CHIP SCALE MODULE PACKAGE IN BGA SEMICONDUCTOR PACKAGE

Information

  • Patent Application
  • 20080042265
  • Publication Number
    20080042265
  • Date Filed
    August 15, 2006
    18 years ago
  • Date Published
    February 21, 2008
    16 years ago
Abstract
A semiconductor package includes a ball grid array (BGA) substrate having integrated metal layer circuitry, a flip chip chip scale module package (CSMP) having a first integrated passive device (IPD), the flip chip chip scale module package attached to the ball grid array (BGA) substrate, and an application die attached to the integrated passive device (IPD). A method of manufacturing a semiconductor package includes providing a ball grid array (BGA) substrate having integrated metal layer circuitry, attaching a flip chip chip scale module package (CSMP) having a first integrated passive device (IPD) to the ball grid array (BGA) substrate, and attaching an application die to the integrated passive device (IPD).
Description

BRIEF DESCRIPTION OF THE DRAWINGS


FIG. 1
a illustrates an example prior art “Known Good Unit” flip chip chip scale module package (CSMP);



FIG. 1
b illustrates an example prior art ball grid array (BGA) package;



FIG. 2 illustrates an example embodiment of a semiconductor package having an incorporated ball grid array (BGA) package together with a “Known Good Unit” (KGU) flip chip chip scale module package (CSMP);



FIG. 3
a illustrates an example embodiment of a semiconductor package having an incorporated BGA package together with a KGU flip chip CSMP in a land grid array (LGA) configuration;



FIG. 3
b illustrates an example embodiment of a semiconductor package having an incorporated BGA package together with a KGU flip chip CSMP in a ball grid array (BGA) configuration;



FIG. 3
c illustrates an example embodiment of a semiconductor package having an incorporated BGA package together with a KGU flip chip CSMP having an additional external pad and bond finger configuration;



FIG. 4
a illustrates a first step in an example method of manufacturing a semiconductor package as illustrated in FIGS. 2, 3a, 3b, or 3c;



FIG. 4
b illustrates a first option of a second step in an example method of manufacturing a semiconductor package as illustrated in FIGS. 2, 3a, 3b, or 3c;



FIG. 4
c illustrates a second option of a second step in an example method of manufacturing a semiconductor package as illustrated in FIGS. 2, 3a, 3b, or 3c;



FIG. 4
d illustrates a third step in an example method of manufacturing a semiconductor package as illustrated in FIGS. 2, 3a, 3b, or 3c;



FIG. 4
e illustrates a fourth step in an example method of manufacturing a semiconductor package as illustrated in FIGS. 2, 3a, 3b, or 3c;



FIG. 4
f illustrates a fifth step in an example method of manufacturing a semiconductor package as illustrated in FIGS. 2, 3a, 3b, or 3c;



FIG. 4
g illustrates a sixth step in an example method of manufacturing a semiconductor package as illustrated in FIGS. 2, 3a, 3b, or 3c;



FIG. 5
a illustrates an example prior art “Known Good Unit” flip chip chip scale module package (CSMP);



FIG. 5
b illustrates an example prior art thermally-enhanced package;



FIG. 6 illustrates an example embodiment of a semiconductor package having an incorporated KGU flip chip CSMP together with a thermally-enhanced package;



FIG. 7
a illustrates a first step in an example method of manufacturing a semiconductor package as illustrated in FIG. 6;



FIG. 7
b illustrates a second step in an example method of manufacturing a semiconductor package as illustrated in FIG. 6;



FIG. 7
c illustrates a third step in an example method of manufacturing a semiconductor package as illustrated in FIG. 6;



FIG. 7
d illustrates a fourth step in an example method of manufacturing a semiconductor package as illustrated in FIG. 6;



FIG. 7
e illustrates a fifth step in an example method of manufacturing a semiconductor package as illustrated in FIG. 6;



FIG. 7
f illustrates a sixth step in an example method of manufacturing a semiconductor package as illustrated in FIG. 6;



FIG. 7
g illustrates a seventh step in an example method of manufacturing a semiconductor package as illustrated in FIG. 6;



FIG. 7
h illustrates a eighth step in an example method of manufacturing a semiconductor package as illustrated in FIG. 6;



FIG. 8
a illustrates an example prior art “Known Good” wafer level chip scale package/chip scale module package (WLCSP-CSMP);



FIG. 8
b illustrates an example prior art ball grid array (BGA) package; and



FIG. 9 illustrates an example embodiment of a semiconductor package having an incorporated ball grid array (BGA) package together with a “Known Good Unit” (KGU) WLCSP-CSMP package.





