Patent Grant
10321575
Field of the Disclosure
Various features relate generally to an integrated circuit (IC) module, and more specifically to an IC module that includes an IC package coupled to an interposer that includes a passive component.
Background
There is an ongoing industry trend to reduce the size of modules and that include passive components, as these modules and packages are placed in smaller and smaller devices. Ideally, such a module and package will have a better form factor, be cheaper to fabricate, while at the same time meeting the needs and/or requirements of mobile and/or wearable devices.
Various features relate generally to an integrated circuit (IC) module, and more specifically to an IC module that includes an IC package coupled to an interposer that includes a passive component.
One example provides an interposer that includes an encapsulation layer, a passive component at least partially embedded in the encapsulation layer, and a plurality of interconnects coupled to the passive component.
Another example provides an integrated circuit (IC) module that includes an integrated circuit (IC) package, a plurality of first solder interconnects coupled to the IC package, an interposer coupled to the IC package through the plurality of first solder interconnects, a plurality of second solder interconnects coupled to the interposer, and a printed circuit board (PGB) coupled to the interposer through the plurality of second solder interconnects. The interposer includes an encapsulation layer, a passive component at least partially embedded in the encapsulation layer, and a plurality of interconnects coupled to the passive component.
Another example provides a method for fabricating an integrated circuit (IC) module. The method provides an interposer, where providing the interposer includes providing at least one passive component, forming an encapsulation layer over the at least one passive component, and forming a plurality of interconnects in the encapsulation layer. The method provides an integrated circuit (IC) package. The method couples the IC package to the interposer by using a plurality of first solder interconnects. The method provides a printed circuit board (PCB). The method couples the PCB to the interposer by using a plurality of second solder interconnects.
Various features, nature and advantages may become apparent from the detailed description set forth below when taken in conjunction with the drawings in which like reference characters identify correspondingly throughout.
In the following description, specific details are given to provide a thorough understanding of the various aspects of the disclosure. However, it will be understood by one of ordinary skill in the art that the aspects may be practiced without these specific details. For example, circuits may be shown in block diagrams in order to avoid obscuring the aspects in unnecessary detail. In other instances, well-known circuits, structures and techniques may not be shown in detail in order not to obscure the aspects of the disclosure.
Some features pertain to an integrated circuit (IC) module that includes an integrated circuit (IC) package, a plurality of first solder interconnects coupled to the IC package, an interposer coupled to the IC package through the plurality of first solder interconnects, a plurality of second solder interconnects coupled to the interposer, and a printed circuit board (PCB) coupled to the interposer through the plurality of second solder interconnects. The interposer includes an encapsulation layer, a first passive component at least partially embedded in the encapsulation layer, and a plurality of interconnects coupled to the first passive component. The encapsulation layer includes a mold and/or an epoxy fill. The first passive component is configured to operate as part of an electronic voltage regulator (FAIR) for the IC module. In some implementations, the interposer is a fan out interposer.
Exemplary Integrated Circuit (IC) Module Comprising an Integrated Circuit (IC) Package and an Interposer Comprising a Plurality of Passive Components
The IC package 201 is coupled to the interposer 202 through a plurality of first solder interconnects 217 (e.g., solder balls). The interposer 202 is coupled (e.g., mounted over) the PCB 204 through a plurality of second solder interconnects 219 (e.g., solder balls). As shown in
The interposer 202 includes a plurality of passive components. More specifically, the interposer 202 includes a first passive component 220, a second passive component 222, and a third passive component 224. Examples of passive components include an inductor and a capacitor. In some implementations, the first passive component 220, the second passive component 222 and/or the third passive component 224 are configured to operate as part of an electronic voltage regulator (EVR) in the IC module 200. The interposer 202 also includes a plurality of interconnects 230 (e.g., vias, traces, pads). Some interconnects from the plurality of interconnects 230 may be coupled to one or more of the passive components (e.g., first passive component 220, second passive component 222). A passive component may be a discrete or an off the shelf passive component that uses a separate or different fabrication process than the fabrication process used to fabricate an interposer (e.g., interposer 202).
