Claims
- 1. An apparatus for depositing a layer on a substrate, comprising:
- a chamber having an enclosure for receiving and processing the substrate therein;
- a moveable substrate support member disposed within said enclosure;
- a stem extending outwardly through said enclosure and interconnected to said substrate support member to move said substrate support member within said enclosure; and
- a heat limiting member disposed about said stem to limit heat transfer along said stem.
- 2. The apparatus of claim 1, wherein said heat limiting member is a reduced area portion on said stem.
- 3. The apparatus of claim 1, further including a substrate edge protection member.
- 4. The apparatus of claim 3, further including a substrate alignment member to align a substrate on said substrate support member with respect to said substrate edge protection member.
- 5. The apparatus of claim 1, further including;
- a shroud extending about the portion of said stem extending outwardly of said enclosure and forming an enclosed space about said stem; and
- a gas supply ported to said space to supply a protective gas about said stem.
- 6. The apparatus of claim 5, wherein said space communicates with said enclosure.
- 7. The apparatus of claim 1, further comprising a substrate edge protection member integrally formed in said substrate support member, said protection member including a gas manifold positioned to direct a purge gas along the edge of a substrate received on the substrate support member.
- 8. The apparatus of claim 1, further comprising a thermocouple disposed within a bore in said substrate support member and maintained in communication with the conditions present on the exterior of said enclosure.
- 9. The apparatus of claim 1, further comprising an exhaust manifold in communication with said enclosure, and an exhaust plate disposed over the exhaust manifold having a plurality of exhaust apertures therein.
- 10. The apparatus of claim 1, further comprising:
- a substrate edge protection member integrally formed in said substrate support member, said protection member including a gas manifold positioned to direct a purge gas along the edge of a substrate received on the substrate support member;
- an exhaust manifold in communication with said enclosure;
- an exhaust plate having a plurality of exhaust apertures therein provided intermediate said enclosure and said exhaust manifold; and
- a thermocouple disposed within a bore in said substrate support member and maintained in communication with the conditions present on the exterior of said enclosure.
- 11. The apparatus of claim 1, wherein the stem is a tubular stem.
- 12. An apparatus for depositing a layer on a substrate, comprising:
- a chamber having an enclosure for receiving and processing the substrate therein;
- a moveable substrate support member disposed within said enclosure;
- a stem extending outwardly through said enclosure and interconnected to said substrate support member within said enclosure to move said substrate support member within said enclosure;
- a shroud disposed about said stem, said shroud extending outwardly of said enclosure and defining a space between said stem and said shroud wherein said space communicates with said enclosure;
- a gas manifold having a plurality of ports in communication with said space; and
- a conduit for directing a purge gas into said manifold, said purge gas flowing from said multiple ports in said manifold and into said space, and flowing from said space into said enclosure.
- 13. An apparatus for depositing a layer on a substrate, comprising:
- a chamber having an enclosure for receiving and processing the substrate therein;
- a substrate support member disposed within said enclosure and selectively maintainable at a high temperature;
- a stem extending outwardly through said enclosure and interconnected to said substrate support member within said enclosure to support said substrate support member within said enclosure; and
- a secondary support member biased against said substrate support member.
- 14. The apparatus of claim 13, wherein said secondary support member includes:
- a sleeve having a first end and a second end, a support plate and a bias member;
- said first end interconnected to said stem outwardly of said enclosure and extending into said enclosure adjacent the interconnection of said stem and said substrate support member; and
- said second end interconnected to said support plate;
- whereby said bias member biases said sleeve upwardly in said enclosure to bias said support plate against said substrate support member.
- 15. The apparatus of claim 14 wherein:
- said stem includes a ledge thereon;
- said first end is disposed adjacent said ledge; and
- said bias member is a spring disposed on said ledge and engaged against said first end to bias the first end of said sleeve from said ledge.
- 16. The apparatus of claim 13, further comprising a substrate edge protection member integrally formed in said substrate support member, said protection member including a gas manifold positioned to direct a purge gas along the edge of a substrate received on the substrate support member.
- 17. The apparatus of claim 13, further comprising a thermocouple disposed within a bore in said substrate support member and maintained in communication with the conditions present on the exterior of said enclosure.
- 18. The apparatus of claim 13, further comprising an exhaust manifold in communication with said enclosure, and an exhaust plate having a plurality of exhaust apertures therein provided intermediate said enclosure and said exhaust manifold.
- 19. The apparatus of claim 13, further comprising:
- a substrate edge protection member integrally formed in said substrate support member, said protection member including a gas manifold positioned to direct a purge gas along the edge of a substrate received on the substrate support member;
- an exhaust manifold in communication with said enclosure;
- an exhaust plate having a plurality of exhaust apertures therein provided intermediate said enclosure and said exhaust manifold; and
- a thermocouple disposed within a bore in said substrate support member and maintained in communication with the conditions present on the exterior of said enclosure.
- 20. The apparatus of claim 13, wherein the stem is a tubular stem.
- 21. An apparatus for processing substrates, comprising:
- a chamber having an enclosure;
- a moveable substrate support member disposed in said enclosure to receive a substrate thereon for processing in said enclosure;
- a substrate edge protection member integrally formed in said substrate support member, said member including a gas manifold positioned to direct a purge gas along the edge of a substrate received on the substrate support member;
- a stem extending outwardly through said enclosure and interconnecting to said substrate support member to move said substrate support member within said enclosure;
- a heat limiting member disposed about said stem to limit heat transfer along said stem;
- an exhaust manifold in communication with said enclosure;
- an exhaust plate having a plurality of exhaust apertures therein provided intermediate said enclosure and said exhaust manifold; and
- a bore disposed in said substrate support member and maintained in communication with the conditions present on the exterior of said enclosure having a thermocouple disposed therein.
- 22. The apparatus of claim 21, wherein the stem is a tubular stem.
RELATED APPLICATIONS
This is a continuation-in-part of U.S. patent application Ser. No. 08/042,961 filed Apr. 5, 1993.
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
42961 |
Apr 1993 |
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