Claims
- 1. A fine alloy wire for forming bump electrodes using a wire bonder, said fine wire comprising a Pb alloy comprising Pb-Sn-Cu including 10 wt % of Sn, 0.9 wt % of Cu, and 0.001 wt % to 50 wt % of at least one additional element selected from the group consisting of In, Be, B, C, Mg, Al, Si, P, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Ga, Ge, Se, Zr, Nb, Mo, Pd, Ag, Cd, Sb, Te, Ir, Pt, Au, Tl, Bi, and mixtures thereof, and a balance of Pb, and said fine wire is made under a rapid cooling and condensation process having a time of 10.sup.3 .degree. to 10.sup.5 .degree. C./sec.
- 2. A fine alloy wire for forming bump electrodes using a wire bonder, said fine wire comprising a Pb alloy comprising Pb-Ag-Cu including 3 wt % of Ag, 0.9 wt % of Cu, and 0.001 wt % to 50 wt % of at least one additional element selected from the group consisting of Sn, In, Be, B, C, Mg, Al, Si, P, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Ga, Ge, Se, Zr, Nb, Mo, Pd, Cd, Sb, Te, Ir, Pt, Au, Tl, Bi, and mixtures thereof, and a balance of Pb, and said fine wire is made under a rapid cooling and condensation process having a time of 10.sup.3 .degree. to 10.sup.5 .degree. C./sec.
- 3. A fine alloy wire for forming bump electrodes using a wire bonder, said fine wire comprising a Pb alloy comprising Pb-Sn-Ag-Cu including 0.3 to 50 wt % of Sn, 0.5 to 10 wt % of Ag, 0.1 to 0.9 wt % of Cu, and 0.001 wt % to 50 wt % of at least one additional element selected from the group consisting of In, Be, B, C, Mg, Al, Si, P, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Ga, Ge, Se, Zr, Nb, Mo, Pd, Cd, Sb, Te, Ir, Pt, Au, Tl, Bi, and mixtures thereof, and a balance of Pb, and said fine wire is made under a rapid cooling and condensation process having a time of 10.sup.3 .degree. to 10.sup.5 .degree. C./sec.
- 4. The fine alloy wire according to claim 3, wherein said Pb-Sn-Ag-Cu comprises 0.3 to 5 wt % of Sn, 0.5 to 5 wt % of Ag, 0.1 to 0.9 wt % of Cu, 0.001 wt % to 50 wt % of at least one additional element selected from the group consisting of In, Be, B, C, Mg, Al, Si, P, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Ga, Ge, Se, Zr, Nb, Mo, Pd, Cd, Sb, Te, Ir, Pt, Au, Tl, Bi, and mixtures thereof, and a balance of Pb.
- 5. A fine alloy wire for forming bump electrodes using a wire bonder, said fine wire comprising a Pb alloy comprising Pb-Sn-Cr-Cu including 0.5 to 2 wt % of Sn, 3 wt % of Cr, 0.9 wt % of Cu, and 0.001 wt % to 50 wt % of at least one additional element selected from the group consisting of In, Be, B, C, Mg, Al, Si, P, Ca, Ti, V, Mn, Fe, Co, Ni, Zn, Ga, Ge, Se, Zr, Nb, Mo, Pd, Ag, Cd, Sb, Te, Ir, Pt, Au, Tl, Bi, and mixtures thereof, and a balance of Pb, and said fine wire is made under a rapid cooling and condensation process having a time of 10.sup.3 .degree. to 10.sup.5 .degree. C./sec.
- 6. A fine alloy wire for forming bump electrodes using a wire bonder, said fine wire comprising a Pb alloy comprising Pb-Sn-Ag-Ni including 0.5 to 5 wt % of Sn, 2 to 5 wt % of Ag, 0.1 to 5 wt % of Ni, and 0.001 wt % to 50 wt % of at least one additional element selected from the group consisting of In, Be, B, C, Mg, Al, Si, P, Ca, Ti, V, Cr, Mn, Fe, Co, Cu, Zn, Ga, Ge, Se, Zr, Nb, Mo, Pd, Cd, Sb, Te, Ir, Pt, Au, Tl, Bi, and mixtures thereof, and a balance of Pb, and said fine wire is made under a rapid cooling and condensation process having a time of 10.sup.3 .degree. to 10.sup.5 .degree. C./sec.
- 7. A fine alloy wire for forming bump electrodes using a wire bonder, said fine wire comprising a Pb alloy comprising Pb-Sn-Sb including 1 to 50 wt % of Sn, 1 to 8 wt % of Sb, and 0.001 wt % to 50 wt % of at least one additional element selected from the group consisting of In, Be, B, C, Mg, Al, Si, P, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Se, Zr, Nb, Mo, Pd, Ag, Cd, Te, Ir, Pt, Au, Tl, Bi, and mixtures thereof, and a balance of Pb, and said fine wire is made under a rapid cooling and condensation process having a time of 10.sup.3 .degree. to 10.sup.5 .degree. C./sec.
- 8. A fine alloy wire for forming bump electrodes using a wire bonder, said fine wire comprising a Pb alloy comprising Pb-Sn-Sb-Ag including 1 to 50 wt % of Sn, 1 to 8 wt % of Sb, 2 to 10 wt % of Ag, and 0.001 wt % to 50 wt % of at least one additional element selected from the group consisting of In, Be, B, C, Mg, Al, Si, P, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Se, Zr, Nb, Mo, Pd, Ag, Cd, Te, Ir, Pt, Au, Tl, Bi, and mixtures thereof, and a balance of Pb, and said fine wire is made under a rapid cooling and condensation process having a time of 10.sup.3 .degree. to 10.sup.5 .degree. C./sec.
