The invention relates to a bonding device and a method for producing a bonding connection.
Bonding connections are used in many areas of electronics for the production of electrically conductive connections. Wires composed of aluminum or based on aluminum are usually used in this case. On account of the increasing miniaturization of electronic components and increased junction temperatures in power semiconductor chips, the bonding wires used have to carry more and more current since a parallel connection of a plurality of bonding wires, if possible at all, is limited owing to the increasing miniaturization of the components. Instead of using an aluminum wire for producing a contact, it is desirable, in order to reduce the power loss occurring during the operation of the power semiconductor module, to use as conducting material pure copper or a copper-based alloy having a high proportion of copper. Copper has a thermal conductivity of 388 W/(m·K) and an electrical resistivity of 0.0172 ohm·mm2/m. Aluminum has a thermal conductivity of 226 W/(m·K) and an electrical resistivity of 0.028 ohm·mm2/m. By using copper instead of aluminum, the thermal and electrical resistance can be almost halved with otherwise identical bonding wire geometry. In addition, copper-based bonding wires have a higher mechanical stiffness and a higher modulus of elasticity than aluminum-based bonding wires, that is to say that they are in the elastic range for longer, which, in the case of intensive thermal cycling operation, is tantamount to a longer service life. At the present time, however, there are neither machines nor methods for bonding bonding wires composed of copper or based on copper with diameters of more than 100 μm using ultrasound reliably and reproducibly by using a wedge-wedge method. This applies to copper-based bonding wires having higher diameters, for example having diameters of greater than or equal to 400 μm or having cross-sectional areas of greater than or equal to 0.125 mm2. A copper wire having a diameter of 400 μm can thus replace an aluminum wire having a diameter of approximately 500 μm without increasing the electrical resistance. Therefore, there is a need for a bonding device which is suitable for bonding copper-based bonding wires. Likewise, there is a need for a method which is suitable for producing bonding connections with copper-based bonding wires.
For these and other reasons, there is a need for the present invention.
The accompanying drawings are included to provide a further understanding of embodiments and are incorporated in and constitute a part of this specification. The drawings illustrate embodiments and together with the description serve to explain principles of embodiments. Other embodiments and many of the intended advantages of embodiments will be readily appreciated as they become better understood by reference to the following detailed description. The elements of the drawings are not necessarily to scale relative to each other. Like reference numerals designate corresponding similar parts.
In the following Detailed Description, reference is made to the accompanying drawings, which form a part hereof, and in which is shown by way of illustration specific embodiments in which the invention may be practiced. In this regard, directional terminology, such as “top,” “bottom,” “front,” “back,” “leading,” “trailing,” etc., is used with reference to the orientation of the Figure(s) being described. Because components of embodiments can be positioned in a number of different orientations, the directional terminology is used for purposes of illustration and is in no way limiting. It is to be understood that other embodiments may be utilized and structural or logical changes may be made without departing from the scope of the present invention. The following detailed description, therefore, is not to be taken in a limiting sense, and the scope of the present invention is defined by the appended claims.
It is to be understood that the features of the various example embodiments described herein may be combined with each other, unless specifically noted otherwise.
One embodiment provides a device including a bonding stamp and an ultrasonic generator. The bonding stamp has an upper end and a lower end, which are spaced apart from one another in a vertical direction. The ultrasonic generator is designed to generate ultrasound of at least one predetermined frequency f and is coupled or can be coupled acoustically to the bonding stamp at a coupling location of the bonding stamp in the region of the upper end. The frequency f and an effective length l, which is given by the distance between the coupling location and the lower end in the vertical direction, are coordinated with one another in such a way that the following holds true:
where c is the speed of the ultrasound in the bonding stamp at the predetermined frequency f, and n=1 or 2 or 3 or 4. This means that the frequency f differs by no more than 10% from the frequency of the zeroth mode (n=1), the first mode (n=2) or the second mode (n=3) or the third mode (n=4).
