The present application relates to the field of semiconductor technologies, and in particular to an integrated package device, a fabrication method thereof and a memory system.
With the development of chip technologies, various packaging techniques have been proposed, among which an existing packaging technique using chip stacking includes wiring and TSV processes. However, the wiring process may enlarge the footprint of the whole package due to the existence of bonding fingers, and the TSV process requires matching between chip designs and chip packaging, is difficult technically and has a relatively high cost. In recent years, fan-out packages have emerged and are expected to drive the development of chip stack packaging. However, in known fan-out package structures, there are problems in system structure of poor assembling efficiency and manner as well as poor physical protection.
An implementation of the present application provides an integrated package device, a method of fabricating the same and a memory system that improve packaging efficiency and the quantity of fabricated devices, while at the same time providing efficient heat conduction and magnetic shielding.
In an aspect, an implementation of the present application provides an integrated package device including at least one package module. Each package module may include a first sub-package module including a plurality of first electronic devices and a molding body encapsulating the plurality of first electronic devices, each of first electronic devices including a first pad on a side thereof. Each package module may include a second sub-package module stacked on the side of the first sub-package module away from the first pad and including a plurality of second electronic devices and a second molding body encapsulating the plurality of second electronic devices, each of the second electronic devices including a second pad on a side thereof. Each package module may include a first re-distribution layer located on the side of the first sub-package module away from the second sub-package module and connected with each of the first pads. Each package module may include a second re-distribution layer located on the side of the second sub-package module away from the first sub-package module and connected with each of the second pads.
Optionally, the package module may further include a through-molding via (TMV) extending through the first molding body and the second molding body and connecting the first re-distribution layer and the second re-distribution layer.
Optionally, the integrated package device may further include a first bonding structure and a second bonding structure that are located on the first sub-package module and the second sub-package module respectively and are sandwiched therebetween, the first bonding structure and the second bonding structure bonding the first sub-package module and the second sub-package module together.
Optionally, the integrated package device may further include an external connection structure located on the side of the second re-distribution layer away from the second sub-package module and connected with the second re-distribution layer.
Optionally, the external connection structure may include tin ball array.
Optionally, the integrated package device may further include a protecting layer covering the side of the first re-distribution layer away from the first sub-package module.
Optionally, the integrated package device may further include an adhesive layer between the first sub-package module and the second sub-package module.
Optionally, the plurality of first electronic devices and/or the plurality of second electronic devices may be stacked, in staircase, respectively in the direction in which the first sub-package module and the second sub-package module are stacked, and the first pad of each of the first electronic devices and/or the second pad of each of the second electronic devices may not covered by any other first electronic device and/or any other second electronic device.
Optionally, the outer connecting surfaces of the first pads and the outer connecting surfaces of the second pads may face the first re-distribution layer and the second re-distribution layer respectively, and the first sub-package module and/or the second sub-package module further include first conductive pillars and/or second conductive pillars respectively, which electrically connect the first re-distribution layer with part of the first pads and/or the second redistribution layer with part of the second pads respectively.
Optionally, the outer connecting surfaces of the first pads may face away from the first re-distribution layer or the outer connecting surfaces of the second pads face away from the second re-distribution layer, and the package module further includes gold wires, through which the first pads are connected with the first re-distribution layer or the second pads are connected with the second re-distribution layer.
Optionally, the plurality of first electronic devices and the plurality of second electronic devices may be arranged respectively in at least two columns in the lateral direction perpendicular to the direction in which the first sub-package module and the second sub-package module are stacked; and the TMV is located on the outer side of one column of electronic devices away from the other column, and there is at least one TMV.
Optionally, the plurality of first electronic devices and the plurality of second electronic devices may be arranged respectively in at least two columns in the lateral direction perpendicular to the direction in which the first sub-package module and the second sub-package module are stacked; and the TMV is located between the two columns of electronic devices, and there is at least one TMV.
Optionally, the integrated package device may further include a plurality of the package module, wherein the plurality of package modules are stacked in the direction in which the first sub-package module and the second sub-package module are stacked. In some implementations, the external connection structure on one of any two adjacent package modules may be connected with the first re-distribution layer of the other of the two adjacent package modules. In some implementations, the integrated package device may further include a protecting layer covering the first re-distribution layer of the package module outermost in the vertical direction.
