Not Applicable
Not Applicable
1. Field of the Invention
Aspects of the present invention relate to a lead frame, a semiconductor device and a fabricating method related thereto.
2. Description of the Related Art
In general, a lead frame for a semiconductor device is fabricated by performing a mechanical stamping or chemical etching process with respect to a metal strip. The lead frame for a semiconductor device simultaneously serves as a lead for connecting a semiconductor die to an external circuit and as a frame for fixing a semiconductor device to an external device.
Lead frames for semiconductor devices may be classified into a copper lead frame (copper:iron:phosphorus=99.8:0.01:0.025), a copper alloy lead frame (copper:chrome:tin:zinc=99:0.25:0.25:0.22), an alloy-42 lead frame (iron:nickel=58:42), and the like. Semiconductor devices using such lead frames are used for a dual inline package (DIP) using a through-hole mounting method, a quad flat package (QFP) and a small outline package (SOP) using a surface mounting method, and the like.
However, since leads with a predetermined length protrude to the outside through the side of an encapsulant, the size of a semiconductor device increases and the number of input/output pins is small. That is, as state of the art semiconductor dies have been highly integrated and multi-functional, a large number of input/output pins are required, but it is difficult to satisfy such requirements with the lead frame.
In order to solve this problem, there has been developed a semiconductor device used for a ball grid array (BGA) or pin grid array package using a laminate, tape or film type circuit board. Since, in these semiconductor devices, a plurality of solder balls or metal pins are not area-arrayed on the side of an encapsulant but rather are on a bottom of the encapsulant (i.e., a bottom of a circuit board), such semiconductor devices can provide a relatively large number of input/output pins.
However, such semiconductor devices have high-priced circuit boards and a lower dissipation and electrical performance than semiconductor devices using lead frames. That is, since a semiconductor die is directly mounted on a die pad formed of a copper material, the semiconductor devices using lead frames have an excellent dissipation performance. Also, since the die pad uses itself as a ground region for a signal lead, the semiconductor devices using lead frames can enhance electrical performance. However, semiconductor devices using circuit boards generally are incapable of providing the same advantages.
In accordance with the present invention, there is provided a lead frame, a semiconductor device and a fabrication method related to the semiconductor device. Since the lead frame has a land connecting bar, an upper surface of which is half-etched, the land connecting bar is more easily removed by a blade than a conventional land connecting bar in a fabrication process for the semiconductor device. Accordingly, stress applied to the lands when the land connecting bar is removed is reduced, and a flatness of the lands is maintained. Also, first and second lands constituting the lands are alternately formed with the land connecting bar, leads are alternately formed with the second lands, and wire bonding regions of the leads are positioned on a plane higher than the second lands. Accordingly, an interval between the conductive wires can be constantly maintained and the conductive wires have different traces, thus preventing a short between the conductive wires due to wire sweeping in an encapsulation process.
The present invention will be more apparent from the following detailed description taken in conjunction with the accompanying drawings.
These, as well as other features of the present invention, will become more apparent upon reference to the drawings wherein:
Common reference numerals are used throughout the drawings and the detailed description to indicate the same elements.
Reference will now be made in detail to the present embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the like elements throughout. The embodiments are described below in order to explain the present invention by referring to the Figures.
Referring to
As shown in
The die pad 110 is formed roughly in the shape of a rectangular plate to have four sides and four corners. In the fabrication process of the semiconductor device, an adhesive is coated on the die pad 110, and a semiconductor die is attached on the die pad 110.
Also, the die pad 110 may have locking projections 111 protruding outwardly at a predetermined length from the respective sides and corners thereof. A lower surface of each of the locking projections 111 may be half-etched. In
The tie bars 120 protrude outwardly from the four corners of the die pad 110. That is, the tie bars 120 extend outwardly and diagonally from the respective corners of the die pad 110. First and second downsets 121 and 122 bent upwardly are formed in each of the tie bars 120. Hence, an outer portion of the first downset 121 in each of the tie bars 120 is positioned higher than the die pad 110. That is, only an inner portion of the first downset 121 in each of the tie bars 120 extends in the same plane as the die pad 110.
The land connecting bar 130 is positioned at one end of the tie bars 120, and the respective tie bars 120 are connected to one another through the land connecting bar 130. The land connecting bar 130 is formed roughly in the shape of a quadrangular ring with four sides and four corners. Also, the land connecting bar 130 is formed to be roughly in parallel with respective sides of the die pad 110 and to surround the die pad 110.