In some implementations, an interconnect is an element or component of a device, a module, a package, and/or an interposer that allows or facilitates an electrical connection between two points, elements and/or components. In some implementations, an interconnect may include a trace, a via, a pad, a pillar, a redistribution metal layer, and/or an under bump metallization (UBM) layer. In some implementations, an interconnect is an electrically conductive material that may configured to provide an electrical path for a signal (e.g., data signal, ground signal, power signal). An interconnect may be part of a circuit. An interconnect may include more than one element or component. For example, an interconnect may comprise one or more interconnects.
There are several advantages of embedding or placing passive components in the interposer 202. First, it reduces the overall real estate or foot print of the IC module 200. A comparison of the IC module 200 to the IC module 100 of
Having described the several advantages of an interposer comprising embedded passive components, the interposer 202 will now be further described below in detail in
The encapsulation layer 300 at least partially encapsulates the first passive component 220, the second passive component 222, and the third passive component 224. In some implementations, portions of the first passive component 220, the second passive component 222, and/or the third passive component 224 may not be encapsulated by the encapsulation layer 300. In some implementations, the first passive component 220, the second passive component 222, and the third passive component 224 are embedded or positioned in the encapsulation layer 300 such that the first passive component 220, the second passive component 222, and/or the third passive component 224 is offset from a center plane that lateral traverses the encapsulation layer 300 (e.g., center plane that traverses along the X-direction). In
In some implementations, the encapsulation layer 300 may be a litho-patternable layer. A litho-patternable layer/material that is a material that is photo etchable. That is, the litho-patternable layer/material is made of a material that can be etched and/or removed (e.g., through a lithography process) through the exposure of the material to a light source (e.g., ultraviolet (UV) light) through a mask (e.g., photomask). One advantage of litho-patternable layer/material is that interconnects with lower pitch and/or spacing may be formed in the litho-patternable layer/material. The use of a photo lithography process to form cavities in the encapsulation layer forms cavities with pitch and/or spacing that can be smaller than the pitch and/or spacing of the cavities formed by a laser process (e.g., laser ablation). Thus, a process that includes a photo lithography process may form interconnects with pitch and/or spacing in the encapsulation layer that may be smaller than the pitch and/or spacing of interconnects formed by a process that includes a laser process (e.g., laser ablation).
The interposer 202 includes a plurality of interconnects 230 (e.g., interconnects 230a-230f). The interconnect 230a is coupled to the first passive component 220 (e.g., a first terminal of the first passive component 220). The interconnect 230b is coupled to the first passive component 220 (e.g., a second terminal of the first passive component 220). The interconnect 230b includes the interconnect 330b (e.g., pad) and the interconnect 332b (e.g., via). The interconnect 230c traverses the interposer 202, and more specifically the encapsulation layer 300. The interconnect 230d traverses the interposer 202, and more specifically the encapsulation layer 300. The interconnect 230d includes the interconnect 330d (e.g., pad) and the interconnect 332d (e.g., via). The interconnect 230e is coupled to the second passive component 222. The interconnect 230f is coupled to the third passive component 224. As mentioned above, an interconnect may include a via, a trace, a pad or a combination thereof.
The solder interconnect 217a is coupled to the interconnect 230a. The solder interconnect 217b is coupled to the interconnect 230b. More specifically, the solder interconnect 217b is coupled to the interconnect 330b. The solder interconnect 217c is coupled to the interconnect 230c. The solder interconnect 217d is coupled to the interconnect 230d. More specifically, the solder interconnect 217d is coupled to the interconnect 330d. The solder interconnect 217e is coupled to the interconnect 230e. The solder interconnect 217f is coupled to the interconnect 230f.
The solder interconnect 219a is coupled to the first passive component 220 (e.g., third terminal of the first passive component 220). The solder interconnect 219b is coupled to the first passive component 220 (e.g., fourth terminal of the first passive component 220). The solder interconnect 219c is coupled to the interconnect 230c. The solder interconnect 219d is coupled to the interconnect 230d. More specifically, the solder interconnect 219b is coupled to the interconnect 332d. The solder interconnect 219e is coupled to the second passive component 222. The solder interconnect 219f is coupled to the third passive component 224.
Different implementations may provide the interposer 202 with different sizes, shapes and interconnect densities. Table 1 below illustrates examples of possible physical properties and dimensions of the interposer 202 or any of the interposers described in the present disclosure. In some implementations, the ball pitch, the ball diameter, and the ball height of Table 1 may refer to the plurality of first solder interconnects 217 and/or the plurality of second solder interconnects 219.
