1. Technical Field
The present disclosure relates to a semiconductor component, and more particularly, to a semiconductor component in which a stack has both lateral and vertical semiconductor devices.
2. Description of Related Art
III-V compound semiconductors such as Gallium Arsenide (GaAs), Gallium Nitride (GaN) are increasingly being provided, in that the devices made therefrom like high electron mobility transistors (HEMTs) are known possessing special characteristics e.g., in high-power performance, different from conventional silicon-based semiconductors.
Unlike the design rule of silicon-based semiconductor device, the formation of the conductive channel of a III-V compound semiconductor device applies the difference between the band gaps of the respective layers in the devices. Due to the band gaps vary among the layers, a two-dimensional electron gas (2DEG) is formed at the interface of these layers. The 2DEG serves as a conductive channel, as that disclosed in the U.S. Pat. Nos. 5,192,987 and 6,849,882. In this regard, a lateral semiconductor device, which the source, drain, and gate electrodes therein are positioned on the same side of the semiconductor device, is now the only form provided in such III-V compound-based semiconductor devices.
On the other hand, a semiconductor component, in which two or more semiconductor devices are stacked and packaged, has become increasingly popular so as to improve the performance and packaging area thereof. Therefore, it is desirable to provide a semiconductor component which accommodates both lateral semiconductor device and vertical semiconductor device in the stacked semiconductor devices.
The present disclosure provides a semiconductor component comprising a lateral semiconductor device, a vertical semiconductor device, and a leadframe. The lateral semiconductor device has a first side, a second side. The lateral semiconductor device has an active region, positioned on the first side, comprising a first electrode, a second electrode, and a control electrode. The vertical semiconductor device has a first side and a second side, a first electrode positioned on the first side, a second electrode and a control electrode positioned on the second side. The leadframe electrically and respectively connected to each of the first electrode of the lateral semiconductor device, the second electrode of the lateral semiconductor device, the second electrode of the vertical semiconductor device, and the control electrodes,
wherein the first side of the vertical semiconductor device is mounted on the second side of the lateral semiconductor device, and wherein the first electrode of the lateral semiconductor device is also electrically connected to the first electrode of the vertical semiconductor device
According to one embodiment of the present disclosure, the first side of the lateral semiconductor device faces to the leadframe. (
According to one embodiment of the present disclosure, the control electrode of the lateral semiconductor device is electrically connected to the second electrode of the vertical semiconductor device. (
According to one embodiment of the present disclosure, further comprising a passivation layer positioned on the first side of the lateral semiconductor device. (
According to one embodiment of the present disclosure, the leadframe comprises a plurality of portions.
According to one embodiment of the present disclosure, at least two of the plurality of portions are substantially coplanar.
According to another embodiment of the present disclosure, at least two of the plurality of portions are substantially non-coplanar.
According to one embodiment of the present disclosure, further comprising a first connector electrically connecting the first electrode of the lateral semiconductor device and the first electrode of the vertical semiconductor device. (
According to one embodiment of the present disclosure, further comprising a conductive layer on the second side of the lateral semiconductor device, wherein the first electrode of the vertical semiconductor device contacts the conductive layer, and the first connector electrically connects the first electrode of the lateral semiconductor device and the conductive layer. (
According to one embodiment of the present disclosure, the first connector comprises a clip, ribbon, or bonding-wire.
According to one embodiment of the present disclosure, further comprising a second connector contacts both the second electrode of the vertical semiconductor and the leadframe. (
According to one embodiment of the present disclosure, the second connector comprises a clip, ribbon, or bonding-wire.
According to one embodiment of the present disclosure, further comprising a third connector contacts both the control electrode of the vertical semiconductor device and the leadframe. (
According to one embodiment of the present disclosure, the third connector comprises a clip, ribbon, or bonding-wire.