Optionally, the package module may further include an external connection structure that is located on the side of the second re-distribution layer away from the second electronic devices and connected with the second re-distribution layer. In some implementations, the integrated package device may further include a plurality of the package module that are stacked in the direction in which the first sub-package module and the second sub-package module are stacked. In some implementations, the external connection structure on one of any two adjacent package modules may be connected with the first re-distribution layer of the other of the two adjacent package modules. In some implementations, the integrated package device may further include a protecting layer covering the first re-distribution layer of the package module outermost in the vertical direction. In some implementations, the TMVs in the plurality of package modules may be aligned or misaligned in the vertical direction.
In another aspect, an implementation of the present application also provides a method of fabricating an integrated package device. The method may include providing a first sub-package module and a second sub-package module. In some implementations, the first sub-package module may include a plurality of first electronic devices and a first molding body encapsulating the plurality of first electronic devices. In some implementations, each of the first electronic devices may include a first pad on a side thereof. In some implementations, the second sub-package module may be on the side of the first sub-package module away from the first pad. In some implementations, the second sub-package may include a plurality of second electronic devices and a second molding body encapsulating the plurality of second electronic devices, each of the second electronic devices including a second pad on a side thereof. The method may include stacking the first sub-package module and the second sub-package module. The method may include forming a first re-distribution layer located on the side of the first sub-package module away from the second sub-package module and connected with the first pads. The method may include forming a second re-distribution layer located on the side of the second sub-package module away from the first sub-package module and connected with the second pads.
Optionally, the forming the second re-distribution layer connected with the second pads may further includes forming a through-molding via (TMV) that extends through the first molding body and the second molding body and connects the first re-distribution layer and the second re-distribution layer. In some implementations, the second re-distribution layer may be connected with the TMV.
Optionally, the method may further include forming an external connection structure that is on the side of the second re-distribution layer away from the second sub-package module and connected with the second re-distribution layer.
Optionally, the providing the first sub-package module and the second sub-package module may include arranging the plurality of first electronic devices and the plurality of second electronic devices on a first temporary adhesive layer and a second temporary adhesive layer respectively with the outer connecting surfaces of the first pads of the first electronic devices facing respectively one and the same side as the outer connecting surfaces of the second pads of the second electronic devices facing one and the same side. Optionally, the providing the first sub-package module and the second sub-package module may include disposing a first carrier and a second carrier on the side of the plurality of first electronic devices and the side of the plurality of second electronic devices away from the first temporary adhesive layer and the second temporary adhesive layer respectively, the first carrier and the second carrier having temporary bonding films facing the plurality of first electronic devices and the plurality of second electronic devices respectively, and the outer connecting surfaces of the first pads and the outer connecting surfaces of the second pads facing the first carrier and the second carrier or facing away from the first carrier and the second carrier respectively. Optionally, the providing the first sub-package module and the second sub-package module may include removing the first temporary adhesive layer and the second temporary adhesive layer and forming the first molding body and the second molding body on the first carrier and the second carrier respectively.
Optionally, the method may further include, before disposing the first carrier and the second carrier, disposing first conductive pillars and second conductive pillars on part of the first pads and part of the second pads respectively.
Optionally, the stacking the first sub-package module and the second sub-package module may further include disposing an adhesive layer between the first sub-package module and the second sub-package module.
Optionally, the stacking the first sub-package module and the second sub-package module may further include disposing a first bonding structure and a second bonding structure on the first sub-package module and the second sub-package module respectively.
Optionally, the method may further include forming a protecting layer on the side of the first re-distribution layer away from the first sub-package module to cover the first re-distribution layer.
Optionally, the method may further include, during stacking of the first sub-package module and the second sub-package module, placing the side of the first sub-package module and the side of the second sub-package module away from the first carrier and the second carrier respectively close to each other with the first carrier and the second carrier located on the two outer sides of the combination of the first sub-package module and the second sub-package module. Optionally, the method may further include removing the first carrier and the second carrier before forming the first re-distribution layer and the second re-distribution layer.
