1. Field of the Invention
The present invention generally relates to a method and a system for fabricating a semiconductor device, and more particularly, to a method and a system for fabricating a semiconductor device, in which a flip-chip connection is performed.
Recently, according to a progress of a high-density integration of the semiconductor device, the flip-chip connection with bumps is frequently used to perform a high-density mounting of a semiconductor chip and to shorten a length of routing lines for requirement of a fast operation. Further, such a semiconductor device has to be fabricated with a low cost. To meet the above requirements, it is necessary to achieve a considerably precise alignment in the mounting of the semiconductor chip with the low cost.
2. Description of the Prior Art
In heights of the stud-bumps 14, there is generally a dispersion of about 20 μm. Therefore, in
In
In
In
In this case, the bonding head is equipped with a heat source, and the insulating adhesive 18 is thermoset by the heat source to reinforce the flip-chip connection.
As a method of heating, another method is known in Japanese Laid-Open Patent Application No. 5-67648, wherein the alignment, the heating, and the pressing are simultaneously performed by nozzles arranged around the bonding head to jet hot winds.
Further, another heating method is known in Japanese Laid-Open Patent Application No. 3-184352. In this method, not shown in a drawing here, the bumps of the semiconductor chip are aligned and mounted by only the heating over the mounting pads of the substrate 17. After that, the thermosetting insulating adhesive is applied and infiltrated into the mounting pads and the bumps. Then the insulating adhesive is thermoset by heating it in a heating block or thermostat.
In
On the other hand, in the Japanese Laid-Open Patent Application No. 3-184352, first the semiconductor chip is mounted by pressing only, and next it is heated. However, a difference (about 4 times) in thermal expansion between the semiconductor chip and the substrate makes the flip-chip connection imperfect.
It is an object of this invention to provide a method and a system for fabricating a semiconductor device, in which a fabrication apparatus cost and a fabrication cost may be reduced, and a perfect flip-chip connection may be performed, in which the disadvantages described above are eliminated.
The object described above is achieved by a fabrication method of a semiconductor device comprising the steps of: (a) forming a given number of projection electrodes on each of a given number of semiconductor chips, and applying a thermosetting insulating adhesive to areas of mounting parts where the semiconductor chips are to be mounted on a substrate; (b) heating the thermosetting insulating adhesive on the substrate with a half-thermoset temperature; (c) aligning the semiconductor chips to the mounting parts of the substrate and performing a first fixing of the semiconductor chips with a first pressure.; and (d) heating the substrate, on which the semiconductor chip is fixed, with a thermosetting temperature of the thermosetting insulating adhesive, and performing a second fixing of the semiconductor chips with a second pressure.
The object described above is also achieved by the fabrication method of the semiconductor device described above, wherein the first pressure is lower than the second pressure.
The object described above is further achieved by the fabrication method of the semiconductor device described above, wherein the second fixing is simultaneously performed for each of semiconductor chips with the second pressure.
In addition, the object described above is achieved by the fabrication method of the semiconductor device described above, wherein the given number of the projection electrodes are formed as studs by wire bonding, the studs being leveled.
The object described above is further achieved by the fabrication method of the semiconductor device described above, wherein the step (a) further comprises the step (a-1) of forming a conductive adhesive on the projection electrodes.
The object described above is also achieved by the fabrication method of the semiconductor device described above, wherein in the step (a-1), the conductive adhesive on the projection electrodes is formed by a conductive adhesive, which has been skidded on a plate, being transcribed onto the projection electrodes.
The object described above is also achieved by a fabrication system of a semiconductor device comprising: a chip loading device forming a given number of projection electrodes on each of a given number of semiconductor chips; a substrate loading device loading a substrate having mounting parts on which the semiconductor chips are to be mounted; an adhesive-application device applying a thermosetting insulating adhesive to areas of the mounting parts of the substrate; an alignment-and-pressing device heating the thermosetting insulating adhesive on the substrate with a half-thermosetting temperature, aligning the semiconductor chips to the mounting parts of the substrate, and performing a first fixing of the semiconductor chips with a first pressure; and a pressing-and-heating device heating the substrate, on which the semiconductor chips are fixed, with a thermosetting temperature of the thermosetting insulating adhesive, and performing a second fixing of the semiconductor chips with a second pressure.
According to the fabrication method of the semiconductor chip, first the semiconductor chip, on which the projection electrodes are formed, is aligned to the substrate, and is fixed in the first fixing by the pressing only. After that, the pressing and heating for thermosetting the insulating adhesive are performed. In such way, the first fixing is performed in a different process from the pressing and heating.
In such a process, a less expensive apparatus may be individually applied for an alignment mechanism and a heating mechanism, so that a cost of fabrication apparatus may be reduced. And since at the final pressing and heating, the alignment is already finished, several processes, such as pressing, heating, and aligning, may be performed by a single process. Thus, throughput is improved, and, as a result, a fabrication cost may be also reduced.
And according to the fabrication method of the semiconductor chip, the first pressure is lower than the second pressure. Therefore, when the semiconductor chip with the projection electrodes is fixed in the first fixing with the first pressure, a dispersion of a degree of collapse of the projection electrodes may be absorbed.
Further according to the fabrication method of the semiconductor chip, the second fixing of the semiconductor chips is performed for each semiconductor chip with the second pressure. Therefore, multi-heads for pressing and heating become available, which leads to an improved mounting operation.
Other objects and further features of the present invention will be apparent from the following detailed description when read in conjunction with the accompanying drawings.
First, a description will be given of first embodiment of a fabrication method of a semiconductor device according to the present invention, by referring to
In the fabrication system shown in
A transcribing device 24 transcribes a conductive adhesive on a surface of the stud-bumps. A cure/alignment-and-pressing device 25 heats a substrate with an adhesive-half-thermosetting temperature, and aligns the semiconductor chip, on which stud-bumps are formed, to the substrate by a stepper to perform a first fixing with a first pressure.