As shown in
That is, since the upper surface of the land connecting bar 130 is half-etched to have a relatively thinner thickness than other portions, it is easily removed by a blade in a subsequent process. Accordingly, when the land connecting bar 130 is removed, it is possible to reduce stress applied to the lands 140. As a result, it is possible to solve a problem regarding the flatness of lands being deviated or distorted due to stress applied when a conventional land connecting bar is removed.
The lands 140 are formed at a side of the land connecting bar 130 therealong. Also, the lands 140 are arranged in a zigzag form with respect to the land connecting bar 130. Each of the lands 140 may include first and second lands 141 and 142 protruding in opposite directions in an offset relationship to each other from the land connecting bar 130.
The first lands 141 have a predetermined pitch from the land connecting bar 130 and protrude in the direction of the die pad 110. Also, the first lands 141 may be formed to alternate with the locking projections 111 as shown, though being spaced apart from the locking projections 111 of the die pad 110. By arranging the first lands 141 as described above, the first lands 141 are formed close to the die pad 110, thus reducing the length of conductive wires to be bonded to the first lands 141. Each of the first lands 141 has a lower surface and an end portion, and a locking projection 141a which is defined by forming a half-etched portion in the lower surface at the end portion thereof. Thus, since an encapsulant covers the locking projection 141a when an encapsulation process is performed, adhesion between the first lands 141 and the encapsulant increases.
The second lands 142 have a predetermined pitch from the land connecting bar 130 and protrude in the direction of the dambar 150. Also, the second lands 142 are formed to correspond to and be aligned with respective spaces between the first lands 141. That is, the second lands 142 are alternately formed with the first lands 141. By arranging the second lands 142 as described above, an interval between conductive wires for connecting the first and second lands 141 and 142 to a semiconductor die is constantly maintained, thus preventing a short between the conductive wires due to wire sweeping in the encapsulation process. Each of the second lands 142 has a lower surface and an end portion, and a locking projection 142a which is defined by forming a half-etched portion in the lower surface at the end portion thereof. Thus, since an encapsulant covers the locking projection 142a when an encapsulation process is performed, adhesion between the second lands 142 and the encapsulant increases.
The dambar 150 connects the other ends of the tie bars 120 to one another. Hence, the dambar 150 is formed roughly in the shape of a quadrangular ring. The dambar 150 is formed to be roughly in parallel with respective sides of the die pad 110. However, the dambar 150 is removed such that the normal leads 160 are electrically isolated from one another in a fabrication process for a semiconductor device which will be described in more detail below.
The first portion 160 of the leads are perpendicular to the dambar 150 and extend toward the die pad 110 in a predetermined length. Also, the first portions 160 are alternately positioned to be arranged with the second lands 142 while being spaced apart from the second lands 142. Each of the first portions 160 has a wire bonding region 161 formed flat to have a predetermined pitch at an end thereof. As shown in
The wire bonding regions 161 are electrically connected to a semiconductor die through conductive wires in a subsequent process. As described above, the first portions 160 are alternately positioned with the second lands 142 while corresponding to the first lands 141. Thus, conductive wires connected to the wire bonding regions 161 have different traces such that they do not come into contact with those connected to the first lands 141. In addition, gold or silver may be plated onto the wire bonding regions 161 such that wire bonding is easily performed.
Each of the first portions 160 of the leads has a downset 162 extending to the wire bonding region 161 and bent upwardly. The dambar 150 and second portions 170 of the leads are positioned on a plane formed higher than the wire bonding regions 161 of the first portions 160 of the leads.
The second portions 170 of the leads are perpendicular to the dambar 150 and correspond to the first portions 160. Also, the second portions 170 extend outwardly at a predetermined length. It will be apparent that the second portions 170 are electrically connected to the tie bars 120 and the first portions 160. However, since portions of the dambar 150 extending between the leads are removed in the fabrication process of the semiconductor device, the second portions 170 of each of the leads are electrically connected to only corresponding ones of the first portions 160 in the semiconductor device. Hence, electrical signals through the first portions 160 are transmitted to an external device through the second portions 170. It will be apparent that the second portions 170 are subjected to surface or through-hole mounting onto the external device through the side of the encapsulant by solder or the like.
As described above, in the lead frame 100 of the present invention, an upper portion of the land connecting bar 130 is half-etched, so that sawing is easily performed with a blade. Accordingly, when the land connecting bar 130 is removed, stress applied to the lands 140 is reduced, thus maintaining the flatness of the lands 140. Also, in the lead frame 100 of the present invention, the first lands 141, second lands 142 and normal leads 160 are alternately formed to be arranged with one another while being spaced apart from one another, and the wire bonding regions 161 of the normal leads 160 are formed higher than the second lands 142. Accordingly, an interval between conductive wires is constantly maintained, thus preventing a short between the conductive wires due to wire sweeping in the encapsulation process.
