Jozef Bicerano, Prediction of Polymer Properties, Second Edition, Marcel Dekker, Inc., pp. 1-15, 50-61, 108-111, and 280-295, 1996. |
Lee, Transport Polymerization of Gaseous Intermediates and Polymer Crystals Growth, J. Macromol. Sci.—Rev. Macromol. Chem., C16(1), 79-127 (1977-1978). |
McClatchie, et al., Low Dielectric Constant Flowfill Technology for IMD Applications, Feb. 10-11, 1997, DUMIC Conference, 1997 ISMIC—222D/97/0034, 34-40. |
Sugahara, et al., Low Dielectric Constant Carbon Containing SiO2 Films Deposited by PECVD Technique Using a Novel CVD Precursor, Feb. 10-11, 1997, DUMIC Conference, 1997 ISMIC—222D/97/0019, 19-25. |
Shimogaki, et al., How Low Dielectric Constant of F-Doped SiO2 Films Can be Obtained, Feb. 10-11, 1997, DUMIC Conference, 1997 ISMIC—222D/97/0034, 189-196. |
Robles, et al., Characterization of High Density Plasma Chemical Vapor Deposited α-Carbon and α-Fluorinated Carbon Films for Ultra Low Dielectric Applications, Feb. 10-11, 1997, DUMIC Conference, 1997 ISMIC—222D/97/0026, 26-33. |
Labelle, et al., Characterization of Pulsed-Plasma Enhanced Chemical Vapor Deposited Fluorocarbon Thin Films, Feb. 10-11, 1997, DUMIC Conference, 1997 ISMIC—222D/97/0098, 98-105. |
J.I. Krochiwitz, Encyclopedia of Chem. Tech., vol. 5, 320-373, 1991. |
J.J. McKetta, Encyclopedia of Chem. Proc. & Design, vol. 14, 276-291, 1992. |
Meriaudeau, et al., Dehydrocyclization of Alkanes Over Zeolite-Supported Metal Catalysts: Monofunctional or Bifunctional Route, Catal. Rev. Sci. Eng., 39 (1&2), 5-48, 1997. |
Lee, et al., Low-Dielectric Constant materials for ULSI Interlayer-Dielectric Applications, MRS Bulletin, 19-27, Oct. 1997. |
Lu, et al., Vapor Deposition of Low-Dielectric-Constant Polymeric Thin Films, MRS Bulletin, 28-31, Oct 1997. |
High Vacuum Electrical Feedthroughs Within Easy Reach, MDC Vacuum Products Corporation, Circle No. 12 on Reader Service Card, No date available. |
Hacker, Organic and Inorganic Spin-on Polymers for Low-Dielectric-Constant Applications, MRS Bulletin, 38-77, Oct. 1997. |