This is a continuation of application Ser. No. 07/421,247, filed Oct. 13, 1989, now abandoned.
Number | Name | Date | Kind |
---|---|---|---|
3511657 | Smith | May 1970 | |
3567445 | Atkinson et al. | Mar 1971 | |
3578451 | Doggett | May 1971 | |
3607346 | Darlow et al. | Sep 1971 | |
3867150 | Ketley | Feb 1975 | |
4168980 | La Rossa | Sep 1979 | |
4299912 | Shiba et al. | Nov 1981 | |
4327167 | Tanabe | Apr 1982 | |
4347305 | Shiba et al. | Aug 1982 | |
4358530 | Shiba | Nov 1982 | |
4373018 | Reichmanis et al. | Feb 1983 | |
4409316 | Zeller-Pendrey | Oct 1983 | |
4469777 | O'Neil | Sep 1984 | |
4477562 | Zeller-Pendrey | Oct 1984 | |
4512843 | Miyazaki | Apr 1985 | |
4515877 | Barzynski et al. | May 1985 | |
4555471 | Barzynski et al. | Nov 1985 | |
4666818 | Lake et al. | May 1987 | |
4690374 | Bellus et al. | Jun 1987 | |
4701363 | Barber | Oct 1987 | |
4812421 | Jung et al. | Mar 1989 | |
4849857 | Butt et al. | Jul 1989 | |
4944850 | Dion | Jul 1990 | |
4948645 | Holzinger et al. | Aug 1990 | |
4953005 | Carlson et al. | Aug 1990 | |
4957882 | Shinomiya | Sep 1990 |
Number | Date | Country |
---|---|---|
350947A1 | Sep 1986 | DEX |
2158869 | May 1973 | FRX |
55-50246 | Oct 1978 | JPX |
462286 | Mar 1937 | GBX |
1068557 | May 1967 | GBX |
1411423 | Oct 1975 | GBX |
2128351 | Apr 1984 | GBX |
2130397 | May 1984 | GBX |
2135793A | Sep 1984 | GBX |
2178231A | Feb 1987 | GBX |
Entry |
---|
Lake et al., application Ser. No. 07/489,789, "Method of Patterning Resist". |
J. W. Boone et al., "Photomaterial For The Fabrication of Printed Circuits", IBM Technical Disclosure Bulletin, vol. 12, No. 12, 1970, p. 2159. |
D. G. Vam Oppens, "Dry-Peel Photo Emulsion Stripping", IBM Technical Disclosure Bulletin, vol. 12, No. 11, 1970, pp. 1777-1778. |
B. C. Atwood, "High Resolution Photomask", IBM Technical Disclosure Bulletin, vol. 13, No. 7, 1970, p. 2078. |
Number | Date | Country | |
---|---|---|---|
Parent | 421247 | Oct 1989 |