Optionally, the method may further include providing a plurality of package modules; stacking the plurality of package modules in the direction in which the first sub-package module and the second sub-package module are stacked. Optionally, the method may further include connecting the external connection structure on one of any two adjacent package modules with the first re-distribution layer of the other of the two adjacent package modules.
Optionally, the stacking the plurality of package modules in the direction in which the first sub-package module and the second sub-package module are stacked, may further include forming a protecting layer covering the first re-distribution layer of the package module outermost in the vertical direction.
In yet another aspect, an implementation of the present application provides a memory system, the memory system including any one of the integrated package devices described above. In some implementations, at least one of the first electronic devices and/or at least one of the second electronic devices in the integrated package device include/includes a memory device and at least any other one of the first electronic devices and/or at least any other one of the second electronic devices include/includes a controller used to control operations of the memory device.
Using the integrated package device, the method of fabricating an integrated package device and the memory system disclosed by implementations of the present application, not only a high number of semiconductor dies or electronic devices can be accommodated, but also the packaging density can be increased by taking vertical stack packaging scheme. Meanwhile, the package body can have a system structure with electromagnetic shielding and the whole package body can have a relatively high proportion of metal. Still further, the dies may be disposed back-to-back and have thermally conductive adhesive films/bonding films therebetween, so that the whole structure has beneficial heat dissipation. By utilizing re-distribution layers (RDLs) instead of conventional gold wiring, the overall wiring pitch may be reduced, the transmission speed of signals can be increased, the high-frequency performance may be improved, and a substantially complete function may be realized to achieve a system in package (SiP). Furthermore, using the modular packaging solution disclosed by implementations of the present application, a high stack structure can be achieved, the difficulty of processing ultra-thin chips for a high stack package having a high capacity may be reduced to facilitate mass production and packages of different capacities may be processed flexibly due to the infinite possibilities of stacking. In this way, the market demands can be met and the processing yield of packages can be beneficially improved.
In order to illustrate the technical solutions in implementations or in the prior art more clearly, drawings needed in the description of the implementations or the prior art will be briefly introduced. Apparently, drawings in the following description represent only some implementations of the present application and, in light of them, other drawings can be figured out by those of ordinary skills in the art without any creative works.
Example implementations of the present disclosure will be described in more detail below with reference to the accompanying drawings. Although example implementations of the present disclosure are shown in the drawings, it should be understood that the present disclosure may be implemented in various forms and should not be limited to the specific implementations set forth herein. Rather, these implementations are provided so that the present disclosure can be more thoroughly understood and the scope of the present disclosure can be fully conveyed to those skilled in the art. Specific details of structures and functions disclosed herein are only representative and used for the purpose of describing exemplary implementations of the present application. However, the present application may be specifically implemented in many alternative forms and should not be construed to be limited by the implementations described herein.
In the description of the present application, it is understood that orientation and position relationships indicated by terms “center”, “lateral”, “upper”, “lower”, “left”, “right”, “vertical”, “horizontal”, “top”, “bottom”, “inner”, “outer” and the like are those based on the drawings and only for the purpose of describing and simplifying the description. There is no indication or implication that the devices or elements referred to must have any particular orientations and positions, or be constructed or operated in any particular orientations and positions. As a result, they should not be understood as limitation for the present application. Moreover, the terms “first”, “second” etc. are only used for the purpose of description and should not be understood to indicate or imply relative importance or to designate the number of the referenced technical features implicitly. Therefore, a feature qualified by “first” or “second” may include one or more instances of the feature explicitly or implicitly. In the description of the present application, “a plurality of” means two or more unless otherwise specified. Moreover, the term “include”, “comprise” and variations thereof are intended to cover the meaning of “include or comprise non-exclusively”.
Furthermore, when the same type of devices are qualified by the terms “first” and “second”, it is only intended to distinguish different devices of the same type and express relative positions instead of any sequence or constancy. That is to say, the terms “first” and “second” are exchangeable and any one of the same type of devices that is referred to as “first” may also be referred to as “second”.
In the description of the present application, it is to be noted that terms “interconnect” and “connect” should be explained broadly. They may include, for example, fixed connection, removable connection or integral connection; mechanical connection or electrical connection; direct interconnection or interconnection with intermediate medium; or inner communication of two elements, unless otherwise specified or limited expressly. The specific meaning of the above-mentioned terms in the present application will be understood by those of ordinary skill in the art depending on specific circumstances.