Exemplary Integrated Circuit (IC) Module Comprising an Integrated Circuit (IC) Package and an Interposer Comprising a Plurality of Passive Components
The IC package 201 is coupled to the interposer 402 through the plurality of first solder interconnects 217 (e.g., solder balls). The interposer 402 is coupled (e.g., mounted over) the PCB 204 through the plurality of second solder interconnects 219 (e.g., solder balls). As shown in
The interposer 402 also include the plurality of interconnects 430 (interconnects 430a-430f). The plurality of interconnects 430 may include vias, traces and/or pads. The interconnect 430a (e.g., pad) is coupled to the first passive component 220 (e.g., third terminal of the first passive component 220). The interconnect 430b (e.g., pad) is coupled to the first passive component 220 (e.g., fourth terminal of the first passive component 220). The interconnect 430b is also coupled to the solder interconnect 219b. The interconnect 430d is coupled to the interconnect 230d. More specifically, the interconnect 430d is coupled to the interconnect 332d. The interconnect 430d is also coupled to the solder interconnect 219d. The interconnect 430e is coupled to the second passive component 222. The interconnect 430e is also coupled to the solder interconnect 219e. The interconnect 430f is coupled to the third passive component 224. The interconnect 430e is also coupled to the solder interconnect 219e. As mentioned above, an interconnect may include a via, a trace, a pad or a combination thereof.
Exemplary Integrated Circuit (IC) Module Comprising an Integrated Circuit (IC) Package and an Interposer Comprising a Plurality of Passive Components
The IC package 201 is coupled to the interposer 602 through the plurality of first solder interconnects 217 (e.g., solder balls). The interposer 602 is coupled (e.g., mounted over) the PCB 204 through the plurality of second solder interconnects 219 (e.g., solder balls). As shown in
One portion of the interposer 602 may include interconnects with a first density property (e.g., pitch, spacing), while a second portion of the interposer 602 may include interconnects with a second density property (e.g., pitch, spacing) that is different than the first density property. An example of different interconnect density properties are further described in
The plurality of interconnects 230 may include vias, traces, and/or pads. The interconnect 230g includes the interconnect 630g (e.g., pad), the interconnect 632g (e.g., trace), and the interconnect 634g (e.g., via). The interconnect 230g may be a redistribution interconnect that redistributes signaling from the IC package 201 to other locations or components of the IC module 600. The interconnect 630g is coupled to the solder interconnect 217g. The interconnect 634g is coupled to the solder interconnect 219g. The interconnect 230h is coupled to the solder interconnect 219h. As mentioned above, an interconnect may include a via, a trace, a pad or a combination thereof.
Exemplary Integrated Circuit (IC) Module Comprising an Integrated Circuit (IC) Package and an Interposer Comprising a Plurality of Passive Components
The IC package 201 is coupled to the interposer 802 through the plurality of first solder interconnects 217 (e.g., solder balls). The interposer 802 is coupled (e.g., mounted over) the PCB 204 through the plurality of second solder interconnects 219 (e.g., solder balls). As shown in
The plurality of interconnects 230 may include vias, traces, and/or pads. The interconnect 230g includes the interconnect 630g (e.g., pad), the interconnect 632g (e.g., trace), the interconnect 634g (e.g., via), and the interconnect 930g. The interconnect 230g may be a redistribution interconnect that redistributes signaling from the IC package 201 to other locations or components of the IC module 800. The interconnect 630g is coupled to the solder interconnect 217g. The interconnect 930g is coupled to the solder interconnect 219g. The interconnect 930h is coupled to the solder interconnect 219h. As mentioned above, an interconnect may include a via, a trace, a pad or a combination thereof.
It is noted that an interconnect comprising a trace and/or pad can be formed on the top surface, the bottom surface, or both, of the encapsulation layer 300. In some implementations, some interconnects from the plurality of interconnects 230 and/or some interconnects from the plurality of interconnects 430, may be configured to operate as an inductor (e.g., built-in inductor). An example of a built-in inductor in an interposer is further illustrated and described below in
Exemplary Fan Out Interposer Comprising a Plurality of Passive Components
As mentioned above, in some implementations, an interposer comprising embedded passive components may be a fan out interposer. For example, the interposer 602 and the interposer 802 may be a fan out interposer.