A substrate loader 26 supplies the substrate on which mounting pads as a mounting part are formed based of a number of the stud-bumps of each semiconductor chip. An adhesive-application device 27 applies, to the supplied substrate, a constant amount of a thermosetting insulating adhesive on areas of the mounting pads which correspond to each semiconductor chip, by using a dispenser, and then supplies the substrate to the cure/alignment-and-pressing device 25.
A pressing-and-heating device 28 presses the semiconductor chip fixed on the substrate with a second pressure, and heats it with a temperature by which the insulating adhesive is thermoset to perform a second fixing. An unloader 29 issues the substrate on which the semiconductor chip is mounted.
In these stud-bumps 34 on the semiconductor chip 31, there is a dispersion of height of about 20 μm. Therefore, to make their height uniform, the stud-bumps 34 are pressed to a flat glass plate 35 for leveling (a step S2 in
In the transcribing device 24, in advance, a conductive adhesive 36 is skidded thinly on a flat glass plate 35a. A conductive adhesive 36a is transcribed on surfaces of the stud-bumps 34 by pressing the stud-bumps 34 to the conductive adhesive 36 with heating (a step S3 in
On the other hand, in the substrate loader 26, mounting pads 37a are formed on a substrate 37 based on a number of the stud-bumps of the semiconductor chip 31, and this substrate 37 with the mounting pads 37a is supplied to the adhesive-application device 27. In this device 27, a thermosetting insulating adhesive 38 is applied in each area of the mounting pads 37a corresponding to each semiconductor chip 31 (a step S4 in
This substrate 37 is precured at a temperature by which the insulating adhesive 38 is half-thermoset on the substrate 37, by the heat plate 39 (a step S5 in
Then, in the device 25, the semiconductor chip 31 is absorbed by a bonding head 40, and each stud-bump 34 is aligned over a respective mounting pad 37a of the substrate 37. At the same time, the bonding head 40 with the semiconductor chip 31 is pressed against the mounting pads 37a with the first pressure to perform a tentative fixing (a step S6 in
The substrate 37, onto which all of the semiconductor chip 31 is tentatively fixed, is moved to the pressing-and-heating device 28 by a transiting rail, etc., to dispose it on an adhesive-hardening stage 41 (a step S7 in
By heating the heater block 42, heat of a temperature which the insulating adhesive 38 is thermoset is transmitted to the pressing-and-heating heads 42a. When the heater block 42 is moved downward, the pressing-and-heating heads 42 are pressed against each semiconductor chip 31 with the second pressure, and simultaneously thermoset the insulating adhesive 38 to perform the second fixing (a step S8 in
In this case, the second pressure is set larger than the first pressure. This method may absorb a dispersion of a degree of collapse of the bumps 34, and a dispersion of a thickness of the mounting pads 37a of the substrate 37, which occur when the substrate 37 is pressed. This method may also absorb a difference of thermal expansion between the substrate 37 and the semiconductor chip 31 during heating. These procedures achieve an significantly improved flip-chip connection.
In this fabrication method of the semiconductor device, a tentative-fixing process for alignment and a pressing-and-heating process are individually performed. Therefore, individual apparatuses for the respective processes may be prepared such as the cure/alignment-and-pressing device 25 for precise alignment and the pressing-and-heating device 28 for pressing and heating. Thus, an expensive apparatus which has both an alignment mechanism and a heating mechanism is unnecessary. The above advantages enable a fabrication apparatus cost to be reduced.
Further, in the cure/alignment-and-pressing device 25, the heating for thermosetting the insulating adhesive 38 is not carried out, but the semiconductor chip 31 is aligned and mounted on the substrate 37. Therefore, it is easy to operate this fabrication apparatus for mounting many chips. This leads to a reduction of a fabrication cost.
And a plurality of the pressing-and-heating heads 42a may be implemented in the pressing-and-heating device 28, so that a mounting operation becomes also easier, and this also leads to a reduction of the fabrication cost.
As described above, the present invention has the following features.
According to the fabrication method of the semiconductor chip, first, the semiconductor chip, on which the projection electrodes are formed, is aligned to the substrate, and is fixed in the first fixing by the pressing only. After that, pressing and heating for thermosetting the insulating adhesive are performed. In such way, the first fixing for the precise alignment is performed in a different process from the pressing and heating.
In such a process, a less expensive apparatus may be individually applied for an alignment mechanism and a heating mechanism, so that the cost of the fabrication apparatus may be reduced. And at the final pressing and heating, the alignment is already finished, therefore, several processes, such as pressing, heating, and aligning, may be performed by a the single process. Thus, the throughput is improved, and as a result, the fabrication cost may be also reduced.
And according to the fabrication method of the semiconductor chip, the first pressure is lower than the second pressure. Therefore, when the semiconductor chip with the projection electrodes is fixed in the second fixing with the second pressure, the dispersion of the degree of collapse of the projection electrodes may be absorbed.
Further according to the fabrication method of the semiconductor chip, the second fixing of the semiconductor chips is performed for each semiconductor chip with the second pressure. Therefore, multi-heads for pressing and heating become available, which leads to the improved mounting operation.
Further, the present invention is not limited to these embodiments, but various variations and modifications may be made without departing from the scope of the present invention.
Number | Date | Country | Kind |
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6-088762 | Apr 1994 | JP | national |
Number | Date | Country | |
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Parent | 08897953 | Jul 1997 | US |
Child | 11822977 | Jul 2007 | US |
Number | Date | Country | |
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Parent | 08393677 | Feb 1995 | US |
Child | 08897953 | Jul 1997 | US |