Embodiments of the subject matter described herein relate semiconductor chip packages, and more specifically, to Quad Flat No-Lead (QFN) burr free dimple packages, Small Outline No-lead (SON) burr free and defect free dimple packages, and a process scheme for producing a burr free dimple after singulation without additional deburring processes.
Quad Flat No-Lead (QFN) and Small Outline None Lead (SON) packages are used to encapsulate one or more integrated circuit die while retaining exposed pads which physically and electrically connect integrated circuit die to printed circuit boards (PCB). These QFN and SON packages are surface-mount technologies that connect integrated circuit dies to the surfaces of PCBs without through-holes using perimeter lead pads on the bottom of the package to provide electrical contact to the PCB. Conventional QFN and SON packaging approaches have performed and result with dimple burr after singulation. The dimple burr is typically caused after cutting.
In the related art, during the singulation or saw processes burrs are prone to accumulate in the dimple. If the accumulation is sufficient and the burrs are not removed, there is a possibility the burrs could impact the solder joint reliability of the device. Removing these burrs requires extra process steps and is difficult, time consuming, and costly. In addition, fine pitch QFN and SON packages, e.g., less than 1.0 mm are more prone to burr accumulation and deburring process may also not be possible given their geometric complexity which can result in not using dimples for semiconductor packages.
Accordingly, a need exists for an improved integrated circuit chip package and manufacture method that addresses various problems in the art that have been discovered by the above-named inventors where various limitations and disadvantages of conventional solutions and technologies will become apparent to one of skill in the art after reviewing the remainder of the present application with reference to the drawings and detailed description which follow, though it should be understood that this description of the related art section is not intended to serve as an admission that the described subject matter is prior art.
An aspect of the invention is directed to semiconductor chip packages, and more specifically, to Quad Flat No-Lead (QFN) burr free dimple packages, Small Outline No-lead (SON) defect free packages with dimples after the singulation process or other separating process. In one process scheme a semiconductor package includes a burr free dimple after singulation without the need for additional deburring processes.
Additional features and advantages of the invention will be set forth in the description which follows and, in part, will be apparent from the description or may be learned by practice of the invention. The objectives and other advantages of the invention will be realized and attained by the structure, particularly set forth in the written description and claims hereof, as well as the appended drawings.
In some aspects, the techniques described herein relate to a semiconductor package, including a lead frame having a plurality of leads. The package also includes a semiconductor die mounted on the lead frame. Bonding pads on the die are electrically connected to ones of the leads and a mold compound encapsulates the die. The leads and the electrical connections are exposed at corner side wall of the semiconductor package, and an exposed portion of each of the leads is flush with two adjacent sides of the device. A portion of the leads a dimple being partially filed or containing a polymer material arranged in a portion of the dimple. The polymer material is configured to prevent defects, e.g., burrs, smearing and other defects during the singulation process.
In some aspects, the techniques described herein the polymer material includes a material formed to about twenty microns or greater in thickness.
In some aspects, the techniques described herein the polymer material includes a material selected from the group consisting of polyimide, polyacrylate, and silicone. The polymer material can also be a thermoplastic polymer and a thermoset polymer.
This Summary section is neither intended to be nor should be construed as being representative of the full extent and scope of the present disclosure. Additional benefits, features and embodiments of the present disclosure are set forth in the attached figures and in the description hereinbelow, and as described by the claims. Accordingly, it should be understood that this Summary section may not contain all of the aspects and embodiments claimed herein.
Additionally, the disclosure herein is not meant to be limiting or restrictive in any manner. Moreover, the present disclosure is intended to provide an understanding to those of ordinary skill in the art of one or more representative embodiments supporting the claims. Thus, it is important that the claims be regarded as having a scope including constructions of various features of the present disclosure insofar as they do not depart from the scope of the methods and apparatuses consistent with the present disclosure (including the originally filed claims). Moreover, the present disclosure is intended to encompass and include obvious improvements and modifications of the present disclosure.
A more complete understanding of the subject matter may be derived by referring to the detailed description and claims when considered in conjunction with the following figures, wherein like reference numbers refer to similar elements throughout the figures.