A fan out interposer includes a redistribution portion (e.g., a fan out portion) for fanning or routing of signaling to and from devices with different I/O pitches. A redistribution portion may redistribute signaling from I/O pads of a die or package to other locations or components of an integrated circuit (IC) module.
In some implementations, the first portion 1040 includes a plurality of first interconnects (not shown) that includes a first minimum pitch, and the second portion 1042 includes a plurality of second interconnects (not shown) that includes a second minimum pitch. In some implementations, the second minimum pitch is less than the first minimum pitch. The second portion 1042 is a perimeter portion of the interposer 1002.
Exemplary Sequence for Fabricating an Interposer Comprising a Plurality of Passive Components
In some implementations, providing/fabricating an interposer comprising a plurality of passive components includes several processes.
It should be noted that the sequence of
Stage 1, as shown in
Stage 2 illustrates a state after the first passive component 220, the second passive component 222, and the third passive component 224 are placed over the lamination layer 1101 and/or the carrier 1100. The first passive component 220, the second passive component 222, and the third passive component 224 may be placed using a pick and place tool.
Stage 3 illustrates a state after the encapsulation layer 300 is formed over the first passive component 220, the second passive component 222, and the third passive component 224. The encapsulation layer 300 may include a mold and/or an epoxy fill. In some implementations, the encapsulation layer 300 may be a litho-patternable layer. A litho-patternable layer/material that is a material that is photo etchable. That is, the litho-patternable layer/material is made of a material that can be etched and/or removed (e.g., through a lithography process) through the exposure of the material to a light source (e.g., ultraviolet (UV) light) through a mask (e.g., photomask). One advantage of a litho-patternable layer/material is that interconnects with lower pitch and/or spacing may be formed in the litho-patternable layer/material.
Stage 4 illustrates a state after the encapsulation layer 300, the first passive component 220, the second passive component 222, and the third passive component 224 are decoupled from the lamination layer 1101 and/or the carrier 1100.
Stage 5 illustrates a state after a portion of the encapsulation layer 300 is removed. In some implementations, a grinding process is used to remove a top portion of the encapsulation layer 300. In some implementations, the grinding process is an optional process.
Stage 6, as shown in
Stage 7 illustrates a state after one or more metal layers 1120 are formed. The one or more metal layers 1120 may include copper.
Stage 8 illustrates a state after the one or more metal layers 1120 are etched to form the plurality of interconnects 230 (e.g., interconnects 230b, 230d, 230e). In some implementations, a photo-etching process may be used to form the plurality of interconnects 230 from the one or more metal layers 1120. Stage 8 illustrates the interposer 202 that includes the encapsulation layer 300, the first passive component 220, the second passive component 222, the third passive component 224, and the plurality of interconnects 230.
Stage 9 illustrates a state after the plurality of first solder interconnects 217 and the plurality of second solder interconnects 219 are formed on the interposer 202. The plurality of first solder interconnects 217 and the plurality of second solder interconnects 219 are formed over the plurality of interconnects 230, the first passive component 220, the second passive component 222 and the third passive component 224. For example, the solder interconnect 217b is formed over the interconnect 230b, the solder interconnect 217d is formed over the interconnect 230d, the solder interconnect 217e is formed over the interconnect 230e, the solder interconnect 219b is formed over the first passive component 220, the solder interconnect 219d is formed over the interconnect 230d, and the solder interconnect 219e is formed over the second passive component 222.
In some implementations, the plurality of first solder interconnects 217 and the plurality of second solder interconnects 219 are formed using a solder printing process. In some implementations, the plurality of first solder interconnects 217 and the plurality of second solder interconnects 219 are solder paste.
Exemplary Sequence for Fabricating an Interposer Comprising a Plurality of Passive Components
In some implementations, providing/fabricating an interposer comprising a plurality of passive components includes several processes.
It should be noted that the sequence of
Stage 1, as shown in
Stage 2 illustrates a state after the first passive component 220 and the second passive component 222 are placed over the lamination layer 1101 and/or the carrier 1100. The first passive component 220 and the second passive component 222 may be placed using a pick and place tool.