A further embodiment is directed at a method for producing a bonding connection between a first bonding partner and a second bonding partner. The method includes:
(a) providing a bonding device including a bonding stamp having an upper end and a lower end and providing an ultrasonic generator, which is designed to generate ultrasound of at least one predetermined frequency f and which is coupled or can be coupled acoustically to the bonding stamp to a coupling location situated in the region of the upper end of the bonding stamp, wherein the frequency f and an effective length l, which is given by the distance between the coupling location and the lower end in the vertical direction, are coordinated with one another in such a way that the following holds true:
where c is the speed of the ultrasound in the bonding stamp at the frequency f, and n=1 or 2 or 3 or 4;
(b) providing a first bonding partner and a second bonding partner;
(c) arranging the second bonding partner between the first bonding partner and the bonding stamp;
(d) generating ultrasound of the frequency f by using the ultrasonic generator and coupling the ultrasound into the bonding stamp in the region of the upper end whilst simultaneously pressing the second bonding partner onto the first bonding partner by using the bonding stamp.
Yet another embodiment relates to a method for producing a bonding connection between a first bonding partner and a second bonding partner. This involves providing a bonding device having a bonding stamp and an ultrasonic generator, which is designed to generate ultrasound of at least one predetermined frequency f, and also a first and a second bonding partner. After arranging the second bonding partner between the first bonding partner and the bonding stamp, ultrasound of the frequency f is generated by using the ultrasonic generator and coupled into the bonding stamp whilst the second bonding partner is simultaneously being pressed onto the first bonding partner by using the bonding stamp. The process of coupling in ultrasound at the same time as pressing the second bonding partner onto the first bonding partner is ended depending on the ultrasonic energy emitted by the bonding stamp.
The ultrasonic generator 4 is coupled or can be coupled acoustically to the bonding stamp 1 in the region of the upper end 11, such that an ultrasound 8 generated by the ultrasonic generator 4 is coupled into the bonding stamp 1 in the region of the upper end 11. The coupling may be effected in such a way that the ultrasound 8 causes the upper end 11 of the bonding stamp 1 to effect horizontal oscillations in the first lateral direction y.
The effective length l of the bonding stamp 1 and the frequency f of the ultrasonic wave 8 are coordinated with one another in such a way that the following holds true:
where c is the speed of the ultrasound in the bonding stamp at the frequency f, and n=1 or n=2 or n=3 or n=4. This ensures that the bonding stamp 1 oscillates within the bounds of a 10 percent deviation with the frequency of the zeroth mode (n=1), the first mode (n=2) or the second mode (n=3) or the third mode (n=4). In comparison with conventional bonding stamps, which typically oscillate in the 6-th or 7-th mode, this results in a significantly stronger oscillation—which therefore cannot be damped as readily—of the lower end 12 of the bonding stamp 1.
As an alternative to this, the permissible range of the frequency f may also be chosen such that the following holds true:
This corresponds to a maximum 5% deviation of the frequency f from the frequency of the zeroth mode (n=1), the first mode (n=2) or the second mode (n=3) or the third mode (n=4).
As can be seen from
In this case, the effective length l of the ultrasonic generator 4 is identical to the wavelength of the ultrasonic wave 8. The upper end 11 and the lower end 12 oscillate in phase.
The upper end 11 and the lower end 12 once again oscillate in antiphase.
Furthermore,
The upper end 11 and the lower end 12 once again oscillate in phase.
In order to produce specific bonding connections to which access is difficult to gain, for example if the bonding connections have to be produced in a semiconductor module already surrounded by a frame, it may be necessary for the effective length l of the bonding stamp 1 to have a specific minimum length. In order to attain this, given a predetermined ultrasonic frequency f and a predetermined oscillation mode of the bonding stamp 1, it may be advantageous to use a material with high sound speed for the bonding stamp 1. In one embodiment, it is possible to choose a material in which the sound speed is higher than 10 000 m/s and thus significantly higher than the sound speed of approximately 8350 m/s in the tungsten carbide used for producing conventional bonding stamps. By way of example, silicon carbide, which has a sound speed of approximately 13 000 m/s, may be chosen as material for the bonding stamp 1. Nevertheless the invention may also be used in conjunction with a bonding stamp 1 composed of tungsten carbide.