DETAILED DESCRIPTION OF THE DRAWINGS

The present invention is described in one or more embodiments in the following description with reference to the Figures, in which like numerals represent the same or similar elements. While the invention is described in terms of the best mode for achieving the invention's objectives, it will be appreciated by those skilled in the art that it is intended to cover alternatives, modifications, and equivalents as may be included within the spirit and scope of the invention as defined by the appended claims and their equivalents as supported by the following disclosure and drawings.


Current semiconductor packaging trends toward delivering towards low cost, smaller size, and higher performance. To help achieve lower cost and smaller size packages with higher performance, the chip scale module package (CSMP) has been implemented. The present invention utilizes the CSMP to incorporate the CSMP into a standard ball grid array (BGA) semiconductor package to provide increased functionality and a smaller package footprint.


Turning to FIG. 1a, an example prior art “Known Good Unit” (KGU) flip chip CSMP package 10 is depicted. Package 10 includes a substrate which is connected to an integrated passive device (IPD). The IPD uses a solder interconnect to connect with an integrated semiconductor die.


Chip scale module packaging is an advanced system-in-package (SiP) which features a modular architecture that integrates mixed integrated circuit (IC) technologies and a wide variety of integrated passive devices such as resistors, capacitors, inductors, filters, BALUNs and interconnects directly onto the silicon substrate.



FIG. 1
b depicts an example prior art ball grid array (BGA) package 12. Package 12 includes a substrate with integrated metal circuitry connected to an array of solder balls. A die is wirebonded to the substrate, and enclosed with an encapsulant for protection.



FIG. 2 illustrates an example embodiment of a semiconductor package 14 according to the present invention. Package 14 incorporates a modified BGA package 12 with a modified KGU flip chip CSMP package 16. Package 16 can include either a land grid array (LGA) or a ball grid array (BGA) type configuration. Package 16 includes a flip chip die 18 which is incorporated into package 16 as shown. A first application die 20 such as an integrated circuit (IC) or an integrated passive device (IPD) as previously described is also incorporated into the package 16. An adhesive material 21 bonds a second application die 22 to the top surface of die 20 as depicted. Dies 20, 22 can be a combination IC/IC, IPD/IPD, or a combination of both IC/IPD. Moreover, additional application dies can be mounted to die 22 in any desired IC/IPD configuration to fulfill a specific need. An underfill material 24 is disposed between die 18 and die 20 to provide structural support.


Package 16 is attached on the BGA substrate 28 by a solder paste, flux, or adhesive material at bump pad 26. To provide connectivity, the application die 22 can use wirebond 30 to connect the wire bond pad 32 of die 22 with the BGA metal layer circuitry and/or bond fingers 34. Similarly, application die 22 can utilize wirebond 36 to connect the wire bond pad 38 to external bond pads and/or bond fingers 40 located on package 16. An encapsulant 42 is formed over package 16 to provide structural support to package 16 within overall package 14.


Package 14 can be constructed utilizing standard molding or TOP mold gate techniques. By combining CSMP package 16 and BGA package 12 into package 14, package 14 can take advantage of the positive aspects of each package to provide enhanced device functionality for applications such as wireless local area networks (WLAN), Bluetooth or similar application specific integrated circuits (ASIC), digital signal processing (DSP), memory applications, gate arrays, PC chipsets, and the like. In addition, package 14 can achieve passive function integration through the use of integrated passive devices (IPDs) which are incorporated on the CSMP module 16 without the use of a standard external passive component.