Hereinafter, a configuration of a semiconductor device according to an embodiment of the present invention will be described.
Referring to
As shown in
The adhesive 210 is formed on the die pad 110 of the lead frame 100. The adhesive 210 generally includes any one selected from a liquid epoxy adhesive, an adhesive film, an adhesive tape and an equivalent thereof. The semiconductor die 220 is attached to the adhesive 210. A plurality of bond pads 221 are formed on an upper surface of the semiconductor die 220. The conductive wires 230 electrically connect the bond pads 221 of the semiconductor die 220 to first lands 141, the bond pads 221 to second lands 142, and the bond pads 221 to wire bonding regions 161 of the normal leads 160.
As described above, the first lands 141, second lands 142 and wire bonding regions 161 of the first portions 160 of the leads are alternately formed, and the wire bonding regions 161 are positioned higher than the first and second lands 141 and 142. Accordingly, an interval between the conductive wires 230 can be constantly maintained and a short between the conductive wires 230 can be prevented by changing a loop height.
The package body or encapsulant 240 encapsulates the lead frame 100, the adhesive 210, the semiconductor die 220 and the conductive wires 230 to protect them from the external environment. The second portions 170 of the leads in the lead frame 100 are extended and bent toward the outside through a side portion 240a of the encapsulant 240 to be of a predetermined length. Although the second portions 170 are bent outwardly from the encapsulant 240 in
A groove 241 is formed in the lower portion 240b of the encapsulant 240 by a blade. The groove 241 has two rows formed in parallel with each other and two columns formed perpendicular to the rows. Also, the groove 241 is formed to correspond to the land connecting bar 130. The groove 241 is formed by grinding and removing the land connecting bar 130 with the blade. The groove 241 is formed such that the first and second lands 141 and 142 are electrically isolated from each other.
As described above, the semiconductor device 200 includes lands 141 having the first and second lands 141 and 142 alternately arranged along sides of the die pad 110. Also, the semiconductor device 200 includes leads having first portions 160 formed on a plane different from the second lands 142 and alternately formed with the second lands 142. Thus, in the semiconductor device 200 of the present invention, an interval between the conductive wires 230 connected to the first lands 141, second lands 142 and wire bonding regions 161 of the first portions 160 of the leads can be constantly maintained, and the conductive wires 230 can be formed to have different traces. Accordingly, the semiconductor device 200 of the present invention can prevent a short between the conductive wires 230.
Hereinafter, a fabrication method for a semiconductor device according to an embodiment of the present invention will be described.
Referring to
As shown in
As shown in
As shown in
As shown in
As shown in
As shown in
As shown in
As shown in
After the encapsulation step (S4), the land connecting bar sawing step (S5), the dambar cutting step (S6) or the lead forming step (S7), ink marking or laser marking may be performed with respect to a surface of the encapsulant 240. In addition, after the encapsulation step (S4), the land connecting bar sawing step (S5), the dambar cutting step (S6) or the lead forming step (S7), gold, silver, solder or the like is plated onto the second portions 170 of the leads and lands 140 exposed to the outside of the encapsulant 240, so that mounting can be easily performed with respect to an external device.
This disclosure provides exemplary embodiments of the present invention. The scope of the present invention is not limited by these exemplary embodiments. Numerous variations, whether explicitly provided for by the specification or implied by the specification, such as variations in structure, dimension, type of material and manufacturing process, may be implemented by one skilled in the art in view of this disclosure.