The following detailed description is merely illustrative in nature and is not intended to limit the embodiments of the subject matter or the application and uses of such embodiments. As used herein, the words “exemplary” and “example” mean “serving as an example, instance, or illustration.” Any implementation described herein as exemplary or an example is not necessarily to be construed as preferred or advantageous over other implementations. Furthermore, there is no intention to be bound by any expressed or implied theory presented in the preceding technical field, background, or the following detailed description.
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In step 440, after dimples are formed plating 506 is formed on the lead frame 502 and dimples 504 or only selected portions thereof, as desired. The plating step 440 preferably is performed using an electro-plating or electro-deposition process during which the lead frames including the ends or edges of the leads are coated with a solderable layer of plating material described herein, e.g., Ni/Pd/AuAg/Au materials. During the plating process, the leads may be connected to a source of electrical potential so that they will form a cathode during the electro-plating or electro-deposition process. The electro-plating or electro-deposition process results in a conductive, wettable metal layer being deposited onto the exposed surfaces of the lead frame. It should be noted that the lead frame may include bare copper or the lead frame may be pre-plated such as with silver at the bond surface (back side typically remains as bare copper) and a coating of tin or tin alloy may be applied to the exposed lead ends before or after cutting the lead frame into individual semiconductor devices.
In step 450, a polymer material 508 is formed in at least a portion of the dimple 504. The polymer material 508 can include a thermoplastic material, thermoset material, e.g., a polyimide material, polyacrylate material, silicone material combinations of the same and the like. In a preferred embodiment, the polymer material 508 can have a thickness of 20 microns or greater. The polymer material 508 can be formed by dispensing, screen printing, pasting, combinations of the same and the like.
Step 460 is an optional taping step, the lead frame or lead frame array 502 is taped with a layer of tape 510 applied the backside of the lead frame. The tape 510 is configured to prevent the lead frames 502 from being deformed prior to use.
Step 470, a die 520 is mounted on and attached to the leads of a lead frame, such as the lead frames. In a presently preferred embodiment, the corners of the non-active side of the die rest on and are attached to inner portions of the leads. A die attach adhesive or double-sided tape 522 may be used to attach the die 522 to the leads.
Step 480 is a wire bonding step, where die bonding pads are electrically connected to respective ones of the leads with bond wires. In an alternative embodiment, the die may be a flip-chip die and have solder bumps on the die bond pads and then the die is mounted on the lead frame with the die active side facing the lead frame such that the die bond pads are in direct contact with the leads.
In step 490, a wire bonding step is followed by an encapsulation or molding step in which the lead frame, die and bond wires are covered with a mold compound 522, as is known in art. The molding step preferably includes a mold array process (MAP) where several assemblies formed on a lead frame array are all molded at the same time. After the molding step, laser marking is performed and if there is a tape on the bottom surface of the lead frame array, then the tape is removed in a de-taping step.
In step 495, the assemblies are separated from each other in a singulation step in which a saw blade cuts and separates the assembled devices from each other. The polymer material 508 prevents any accumulation of burrs or other defects of the plating 506. Thereby preventing the need for further deburring or processing.
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In some aspects, the techniques described herein relate to a method of forming to lead frame for a semiconductor package, including: providing a sheet of conductive material; applying a resist material in a predetermined pattern on the sheet of conductive material; etching the conductive material to form a lead frame that has leads that extend to corners of the lead frame such that each corner lead has a dimple formed at an outer surface thereof; applying a metal or metal alloy to exposed lead ends of the leads; and applying a polymer material into a portion of the dimple to a predetermined thickness.
In some aspects, the techniques described herein relate to a method, wherein the metal or metal alloy is applied by electro-plating or electro-deposition.
In some aspects, the techniques described herein relate to a method, wherein the predetermined thickness is 20 microns or greater.
In some aspects, the techniques described herein relate to a method, wherein the metal or metal alloy includes one or more of NiPdAu, NiPdAuAg, and NiPd.
In some aspects, the techniques described herein relate to a method, further including applying tape to portion the lead frame.
In some aspects, the techniques described herein relate to a method, wherein the polymer material includes a thermoplastic material.
In some aspects, the techniques described herein relate to a method, wherein the polymer material includes a material selected from the group consisting of thermoplastic polymer and a thermoset polymer.
In some aspects, the techniques described herein relate to a method, wherein the polymer material includes a material selected from the group consisting of polyimide, polyacrylate, and silicone.