Terms used herein are only for the purpose of describing specific implementations without any intention of limiting them. Singular forms used herein such as “a” and “an” are also intended to include plural forms, unless otherwise noted expressly in the context. It is also understood that terms “include” and/or “comprise” used herein designate existence of the stated features, integers, steps, operations, elements and/or assemblies without excluding existence or addition of one or more other features, integers, steps, operations, elements, assemblies and/or any combination thereof.
Fan-out wafer level packaging (FOWLP) is a new method of integrating a plurality of dies obtained from heterogeneous fabrication processes into one compact package. Due to the demands for apparatuses with a low profile and a higher number of inputs/outputs, fan-out wafer level packages are drawing increasing attention. With the development of FOWLP, single-chip applications have evolved into multi-chip package (MCP) applications, 3D package-on-package (POP) applications, and the like to achieve a higher level of integration of I/O chips.
FOWLP makes full use of RDLs for connection so as to maximize interconnection density. Conventional WLP packages are usually in Fan-in configurations and used for integrated circuits (ICs) with a low number of pins. When the area of a chip decreases, the number of pins that can be accommodated by the chip also decrease, and as the result FOWLP packages in a spreading configurations have been developed to utilize RDLs fully for making connections outside the chip, increasing the number of pins. When each die is embedded in an epoxy molding compound (EMC), the gaps between dies each has an additional input/output (I/O) connecting point so as to increase the I/O number, improve silicon utilization, maximize interconnection density, and achieve high-bandwidth transmissions of data.
FOWLP can lower package cost and package thickness. In contrast to fan-in packaging techniques, FOWLP has the advantages of reduced package thickness, scalability (increased I/O number), improved electrical and thermal performance, and processes without any base plate. Fan-out WLP is similar to conventional ball grid array (BGA) packaging in structure, but needs no expensive substrate process.
Based on the demands for versatile and miniaturized system products, integrated circuit packages enter an era of 3D stacking packages. The era of 3D stacking packages is characterized by: (1) evolvement from package assemblies to package systems, (2) development from single-chip applications to multiple-chip applications, and (3) development from in-plane packages (MCM) to 3D packages. However, until now there are no effective and efficient package designs that enable simple operations of 3D packaging and adapt to various combinations, especially in designing of memory chips and memory systems. Therefore, the present application utilizes chip-size packages (CSPs) and a build-up multilayer base plates technique in combination with flip connection, connection through vias, Package on Package (POP) techniques and the like, as well as an ingenious design to provide an integrated package device that provides convenience and adapts to various system packages, especially those including memories. The integrated package device can integrate chips of various functions, including a processor, a memory, or any other functional chips, into one package to realize a substantially complete function and form a system-in-package (SiP).
Hereafter, in some implementations, the integrated package device, the fabrication method thereof and the memory system provided by the present application will be illustrated.
As shown in
First of all, the integrated package device in accordance with some implementations of the present application can be a basic one. As shown in
In some implementations, the first electronic devices 111 and the second electronic devices 121 may include any active devices or passive components and can be collectively referred to as the first or second electronic devices, respectively. Common passive components are mainly resistors, inductors, capacitors and the like, characterized by the capability of operating without any power source in a circuit when signals are present. Common passive components can be classified into a circuit type and a connection type, according to their functions in a circuit. Therefore, the first electronic devices 111 and/or the second electronic devices 121 may include, for example, diodes, resistors, resistor networks, capacitors, inductors, transformers, relays, keys, beepers, speakers, switches, or any other devices of the circuit type.
Active devices are main devices of an electronic circuit and can be classified into various types of discrete devices and integrated circuits, according to their physical structures, circuit functions, and engineering parameters. Therefore, the first electronic devices 111 and/or the second electronic devices 121 may include, for example, discrete devices such as bipolar transistors (BJTs), field effective transistors, thyristors and semiconductor resistors and capacitors (those fabricated by integration processes and used in integrated circuits). The first electronic devices 111 and/or the second electronic devices 121 may include analog integrated circuit devices, e.g., such as integrated operation amplifiers, comparators, logarithmic amplifiers and exponential amplifiers, analog multipliers/dividers, analog switches, phase lock loops (PLLs), voltage regulators, reference sources, wave-form generators, power amplifiers, power management circuits and the like. The first electronic devices 111 and/or the second electronic devices 121 may include, e.g., digital integrated circuit devices such as basic logic gate circuits, flip-flops, registers, decoders, data comparators, drivers, counters, shaping circuits, PLDs, microprocessors (MPUs), microcontrollers (MCUs), digital signal processors (DSPs), and the like.