Number | Name | Date | Kind |
---|---|---|---|
3435815 | Forcier | Apr 1969 | A |
3734660 | Davies et al. | May 1973 | A |
3838984 | Crane et al. | Oct 1974 | A |
4054238 | Lloyd et al. | Oct 1977 | A |
4189342 | Kock | Feb 1980 | A |
4221925 | Finley et al. | Sep 1980 | A |
4258381 | Inaba | Mar 1981 | A |
4289922 | Devlin | Sep 1981 | A |
4301464 | Otsuki et al. | Nov 1981 | A |
4332537 | Slepcevic | Jun 1982 | A |
4417266 | Grabbe | Nov 1983 | A |
4451224 | Harding | May 1984 | A |
4530152 | Roche et al. | Jul 1985 | A |
4541003 | Otsuka et al. | Sep 1985 | A |
4646710 | Schmid et al. | Mar 1987 | A |
4707724 | Suzuki et al. | Nov 1987 | A |
4727633 | Herrick | Mar 1988 | A |
4737839 | Burt | Apr 1988 | A |
4756080 | Thorp, Jr. et al. | Jul 1988 | A |
4812896 | Rothgery et al. | Mar 1989 | A |
4862245 | Pashby et al. | Aug 1989 | A |
4862246 | Masuda et al. | Aug 1989 | A |
4907067 | Derryberry | Mar 1990 | A |
4920074 | Shimizu et al. | Apr 1990 | A |
4935803 | Kalfus et al. | Jun 1990 | A |
4942454 | Mori et al. | Jul 1990 | A |
4987475 | Sclesinger et al. | Jan 1991 | A |
5018003 | Yasunaga | May 1991 | A |
5029386 | Chao et al. | Jul 1991 | A |
5041902 | McShane | Aug 1991 | A |
5057900 | Yamazaki | Oct 1991 | A |
5059379 | Tsutsumi et al. | Oct 1991 | A |
5065223 | Matsuki et al. | Nov 1991 | A |
5070039 | Johnson et al. | Dec 1991 | A |
5087961 | Long et al. | Feb 1992 | A |
5091341 | Asada et al. | Feb 1992 | A |
5096852 | Hobson | Mar 1992 | A |
5118298 | Murphy | Jun 1992 | A |
5122860 | Kikuchi et al. | Jun 1992 | A |
5134773 | LeMaire et al. | Aug 1992 | A |
5151039 | Murphy | Sep 1992 | A |
5157475 | Yamaguchi | Oct 1992 | A |
5157480 | McShane et al. | Oct 1992 | A |
5168368 | Gow, 3rd et al. | Dec 1992 | A |
5172213 | Zimmerman | Dec 1992 | A |
5172214 | Casto | Dec 1992 | A |
5175060 | Enomoto et al. | Dec 1992 | A |
5200362 | Lin et al. | Apr 1993 | A |
5200809 | Kwon | Apr 1993 | A |
5214845 | King et al. | Jun 1993 | A |
5216278 | Lin et al. | Jun 1993 | A |
5218231 | Kudo | Jun 1993 | A |
5221642 | Burns | Jun 1993 | A |
5250841 | Sloan et al. | Oct 1993 | A |
5252853 | Michii | Oct 1993 | A |
5258094 | Furui et al. | Nov 1993 | A |
5266834 | Nishi et al. | Nov 1993 | A |
5273938 | Lin et al. | Dec 1993 | A |
5277972 | Sakumoto et al. | Jan 1994 | A |
5278446 | Nagaraj et al. | Jan 1994 | A |
5279029 | Burns | Jan 1994 | A |
5281849 | Singh Deo et al. | Jan 1994 | A |
5285352 | Pastore et al. | Feb 1994 | A |
5294897 | Notani et al. | Mar 1994 | A |
5327008 | Djennas et al. | Jul 1994 | A |
5332864 | Liang et al. | Jul 1994 | A |
5335771 | Murphy | Aug 1994 | A |
5336931 | Juskey et al. | Aug 1994 | A |
5343076 | Katayama et al. | Aug 1994 | A |
5358905 | Chiu | Oct 1994 | A |
5365106 | Watanabe | Nov 1994 | A |
5381042 | Lerner et al. | Jan 1995 | A |
5391439 | Tomita et al. | Feb 1995 | A |
5406124 | Morita et al. | Apr 1995 | A |
5410180 | Fujii et al. | Apr 1995 | A |
5414299 | Wang et al. | May 1995 | A |
5417905 | LeMaire et al. | May 1995 | A |
5424576 | Djennas et al. | Jun 1995 | A |
5428248 | Cha | Jun 1995 | A |
5444301 | Song et al. | Aug 1995 | A |
5452511 | Chang | Sep 1995 | A |
