation
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming dielectric layers
- Patent number 6,809,022
- Issue date Oct 26, 2004
- United Microelectronics Corp.
- Chih-Chien Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of designing active region pattern with shift dummy pattern
- Patent number 6,810,511
- Issue date Oct 26, 2004
- United Microelectronics Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing in forming semiconductor device
- Patent number 6,790,742
- Issue date Sep 14, 2004
- United Microelectronics Corporation
- Ming-Sheng Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of photolithography
- Patent number 6,627,387
- Issue date Sep 30, 2003
- United Microelectronics Corp.
- Kevin Hsieh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of planarization
- Patent number 6,609,954
- Issue date Aug 26, 2003
- United Microelectronics Corp.
- Ming-Sheng Yang
- B24 - GRINDING POLISHING
Information Patent Grant
Method for monitoring a semiconductor wafer in a chemical mechanica...
- Patent number 6,580,508
- Issue date Jun 17, 2003
- United Microelectronics Corp.
- Hsueh-Chung Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Method for forming dielectric layers
- Patent number 6,562,731
- Issue date May 13, 2003
- United Microelectronics Corp.
- Chih-Chien Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical mechanical polishing for forming a shallow trench isolatio...
- Patent number 6,486,040
- Issue date Nov 26, 2002
- United Microelectronics Corporation
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing for forming a shallow trench isolatio...
- Patent number 6,448,159
- Issue date Sep 10, 2002
- United Microelectronics Corporation
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing methods using low pH slurry mixtures
- Patent number 6,362,101
- Issue date Mar 26, 2002
- United Microelectronics Corp.
- Ming-Sheng Yang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for improving non-uniformity of chemical mechanical polishin...
- Patent number 6,344,408
- Issue date Feb 5, 2002
- United Microelectronics Corp.
- Hsueh-Chung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a shallow trench isolation
- Patent number 6,337,279
- Issue date Jan 8, 2002
- United Microelectronics Corp.
- Chao-Yuan Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving deposition
- Patent number 6,319,861
- Issue date Nov 20, 2001
- United Microelectronics Corp.
- Hsueh-Hao Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating dual damascene
- Patent number 6,319,814
- Issue date Nov 20, 2001
- United Microelectronics Corp.
- Cheng-Yuan Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating dual damascene structure
- Patent number 6,313,028
- Issue date Nov 6, 2001
- United Microelectronics Corp.
- Chao-Yuan Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-mechanical polish machines and fabrication process using t...
- Patent number 6,293,850
- Issue date Sep 25, 2001
- United Microelectronics Corp.
- Juen-Kuen Lin
- B24 - GRINDING POLISHING
Information Patent Grant
Method of trench polishing
- Patent number 6,291,111
- Issue date Sep 18, 2001
- United Microelectronics Corp.
- Coming Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of mixing slurries
- Patent number 6,280,079
- Issue date Aug 28, 2001
- United Microelectronics Corp.
- Ming-Sheng Yang
- B24 - GRINDING POLISHING
Information Patent Grant
Method of applying partial reverse mask
- Patent number 6,271,118
- Issue date Aug 7, 2001
- United Microelectronics Corp.
- Juan-Yuan Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preventing an electrostatic chuck from being corroded du...
- Patent number 6,261,977
- Issue date Jul 17, 2001
- United Microelectronics Corp.
- Cheng-Yuan Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing binary phase shift mask
- Patent number 6,255,023
- Issue date Jul 3, 2001
- United Microelectronics Corp.
- Chien-Chao Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure of a dual damascene
- Patent number 6,246,119
- Issue date Jun 12, 2001
- United Microelectronics Corp.
- Juan-Yuan Wu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITION PROCESS
- Publication number 20100173490
- Publication date Jul 8, 2010
- Chih-Chien Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING FOR FORMING A SHALLOW TRENCH ISOLATIO...
- Publication number 20060009005
- Publication date Jan 12, 2006
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical mechanical polishing in forming semiconductor device
- Publication number 20050032328
- Publication date Feb 10, 2005
- Ming-Sheng Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming dielectric layers
- Publication number 20030185999
- Publication date Oct 2, 2003
- Chih-Chien Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Chemical mechanical polishing for forming a shallow trench isolatio...
- Publication number 20030148589
- Publication date Aug 7, 2003
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical mechanical polishing in forming semiconductor device
- Publication number 20030129808
- Publication date Jul 10, 2003
- Ming-Sheng Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of planarization
- Publication number 20030087590
- Publication date May 8, 2003
- Ming-Sheng Yang
- B24 - GRINDING POLISHING
Information Patent Application
Method of designing active region pattern with shift dummy pattern
- Publication number 20030056191
- Publication date Mar 20, 2003
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-situ steam generation process for nitrided oxide
- Publication number 20020146914
- Publication date Oct 10, 2002
- Kuo-Tai Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming partial reverse active mask
- Publication number 20020094493
- Publication date Jul 18, 2002
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical mechanical polishing for forming a shallow trench isolatio...
- Publication number 20020037629
- Publication date Mar 28, 2002
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of photolithography
- Publication number 20020031726
- Publication date Mar 14, 2002
- Kevin Hsieh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Method of improving surface planarity of chemical-mechanical polish...
- Publication number 20020025689
- Publication date Feb 28, 2002
- Ming-Sheng Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming partial reverse active mask
- Publication number 20020001919
- Publication date Jan 3, 2002
- United Microelectronics Corp.
- Coming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A GATE OXIDE LAYER
- Publication number 20010014483
- Publication date Aug 16, 2001
- HSUEH-HAO SHIH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING DUAL DAMASCENE STRUCTURE
- Publication number 20010002333
- Publication date May 31, 2001
- CHAO-YUAN HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING METHODS USING LOW PH SLURRYMIXTURES
- Publication number 20010002335
- Publication date May 31, 2001
- MING-SHENG YANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method for forming dielectric layers
- Publication number 20010001191
- Publication date May 17, 2001
- Chih-Chien Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Juan-Yuan Wu