The plurality of first electronic devices 111 may be the same as or different from each other, and so may the plurality of second electronic devices 121. For example, as shown in the implementation of
As an optional implementation of the combination of the first electronic devices 111 and the second electronic devices 121,
In some implementations, both the first electronic devices 111 and the second electronic devices 121 may be electronic devices. Each electronic device may have a substrate and electronic components on the substrate. The electronic components may include 2D units, 3D memory units, and/or any other suitable components. As used herein, the term “3D memory unit” may refer to a semiconductor device having memory cell transistor strings (also referred to as “memory strings”), which extend in the direction perpendicular to the direction of chip thickness.
As also shown in
Still referring to
In the implementation of
In some implementations, the first sub-package module 110 and the second sub-package module 120 may be adhered to each other through a DAF 150 or any other adhesive film. The first sub-package module 110 and the second sub-package module 120 may be joined through an adhesive layer, and may be bonded and electrically connected through the above-described bonding adhesive layer, in some non-limiting examples. The DAF 150 may be respectively disposed on the opposite stacking surfaces of the first sub-package module 110 and the second sub-package module 120.
As shown in
In some implementations, as shown in
In other words, the first re-distribution layer 130 and the second re-distribution layer 140 may be electrically connected with the first pads 112 of the first electronic devices 111 and the second pads 122 of the second electronic devices 121, respectively, through the conductive pillars or gold wires. As also shown in
As shown in
As shown in
Still referring to
The first re-distribution layer 130 may include at least one conductive layer 132 and at least one insulating layer 131. Each conductive layer 132 may include, e.g., metal, any other suitable conductive material, or any combination thereof. Each insulating layer 131 may include an organic or inorganic material, e.g., such as silicon oxide, silicon nitride, silicon oxynitride, any other suitable insulating material, or any combination thereof. Likewise, the second re-distribution layer 140 may include at least one conductive layer 142 and at least one insulating layer 141. Each conductive layer 142 may include, e.g., metal, any other suitable conductive material, or any combination thereof. Each insulating layer 141 may include, for example, silicon oxide, silicon nitride, silicon oxynitride, any other suitable insulating material or any combination thereof. The number of the conductive layer(s) 132/142 and the number of the insulating layer(s) 131/141 in the first and second re-distribution layer 130 and 140 may be determined depending on practical designs. For ease of illustration, only one conductive layer 132/142 is shown, as one non-limiting example.
Referring again to
As a summary of the description above, it can be appreciated that the first electronic devices 111/111′ in the first sub-package module 110/110′ and the second electronic devices 121/121′ in the second sub-package module 120/120′ may include any type of electronic devices, and can be arranged and connected side-by-side or in stack. The connecting components between the electronic devices and the first re-distribution layer 130 or the second redistribution layer 140 may also be varied. Therefore, in some further implementations hereafter, for ease of description, the combination of the first electronic devices 111/111′ in the first sub-package module 110/110′ and the second electronic devices 121/121′ in the sub-package module 120/120′, and the connections between the electronic devices and the first re-distribution layer 130 or the second redistribution layer 140, will be described with reference to the combination in
Through the package module 100/101 described above, the main members of the package stack structure as the base of the integrated package device disclosed by an implementation of the present application are provided. That is, the package module of the present disclosure (e.g., an integrated package device) not only accommodates a high number of semiconductor dies or devices, but also increases packaging density by taking vertical stack packaging. Meanwhile, the package body may have a system structure with electromagnetic shielding, and the whole package body can have a relatively high proportion of metal. The dies may be disposed back-to-back and have thermally conductive films/bonding films therebetween. As a result, the whole structure has improved heat dissipation. By utilizing RDLs instead of conventional gold wiring, the overall wiring pitch may be reduced by 40% or more, the signal-transmission speed can be increased, the high-frequency performance may be improved, and a substantially complete function may be realized to achieve an SiP. Furthermore, circuit scalability can be enabled by electronic devices using the internal or external connection components of the package module. When such a package module is used to complete a high-stack structure in the modularized-packaging process described below, the difficulty of package processing ultra-thin chips for a high-stack package, which has a high capacity, may be reduced to facilitate mass production. Moreover, packages of different capacities may be flexibly processed due to the infinite possibilities of stacking to meet the market demands and beneficially improve the processing yield of packages.
