Number | Name | Date | Kind |
---|---|---|---|
5926740 | Forbes et al. | Jul 1999 | A |
6376392 | Lee et al. | Apr 2002 | B1 |
20020113310 | Kim et al. | Aug 2002 | A1 |
Entry |
---|
U.S. Pub 2002/0106891 Kim et al. Method of fabricating semiconductor devices having low dielectric interlayer insulation layer Aug. 8, 2002.* |
U.S. Pub. 2002/0106891 Kim et al. Aug. 8, 2002.* |
U.S. Pub. 2003/0077916 Xu et al. Apr. 24, 2003. |