5454905 | Fogelson | Oct 1995 | A |
5467032 | Lee | Nov 1995 | A |
5474958 | Djennas et al. | Dec 1995 | A |
5484274 | Neu | Jan 1996 | A |
5493151 | Asada et al. | Feb 1996 | A |
5508556 | Lin | Apr 1996 | A |
5517056 | Bigler et al. | May 1996 | A |
5521429 | Aono et al. | May 1996 | A |
5528076 | Pavio | Jun 1996 | A |
5534467 | Rostoker | Jul 1996 | A |
5539251 | Iverson et al. | Jul 1996 | A |
5543657 | Diffenderfer et al. | Aug 1996 | A |
5544412 | Romero et al. | Aug 1996 | A |
5545923 | Barber | Aug 1996 | A |
5581122 | Chao et al. | Dec 1996 | A |
5592019 | Ueda et al. | Jan 1997 | A |
5592025 | Clark et al. | Jan 1997 | A |
5594274 | Suetaki | Jan 1997 | A |
5595934 | Kim | Jan 1997 | A |
5604376 | Hamburgen et al. | Feb 1997 | A |
5608265 | Kitano et al. | Mar 1997 | A |
5608267 | Mahulikar et al. | Mar 1997 | A |
5625222 | Yoneda et al. | Apr 1997 | A |
5633528 | Abbott et al. | May 1997 | A |
5637922 | Fillion et al. | Jun 1997 | A |
5639990 | Nishihara et al. | Jun 1997 | A |
5640047 | Nakashima | Jun 1997 | A |
5641997 | Ohta et al. | Jun 1997 | A |
5643433 | Fukase et al. | Jul 1997 | A |
5644169 | Chun | Jul 1997 | A |
5646831 | Manteghi | Jul 1997 | A |
5650663 | Parthasaranthi | Jul 1997 | A |
5661088 | Tessier et al. | Aug 1997 | A |
5665996 | Williams et al. | Sep 1997 | A |
5673479 | Hawthorne | Oct 1997 | A |
5683806 | Sakumoto et al. | Nov 1997 | A |
5683943 | Yamada | Nov 1997 | A |
5689135 | Ball | Nov 1997 | A |
5696666 | Miles et al. | Dec 1997 | A |
5701034 | Marrs | Dec 1997 | A |
5703407 | Hori | Dec 1997 | A |
5710064 | Song et al. | Jan 1998 | A |
5723899 | Shin | Mar 1998 | A |
5724233 | Honda et al. | Mar 1998 | A |
5726493 | Yamashita et al. | Mar 1998 | A |
5736432 | Mackessy | Apr 1998 | A |
5745984 | Cole, Jr. et al. | May 1998 | A |
5753532 | Sim | May 1998 | A |
5753977 | Kusaka et al. | May 1998 | A |
5766972 | Takahashi et al. | Jun 1998 | A |
5767566 | Suda | Jun 1998 | A |
5770888 | Song et al. | Jun 1998 | A |
5776798 | Quan et al. | Jul 1998 | A |
5783861 | Son | Jul 1998 | A |
5801440 | Chu et al. | Sep 1998 | A |
5814877 | Diffenderfer et al. | Sep 1998 | A |
5814881 | Alagaratnam et al. | Sep 1998 | A |
5814883 | Sawai et al. | Sep 1998 | A |
5814884 | Davis et al. | Sep 1998 | A |
5817540 | Wark | Oct 1998 | A |
5818105 | Kouda | Oct 1998 | A |
5821457 | Mosley et al. | Oct 1998 | A |
5821615 | Lee | Oct 1998 | A |
5834830 | Cho | Nov 1998 | A |
5835988 | Ishii | Nov 1998 | A |
5844306 | Fujita et al. | Dec 1998 | A |
5854511 | Shin et al. | Dec 1998 | A |
5854512 | Manteghi | Dec 1998 | A |
5856911 | Riley | Jan 1999 | A |
5859471 | Kuraishi et al. | Jan 1999 | A |
5866939 | Shin et al. | Feb 1999 | A |
5866942 | Suzuki et al. | Feb 1999 | A |
5871782 | Choi | Feb 1999 | A |
5874784 | Aoki et al. | Feb 1999 | A |
5877043 | Alcoe et al. | Mar 1999 | A |
5886397 | Ewer | Mar 1999 | A |
5973935 | Schoenfeld et al. | Oct 1999 | A |
5977630 | Woodworth et al. | Nov 1999 | A |
RE36773 | Nomi et al. | Jul 2000 | E |
6107679 | Noguchi | Aug 2000 | A |
6143981 | Glenn | Nov 2000 | A |
6150709 | Shin et al. | Nov 2000 | A |
6157074 | Lee | Dec 2000 | A |