The bonding stamp 1 may have for example an effective length l of greater than or equal to 6.35 cm (2.5″), or of greater than or equal to 8.9 cm (3.5″). In principle, an effective length shorter or longer than those mentioned may also be provided for a bonding stamp 1. Any desired ultrasonic frequencies, for example 20 kHz, 40 kHz, 60 kHz, 80 kHz or 90 kHz, are suitable as ultrasonic frequencies f. In order to have the effect that a bonding stamp 1 may be operated such that it may be changed over in the zero-th, first, second or third oscillation mode, the ultrasonic generator may be designed to provide at least two, for example four, frequencies f1, f2, f3, f4 having a ratio f1:f2:f3:f4 of 4:3:2:1. The at least two frequencies f1, f2, f3, f4 may deviate from the computational values of the exact resonant frequencies of the bonding stamp 1 by up to ±10% in each case, for example in order to avoid component resonances of the components to be bonded and of components coupled or connected thereto.
Moreover, the ultrasonic generator 4 may be designed to alter the frequency of the ultrasonic signal 8 during the bonding operation at the same bonding location and/or to provide ultrasonic signals having different frequencies for the bonding of bonding locations that are to be successively bonded (“bonding sequence”). This affords the advantage that an individual adaptation of the bonding operation to different bonding locations becomes possible. It is thus possible for example to avoid resonances of the bonding partners involved and/or to optimize the inputting of ultrasonic energy into the respective bonding location. In order to avoid resonances or oscillations close to resonance, the frequency of an ultrasonic signal used for bonding may be spaced apart by at least 5 kHz from the resonant frequency or resonant frequencies which can occur at the components to be bonded or connected thereto.
Various processes of a method for producing a bonding connection between a copper-based bonding wire and a metallization of a substrate using the bonding device 100 explained in
In order to electrically conductively connect the metallization 61 to the metallization 51, the copper based bonding wire 52 is also intended to be bonded onto the metallization 51. Proceeding from the first bonding location 91, the bonding wire 52 forms a loop resulting from the fact that the bonding device 100, after the production of the first bonding location 91, was moved upward, i.e. counter to the vertical direction z, and also in the first lateral direction y into a position above the metallization 51 and was subsequently lowered again downward, i.e. in the vertical direction z, toward the metallization 51. The bonding wire 52 is guided by using the guide device 2 and also by using a guide groove (not discernible in
If the bonding device 100, proceeding from the arrangement in accordance with
In order then to produce a fixed and permanent bonding connection between the first soldering partner embodied as metallization 51 and the second soldering partner 52 embodied as copper-based bonding wire, the bonding wire 52, as is illustrated in
During the action of the press-on force F1, an ultrasonic wave 8 is generated by using the ultrasonic generator 4 and coupled into the bonding stamp 1 in the region of the upper end 11. In this case, the frequency of the ultrasonic wave 8 is chosen in such a way that it meets the condition:
where c is the speed of the ultrasonic wave 8 in the bonding stamp 1 at the predetermined frequency f, and n=1 or 2 or 3 or 4. What is of importance in the production of a fixed and permanent bonding connection is the interaction of the ultrasonic wave 8 and the oscillation—caused thereby—of the lower end 12 of the bonding stamp 1 in the first lateral direction y and the press-on force F1. In this case, the ultrasonic wave 8 may be coupled into the bonding stamp 1 before, together with, or after the commencement of the press-on force F1. Independently of this, the press-on force F1 may be removed or reduced before, at the same time as, or after the end of coupling the ultrasonic wave 8 into the bonding stamp 1.