Turning to FIG. 3a, an example embodiment of a semiconductor package 14 having an incorporated modified BGA package together with a modified KGU flip chip CSMP utilizing an additional external pad and bond finger configuration is illustrated. Package 14 includes components as illustrated in FIG. 2, such as flip chip die 18, first application die 20, second application die 22, underfill material 24, BGA substrate 28 with incorporated metal circuitry, wire bonding 30, 36 and bond pads 32, 34, 38, and 40. An encapsulant 42 is again disposed over the application dies 20, 22 to provide structural support.


In the depicted embodiment, interconnectivity from the flip chip CSMP external pads to pads located on the BGA substrate 28 is provided at junction 44 using solder paste or a conductive epoxy.



FIG. 3
b illustrates an example embodiment of a semiconductor package 14 having an incorporated modified BGA package together with a modified KGU flip chip CSMP in a ball grid array (BGA) configuration. Here again, package 14 includes many of the same subcomponents as illustrated. Interconnectivity from the flip CSMP solder balls to the BGA bump pads are provided along junction 44 using solder paste, flux, or a conductive epoxy. In the depicted embodiment, package 14 makes use of a grounded flip chip die 48 in place of flip chip die 18 for enhanced thermal performance.



FIG. 3
c illustrates an example embodiment of a semiconductor package 14 having an incorporated modified BGA package together with a KGU flip chip CSMP having an additional external pad 50 and bond finger configuration. Interconnectivity from the flip chip CSMP to the BGA substrate is provided using conventional wire bonding. As such, an additional wire bonding 46 is shown connecting external bond pad 50 to bond pad 34.



FIG. 4
a depicts a first step in an example method of manufacturing a semiconductor package as illustrated in FIGS. 2, 3a, 3b, or 3c. A BGA substrate 28 having incorporated metal circuitry is provided. Depending on the configuration, as previously described, solder flux, solder paste, or conductive epoxy is disposed over the substrate 28 at junction 44, to provide interconnectivity between BGA bump pads and the CSMP package. A thermal/conductive adhesive material 52 is also disposed over substrate 28 as depicted to promote adhesion. If a grounded flip chip die 48 is utilized, the use of material 52 is optional.



FIG. 4
b illustrates a first option of a second step in an example method of manufacturing a semiconductor package as illustrated in FIGS. 2, 3a, 3b, or 3c. The option depicted in the present embodiment reflects the use of a land grid array-configured flip chip CSMP 10 which is attached to BGA substrate 28 at junction 44. Similarly, FIG. 4c illustrates the second option of the second step in the example method, reflecting the use of a ball grid array-configured flip chip CSMP 10 which is attached to the BGA substrate 28.



FIG. 4
d illustrates a third step in an example method of manufacturing a semiconductor package as illustrated in FIGS. 2, 3a, 3b, or 3c. A film or adhesive mount 21 is disposed on the backside surface of IPD 20 as shown. FIG. 4e, illustrating a fourth step in the method, depicts the attachment of a second application die 22 to the film 21 as shown.


In the fifth step of the method, FIG. 4f depicts the various wire bonding which provides interconnectivity between bond pads 32, 38 located as part of application die 22 and external bond pads/fingers 34, 40 on the CSMP package and BGA substrate as depicted. As a sixth step, the dies and wirebonding are overmolded with the encapsulant 42 as shown in FIG. 4g.


In an additional embodiment, a modified KGU flip chip CSMP can be incorporated in a modified thermally-enhanced package for a particular application. For purposes of conception, FIG. 5a again illustrates an example prior art “Known Good Unit” (KGU) flip chip chip scale module package (CSMP) 10 which is used in applications such as WLAN, Bluetooth, GPS, switches, and the like. FIG. 5b refers to an example prior art thermally-enhanced semiconductor package 54 used in applications featuring application specific integrated circuits (ASICs), digital signal processing (DSP), microprocessors and controllers, chipsets, or other various applications requiring enhanced thermal performance.



