This application claims the priority benefit of Taiwan application serial no. 94124043, filed on Jul. 15, 2005. All disclosure of the Taiwan application is incorporated herein by reference.
1. Field of the Invention
The present invention relates to a die pad arrangement, and more particularly, to a die pad arrangement for a bumpless chip package.
2. Description of the Related Art
Along with the continuous development of the electronic technology, in order to fulfill the requirements for electronic components such as the high speed processing, multi-functions, high integration, compact size and lower price, the chip packaging technique is also intensively developed following the trend of miniaturation and high density. A package substrate is usually used by the conventional ball grid array (BGA) packaging technique as a carrier of the integrated circuit (IC) chip, and the chip is electrically coupled to the top surface of the package substrate by using an electrical connecting technique such as the flip chip bonding or the wire bonding and a plurality of solder balls are disposed on the bottom surface of the package substrate with an arrangement of area array. Accordingly, the chip is electrically coupled to an electronic apparatus on the next layer (for example, a printed circuit board (PCB)) through the interconnection of the package substrate and the solder balls on the bottom surface.
However, in the conventional BGA packaging technique it is required to use the package substrate with high layout density and the electrical connecting technique such as the flip chip bonding or the wire bonding, which inevitably causes a long signal transmission path. Accordingly, a bumpless build-up layer (BBUL) chip packaging technique has been developed, which eliminates the fabricating process of the flip chip bonding or the wire bonding. Instead, a multi-layered interconnection structure is formed on the chip directly, and a plurality of electric contacts such as the solder balls or the pins for being electrically coupled to the electronic apparatus on the next level are formed on the multi-layered interconnection structure.
Referring to
The interconnection structure 120 includes a plurality of dielectric layers 128, a plurality of conductive vias 122a and a plurality of conductive layers 122b. Wherein, the inner circuit 122 consists of the conductive vias 122a and the conductive layers 122b. The conductive vias 122a pass through the dielectric layers 128 respectively, and the dielectric layers 128 and the conductive layers 122b are interlaced with each other. Two adjacent conductive layers 122b are electrically coupled to each other by at least a conductive via 122a. In addition, the solder balls 140 for being electrically coupled to an electronic apparatus on the next level (not shown in
However, the size of the power pads and the ground pads on the active surface of the chip are significantly reduced along with the decrease of the chip size, and thus the design is not suitable for chips which require large power supply, such as a CPU. Accordingly, the shape and the arrangement of the point-shaped pads of the chip in the conventional bumpless chip package are desired for further improvement.
Therefore, it is an object of the present invention to provide a die pad arrangement, which is applied in the bumpless chip package for increasing the I/O cross-sectional area of the power or ground pad, such that the electric characteristic of the bumpless chip package is improved.
In order to achieve the object mentioned above and others, the present invention provides a die pad arrangement suitable for being disposed on an active surface of a chip. Wherein, the die pad arrangement includes a plurality of point-shaped pads and at least a non-point-shaped pad. In addition, the area of the non-point-shaped pad is greater than or equal to the area of two point-shaped pads.
In order to achieve the object mentioned above and others, a bumpless chip package including at least a chip and an interconnection structure is provided by the present invention. Wherein, the chip has a die pad arrangement disposed on an active surface of the chip. The die pad arrangement includes a plurality of point-shaped pads and at least a non-point-shaped pad. In addition, the area of the non-point-shaped pad is greater than or equal to the area of two point-shaped pads. The chip is embedded within the interconnection structure. The interconnection structure has an inner circuit and a plurality of contact pads. The contact pads are disposed on a contact surface of the interconnection structure. Moreover, at least one of the point-shaped pads and the non-point-shaped pad is electrically coupled to at least one of the contact pads through the inner circuit.
In accordance with a preferred embodiment of the present invention, the interconnection structure mentioned above includes, for example but not limited to, a plurality of dielectric layers, a plurality of conductive vias and a plurality of conductive layers. The conductive vias pass through the dielectric layers respectively. Wherein, one terminal of at least one of the conductive vias is electrically coupled to the non-point-shaped pad, and the conductive layers and the dielectric layers are interlaced with each other. In addition, the inner circuit consists of the conductive layers and the conductive vias, and two adjacent conductive layers are electrically coupled to each other by at least one of the conductive vias. Moreover, on a projection surface parallel to the active surface of the chip, a partial extension path of the conductive via electrically coupled to the non-point-shaped pad is overlapped with a projection of an extension path of the non-point-shaped pad on the projection surface.
In summary, in the bumpless chip package provided by the present invention, since the non-point-shaped pad included by the chip is used as the non-signal pad, the I/O cross-sectional area of the non-signal pad (e.g. the power or ground pad) is increased and the current density is reduced, such that the electric characteristic of the bumpless chip package provided by the present invention is further improved.
The accompanying drawings are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification. The drawings illustrate embodiments of the invention, and together with the description, serve to explain the principles of the invention.
Referring to
The interconnection structure 220 includes, for example but not limited to, a plurality of dielectric layers 228, a plurality of conductive vias 222a and a plurality of conductive layers 222b. Wherein, the conductive vias 222a pass through the dielectric layers 228, respectively. In addition, one terminal of at least one of the conductive vias 222a is electrically coupled to the non-point-shaped pad 212b and the conductive layers 222b and the dielectric layers 228 are interleavedly disposed. Moreover, the inner circuit 222 mentioned above consists of the conductive layers 222b and the conductive vias 222a. Two adjacent conductive layers are electrically coupled to each other by at least one of the conductive vias 222a.
Referring to
Moreover, if classified by function, at least one of the point-shaped pads 212a may be a signal pad and the non-point-shaped pad 212b may be a non-signal pad (e.g. the ground pad, the power pad or other non-signal pad). If classified by shape, the non-point-shaped pad 212b may be a ring-shaped pad, a strip-shaped pad or a block-shaped pad as shown in
Referring to
The panel-shaped component 350 has a plurality of electrodes 352 which are disposed on an electrode surface 354 of the panel-shaped component 350. In addition, at least one of the point-shaped pads 212a on the chip 210 is electrically coupled to at least one of the electrodes 352 through the inner circuit 222 of the interconnection structure 220. Alternatively, the non-point-shaped pad 212b on the chip 210 may be electrically coupled to one of the electrodes 352 through the inner circuit 222 of the interconnection structure 220. Moreover, at least one of the electrodes 352 is electrically coupled to at least one of the contact pads 224 of the interconnection structure 220 through the inner circuit 222.
The panel-shaped component 350 may be a panel-shaped active component or a panel-shaped passive component. Wherein, the panel-shaped active component may be a panel-shaped transistor and the panel-shaped passive component may be a panel-shaped capacitor, a panel-shaped resistor or a panel-shaped inductor. It is to be noted that the panel-shaped component 350 may has both the active device part and the passive device part, which together form an integrated panel-shaped component. In addition, since the panel-shaped component 350 may be made by either the semiconductor fabricating process or the ceramic fabricating process, the panel-shaped component 350 may be made of a material such as silicon or ceramic.
In summary, in the bumpless chip package provided by the present invention, since the non-point-shaped pad included by the chip is used as the non-signal pad, the I/O cross-sectional area of the power or ground pad is increased and the current density is reduced, such that the electric characteristic of the bumpless chip package provided by the present invention is further improved.
Although the invention has been described with reference to a particular embodiment thereof, it will be apparent to one of the ordinary skill in the art that modifications to the described embodiment may be made without departing from the spirit of the invention. Accordingly, the scope of the invention will be defined by the attached claims not by the above detailed description.
Number | Date | Country | Kind |
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94124043 | Jul 2005 | TW | national |