Hereafter, with further reference to
As shown in
In some implementations, each through-molding via 170 may include an insulating layer (not labeled) and a metal layer 170a formed on the inner sidewall of an opening through the first molding body 118. The second molding body 128 and an insulator 170b may be filled within the metal layer 170a. The metal layer 170a may connect the conductive layers 132 and 142 in the first re-distribution layer 130 and the second re-distribution layer 140 to electrically connect the first re-distribution layer 130 and the second re-distribution layer 140 outside the first sub-package module 110 and the second sub-package module 120, respectively. In this way, circuit connections may be diversified between electronic devices of the package module 102.
Using 3D-interconnection techniques, like the through-molding vias (TMVs) 170, in contrast to wire bonding, shorter interconnection paths, lower resistance and inductance, and more efficient transmissions of signals and power can be achieved, so that signal transmissions in the whole package module are improved or sped up, high-frequency performance of the product is improved, the number of the stacked dies is not limited, fabrication and design processes are not operation intensive, and fabrication costs may be reduced.
Furthermore, in accordance with some implementations of the present application, as shown in
In some implementations, the first bonding structure 114 and the second bonding structure 124 may have the same structure and each have at least one bonding insulating layer 1141/1241 and at least one bonding contact 1142/1242 extending longitudinally through the bonding insulating layer 1141/1241. The bonding contacts 1142 and 1242 connect the circuit interconnection layers (not shown) in the first electronic devices 111 and the second electronic devices 121 to achieve mechanical and electrical connections between the first sub-package module 110″ and the second sub-package module 120″ in the package module 103 directly through the first bonding structure 114 and the second bonding structure 124. The material of each bonding insulating layer 1141/1241 may include, for example, silicon oxide, silicon nitride, silicon oxynitride, any other suitable insulating material, or any combination thereof. The material of each bonding contact 1142/1242 may include at least one conductive material, such as gold, copper, aluminum, silver and/or any other suitable metal, without limitation. Various bonding techniques may be used to facilitate the above-described structure.
By disposing the first bonding structure 114 and the second bonding structure 124 to replace the above-mentioned TMVs, the fabrication processes for the TMVs can be omitted. However, the bonding structures can be disposed in addition to the TMVs to achieve the function equivalent to that obtained by the above-mentioned TMVs 170. As previously mentioned, a plurality of first electronic devices 111 in the first sub-package module 110/110″ or a plurality of second electronic devices 121 in the second sub-package module 120/120″ may be mechanically and/or electrically connected through the above-mentioned bonding structures to achieve a conductive connection.
As another summary of the description above, in contrast to the package module 100/101, the above-described package module 102/103 has additional TMVs or bonding structures, and, thus, not only constitutes the main member of the package stack structure as the base of an integrated package device but also provides more possibilities of circuit connection for flexibility of application. In this way, combinations of package modules can be used more flexibly in any subsequent package-stack structure.
With further reference to
As shown in
As shown in
In some implementations, the external connection structure 190 may include, but is not limited to, an array of tin balls and may also include, e.g., tin paste, conductive glue, or bonding contacts. The tin balls are disposed in a plurality of openings (not labeled) that are in the above-mentioned insulating layer(s) 141 and face outside, and electrically connected with the exposed portions of the conductive layer 142. Using the tin balls of the external connection structure 190 as signal input/output terminals, the signals from an external device may be input into the package module 104/105 and the signals from the package module 104/105 may be output to the external device.
