Claims
- 1. A fabrication process of a semiconductor package, comprising the steps of:(1) bonding a semiconductor chip to a first side of two substrates of a lead frame with an adhesive member; (2) conductivelv connecting a second side of said two surfaces of said lead frame and said semiconductor chip via a wire; and (3) molding a molding compound so that the molding compound covers at least said semiconductor chip and a bonded part between the semiconductor chip and said frame, wherein said wire and said lead frame are connected at a position inside a shadow which is formed by projecting said semiconductor chip vertically on said second side of said lead frame; and said adhesive member is a composite adhesive sheet comprising a heat-resistant film and a coating layer of an adhesive applied on both major surfaces of the heat resistant film; and said adhesive member is made of polyimide or polyamide and includes a heat-resistant adhesive having a coming-out length of not more than 2 mm and a water absorption rate of not more than 3 wt. % wherein the coming-out length of said adhesive is measured by the steps of pressing a film of said adhesive having a size of 19 mm×50 mm with a thickness of 25 μm at 350° C. under 3 Mpa for one minute; and measuring a coming-out length of said adhesive at a central part in the direction of the longer surface of said adhesive film.
- 2. A fabrication process of a semiconductor package as defined in claim 1, wherein the glass transition temperature of said heat-resistant adhesive is 200° C. or higher.
- 3. A fabrication process of a semiconductor package as defined in claim 1, wherein the adhesive applied in the form of the coating layer on one of said major surfaces of said heat-resistant film comprises a heat-resistant adhesive which is different from the adhesive applied in the form of the coating layer on the other of said major surfaces of the heat-resistant film.
- 4. A fabrication process of a semiconductor package as defined in claim 1, wherein the adhesive applied in the form of the coating layer on one of said major surfaces of said heat-resistant film comprises a heat-resistant adhesive which is the same as the adhesive applied in the form of the coating layer on the other of said major surfaces of the heat-resistant film.
- 5. A fabrication process of a semiconductor package as defined in claim 1, wherein the glass transition temperature of said heat-resistant film is higher than the glass transition temperature of said heat-resistant adhesive.
- 6. A fabrication process of a semiconductor package as defined in claim 1, wherein the glass transition temperature of said heat-resistant adhesive is 200° C. or higher.
- 7. A fabrication process of a semiconductor package as defined in claim 2, wherein the adhesive applied in the form of the coating layer on one of said major surfaces of the heat-resistant film comprises a heat-resistant adhesive which is different from the heat-resistant adhesive applied in the form of the coating layer on the other of said major surfaces of the heat-resistant film.
- 8. A fabrication process of a semiconductor package as defined in claim 7, wherein the glass transition temperature of said heat-resistant film is higher than the glass transition temperature of said heat-resistant adhesive.
- 9. A fabrication process of a semiconductor package as defined in claim 2, wherein the adhesive applied in the form of the coating layer on one of said major surfaces of said heat-resistant film comprises a heat-resistant adhesive which is the same as the adhesive applied in the form of the coating layer on the other of said major surfaces of the heat-resistant film.
- 10. A fabrication process of a semiconductor package as defined in claim 9, wherein the glass transition temperature of said heat-resistant film is higher than the glass transition temperature of said heat-resistant adhesive.
- 11. A fabrication process of a semiconductor package as defined in claim 3, wherein the glass transition temperature of said heat-resistant film is higher than the glass transition temperature of said heat-resistant adhesive.
- 12. A fabrication process of a semiconductor package as defined in claim 4, wherein the glass transition temperature of said heat-resistant film is higher than the glass transition temperature of said heat-resistant adhesive.
- 13. A fabrication process of a semiconductor package according to claim 1, wherein said step (3) is a step of molding said molding compound in a manner that the molding compound covers the bonded part where said semiconductor chip is bonded to said lead frame, and an entire surface of said semiconductor chip.
Priority Claims (3)
Number |
Date |
Country |
Kind |
5-91870 |
Mar 1993 |
JP |
|
5-91899 |
Mar 1993 |
JP |
|
6-25939 |
Jan 1994 |
JP |
|
Parent Case Info
This is a continuation application under 37 C.F.R. 1.53(b)(1) of prior application Ser. No. 09/044,575, filed Mar. 19, 1998 now U.S. Pat. No. 6,046,072, which is a continuation application of application Ser. No. 08/542,576, filed Oct. 13, 1995, which is a continuation-in-part of application Ser. No. 08/514,353 filed Jul. 27, 1995, now abandoned, which is a FWC of application Ser. No. 08/218,544, filed Mar. 28, 1994, now abandoned.
This application is a continuation-in-part of co-pending U.S. application Ser. No. 08/514,353 filed on Jul. 27, 1995, entitled “HEAT-RESISTANT ADHESIVE” which is a Continuation Application under C.F.R. § 1.62 for U.S. application Ser. No. 08/218,544 filed on Mar. 28, 1994.
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Non-Patent Literature Citations (4)
Entry |
Matsuura et al., “Polimides & Resins” (Nov. 13, 1991) EP-456515, Chem Abs. (116:256718).* |
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Continuations (3)
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Number |
Date |
Country |
Parent |
09/044575 |
Mar 1998 |
US |
Child |
09/468684 |
|
US |
Parent |
08/542576 |
Oct 1995 |
US |
Child |
09/044575 |
|
US |
Parent |
08/218544 |
Mar 1994 |
US |
Child |
08/514353 |
|
US |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
08/514353 |
Jul 1995 |
US |
Child |
08/542576 |
|
US |