According to one embodiment of the present disclosure, the lateral semiconductor device comprises a metal-insulator-semiconductor field-effect transistor (MISFET), a metal semiconductor field effect transistor (MESFET), or a High-electron-mobility transistor (HEMT).
According to one embodiment of the present disclosure, the lateral semiconductor device comprises a nitride-based power transistor.
According to one embodiment of the present disclosure, the first electrode of the lateral semiconductor device is a source electrode, the second electrode of the lateral semiconductor device is a drain electrode, the first electrode of the vertical semiconductor device is a drain electrode, the second electrode of the vertical semiconductor device is a source electrode, the control electrodes of the lateral and the vertical semiconductor devices are gate electrodes.
According to one embodiment of the present disclosure, the lateral semiconductor device has a thickness larger than that of the vertical semiconductor device.
The disclosure may be more fully understood by reading the following detailed description of the embodiment, with reference made to the accompanying drawings as follows:
The present disclosure is described by the following specific embodiments. Those with ordinary skill in the arts can readily understand the other advantages and functions of the present invention after reading the disclosure of this specification. The present disclosure can also be implemented with different embodiments. Various details described in this specification can be modified based on different viewpoints and applications without departing from the scope of the present disclosure.
As used herein, the singular forms “a,” “an” and “the” include plural referents unless the context clearly dictates otherwise. Therefore, reference to, for example, a data sequence includes aspects having two or more such sequences, unless the context clearly indicates otherwise.
Reference will now be made in detail to the embodiments of the present disclosure, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and the description to refer to the same or like parts.
Referring to
The lateral semiconductor device 110 has a first side 111 and a second side 112. As illustrated in
The lateral semiconductor device 110 also has an active region, positioned on the first side 111, comprising a first electrode 113, a second electrode 114, and a control electrode 115 positioned on the first side 111 (the lower surface). The lateral semiconductor device 110 of the present disclosure can be metal-insulator-semiconductor field-effect transistor (MISFET), a metal semiconductor field effect transistor (MESFET) or a High-electron-mobility transistor (HEMT), which is made of a silicon-based semiconductor or a compound semiconductor and not limited to it. For the devices aforementioned, the first electrode 113 of the lateral semiconductor device is a source electrode, the second electrode 114 of the lateral semiconductor device is a drain electrode, and the control electrode 115 of the lateral semiconductor device is a gate electrode. In one embodiment of the present disclosure, the lateral semiconductor device 110 is a HEMT device, which includes several wide bandgap material layers, such as III-V semiconductor layers. In an embodiment, the lateral semiconductor device comprises a channel layer made of GaN and a barrier layer made of AlGaN. Due to the different band gaps of the two layers, a two-dimensional electron gas (2DEG) is formed at the interface therebetween, the 2DEG serving as a conductive channel. The mobility of the electrons as well as the 2D-electron charge carrier density is very high in the two-dimensional electron gas, which is provided in an active region between the first electrode 113 of the lateral semiconductor device 110 (the source electrode) and the second electrode 115 of the lateral semiconductor device 110 (the drain electrode).
The vertical semiconductor device 120 has a first side 121 and a second side 122. As illustrated in
The vertical semiconductor device 120 has a second electrode 124 and a control electrode 125 positioned on the second side 122 (the upper surface), and a first electrode 123 positioned on the first side 121 (the lower surface). The vertical semiconductor device 120 of the present disclosure can be one of a metal-oxide-semiconductor field-effect transistor (MOSFET), but not limited to it. For a MOSFET device, the first electrode 123 of the vertical semiconductor device 120 is a drain electrode, the second electrode 124 of the vertical semiconductor device 120 is a source electrode, and the control electrode 125 of the vertical semiconductor device 120 is a gate electrode.