FIG. 6 refers to a semiconductor package 56 having a thermally-enhanced substrate 57 which has been adapted for a modified KGU flip chip CSMP package 58. An IPD 60, or IC 60 is integrated into the CSMP package 58. The flip chip CSMP package 58 is attached to substrate 57. Substrate 57 includes a heat sink structure 70 and an integrated cavity 59, as well as metal circuitry incorporated into the substrate 57 to conduct electricity. Package 58 is attached in the cavity by an adhesive material or film 62 which can be thermal or conductive. A high thermal flip chip 64 is incorporated into package 56 as depicted and bonded to the cavity 59 using adhesive 62. An additional die 66, which can include an IC or additional IPD is mounted with adhesive 62 to die 60. Again, as before, dies 60, 66 can include any combination of IC/IC, IPD/IPD, IC/IPD, or IPD/IC. Additional dies (IC or IPD) can be mounted to the top surface of die 66 using a similar approach with adhesive 62. An underfill/encapsulant material 63 is utilized between dies 60, 64 to provide structural support. Similarly, an encapsulant or mold compound 68 is disposed over package 58 to provide structural support to dies 60, 66 within package 58 and the overall package 56.


Wire bonding can be incorporated into package 56 as follows. Wire bonds 72 provide electrical interconnectivity between bond pads 74 located on die 66 and bond pads 76 located as part of the modified thermally-enhanced package. Wire bonds 76 provide electrical connectivity between pads 80, also on die 66, and pads 82, located externally on CSMP package 58. Similarly, wire bonds 84 provide connectivity between pads 86 located as part of the modified thermally-enhanced substrate 57 and pads 88 located externally on modified CSMP package 58. Finally, solder balls 90 provide electrical connectivity to external electrical circuitry as depicted.



FIG. 7
a illustrates a first step in an example method of manufacturing a semiconductor package as illustrated in FIG. 6. A modified thermally-enhanced substrate 57 is provided, the substrate 57 having a heat sink 70 with an integrated cavity 59 again as shown to accommodate package 58. Film or adhesive material 62 is disposed on the thermally-enhanced substrate 57 as shown. In FIG. 7b, a KGU flip chip CSMP 58 is attached to the material 62. As a next step, FIG. 7c depicts underfill material 63 disposed between dies 60, 64. FIG. 7d depicts the following step of applying a film/adhesive material 62 on the top surface of die 60, where FIG. 7e shows die 66 attached to die 60 as a next step.


As a next step, the various wirebonding as previously described takes place as shown in FIG. 7f. Package 58 with dies 60, 64 is then encapsulated/overmolded with encapsulant 68 as depicted in FIG. 7g. As a next step, FIG. 7h depicts solder balls 90 attached to the modified thermally-enhanced substrate 57 to provide connectivity to external circuitry.


In an additional embodiment, a “Known Good” wafer level chip scale package/chip scale module package (WLCSP-CSMP) can be modified to be incorporated into a modified ball grid array (BGA) package to perform specific functionality for a particular application. Again, for purposes of conceptual illustration, FIG. 8a illustrates an example prior art “Known Good” wafer level chip scale package/chip scale module package 92 (WLCSP-CSMP). FIG. 8b illustrates an example prior art ball grid array (BGA) package 12.



FIG. 9 illustrates an example embodiment of a semiconductor package 94 having an incorporated modified ball grid array (BGA) package 12 together with a modified KGU WLCSP-CSMP package. The WLCSP-CSMP is attached on the BGA substrate 28 by an adhesive material, solder paste, or flux-reflow material. An additional application die 98 is disposed at the backside of the IPD die 92 by using adhesive material 100. Additional dies 92 can be stacked on die 92 depending upon the application. Here, as before, dies 92 can include ICs, IPDs, or any combination thereof.


Connectivity of the modified WLCSP-CSMP to the BGA substrate 28 can be performed by wirebonds 102 connecting bond pads 104 located as part of die 98 to pads 106 connected to metal circuitry incorporated into BGA substrate 28. Additionally, junction 96 provides electrical connectivity between solder balls of the modified WLCSP-CSMP and additional pads 106 also connected to metal circuitry of the BGA substrate 28.