6166430 | Yamaguchi | Dec 2000 | A |
6169329 | Farnworth et al. | Jan 2001 | B1 |
6177718 | Kozono | Jan 2001 | B1 |
6181002 | Juso et al. | Jan 2001 | B1 |
6184465 | Corisis | Feb 2001 | B1 |
6184573 | Pu | Feb 2001 | B1 |
6194777 | Abbott et al. | Feb 2001 | B1 |
6197615 | Song et al. | Mar 2001 | B1 |
6198171 | Huang et al. | Mar 2001 | B1 |
6201186 | Daniels et al. | Mar 2001 | B1 |
6201292 | Yagi et al. | Mar 2001 | B1 |
6204554 | Ewer et al. | Mar 2001 | B1 |
6208020 | Minamio et al. | Mar 2001 | B1 |
6208021 | Ohuchi et al. | Mar 2001 | B1 |
6208023 | Nakayama et al. | Mar 2001 | B1 |
6211462 | Carter, Jr. et al. | Apr 2001 | B1 |
6218731 | Huang et al. | Apr 2001 | B1 |
6222258 | Asano et al. | Apr 2001 | B1 |
6222259 | Park et al. | Apr 2001 | B1 |
6225146 | Yamaguchi et al. | May 2001 | B1 |
6229200 | McClellan et al. | May 2001 | B1 |
6229205 | Jeong et al. | May 2001 | B1 |
6238952 | Lin et al. | May 2001 | B1 |
6239367 | Hsuan et al. | May 2001 | B1 |
6239384 | Smith et al. | May 2001 | B1 |
6242281 | McClellan et al. | Jun 2001 | B1 |
6256200 | Lam et al. | Jul 2001 | B1 |
6258629 | Niones et al. | Jul 2001 | B1 |
6261864 | Jung et al. | Jul 2001 | B1 |
6281566 | Magni | Aug 2001 | B1 |
6282094 | Lo et al. | Aug 2001 | B1 |
6282095 | Houghton et al. | Aug 2001 | B1 |
6285075 | Combs et al. | Sep 2001 | B1 |
6291271 | Lee et al. | Sep 2001 | B1 |
6291273 | Miyaki et al. | Sep 2001 | B1 |
6294100 | Fan et al. | Sep 2001 | B1 |
6294830 | Fjelstad | Sep 2001 | B1 |
6295977 | Ripper et al. | Oct 2001 | B1 |
6297548 | Moden et al. | Oct 2001 | B1 |
6303984 | Corisis | Oct 2001 | B1 |
6303997 | Lee | Oct 2001 | B1 |
6306685 | Liu et al. | Oct 2001 | B1 |
6307272 | Takahashi et al. | Oct 2001 | B1 |
6309909 | Ohgiyama | Oct 2001 | B1 |
6316822 | Venkateshwaran et al. | Nov 2001 | B1 |
6316838 | Ozawa et al. | Nov 2001 | B1 |
6323550 | Martin et al. | Nov 2001 | B1 |
6326243 | Suzuya et al. | Dec 2001 | B1 |
6326244 | Brooks et al. | Dec 2001 | B1 |
6326678 | Karnezos et al. | Dec 2001 | B1 |
6335564 | Pour | Jan 2002 | B1 |
6337510 | Chun-Jen et al. | Jan 2002 | B1 |
6339252 | Niones et al. | Jan 2002 | B1 |
6339255 | Shin | Jan 2002 | B1 |
6342730 | Jung et al. | Jan 2002 | B1 |
6348726 | Bayan et al. | Feb 2002 | B1 |
6355502 | Kang et al. | Mar 2002 | B1 |
6359221 | Yamada et al. | Mar 2002 | B1 |
6362525 | Rahim | Mar 2002 | B1 |
6369447 | Mori | Apr 2002 | B2 |
6369454 | Chung | Apr 2002 | B1 |
6373127 | Baudouin et al. | Apr 2002 | B1 |
6377464 | Hashemi et al. | Apr 2002 | B1 |
6380048 | Boon et al. | Apr 2002 | B1 |
6384472 | Huang | May 2002 | B1 |
6388336 | Venkateshwaran et al. | May 2002 | B1 |
6395578 | Shin et al. | May 2002 | B1 |
6399415 | Bayan et al. | Jun 2002 | B1 |
6400004 | Fan et al. | Jun 2002 | B1 |
6410979 | Abe | Jun 2002 | B2 |
6414385 | Huang et al. | Jul 2002 | B1 |
6420779 | Sharma et al. | Jul 2002 | B1 |
6421013 | Chung | Jul 2002 | B1 |
6423643 | Furuhata et al. | Jul 2002 | B1 |
6429508 | Gang | Aug 2002 | B1 |
6437429 | Su et al. | Aug 2002 | B1 |
6444499 | Swiss et al. | Sep 2002 | B1 |
6448633 | Yee et al. | Sep 2002 | B1 |
6452279 | Shimoda | Sep 2002 | B2 |