The action of the press-on force F1 results in a deformation of the bonding wire 52 in the region of the second bonding location 92 to be produced, which is illustrated in
In order to achieve a good coupling between the bonding stamp 1 and the bonding wire 52 during the production of the bonding connection, the surface of such a guide groove 7 may be provided wholly or in portions with an engaging structure, for example a waffle-type structure. Examples of such engaging structures are explained in more detail below with reference to
For a fixed and permanent bonding connection it is advantageous if the pressing of the bonding partners 51, 52 onto one another by the press-on force F1 and the excitation of the bonding stamp 1 by the ultrasonic wave 8 are effected jointly. The joint action of the press-on force F1 and of the ultrasonic wave 8 may be initiated by the ultrasonic wave 8 being coupled into the bonding stamp with the press-on force F1 already having an effect. As an alternative to this, the joint action of the press-on force F1 and of the ultrasonic wave 8 may also be initiated by the ultrasonic wave 8 being coupled into the bonding stamp before or at the same time as the introduction of the press-on force F1.
The quality of the bonding connection to be produced depends on the active power and thus on the temporal duration of the joint action of the press-on force F1 and of the bonding stamp 1 excited by the ultrasonic signal 8 on the bonding wire 52, and also on the quality of the coupling of the bonding stamp 1 to the bonding wire 52. In addition, the ratio of bonding force and ultrasonic power is crucial; otherwise, either the lower end of the bonding stamp 1 may slip over the surface of the bonding wire 52 without carrying along the bonding wire 52, or the oscillation of the bonding stamp 1 may be damped to a standstill with an excessively high press-on force F1. In the event of an excessively short joint action of the press-on force F1 of the bonding stamp 1 excited by the ultrasonic signal 8 and/or in the event of an excessively small press-on force F1 and/or in the event of an excessively small amplitude of the lower end 12 of the bonding stamp 1, this results in a bonding connection having an excessively low bonding intensity between the bonding partners 51 and 52. Conversely in the event of an excessively long joint action of the press-on force F1 of the bonding stamp 1 excited by the ultrasonic signal 8 and/or in the event of an excessively high press-on force F1 and/or in the event of an excessively high amplitude of the lower end 12 of the bonding stamp 1, this correspondingly results in a material weakening of the bonding wire 52, such that there is the risk of the bonding wire 52 tearing away at the bonding location 92, or of the occurrence of great damage to the bonding wire 52 in the heel region or even to impressions of the bonding stamp 1 on the surface of the bonding partner, here the metallization 51.
In order to obtain a high-quality bonding connection, the interaction of the predetermined press-on force F1 and of the coupled-in ultrasonic wave 8 may be made dependent on the ultrasonic energy that is transmitted from the ultrasonic generator 4 via the bonding stamp 1 onto the bonding location 92 reaching or exceeding a predetermined value. By way of example, the electrical energy fed into the ultrasonic generator 4 for the operation of the ultrasonic generator 4 may be used as a measure of the ultrasonic energy fed to the second bonding location 92. In this case it is necessary, of course, to take account of losses resulting from the efficiency of the ultrasonic generator 4 and the coupling thereof to the bonding stamp 1, for example by using an efficiency factor.
In addition, the press-on force F1 and/or the difference energy (“active energy”) between the energy fed to the second bonding location 92 and the energy (“reactive energy”) reflected from the second bonding location 92 may be used to determine the ultrasonic energy fed to the second bonding location 92. The difference between the energy fed to the second bonding location 92 and the energy reflected from the second bonding location 92 is in this case a measure of the ultrasonic energy introduced into the second bonding location 92. In order to be able to feed a sufficient amount of energy to the bonding location 92 for producing a bonding connection with a copper-based bonding wire 52 having a copper proportion of, for example, at least 99% by weight, the ultrasonic generator 4 may be designed to provide an ultrasonic power PUS for which the following holds true:
where A52 is the cross-sectional area of the bonding wire. Likewise, the ultrasonic power PUS that can be provided by the ultrasonic generator may be at least 250 W.
After the production of the bonding connection at the second bonding location 92, the bonding wire 52 may also be bonded to one or more further bonding partners in the manner described. As an alternative to a further bonding, the bonding wire 52 may be separated using a cutting device 3. For this purpose, the cutting device 3 is moved in the direction of the metallization 51 until it wholly or partly severs the bonding wire 52, which is illustrated in
Instead of complete or partial severing of the bonding wire 52, the bonding wire 52 may also be torn away by fixedly securing the bonding wire 52 to the bonding device 100, for example in the region of the guide device 2, and moving the bonding device 100 away from the metallization 51. If exclusively a tearing away of the bonding wire 52 is provided, it is possible to dispense with equipping the bonding device 100 with a cutting device 3.