Person

Patents Grantslast 30 patents

High density plasma chemical vapor deposition process

High density plasma chemical vapor deposition process

High density plasma chemical vapor deposition process

High density plasma chemical vapor deposition process

Chemical mechanical polishing in forming semiconductor device

Chemical mechanical polishing for forming a shallow trench isolatio...

Method of forming partial reverse active mask

Chemical mechanical polishing for forming a shallow trench isolatio...

Method for forming dielectric layers

Method of designing active region pattern with shift dummy pattern

Chemical mechanical polishing in forming semiconductor device

Method of photolithography

Method of planarization

Method for monitoring a semiconductor wafer in a chemical mechanica...

Method for forming dielectric layers

Chemical mechanical polishing for forming a shallow trench isolatio...

Chemical mechanical polishing for forming a shallow trench isolatio...

Chemical mechanical polishing methods using low pH slurry mixtures

Method for improving non-uniformity of chemical mechanical polishin...

Method of fabricating a shallow trench isolation

Method of improving deposition

Method of fabricating dual damascene

Method of fabricating dual damascene structure

Chemical-mechanical polish machines and fabrication process using t...

Method of trench polishing

Method of mixing slurries

Method of applying partial reverse mask

Method for preventing an electrostatic chuck from being corroded du...

Method of manufacturing binary phase shift mask

Structure of a dual damascene

Patents Applicationslast 30 patents

HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITION PROCESS

CHEMICAL MECHANICAL POLISHING FOR FORMING A SHALLOW TRENCH ISOLATIO...

Chemical mechanical polishing in forming semiconductor device

Method for forming dielectric layers

Chemical mechanical polishing for forming a shallow trench isolatio...

Chemical mechanical polishing in forming semiconductor device

Method of planarization

Method of designing active region pattern with shift dummy pattern

In-situ steam generation process for nitrided oxide

Method of forming partial reverse active mask

Chemical mechanical polishing for forming a shallow trench isolatio...

Method of photolithography

Method of improving surface planarity of chemical-mechanical polish...

Method of forming partial reverse active mask

METHOD OF FORMING A GATE OXIDE LAYER

METHOD OF FABRICATING DUAL DAMASCENE STRUCTURE

CHEMICAL MECHANICAL POLISHING METHODS USING LOW PH SLURRYMIXTURES

Method for forming dielectric layers