Claims
- 1. A method for making solder electrical interconnections in an electronic component assembly comprising the steps of:applying a first solder having a first melting point to first pads on the surface of a first substrate of an electronic component assembly; forming a solder structure comprising: an inner core of a second solder having a second melting point which is higher than the melting point of the first solder to which the structure is to be bonded; a layer of a metal wettable by the first solder and having a melting point higher than the second melting point of the second solder of the inner core; an outer layer of a third solder having a third melting point which provides a wettable surface for attachment of the solder structure and passivates the layer of metal from oxidation and corrosion, the third melting point being lower than the second melting point; bonding the solder structure to the first pad by reflowing the first and third solders; applying a fourth solder to second pads on the surface of a second substrate of the electronic component assembly; positioning the second pads on the surface of the second substrate electronic component assembly to be joined proximate to the corresponding solder structure containing pads on the first substrate; heating the substrates to a temperature sufficient to form a bond between the solder structure and the pads of the second substrate; and cooling the bonded interconnected assembly.
- 2. The method of claim 1 wherein the structure is in the form of a sphere.
- 3. The method of claim 1 wherein the structure is in the form of a column.
- 4. The method of claim 1 wherein the metal layer is copper or nickel.
- 5. The method of claim 1 wherein the free end of the solder structure is shaved to expose the inner core of solder and to provide a desired height of the solder structure which shaved end of the structure is then bonded to the pads on the second substrate.
Parent Case Info
This is a divisional of application Ser. No. 09/070,163 filed on Apr. 30, 1998, now U.S. Pat. No. 6,158,644.
US Referenced Citations (19)
Foreign Referenced Citations (2)
Number |
Date |
Country |
3-095636 |
Sep 1991 |
JP |
410294337 |
Nov 1998 |
JP |