Particularly if the side wall of the guide groove 7 includes an engaging structure, it can happen that the bonding stamp 1 does not readily disengage when the bonding device 100 moves away from the metallization 51 and from the bonding wire 52. In order to facilitate a detachment, the bonding device 100 may optionally be moved away from the metallization 51 with a predetermined force F2 counter to the vertical direction z and with ultrasonic waves 8 simultaneously being coupled into the bonding stamp 1, which is illustrated in
After the detachment of the bonding stamp 1 from the bonding wire 52, the second bonding location 92 has been completed, which is illustrated as the result in
The method explained above was explained on the basis of the production of a bonding connection between a metallization of a semiconductor chip 60, such as are provided e.g., in the case of load and control connections for IGBTs, MOSFETs, thyristors, diodes, and a metallization 51 of a substrate 5. In principle, it is possible to produce the bonding connections between any metallic structures. By way of example, suitable metallic structures include chip carriers, or connecting lugs of a power semiconductor module, which are soldered or welded onto a circuit carrier or are plugged into the housing frame of a power semiconductor module.
The method explained may be used in one embodiment for making an integrated circuit including producing wedge-wedge bonding connections.
In accordance with a further alternative, a surface 71 of a guide groove 7 may include transverse grooves 73 running perpendicular to the guide groove 7 and thus perpendicular to the first lateral direction y, which is illustrated in
An engaging structure of a surface 71 of the guide groove 7 may include for example a predetermined surface roughness Rq of 2% to 30% of the thickness d of the bonding wire 52, i.e. the thickness thereof in the vertical direction z. In the case of a bonding wire 52 having a circular cross section, d is identical to the diameter D of the bonding wire. If a bonding wire 52 embodied as a flattened ribbon is used instead of a bonding wire 52 having a circular cross section, then d is the smallest thickness of the ribbon as viewed in the cross section of the ribbon. As an example,
As is illustrated in
A further example of the configuration of a guide groove 7 of a bonding stamp 1 is illustrated in
The production of a bonding connection between a bonding wire having a circular cross section and a metallization of a substrate has been described on the basis of the exemplary embodiments in accordance with
With the bonding device 100 illustrated in
By way of example, material having a copper proportion of at least 99.99% by weight is suitable as oxygen- and carbon-free copper. A suitable bonding wire has for example a composition according to the standard DIN CEN/TS 13388, which is permitted to include a copper proportion of at least 99.99% by mass with admixtures of in each case at most 0.0025% by mass of silver (Ag), 0.0015% by mass of sulfur (S), 0.0010% by mass of nickel (Ni), 0.0010% by mass of iron (Fe) and 0.0003% by mass of phosphorus (P), wherein the copper (Cu) is to be produced from Cu-CATH-1 (CR001A) in accordance with the standard DIN EN 1978. Further admixtures are in each case at most 0.0005% by mass of arsenic (As), 0.00020% by mass of bismuth (Bi), 0.0001% by mass of cadmium (Cd), 0.0005% by mass of manganese (Mn), 0.0005% by mass of lead (Pb), 0.0004% by mass of antimony (Sb), 0.00020% by mass of selenium (Se), 0.0002% by mass of tin (Sn), 0.00020% by mass of tellurium (Te) and 0.0001% by mass of zinc (Zn). Moreover, the oxygen content should in this case be set in such a way that the requirements in accordance with the standard DIN EN 1976 are met.
In the case where copper-based bonding wires or ribbons are used, the guide device 2 illustrated in
As an alternative to the exemplary embodiments in accordance with
Although specific embodiments have been illustrated and described herein, it will be appreciated by those of ordinary skill in the art that a variety of alternate and/or equivalent implementations may be substituted for the specific embodiments shown and described without departing from the scope of the present invention. This application is intended to cover any adaptations or variations of the specific embodiments discussed herein. Therefore, it is intended that this invention be limited only by the claims and the equivalents thereof.