Furthermore, still referring to
Using the package module 104/105 with the additional external connection structure 190 in the integrated package device disclosed in implementations of the present application, a plurality of package modules can be stacked and their external connections can be achieved by directly using the package module 104/105 as a unit. However, it should be understood that even though there is only the structure of the above-mentioned package module 102/103, a plurality of package modules may be stacked and externally connected. This is at least since the external connection structure 190 is a component that may be added when apparatus mounting is performed or a plurality of package modules are stacked by a downstream manufacturer. Therefore, the integrated package device disclosed herein may be or include any one of the above-described package modules 100, 101, 102, 103, 104 and 105.
In accordance with implementations of the present application, various integrated package devices that can be obtained using various stacking combinations utilizing any of the above-described various package modules 100, 101, 102, 103, 104 and 105. In other words, based on the package module 100, 101, 102, 103, 104, 105, the integrated package device disclosed by implementations of the present application may include one or more package modules.
For example, referring to
In some implementations, the material of the protecting layer 160 may be the same as that of the above-mentioned first/second molding body 118/128, and may include epoxy resin and/or any other suitable molding compound, e.g., such as epoxy resin, phenolic resin, a catalytic agent, a micro-powder of silicon dioxide, etc. The protecting layer 160 may protect the first re-distribution layer 130 from being damaged physically and/or chemically by, for example, oxidization and moisture.
In the integrated package device 201 depicted in
As shown in
Referring to
Still referring to
Using the integrated package device 202 as shown in
Referring to
The integrated package device 203 depicted in
The integrated package device 203 as shown in
Some implementations of the present application further provide a memory system including an integrated package device using any of the previously described combinations. In the memory system, at least one of the first electronic devices and/or at least one of the second electronic devices of the integrated package device include a memory device and at least any other one of the first electronic devices and/or at least any other one of the second electronic devices include a controller used to control operations of the memory device.
As shown in
Still referring to
The integrated package devices in accordance with some implementations of the present application have been described above and in accordance with some other implementations of the present application a method of fabricating the integrated package device as described above is further provided. As shown in
Referring to
At operation S300, the first sub-package module and the second sub-package module are stacked.
At operation S500, a first re-distribution layer is formed on the side of the first sub-package module away from the second sub-package module and connected with the first pads.
At operation S700, a second re-distribution layer is formed on the side of the second sub-package module away from the first sub-package module and connected with the second pads.
Referring again to operation S100, the first sub-package module and the second sub-package module can be provided in many ways, one of which will be taken as a representative and may further include the following sub-steps.
For instance, at operation S110, the plurality of first electronic devices and the plurality of second electronic devices are arranged on a first temporary adhesive layer and a second adhesive layer respectively with the first pads of the first electronic devices and the second pads of the second electronic devices facing one and the same side respectively.
At operation S120, first conductive pillars and second conductive pillars are disposed on part of the first pads and part of the second pads respectively.
At operation S130, a first carrier and a second carrier are disposed on the side of the plurality of first electronic devices and the side of the plurality of second electronic devices away from the first temporary adhesive layer and the second temporary adhesive layer respectively and have temporary bonding films facing the plurality of first electronic devices and the plurality of second electronic devices respectively with the first pads and the second pads facing the first carrier and the second carrier or facing away from the first carrier and the second carrier respectively.
At operation S140, the first temporary adhesive layer and the second temporary adhesive layer are removed respectively, and the first molding body and the second molding body are formed on the first carrier and the second carrier respectively.
Referring again to operation S300, the first sub-package module and the second sub-package module can be stacked in many ways, one of which will be taken as a representative. That is to say, operation S300 may further include: positioning the first carrier and the second carrier on two sides of the combination of the first molding body and the second molding body; and removing the first carrier and the second carrier before forming the first re-distribution layer and the second re-distribution layer.
Likewise, between operation S100 and operation S300, various operations may be added depending on the chosen structure of the integrated package device and two of the operations are taken as a representative.
For instance, at operation S200, an adhesive layer may be disposed between the first sub-package module and the second sub-package module. At operation S210, a first bonding structure and a second bonding structure may be disposed on the first sub-package module and the second sub-package module respectively.
Furthermore, after forming the first re-distribution layer in operation S500 and before performing operation S700, many operations may be added depending on the chosen structure of the integrated package device. For instance, operation S550 may be optionally added, which includes forming a protecting layer on the side the first re-distribution layer away from the first sub-package module to cover the first re-distribution layer.