6459148 | Chun-Jen et al. | Oct 2002 | B1 |
6464121 | Reijnders | Oct 2002 | B2 |
6465883 | Olofsson | Oct 2002 | B2 |
6472735 | Isaak | Oct 2002 | B2 |
6475646 | Park et al. | Nov 2002 | B2 |
6476469 | Hung et al. | Nov 2002 | B2 |
6476474 | Hung | Nov 2002 | B1 |
6482680 | Khor et al. | Nov 2002 | B1 |
6483178 | Chuang | Nov 2002 | B1 |
6492718 | Ohmori | Dec 2002 | B2 |
6495909 | Jung et al. | Dec 2002 | B2 |
6498099 | McClellan et al. | Dec 2002 | B1 |
6498392 | Azuma | Dec 2002 | B2 |
6507096 | Gang | Jan 2003 | B2 |
6507120 | Lo et al. | Jan 2003 | B2 |
6518089 | Coyle | Feb 2003 | B2 |
6525942 | Huang et al. | Feb 2003 | B2 |
6528893 | Jung et al. | Mar 2003 | B2 |
6534849 | Gang | Mar 2003 | B1 |
6545332 | Huang | Apr 2003 | B2 |
6545345 | Glenn et al. | Apr 2003 | B1 |
6552421 | Kishimoto et al. | Apr 2003 | B2 |
6559525 | Huang | May 2003 | B2 |
6566168 | Gang | May 2003 | B2 |
6580161 | Kobayakawa | Jun 2003 | B2 |
6583503 | Akram et al. | Jun 2003 | B2 |
6585905 | Fan et al. | Jul 2003 | B1 |
6603196 | Lee et al. | Aug 2003 | B2 |
6624005 | DiCaprio et al. | Sep 2003 | B1 |
6627977 | Foster | Sep 2003 | B1 |
6646339 | Ku | Nov 2003 | B1 |
6667546 | Huang et al. | Dec 2003 | B2 |
6677663 | Ku et al. | Jan 2004 | B1 |
6686649 | Matthews et al. | Feb 2004 | B1 |
6696752 | Su et al. | Feb 2004 | B2 |
6700189 | Shibata | Mar 2004 | B2 |
6713375 | Shenoy | Mar 2004 | B2 |
6757178 | Okabe et al. | Jun 2004 | B2 |
6800936 | Kosemura et al. | Oct 2004 | B2 |
6812552 | Islam et al. | Nov 2004 | B2 |
6818973 | Foster | Nov 2004 | B1 |
6858919 | Seo et al. | Feb 2005 | B2 |
6867492 | Auburger et al. | Mar 2005 | B2 |
6876068 | Lee et al. | Apr 2005 | B1 |
6878571 | Isaak et al. | Apr 2005 | B2 |
6897552 | Nakao | May 2005 | B2 |
6927478 | Paek | Aug 2005 | B2 |
6967125 | Fee et al. | Nov 2005 | B2 |
6995459 | Lee et al. | Feb 2006 | B2 |
7002805 | Lee et al. | Feb 2006 | B2 |
7005327 | Kung et al. | Feb 2006 | B2 |
7015571 | Chang et al. | Mar 2006 | B2 |
7045396 | Crowley et al. | May 2006 | B2 |
7053469 | Koh et al. | May 2006 | B2 |
7075816 | Fee et al. | Jul 2006 | B2 |
7102209 | Bayan et al. | Sep 2006 | B1 |
7109572 | Fee et al. | Sep 2006 | B2 |
7185426 | Hiner et al. | Mar 2007 | B1 |
7193298 | Hong et al. | Mar 2007 | B2 |
7211471 | Foster | May 2007 | B1 |
7245007 | Foster | Jul 2007 | B1 |
7253503 | Fusaro et al. | Aug 2007 | B1 |
20010008305 | McClellan et al. | Jul 2001 | A1 |
20020024122 | Jung et al. | Feb 2002 | A1 |
20020027297 | Ikenaga et al. | Mar 2002 | A1 |
20020038873 | Hiyoshi | Apr 2002 | A1 |
20020072147 | Sayanagi et al. | Jun 2002 | A1 |
20020111009 | Huang et al. | Aug 2002 | A1 |
20020140061 | Lee | Oct 2002 | A1 |
20020140068 | Lee et al. | Oct 2002 | A1 |
20020140081 | Chou et al. | Oct 2002 | A1 |
20020158318 | Chen | Oct 2002 | A1 |
20020163015 | Lee et al. | Nov 2002 | A1 |
20020167060 | Buijsman et al. | Nov 2002 | A1 |
20030006055 | Chien-Hung et al. | Jan 2003 | A1 |
20030030131 | Lee et al. | Feb 2003 | A1 |
20030059644 | Datta et al. | Mar 2003 | A1 |
20030064548 | Isaak | Apr 2003 | A1 |
20030073265 | Hu et al. | Apr 2003 | A1 |
20030102537 | McLellan et al. | Jun 2003 | A1 |