- 9. The fine alloy wire according to claim 8, wherein said Pb-Sn-Sb-Ag comprises 1 to 5 wt % of Sn, 1 to 8 wt % of Sb, 2 to 5 wt % of Ag, and 0.001 wt % to 50 wt % of at least one additional element selected from the group consisting of In, Be, B, C, Mg, Al, Si, P, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Se, Zr, Nb, Mo, Pd, Ag, Cd, Te, Ir, Pt, Au, Tl, Bi, and mixtures thereof, and a balance of Pb.
- 10. A fine alloy wire for forming bump electrodes using a wire bonder, said fine wire comprising a Pb alloy comprising Pb-Sn-Ag-Cu-Sb including 1 to 50 wt % of Sn, 2 to 10 wt % of Ag, 0.1 to 0.9 wt % of Cu, 1 to 8 wt % of Sb, and 0.001 wt % to 50 wt % of at least one additional element selected from the group consisting of In, Be, B, C, Mg, Al, Si, P, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Ga, Ge, Se, Zr, Nb, Mo, Pd, Ag, Cd, Te, Ir, Pt, Au, Tl, Bi, and mixtures thereof, and a balance of Pb, and said fine wire is made under a rapid cooling and condensation process having a time of 10.sup.3 .degree. to 10.sup.5 .degree. C./sec.
- 11. The fine alloy wire according to claim 10, wherein said Pb-Sn-Ag-Cu-Sb comprises 1 to 5 wt % Sn, 2 to 5 wt % Ag, 0.1 to 0.9 wt % Cu, 1 to 8 wt % Sb, and 0.001 wt % to 50 wt % of at least one additional element selected from the group consisting of In, Be, B, C, Mg, Al, Si, P, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Ga, Ge, Se, Zr, Nb, Mo, Pd, Ag, Cd, Te, Ir, Pt, Au, Tl, Bi, and mixtures thereof, and a balance of Pb.
- 12. A fine alloy wire for forming bump electrodes using a wire bonder, said fine wire comprising a Pb alloy comprising Pb-Sn-Au-Sb-Cu including 2 to 50 wt % of Sn, 0.001 to 0.5 wt % of Au, 0.01 to 5 wt % of Sb, 0.01 to 1.5 wt % of Cu, and 0.001 wt % to 50 wt % of at least one additional element selected from the group consisting of In, Be, B, C, Mg, Al, Si, P, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Ga, Ge, Se, Zr, Nb, Mo, Pd, Ag, Cd, Te, Ir, Pt, Tl, Bi, and mixtures thereof, and a balance of Pb, and said fine wire is made under a rapid cooling and condensation process having a time of 10.sup.3 .degree. to 10.sup.5 .degree. C./sec.
- 13. A fine alloy wire for forming bump electrodes using a wire bonder, said fine wire comprising a Pb alloy comprising Pb-In-Au including 5 to 50 wt % of In, 0.1 to 5 wt % of Au, and 0.001 wt % to 50 wt % of at least one additional element selected from the group consisting of Sn, Be, B, C, Mg, Al, Si, P, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Se, Zr, Nb, Mo, Pd, Ag, Cd, Sb, Te, Ir, Pt, Tl, Bi, and mixtures thereof, and a balance of Pb, and said fine wire is made under a rapid cooling and condensation process having a time of 10.sup.3 .degree. to 10.sup.5 .degree. C./sec.
- 14. A fine alloy wire for forming bump electrodes using a wire bonder, said fine wire comprising a Pb alloy comprising Pb-In-Cu including 5 to 50 wt % of In, 0.1 to 5 wt % of Cu, and 0.001 wt % to 50 wt % of at least one additional element selected from the group consisting of Sn, Be, B, C, Mg, Al, Si, P, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Se, Zr, Nb, Mo, Pd, Ag, Cd, Sb, Te, Ir, Pt, Au, Tl, Bi, and mixtures thereof, and a balance of Pb, and said fine wire is made under a rapid cooling and condensation process having a time of 10.sup.3 .degree. to 10.sup.5 .degree. C./sec.
Priority Claims (3)
Number |
Date |
Country |
Kind |
62-21202 |
Jan 1987 |
JPX |
|
62-130595 |
May 1987 |
JPX |
|
62-193340 |
Jul 1987 |
JPX |
|
Parent Case Info
This application is a continuation of application No. 07/970,232, filed Oct. 30, 1992, now U.S. Pat. No. 5,384,090 which is a continuation of application Ser. No. 07/139,808, filed Dec. 30, 1987, now abandoned.
US Referenced Citations (10)
Foreign Referenced Citations (14)
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2093 |
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JPX |
17643 |
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JPX |
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JPX |
61-219159 |
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JPX |
222140 |
Oct 1986 |
JPX |
63-168036 |
Jul 1988 |
JPX |
63-168031 |
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4174527 |
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Non-Patent Literature Citations (4)
Entry |
English Language Abstract of Japanese Patent Document No. 63-168031. |
English Language Abstract of Japanese Patent Document No. 63-168036. |
English Language Abstract of Japanese Patent Document No. 4-174527. |
English Language Abstract of Japanese Patent Document No. 53-86572. |
Continuations (2)
|
Number |
Date |
Country |
Parent |
970232 |
Oct 1992 |
|
Parent |
139808 |
Dec 1987 |
|