Stage 3 illustrates a state after the encapsulation layer 300 is formed over the first passive component 220 and the second passive component 222. The encapsulation layer 300 may include a mold and/or an epoxy fill. In some implementations, the encapsulation layer 300 may be a litho-patternable layer. A litho-patternable layer/material that is a material that is photo etchable. That is, the litho-patternable layer/material is made of a material that can be etched and/or removed (e.g., through a lithography process) through the exposure of the material to a light source (e.g., ultraviolet (UV) light) through a mask (e.g., photomask). One advantage of a litho-patternable layer is that interconnects with lower pitch and/or spacing may be formed in the litho-patternable layer.
Stage 4 illustrates a state after the encapsulation layer 300, the first passive component 220 and the second passive component 222 are decoupled from the lamination layer 1101 and/or the carrier 1100.
Stage 5 illustrates a state after a portion of the encapsulation layer 300 is removed. In some implementations, a grinding process is used to remove a top portion of the encapsulation layer 300. In some implementations, the grinding process is an optional process.
Stage 6, as shown in
Stage 7 illustrates a state after one or more metal layers 1120 are formed. The one or more metal layers 1120 may include copper.
Stage 8 illustrates a state after the one or more metal layers 1120 are etched to form the plurality of interconnects 230 (e.g., interconnects 230d, 230e, 230g). In some implementations, a photo-etching process may be used to form the plurality of interconnects 230 from the one or more metal layers 1120. Stage 8 illustrates the interposer 802 that includes the encapsulation layer 300, the first passive component 220, the second passive component 222, the third passive component 224, and the plurality of interconnects 230.
Stage 9 illustrates a state after the plurality of first solder interconnects 217 and the plurality of second solder interconnects 219 are formed on the interposer 802. The plurality of first solder interconnects 217 and the plurality of second solder interconnects 219 are formed over the plurality of interconnects 230, the first passive component 220 and the second passive component 222. For example, the solder interconnect 217g is formed over the interconnect 230g, the solder interconnect 217d is formed over the interconnect 230d, the solder interconnect 217e is formed over the interconnect 230e, the solder interconnect 219g is formed over the interconnect 230g, the solder interconnect 219d is formed over the interconnect 230d, and the solder interconnect 219e is formed over the interconnect 830e.
In some implementations, the plurality of first solder interconnects 217 and the plurality of second solder interconnects 219 are formed using a solder printing process. In some implementations, the plurality of first solder interconnects 217 and the plurality of second solder interconnects 219 are solder paste.
Exemplary Method for Fabricating an Interposer Comprising a Plurality of Passive Components
In some implementations, providing/fabricating an interposer comprising a plurality of passive components includes several processes.
It should be noted that the flow diagram of
The method places (at 1305) at least one passive component (e.g., first passive component 220) over a carrier (e.g., carrier 1100) and/or a lamination layer (e.g., lamination layer 1101). In some implementations, the lamination layer may be an adhesive layer.
The method forms (at 1310) an encapsulation layer (e.g., encapsulation layer 300) over the at least one passive component. The encapsulation layer may include a mold and/or an epoxy fill. In some implementations, the encapsulation layer may be a litho-patternable layer. A litho-patternable layer/material that is a material that is photo etchable. That is, the litho-patternable layer/material is made of a material that can be etched and/or removed (e.g., through a lithography process) through the exposure of the material to a light source (e.g., ultraviolet (UV) light) through a mask (e.g., photomask).
The method decouples (at 1315) the encapsulation layer (e.g., encapsulation layer 300) and the at least one passive component (e.g., first passive component 220) from the lamination layer (e.g., lamination layer 1101) and/or the carrier (e.g., carrier 1100).
The method optionally removes (at 1320) a portion of the encapsulation layer (e.g., encapsulation layer 300). In some implementations, a grinding process is used to remove a top portion of the encapsulation layer.
The method forms (at 1325) a plurality of cavities 1110 in the encapsulation layer. Different implementations may use different processes for forming the plurality of cavities (e.g., cavities 1110). In some implementations, a laser process is used to form the cavities. In some implementations, a photo-etching process is used to form the cavities.