Package 94 can be constructed using standard molding or TOP mold gate techniques. The package 94 provides enhanced device functionality due to combining favorable aspects of the WLCSP-CSMP and BGA package designs for applications such as WLAN, Bluetooth, DSP, chipsets, and a host of related applications.


Package 94 adds passive function integration through the use of IPDs 98 as application dies 98 which are incorporated on the modified CSMP module as previously depicted without the requirement of using a standard external passive component.


In summary, the use of packages such as package 94, package 56, and package 14 provides enhanced functionality and serves to take advantage of positive aspects of older designs which are modified to create the packages 94, 56, and 14.


While one or more embodiments of the present invention have been illustrated in detail, the skilled artisan will appreciate that modifications and adaptations to those embodiments may be made without departing from the scope of the present invention as set forth in the following claims.

Claims
  • 1. A semiconductor package comprising: a ball grid array (BGA) substrate having integrated metal layer circuitry;a flip chip chip scale module package (CSMP) having a first integrated passive device (IPD), the flip chip chip scale module package attached to the ball grid array (BGA) substrate; andan application die attached to the integrated passive device (IPD).
  • 2. The semiconductor package of claim 1, wherein the flip chip CSMP is attached to the BGA substrate using an adhesive material.
  • 3. The semiconductor package of claim 2, wherein the adhesive material further includes a solder paste or flux material.
  • 4. The semiconductor package of claim 1, wherein the application die is wirebonded to the metal layer circuitry of the BGA substrate to provide electrical connectivity.
  • 5. The semiconductor package of claim 1, wherein the application die is wirebonded to the CSMP to provide electrical connectivity.
  • 6. The semiconductor package of claim 1, wherein the CSMP is wirebonded to the metal layer circuitry of the BGA substrate to provide electrical connectivity.
  • 7. The semiconductor package of claim 1, wherein the application die further comprises a second IPD or an integrated circuit (IC) device.
  • 8. The semiconductor package of claim 1, further including an encapsulant formed over the CSMP for providing structural support to the CSMP within the semiconductor package.
  • 9. The semiconductor package of claim 1, wherein the CSMP includes a grounded flip chip die for enhanced thermal performance.
  • 10. A method of manufacturing a semiconductor package, comprising: providing a ball grid array (BGA) substrate having integrated metal layer circuitry;attaching a flip chip chip scale module package (CSMP) having a first integrated passive device (IPD) to the ball grid array (BGA) substrate; andattaching an application die to the integrated passive device (IPD).
  • 11. The method of manufacturing a semiconductor package of claim 10, wherein the flip chip CSMP is attached to the BGA substrate using an adhesive material.
  • 12. The method of manufacturing a semiconductor package of claim 11, wherein the adhesive material further includes a solder paste or flux material.
  • 13. The method of manufacturing a semiconductor package of claim 10, further including wirebonding the application die to the metal layer circuitry of the BGA substrate to provide electrical connectivity.
  • 14. The method of manufacturing a semiconductor package of claim 10, further including wirebonding the application die to the CSMP to provide electrical connectivity.
  • 15. The method of manufacturing a semiconductor package of claim 10, further including wirebonding the CSMP to the metal layer circuitry of the BGA substrate to provide electrical connectivity.
  • 16. The method of manufacturing a semiconductor package of claim 10, wherein the application die further comprises a second IPD or an integrated circuit (IC) device.
  • 17. The method of manufacturing a semiconductor package of claim 1, further including forming an encapsulant over the CSMP for providing structural support to the CSMP within the semiconductor package.
  • 18. The method of manufacturing a semiconductor package of claim 10, wherein the CSMP includes a grounded flip chip die for enhanced thermal performance.
  • 19. A semiconductor package comprising: a thermally-enhanced substrate, the thermally-enhanced substrate having a heat sink portion with an integrated cavity;a flip chip chip scale module package (CSMP) having a first integrated passive device (IPD), the flip chip chip scale module package attached to the cavity of the thermally-enhanced substrate; andan application die attached to the integrated passive device (IPD).
