BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a schematic diagram of the conventional liquid crystal display, showing the driving IC connecting the glass substrate by anisotropic conductive film;
FIG. 2 is a similar to FIG. 1, showing the conductive particles causing a bad electrical connection;
FIG. 3 is a schematic diagram of the conventional liquid crystal display, showing the driving IC connecting the glass substrate by non-conductive film;
FIG. 4 is a schematic diagram of a first preferred embodiment of the present invention, showing the preassembled liquid crystal display package;
FIG. 5 is an exploded view of the first preferred embodiment of the present invention, showing the liquid crystal display package going to be assembled;
FIG. 6 is a schematic diagram of the first preferred embodiment of the present invention, showing the assembled liquid crystal display package;
FIG. 7 shows the bump pad made of tin/chromium alloy;
FIG. 8 is a schematic diagram of a second preferred embodiment of the present invention, showing the flip chip bump with a closed chamber therein;
FIG. 9 is a sectional view of the second preferred embodiment of the present invention;
FIG. 10 is similar to FIG. 9, showing the lip chip bump having two lateral bores communicated with the chamber;
FIG. 11 shows an insulating member received in the chamber of FIG. 9;
FIG. 12 shows the bump pad with closed chamber therein;
FIG. 13 shows the bump pad having two lateral bores communicated with the chamber; and
FIG. 14 shows an insulating member received in the chamber of the bump pad of FIG 12.
DETAILED DESCRIPTION OF THE INVENTION
FIGS. from 4 to 6 show an optical display package 10 of the first preferred embodiment of the present invention and the package method.
The optical display package 10 includes a substrate 12 and an integrated circuit chip 14.
The substrate 12 includes a glass plate 121, a plurality of oxide wires 122 and a plurality of flip chip bumps 123. The oxide wires 122, which ITO film, are provided on the glass plate 121, and the flip chip bumps 123 are protrusions on the oxide wires 122 with an edge side 123a respectively. In the present invention, the flip chip bumps 123 are made of gold.
The integrated circuit chip 14 is provided with bump pads 141 associated with the flip chip bumps 123 respectively. In the present invention, the bump pads 141 are made of gold with an edge side 141a respectively.
The optical display package 10 of the present invention has the integrated circuit chip 14 bonded to the substrate 12 by flip chip technique. As shown in FIG. 4, the bump pads 141 of the integrated circuit chip 14 are aligned with the flip chip bumps 123 of the substrate 12, then a non-conductive film 16 is provided between the integrated circuit chip 14 and the substrate 12, as shown in FIG. 5. A pressure F less than 500 MPa is applied on the integrated circuit chip 14 to contact the edge sides 123a of the flip chip bumps 123 of the substrate 12 with the edge sides 141a of the bump pads 141 of the integrated circuit chip 14 respectively. In the same time, the integrated circuit chip 14 and the substrate 12 are heated in a predetermined temperature less than 400° C. to make the bump pads 141 and the flip chip bumps 123 thermoplastic deformation at contact portions thereof, and it occurs atom-stage bonding at the edge sides 141a and 123a. In other words, it occurs eutectic bonding between the gold atoms of the edge sides 141a and 123a by forming chemical bonds therebetween. After that, the temperature is lowed to have a firm bonding of the bump pads 141 and the flip chip bumps 123 and the solidified non-conductive film 16 to achieve the results of package and electrical connection.
In conclusion, the present invention provides an electrical conduction between two fine electric devices by direct connection of the bump pads 141 and the flip chip bumps 123. The eutectic bonding is occurred between the bump pads 141 and the flip chip bumps 123 under a predetermined bonding temperature. Such structure overcomes the short problem of the anisotropic conductive film. Furthermore, the non-conductive film 16 used the present invention is cheaper than the anisotropic conductive film. In addition, the present invention provides the flip chip bumps 123 on the oxide wires 122 for eutectic bonding. The bump pads 141 are inserted into the flip chip bumps 123 respectively when the integrated circuit chip 14 is pressed onto the substrate 12 so that the present invention has no break problem of the conventional combination type bumps 7 shown in FIG. 3. As a result, the present invention uses the eutectic bonding to electrically conduct two electric devices, and the electric devices have well conduction.
In the present invention, the bump pads 141 and the flip chip bumps 123 are made of gold, in fact, the bump pads 141 and the flip chip bumps 123 may be made of silver, copper, tin, nickel, aluminum, lead, and the alloy thereof. For eutectic bonding, the bonding temperature (melting temperature) should reach a temperature making two bonding materials generating chemical bonds for bonding. For example, when the bump pad is made of gold and the flip chip bump is made of tin (the melting temperature of tin is lower than that of gold), the bonding temperature (melting temperature of tin is 231.97° C.) of eutectic bonding has to spread the tin atoms to the gold atoms and generate chemical bonds for bonding. FIG. 7 shows a combination type flip chip bump 17, which has a chromium layer 172 covered by a tin layer 171. The chromium layer 172 has well conduction to be a well bonding interlayer between the tin layer 171 and the oxide wire 122. If the bump pad 141 is made of gold, the bonding temperature for eutectic bonding is associated with the melting temperature of tin.
As shown in FIG. 8 and FIG. 9, an optical display package 20 of the second preferred embodiment, which is similar to the first preferred embodiment, includes a substrate 22 and an integrated circuit chip 24. The substrate 22 includes a glass plate 221 and a plurality of oxide wires 222. The integrated circuit chip 24 includes a plurality of bump pads 241. The different parts of the second preferred embodiment include:
Each of flip chip bumps 223 on the oxide wires 222 has a chamber 223a therein. In the hot press of the substrate 22 and the integrated circuit chip 24, eutectic bonding is occurred between edge sides 223b and 241a of the flip chip bumps 223 and the bump pads 241. In the same time, the chambers 223a help the flip chip bumps 223 extension and deformation to increase the contact area and get a well conduction condition. FIG. 10 shows the flip chip bump 223 further includes two lateral bores 223c communicated with the chamber 223a that escape gas in the chamber out when the flip chip bump 223 is pressed by the bump pad 241.
In addition, FIG. 11 shows the flip chip bump 223 further includes an insulating member 224 received in the chamber 223a. The insulating member 224 is made of a flexible material to absorb the pressure of hot press that reduces the impact of the bump pad 241 on the flip chip bump 223 and keeps a well eutectic bonding condition.
It is noted that the structures of the flip chip bump shown in FIG. 6 to FIG. 11 may be incorporated in the bump pads of the integrated circuit chip. FIG. 12 shows a bump pad 30 having a chamber 32 therein. FIG. 13 shows a bump pad 34 having lateral bores 36 communicated with a chamber 35 therein. FIG. 14 shows a bump pad 38 having an insulating member 39 therein. Above structures do not affect the eutectic bonding of the flip chip bumps and the bump pads, they increase the stability of eutectic bonding.
The description above is a few preferred embodiments of the present invention and the equivalence of the present invention is still in the scope of the claim of the present invention.