The method forms (at 1330) one or more metal layers (e.g., metal layers 1120) in/on the encapsulation layer. The metal layers may include copper.
The method selectively removes (at 1335) portions of the metal layer to form a plurality of interconnects (e.g., plurality of interconnects 230). In some implementations, a photo-etching process may be used to form the plurality of interconnects from the one or more metal layers.
The method forms (at 1340) a plurality of solder interconnects on the interposer. For example, the method may form (at 1340) the plurality of first solder interconnects 217 and the plurality of second solder interconnects 219 on the interposer 202 and/or the passive component. In some implementations, the plurality of solder interconnects are formed using a solder printing process. In some implementations, the plurality of solder interconnects are solder paste, in some implementations, the plurality of solder interconnects is optional to fabricate the interposer. In some implementations, the solder interconnects may be formed or provided during a later or earlier state of a fabrication process of an integrated circuit (IC) module (e.g., IC module 200).
Exemplary Sequence for Fabricating an Integrated Circuit (IC) Module Comprising an Interposer Comprising a Plurality of Passive Components
In some implementations, providing/fabricating an integrated circuit (IC) module that includes an interposer comprising a plurality of passive components includes several processes.
It should be noted that the sequence of
Stage 1 illustrates a state after an integrated circuit (IC) package 201 is provided. The IC package 201 includes the die 210, the package substrate 212, the encapsulation layer 214, and the plurality of solder interconnects 215. The encapsulation layer 214 at least partially encapsulates the die 210.
Stage 2 illustrates a state after the interposer 602 is provided. The interposer 602 includes the encapsulation layer 300, the first passive component 220, the second passive component 222, and the plurality of interconnects 230. The interposer 602 also includes the plurality of first solder interconnects 217 and the plurality of second solder interconnects 219. In some implementations, the plurality of first solder interconnects 217 and the plurality of second solder interconnects 219 are formed using a solder printing process, in some implementations, the plurality of first solder interconnects 217 and the plurality of second solder interconnects 219 are solder paste.
Stage 3 illustrates a state after the IC package 201 is coupled to the interposer 602 through the plurality of first solder interconnects 217. In some implementations, stage 3 illustrates a state after a reflow process. The plurality of first solder interconnects 217 is coupled to the package substrate 212 of the IC package 201.
Stage 4 illustrates a state after a printed circuit board (PCB) 204 is provided.
Stage 5 illustrates a state after the IC package 201 and the interposer 602 is coupled to the PCB 204. As shown at stage 5, the interposer 602 is coupled to the PCB 204 through the plurality of second solder interconnects 219. In some implementations, stage 5 illustrates a state after a reflow process (e.g., second reflow process). In some implementations, stage 5 illustrates the integrated circuit (IC) module 600 that includes the IC package 201, the interposer 602 and the PCB 204.
It should be noted that the sequence of
Stage 1 illustrates a state after an integrated circuit (IC) package 201 is provided. The IC package 201 includes the die 210, the package substrate 212, the encapsulation layer 214, and the plurality of solder interconnects 215. The encapsulation layer 214 at least partially encapsulates the die 210. The IC package 201 also includes a plurality of first solder interconnects 217 (e.g., solder balls), which is coupled to the package substrate 212. In some implementations, the plurality of first solder interconnects 217 may be coupled to interconnects bumps (not shown) that are coupled to the package substrate 212.
Stage 2 illustrates a state after the interposer 602 is provided. The interposer 602 includes the encapsulation layer 300, the first passive component 220, the second passive component 222, and the plurality of interconnects 230. The interposer 602 also includes the plurality of second solder interconnects 219. Thus, the interposer 602 at stage 2 in
Stage 3 illustrates a state after the IC package 201 is coupled to the interposer 602 through the plurality of first solder interconnects 217. In some implementations, stage 3 illustrates a state after a reflow process.
Stage 4 illustrates a state after a printed circuit board (PCB) 204 is provided.
Stage 5 illustrates a state after the IC package 201 and the interposer 602 is coupled to the PCB 204. As shown at stage 5, the interposer 602 is coupled to the PCB 204 through the plurality of second solder interconnects 219. In some implementations, stage 5 illustrates a state after a reflow process (e.g., second reflow process). In some implementations, stage 5 illustrates the integrated circuit (IC) module 600 that includes the IC package 201, the interposer 602 and the PCB 204.