The leadframe 130 electrically and respectively connecting to each of the first electrode 113 of the lateral semiconductor device 110, the second electrode 114 of the lateral semiconductor device 110, the second electrode 124 of the vertical semiconductor device 120, the control electrode 115 of the lateral semiconductor device 110, and the control electrode 125 of the vertical semiconductor device 120. In one embodiment of the present disclosure, the leadframe 130 comprises a plurality of portions. As illustrated in
As shown in
As illustrated in
In one embodiment of the present disclosure, the first electrode 113 of the lateral semiconductor device 110 is a source electrode, the second electrode 114 of the lateral semiconductor device 110 is a drain electrode, and the control electrode 125 is a gate electrode of the lateral semiconductor device 110; the first electrode 123 of the vertical semiconductor device 120 is a drain electrode, the second electrode 124 of the vertical semiconductor device 120 is a source electrode, and the control electrode 125 is a gate electrode of the vertical semiconductor device 120, so as to the current flow within the semiconductor component 100 flows in the portion 132 of the leadframe 130 to the second electrode 114 of the lateral semiconductor device 110, the first electrode 113 of the lateral semiconductor device 110, the portion 131 of the leadframe 130, the first electrode 123 of the vertical semiconductor device 120, the second electrode 124 of the vertical semiconductor device 120, and finally flows out from the portion 134 of the leadframe 130. The control electrode 125 of the vertical semiconductor device 120 is a switch to turn on/off the current between the first electrode 123 of the vertical semiconductor device 120 and the second electrode 124 of the vertical semiconductor device 120 by inputting signal to the portion 135 of the leadframe 130; and the control electrode 115 of the lateral semiconductor device 110 is a switch to turn on/off the current between the second electrode 114 of the lateral semiconductor device 110 and the first electrode 113 of the lateral semiconductor device 110 by inputting signal to the portion 133 of the leadframe 130. In one embodiment, the portion 134 of the leadframe 130 is electrically connected to the portion 133 of the leadframe 130. In other words, the second electrode 124 of the vertical semiconductor device 120 is electrically connected to the control electrode 115 of the lateral semiconductor device 110.
In another embodiment of the present disclosure, the first electrode 113 of the lateral semiconductor device 110 is a drain electrode, the second electrode 114 of the lateral semiconductor device 110 is a source electrode, and the control electrode 125 is a gate electrode of the lateral semiconductor device 110; the third electrode 123 is a source electrode, the second electrode 124 of the vertical semiconductor device 120 is a drain electrode, and the control electrode 125 is a gate electrode of the vertical semiconductor device 120, so as to the current flow within the semiconductor component 100 flows in the portion 134 of the leadframe 130 to the second electrode 124 of the vertical semiconductor device 120, the first electrode 123 of the vertical semiconductor device 120, the portion 131 of the leadframe 130, the first electrode 113 of the lateral semiconductor device 110, the second electrode 114 of the lateral semiconductor device 110, and finally flows out from the portion 132 leadframe 130. Similarly, the control electrode 125 of the vertical semiconductor device 120 is a switch to turn on/off the current between the second electrode 124 of the vertical semiconductor device 120 and the first electrode 123 of the vertical semiconductor device 120 by inputting signal to the portion 135 of the leadframe 130; and the control electrode 115 of the lateral semiconductor device 110 is a switch to turn on/off the current between the first electrode 113 of the lateral semiconductor device 110 and the second electrode 114 of the lateral semiconductor device 110 by inputting signal to the portion 133 of the leadframe 130.
In one embodiment of the present disclosure, at least two of the plurality of portions are substantially coplanar. As illustrated in
However, bonding-wire 192 is not the only option to electrically connect the elements which are positioned on different height levels. In one embodiment of the present disclosure, further comprising a first connector 160 electrically connecting the first electrode 113 of the lateral semiconductor device 110 and the first electrode 123 of the vertical semiconductor device 120. In another embodiment of the present disclosure, further comprising a second connector 180 contacts both the second electrode 124 of the vertical semiconductor 120 and the leadframe 130. As illustrated in
Also illustrated in
As illustrated in
In another embodiment of the present disclosure, the semiconductor 300 further comprises a passivation layer 150 positioned on the first side 111 of the lateral semiconductor device 110. As illustrated in
In one embodiment of the present disclosure, as illustrated in
In another embodiment of the present disclosure as illustrated in
As illustrated in
In one embodiment of the present disclosure as shown in
Although the present disclosure has been described in considerable detail with reference to certain embodiments thereof, other embodiments are possible. Therefore, the spirit and scope of the appended claims should not be limited to the description of the embodiments contained herein.