In some aspects, the techniques described herein relate to a method, further includes cutting the lead frame through a portion of the dimple and the polymer material, wherein the dimple of each corner lead has no burrs or defects immediately after cutting.
In some aspects, the techniques described herein relate to a method of forming semiconductor packaging with a burr free dimple, including: providing an array of rectangular lead frames, wherein each lead frame of the array of rectangular lead frames has leads that extend to corners of each lead frame and a dimple at an outer surface thereof; applying a metal or metal alloy to exposed lead ends of the leads; applying a polymer material in a portion of dimple, wherein the polymer material is configured to prevent accumulation of defects including one or more of burrs; mounting and attaching semiconductor dies to the lead frames; electrically connecting bond pads on the semiconductor dies with each semiconductor die on a different one of the leads of the lead frames upon which the semiconductor dies are mounted; and encapsulating the semiconductor dies and electrical connections with a mold compound; and cutting the array of lead frames to separate individual devices from adjacent devices through a portion of the dimple and polymer material, whereby each device has corner bond pads that are configured to be substantially flush with the mold compound thereof and wherein the dimple of each corner lead has no burrs or defects immediately after cutting.
In some aspects, the techniques described herein relate to a method, wherein the metal or alloy is applied by electro-plating or electro-deposition.
In some aspects, the techniques described herein relate to a method, wherein the metal or metal alloy includes one or more of NiPdAu, NiPdAuAg, and NiPd.
In some aspects, the techniques described herein relate to a method, wherein the step of electrically connecting includes attaching bond wires to the die bond pads and respective ones of the leads.
In some aspects, the techniques described herein relate to a method, wherein non-active sides of the semiconductor dies are attached to the leads of each of the respective lead frames.
In some aspects, the techniques described herein relate to a method, wherein the polymer material includes a thermoplastic material.
In some aspects, the techniques described herein relate to a method, wherein the polymer material includes a material selected from the group consisting of thermoplastic polymer and a thermoset polymer.
In some aspects, the techniques described herein relate to a method, wherein the polymer material includes a material selected from the group consisting of polyimide, polyacrylate, and silicone.
In some aspects, the techniques described herein relate to a method, wherein the polymer material includes a material formed to about twenty microns or greater in thickness.
In some aspects, the techniques described herein relate to a semiconductor package, including: a lead frame including a plurality of leads; a semiconductor die mounted on the lead frame, wherein bonding pads on the semiconductor die are electrically connected to respective ones of the leads; and a mold compound that encapsulates the semiconductor die, the leads, and electrical connections, wherein ends of the leads are exposed at corner side wall of the semiconductor package, and wherein an exposed portion of each of the leads is flush with two adjacent sides of a device and includes a dimple including a polymer material arranged in a portion of the dimple.
In some aspects, the techniques described herein relate to a semiconductor package, wherein the polymer material includes a material selected from the group consisting of thermoplastic polymer and a thermoset polymer.
For the sake of brevity, conventional semiconductor fabrication techniques may not be described in detail herein. In addition, certain terminology may also be used herein for the purpose of reference only, and thus are not intended to be limiting, and the terms “first,” “second” and other such numerical terms referring to structures do not imply a sequence or order unless clearly indicated by the context.
The foregoing description refers to elements or nodes or features being “connected” or “coupled” together. As used herein, unless expressly stated otherwise, “connected” means that one element is directly joined to (or directly communicates with) another element, and not necessarily mechanically. Likewise, unless expressly stated otherwise, “coupled” means that one element is directly or indirectly joined to (or directly or indirectly communicates with) another element, and not necessarily mechanically. Thus, although the schematic shown in the figures depict one exemplary arrangement of elements, additional intervening elements, devices, features, or components may be present in an embodiment of the depicted subject matter.
While at least one exemplary embodiment has been presented in the foregoing detailed description, it should be appreciated that a vast number of variations exist. It should also be appreciated that the exemplary embodiment or embodiments described herein are not intended to limit the scope, applicability, or configuration of the claimed subject matter in any way. Rather, the foregoing detailed description will provide those skilled in the art with a convenient road map for implementing the described embodiment or embodiments. It should be understood that various changes can be made in the function and arrangement of elements without departing from the scope defined by the claims, which includes known equivalents and foreseeable equivalents at the time of filing this patent application.