It should be noted that the sequence of
Stage 1 illustrates a state after an integrated circuit (IC) package 201 is provided. The IC package 201 includes the die 210, the package substrate 212, the encapsulation layer 214, and the plurality of solder interconnects 215. The encapsulation layer 214 at least partially encapsulates the die 210. The IC package 201 also includes a plurality of first solder interconnects 217 (e.g., solder balls), which is coupled to the package substrate 212. In some implementations, the plurality of first solder interconnects 217 may be coupled to interconnects bumps (not shown) that are coupled to the package substrate 212.
Stage 2 illustrates a state after the interposer 602 is provided. The interposer 602 includes the encapsulation layer 300, the first passive component 220, the second passive component 222, and the plurality of interconnects 230.
Stage 3 illustrates a state after the IC package 201 is coupled to the interposer 602 through the plurality of first solder interconnects 217. In some implementations, stage 3 illustrates a state after a reflow process. The plurality of first solder interconnects 217 is coupled to the package substrate 212 of the IC package 201.
Stage 4 illustrates a state after a printed circuit board (PCB) 204 is provided. The PCB 204 also includes the plurality of second solder interconnects 219 (e.g., solder balls).
Stage 5 illustrates a state after the IC package 201 and the interposer 602 is coupled to the PCB 204. As shown at stage 5, the interposer 602 is coupled to the PCB 204 through the plurality of second solder interconnects 219. In some implementations, stage 5 illustrates a state after a reflow process (e.g., second reflow process). In some implementations, stage 5 illustrates the integrated circuit (IC) module 600 that includes the IC package 201, the interposer 602 and the PCB 204.
Exemplary Fan Out interposer Comprising Built-In Inductors
As mentioned above, in some implementations, an interposer may include a built-in inductor. In some implementations, a built-in inductor is an inductor comprising a plurality of first interconnects formed in/on the interposer. In some implementations, a built-in inductor may be more practical and/or cost effective than providing an off the shelf inductor (e.g., third passive component) in the interposer. For example, a built-in inductor can be formed in the interposer with a lower height than an off the shelf inductor. Moreover, a built-in inductor may be more customizable than an off the shelf inductor. In some implementations, a built-in inductor of an interposer is an inductor that is fabricated during the same fabrication process as the interposer. That is, a built-in inductor of an interposer may be an inductor that is fabricated as the interposer is being fabricated. In some implementations, an off the shelf inductor of an interposer, is an inductor that is fabricated using a separate fabrication process than the interposer, and is embedded in the interposer after the off the shelf inductor has been fabricated.
The interposer 1702 includes the encapsulation layer 300, the first passive component 220, the second passive component 222, the plurality of interconnects 230 (e.g., interconnects 230i-230m), the first inductor 1710, and the second inductor 1720, The first inductor 1710 includes a plurality of first interconnects (e.g., interconnect 230i, interconnect 230j). Thus, the interconnect 230i and the interconnect 230j are configured to operate as a first inductor 1710. The second inductor 1720 includes a plurality of second interconnects (e.g., interconnect 230k, interconnect 230m). Thus, the interconnect 230k and the interconnect 230m are configured to operate as a second inductor 1720. The first inductor 1710 and the second inductor 1720 may be built-in inductors.
The interconnect 230i may include a trace and a pad. The interconnect 230j may include a trace, a pad and a via. The interconnect 230i is formed at least on a first surface (e.g., top surface) of the encapsulation layer 300, and the interconnect 230j is formed at least on a second surface (e.g., bottom surface) of the encapsulation layer 300. The interconnect 230j may also be formed in the encapsulation layer 300 (e.g., as a via that traverses the encapsulation layer 300). Thus, a portion (e.g., trace, pad) of the interconnect 230j is on a surface of the encapsulation layer 300, and another portion (e.g., via) of the interconnect 230j traverses the encapsulation layer 300. A solder interconnect 219j is formed over the interconnect 230j.