  • 20. The semiconductor package of claim 19, wherein the flip chip CSMP is attached to the thermally-enhanced substrate using an adhesive material.
  • 21. The semiconductor package of claim 19, wherein the application die is attached to the integrated passive device using an adhesive material.
  • 22. The semiconductor package of claim 19, wherein the application die is wirebonded to a bond finger of the thermally-enhanced substrate to provide electrical connectivity.
  • 23. The semiconductor package of claim 19, wherein the application die is bonded to the flip chip CSMP package to provide electrical connectivity.
  • 24. The semiconductor package of claim 19, wherein the flip chip CSMP package is wirebonded to a bond finger of the thermally-enhanced package to provide electrical connectivity.
  • 25. The semiconductor package of claim 19, wherein the application die further comprises a second IPD or an integrated circuit (IC) device.
  • 26. The semiconductor package of claim 19, wherein the CSMP includes a thermally-enhanced flip chip die.
  • 27. The semiconductor package of claim 19, further including an encapsulant formed over the CSMP for providing structural support to the CSMP within the semiconductor package.
  • 28. A method of manufacturing a semiconductor package comprising: providing a thermally-enhanced substrate, the thermally-enhanced substrate having a heat sink portion with an integrated cavity;attaching a flip chip chip scale module package (CSMP) having a first integrated passive device (IPD) to the cavity of the thermally-enhanced substrate; andattaching an application die to the integrated passive device (IPD).
  • 29. The method of manufacturing a semiconductor package of claim 28, wherein the flip chip CSMP is attached to the cavity of the thermally-enhanced substrate using an adhesive material.
  • 30. The method of manufacturing a semiconductor package of claim 28, wherein the application die is attached to the integrated passive device using an adhesive material.
  • 31. The method of manufacturing a semiconductor package of claim 28, wherein the application die is wirebonded to a bond finger of the thermally-enhanced substrate to provide electrical connectivity.
  • 32. The method of manufacturing a semiconductor package of claim 28, wherein the application die is bonded to the flip chip CSMP package to provide electrical connectivity.
  • 33. The method of manufacturing a semiconductor package of claim 28, wherein the flip chip CSMP package is wirebonded to a bond finger of the thermally-enhanced package to provide electrical connectivity.
  • 34. The method of manufacturing a semiconductor package of claim 28, wherein the application die further comprises a second IPD or an integrated circuit (IC) device.
  • 35. The method of manufacturing a semiconductor package of claim 28, wherein the CSMP includes a thermally-enhanced flip chip die.
  • 36. The method of manufacturing a semiconductor package of claim 28, further including an encapsulant formed over the CSMP for providing structural support to the CSMP within the semiconductor package.
  • 37. A semiconductor package, comprising: a ball grid array (BGA) substrate having integrated metal circuitry;a wafer level chip scale package (WLCSP) attached to the ball grid array substrate, the wafer level chip scale package having a first integrated passive device (IPD); andan application die attached to the integrated passive device (IPD).
  • 38. The semiconductor package of claim 37, wherein the WLCSP is attached to the BGA substrate, or the application die is attached to the IPD using an adhesive material.
  • 39. The semiconductor package of claim 38, wherein the adhesive material further includes solder paste or flux-reflow material.
  • 40. The semiconductor package of claim 37, wherein the application die further includes a second IPD or an integrated circuit (IC) device.
  • 41. The semiconductor device of claim 37, wherein the WLCSP is wirebonded to the integrated metal circuitry of the BGA substrate to provide electrical connectivity.
  • 42. The semiconductor device of claim 37, wherein a solder ball of the WLCSP is bonded to a ball pad located on the BGA substrate to provide electrical connectivity.
  • 43. The semiconductor device of claim 37, further including an encapsulant formed over the WLCSP to provide structural support to the WLCSP within the semiconductor package.