Furthermore, with reference to the integrated package device having TMVs depicted in
For instance, at operation S600, TMVs are formed to extend through the first molding body and the second molding body and to be connected with the first re-distribution layer and the second re-distribution layer; and the second re-distribution layer is connected with the TMVs.
Furthermore, the method of fabricating an integrated package device may include applying the completed basic package module.
For instance, at operation S800, an external connection structure is formed on the side of the second re-distribution layer away from the second sub-package module and connected with the second re-distribution layer.
At operation S900, a plurality of package modules are provided and stacked in the direction in which the first sub-package module and the second sub-package module are stacked. The external connection structure on one of any two adjacent package modules may be connected with the first re-distribution layer of the other of the two adjacent package modules.
Operations corresponding to various possible operations in the method of fabricating an integrated package device will be detailed with reference to the cross-sectional structural diagrams in
For instance, with reference to
In some implementations, the first sub-package module and the second sub-package module may have combinations of the same electronic devices or different electronic devices as shown in
For instance, operation S100 may include sub-operations S110 to S140. As shown in
As shown in
Herein, in accordance with the integrated package devices in some implementations of the present application as shown in
Subsequently, as shown in
For instance, as shown in
Subsequently, as shown in
After the first sub-package module and the second sub-package module are completed respectively using the sub-operations mentioned above, the above-mentioned operation S100 of providing the first sub-package module and the second sub-package module may be completed.
Subsequently, the above-mentioned main operation S300 of stacking the first sub-package module and the second sub-package module may be performed.
For instance, with reference to
In accordance with some implementations of the present application, different alternative operations may be used to stack the first sub-package module and the second sub-package module depending on different structures of the integrated package device.
With respect to the first type of the steps, as shown in
With respect to the second type of the steps, as shown in
After the first sub-package module and the second sub-package module are bonded together to form a combination, the main operation S500 is performed. At operation S500, the first re-distribution layer 130 is formed on the side of the first sub-package module 110 away from the second sub-package module 120 and connected with the first pads 112. However, before formation of the first re-distribution layer 130, the first carrier 116 is removed. Moreover, before subsequent formation of the second re-distribution layer 140, the second carrier 126 is also removed.
For instance, as shown in
Still referring to
Subsequently, operation S700 may be performed, the second re-distribution layer is formed on the side of the second sub-package module away from the first sub-package module and connected with the second pads.
Referring to
It is noted that, for different designs, as an option, the TMVs 170 corresponding to operation S600 may be selectively formed at the same time as the second re-distribution layer 140. In other words, if the bonding structures 114/124 as previously shown in
As shown in
As shown in
As shown in
Hereafter, the method of fabricating an integrated package device including a plurality of package modules disclosed in implementations of the present application will be described. That is to say, operation S900 is performed. Here, a plurality of package modules are provided and stacked in the direction in which the first sub-package module and the second sub-package module are stacked; and the external connection structure on one of any two adjacent package modules is connected with the first re-distribution layer of the other of the two adjacent package modules.
As shown in
Using the method of fabricating an integrated package device described above in some implementations of the present application, an integrated package device is provided that provides convenience and adapts to various system packages, especially those including memories. The integrated package device integrates chips of various functions, including a processor, a memory or any other functional chips, into one package to realize a substantially complete function and form an SiP. Furthermore, the difficulty of processing ultra-thin chips for a high stack package having a high capacity may be reduced to facilitate mass production and packages of different capacities may be processed flexibly due to the infinite possibilities of stacking, so as to meet the market demands and beneficially improve the processing yield of packages.
In summary, the integrated package device, the method of fabricating an integrated package device and the memory system in some implementations of the present application have been described above. However, the present application is not defined by those implementations. Alternations and modifications may be made to the implementations above by those skilled in the art to obtain other implementations without departing from the scope and spirit of the present application. All the technical solutions formed by identical or equivalent substitutions fall within the scope of the present application. Therefore, the scope of this application is defined by the claims.
This application is a continuation of International Application No. PCT/CN2023/086020, filed on Apr. 3, 2023, which is incorporated herein by reference in its entirety.
Number | Date | Country | |
---|---|---|---|
Parent | PCT/CN2023/086020 | Apr 2023 | WO |
Child | 18227266 | US |