The interconnect 230k may include a trace, a pad and a via. The interconnect 230m may include a trace and a pad. The interconnect 230k is formed at least on a first surface (e.g., top surface) of the encapsulation layer 300, and the interconnect 230m is formed at least on a second surface (e.g., bottom surface) of the encapsulation layer 300. The interconnect 230k may also be formed in the encapsulation layer 300 (e.g., as a via that traverses the encapsulation layer 300). Thus, a portion (e.g., trace, pad) of the interconnect 230k is on a surface of the encapsulation layer 300 and another portion (e.g., via) of the interconnect 230k traverses the encapsulation layer 300. A solder interconnect 219k is formed over the interconnect 230k.
The first portion 1040 is a portion of the interposer 1702 that includes low density interconnects. The second portion 1042 is a portion of the interposer 1702 that includes high density interconnects. That is, the pitch and/or spacing of the interconnects (e.g., interconnect 230i) from the plurality of interconnects 230 in the second portion 1042, is greater than the pitch and/or spacing of the interconnects from the plurality of interconnects 230 in the first portion 1040. In some implementations, the second portion 1042 of the interposer 1002 is the fan out portion of the interposer 1002.
Exemplary Electronic Devices
One or more of the components, processes, features, and/or functions illustrated in
The word “exemplary” is used herein to mean “serving as an example, instance, or illustration.” Any implementation or aspect described herein as “exemplary” is not necessarily to be construed as preferred or advantageous over other aspects of the disclosure. Likewise, the term “aspects” does not require that all aspects of the disclosure include the discussed feature, advantage or mode of operation. The term “coupled” is used herein to refer to the direct or indirect coupling between two objects. For example, if object A physically touches object B, and object B touches object C, then objects A and C may still be considered coupled to one another—even if they do not directly physically touch each other.
Also, it is noted that various disclosures contained herein may be described as a process that is depicted as a flowchart, a flow diagram, a structure diagram, or a block diagram. Although a flowchart may describe the operations as a sequential process, many of the operations can be performed in parallel or concurrently. In addition, the order of the operations may be re-arranged. A process is terminated when its operations are completed.
The various features of the disclosure described herein can be implemented in different systems without departing from the disclosure. It should be noted that the foregoing aspects of the disclosure are merely examples and are not to be construed as limiting the disclosure. The description of the aspects of the present disclosure is intended to be illustrative, and not to limit the scope of the claims. As such, the present teachings can be readily applied to other types of apparatuses and many alternatives, modifications, and variations will be apparent to those skilled in the art.
| Number | Name | Date | Kind |
|---|---|---|---|
| 7081650 | Palanduz | Jul 2006 | B2 |
| 7339798 | Chakravorty | Mar 2008 | B2 |
| 7504283 | Dunne | Mar 2009 | B2 |
| 7952194 | Nair et al. | May 2011 | B2 |
| 8139368 | Nomura | Mar 2012 | B2 |
| 8273603 | Racz | Sep 2012 | B2 |
| 9048125 | Paek et al. | Jun 2015 | B2 |
| 20080012154 | Chang | Jan 2008 | A1 |
| 20100220448 | Nomura | Sep 2010 | A1 |
| 20100230806 | Huang et al. | Sep 2010 | A1 |
| 20110147917 | England et al. | Jun 2011 | A1 |
| 20120286407 | Choi | Nov 2012 | A1 |
| 20130171752 | Val | Jul 2013 | A1 |
| 20130201616 | Arnold | Aug 2013 | A1 |
| 20140092576 | Lucero | Apr 2014 | A1 |
| 20140106511 | Juskey | Apr 2014 | A1 |
| 20140145300 | Bhagavat | May 2014 | A1 |
| 20140264789 | Yang et al. | Sep 2014 | A1 |
| 20140283379 | Russell | Sep 2014 | A1 |
| 20140367854 | Zhao | Dec 2014 | A1 |
| 20150028463 | Ng | Jan 2015 | A1 |
| 20150071333 | Zhou et al. | Mar 2015 | A1 |
| 20150137338 | Lin et al. | May 2015 | A1 |
| 20150206866 | Yu | Jul 2015 | A1 |
| 20150237732 | Velez et al. | Aug 2015 | A1 |
| Entry |
|---|
| International Search Report and Written Opinion—PCT/US2016/049774—ISA/EPO—dated Nov. 8, 2016. |
| Number | Date | Country | |
|---|---|---|---|
| 20170064837 A1 | Mar 2017 | US |