It will be apparent to those ordinarily skilled in the art that various modifications and variations may be made to the structure of the present disclosure without departing from the scope or spirit of the disclosure. In view of the foregoing, it is intended that the present disclosure cover modifications and variations thereof provided they fall within the scope of the following claims.
Number | Name | Date | Kind |
---|---|---|---|
5192987 | Khan et al. | Mar 1993 | A |
6849882 | Chavarkar et al. | Feb 2005 | B2 |
7271470 | Otremba | Sep 2007 | B1 |
7291869 | Otremba | Nov 2007 | B2 |
7443014 | Otremba | Oct 2008 | B2 |
7569920 | Otremba | Aug 2009 | B2 |
7732929 | Otremba et al. | Jun 2010 | B2 |
7800217 | Otremba et al. | Sep 2010 | B2 |
7880285 | Hosseini | Feb 2011 | B2 |
7880288 | Otremba | Feb 2011 | B2 |
8399970 | Urushihata | Mar 2013 | B2 |
8466561 | Otremba | Jun 2013 | B2 |
8679896 | Joshi et al. | Mar 2014 | B2 |
9018744 | Otremba et al. | Apr 2015 | B2 |
9041986 | Yi | May 2015 | B2 |
20020031865 | Chen et al. | Mar 2002 | A1 |
20050006730 | Owens et al. | Jan 2005 | A1 |
20050017339 | Yoshiba et al. | Jan 2005 | A1 |
20050224945 | Saito et al. | Oct 2005 | A1 |
20060169976 | Kameda et al. | Aug 2006 | A1 |
20070132079 | Otremba | Jun 2007 | A1 |
20070262346 | Otremba | Nov 2007 | A1 |
20080006923 | Otremba | Jan 2008 | A1 |
20080224300 | Otremba | Sep 2008 | A1 |
20090134503 | Feng et al. | May 2009 | A1 |
20090174047 | Irving et al. | Jul 2009 | A1 |
20090261462 | Gomez | Oct 2009 | A1 |
20100122454 | Fan et al. | May 2010 | A1 |
20110227207 | Yilmaz | Sep 2011 | A1 |
20120168922 | Cho | Jul 2012 | A1 |
20120217616 | Matsuoka | Aug 2012 | A1 |
20120228696 | Carpenter et al. | Sep 2012 | A1 |
20120280308 | Disney | Nov 2012 | A1 |
20130027113 | Otremba et al. | Jan 2013 | A1 |
20130043940 | Hebert et al. | Feb 2013 | A1 |
20130299845 | Nomoto | Nov 2013 | A1 |
20140003179 | Girdhar | Jan 2014 | A1 |
20140061884 | Carpenter et al. | Mar 2014 | A1 |
20140175628 | Pan et al. | Jun 2014 | A1 |
20140264804 | Terrill et al. | Sep 2014 | A1 |
20140273344 | Terrill | Sep 2014 | A1 |
20150206868 | Zhang | Jul 2015 | A1 |
20150236005 | Yilmaz | Aug 2015 | A1 |
20150243589 | Ho | Aug 2015 | A1 |
20150303128 | Otremba | Oct 2015 | A1 |
Number | Date | Country |
---|---|---|
2477221 | Jul 2012 | EP |
200810079 | Feb 2008 | TW |
Number | Date | Country | |
---|---|---|---|
20150001692 A1 | Jan 2015 | US |