20030164554 | Fee et al. | Sep 2003 | A1 |
20030168719 | Cheng et al. | Sep 2003 | A1 |
20030198032 | Collander et al. | Oct 2003 | A1 |
20040027788 | Chiu et al. | Feb 2004 | A1 |
20040056277 | Karnezos | Mar 2004 | A1 |
20040061212 | Karnezos | Apr 2004 | A1 |
20040061213 | Karnezos | Apr 2004 | A1 |
20040063242 | Karnezos | Apr 2004 | A1 |
20040063246 | Karnezos | Apr 2004 | A1 |
20040065963 | Karnezos | Apr 2004 | A1 |
20040080025 | Kasahara et al. | Apr 2004 | A1 |
20040089926 | Hsu et al. | May 2004 | A1 |
20040097016 | Yee et al. | May 2004 | A1 |
20040164387 | Ikenaga et al. | Aug 2004 | A1 |
20040253803 | Tomono et al. | Dec 2004 | A1 |
20050199987 | Danno et al. | Sep 2005 | A1 |
20060087020 | Hirano et al. | Apr 2006 | A1 |
20060157843 | Hwang | Jul 2006 | A1 |
20060231939 | Kawabata et al. | Oct 2006 | A1 |
20070023202 | Shibata | Feb 2007 | A1 |
Number | Date | Country |
---|---|---|
19734794 | Aug 1997 | DE |
0393997 | Oct 1990 | EP |
0459493 | Dec 1991 | EP |
0720225 | Mar 1996 | EP |
0720234 | Mar 1996 | EP |
0794572 | Oct 1997 | EP |
0844665 | May 1998 | EP |
0936671 | Aug 1999 | EP |
0989608 | Mar 2000 | EP |
1032037 | Aug 2008 | EP |
55163868 | Dec 1980 | JP |
5745959 | Mar 1982 | JP |
58160096 | Aug 1983 | JP |
59208756 | Nov 1984 | JP |
59227143 | Dec 1984 | JP |
60010756 | Jan 1985 | JP |
60116239 | Aug 1985 | JP |
60195957 | Oct 1985 | JP |
60231349 | Nov 1985 | JP |
6139555 | Feb 1986 | JP |
61248541 | Nov 1986 | JP |
629639 | Jan 1987 | JP |
6333854 | Feb 1988 | JP |
63067762 | Mar 1988 | JP |
63188964 | Aug 1988 | JP |
63205935 | Aug 1988 | JP |
63233555 | Sep 1988 | JP |
63249345 | Oct 1988 | JP |
63289951 | Nov 1988 | JP |
63316470 | Dec 1988 | JP |
64054749 | Mar 1989 | JP |
1106456 | Apr 1989 | JP |
1175250 | Jul 1989 | JP |
1205544 | Aug 1989 | JP |
1251747 | Oct 1989 | JP |
2129948 | May 1990 | JP |
369248 | Jul 1991 | JP |
3177060 | Aug 1991 | JP |
3289162 | Dec 1991 | JP |
4098864 | Mar 1992 | JP |
5129473 | May 1993 | JP |
5166992 | Jul 1993 | JP |
5283460 | Oct 1993 | JP |
6061401 | Mar 1994 | JP |
692076 | Apr 1994 | JP |
6140563 | May 1994 | JP |
6252333 | Sep 1994 | JP |
6260532 | Sep 1994 | JP |
7297344 | Nov 1995 | JP |
7312405 | Nov 1995 | JP |
8064634 | Mar 1996 | JP |
8083877 | Mar 1996 | JP |
8125066 | May 1996 | JP |
964284 | Jun 1996 | JP |
8222682 | Aug 1996 | JP |
8306853 | Nov 1996 | JP |
98205 | Jan 1997 | JP |
98206 | Jan 1997 | JP |
98207 | Jan 1997 | JP |
992775 | Apr 1997 | JP |
9260568 | Oct 1997 | JP |
9293822 | Nov 1997 | JP |
10022447 | Jan 1998 | JP |
10199934 | Jul 1998 | JP |
10256240 | Sep 1998 | JP |
11307675 | Nov 1999 | JP |
2000150765 | May 2000 | JP |
2001060648 | Mar 2001 | JP |
2002519848 | Jul 2002 | JP |
2002043497 | Aug 2002 | JP |
941979 | Jan 1994 | KR |
19940010938 | May 1994 | KR |
19950018924 | Jun 1995 | KR |
19950041844 | Nov 1995 | KR |
19950044554 | Nov 1995 | KR |
19950052621 | Dec 1995 | KR |
1996074111 | Dec 1996 | KR |
9772358 | Nov 1997 | KR |
100220154 | Jun 1999 | KR |
20000072714 | Dec 2000 | KR |
20000086238 | Dec 2000 | KR |
20020049944 | Jun 2002 | KR |
9956316 | Nov 1999 | WO |
9967821 | Dec 1999 | WO |