Claims
- 1. A semiconductor chip assembly comprising:
(a) a plurality of units, each such unit including:
(i) a semiconductor chip having at least one chip select contact and a plurality of other contacts and (ii) a circuit panel having a plurality of chip select terminals, a plurality of other terminals, and traces extending on or in the panel electrically connected between the contacts of the chip and the terminals, the trace electrically connected to each chip select contact being a multi-branched trace including a common section connected to the select contact and a plurality of branches connected to different ones of the chip select terminals, at least one branch, but less than all branches, of each such multi-branched trace having an interruption therein so that the select contact is connected to less than all of the chip select terminals; and said units being disposed one above the other in a stack of superposed units; and (b) vertical conductors interconnecting the terminals of the units in the stack to form a plurality of vertical buses, said chip select terminals of different units being connected to the same vertical buses, said interruptions in said multi-branched traces being arranged so that the chip select contacts of different units are electrically connected to different ones of said vertical buses.
- 2. A semiconductor assembly as claimed in claim 1 wherein, in each said unit, all but one branch of each said multi-branched trace has an interruption therein so that each chip select contact is connected to only one said chip select terminal of that unit.
- 3. A semiconductor assembly as claimed in claim 1 wherein the chips, traces and terminals of different units are identical to one another except that different ones of said units have different branches interrupted so that the chip select contacts of different units are connected to different terminals on the circuit panels of such units.
- 4. A semiconductor assembly as claimed in claim 3 wherein corresponding terminals of different units are disposed one above the other.
- 5. A semiconductor assembly as claimed in claim 3 wherein said identical units in said stack include a bottom unit, said terminals of said bottom unit being exposed for interconnection to an external substrate.
- 6. A semiconductor assembly as claimed in claim 3 wherein said identical units in said stack include a bottom unit, the assembly further comprising a translator underlying said bottom unit, said translator having contact pads connected to said vertical buses and having terminals connected to said contact pads, the terminals of the translator being exposed for connection to an external substrate.
- 7. A semiconductor assembly as claimed in claim 2 wherein said identical units in said stack include a bottom unit, the assembly further comprising an additional unit underlying said bottom unit, said additional unit including a semiconductor chip and a circuit panel having terminals exposed for connection to an external substrate, said terminals of said additional unit being disposed in a pattern different from the terminals of said identical units in said stack, at least some of said terminals of said additional unit being electrically connected to said vertical buses, at least some of said terminals of said additional unit being electrically connected to the chip of said additional unit.
- 8. A semiconductor assembly as claimed in claim 1 wherein the circuit panel of each said unit includes only a single layer of electrically conductive material constituting said traces and said terminals.
- 9. A semiconductor assembly as claimed in claim 8 wherein the circuit panel of each said unit includes a dielectric layer less than about 100 μm thick.
- 10. A semiconductor assembly as claimed in claim 9 wherein the chip of one said unit is disposed between the dielectric layer that unit and the dielectric layer of an adjacent one of said units, and wherein the vertical distance between corresponding surfaces of such dielectric layers is no more than 250 μm greater than the thickness of the semiconductor chip in such unit.
- 11. A semiconductor assembly as claimed in claim 10 wherein a vertical spacing distance between corresponding features in adjacent ones of said units is no more than 250 μm greater than the thickness of each chip.
- 12. A semiconductor assembly as claimed in claim 1 wherein said circuit panel of each said unit includes a dielectric layer with at least one disconnection aperture therein, said interruptions being formed at said disconnection apertures.
- 13. A semiconductor assembly as claimed in claim 1 wherein the circuit panel of each said unit has edges and one or more notches extending inwardly from one or more of said edges, said interruptions being formed at said notches.
- 14. A semiconductor assembly as claimed in claim 13 wherein said terminals of each said unit include a first outer row of terminals disposed adjacent to a first edge of the circuit panel, said first outer row of terminals defining a first inner border remote from said first edge, at least some of said branches having outboard portions extending outwardly beyond the first inner border, at least one of said notches defining at least one interruption in at least one said outboard portion.
- 15. A semiconductor assembly as claimed in claim 13 wherein said terminals of each said unit include a first outer row of terminals disposed adjacent to a first edge of the circuit panel of such unit, the first edge having at least one protrusion extending outwardly from the remainder of the first edge, at least one of said branches extending onto said protrusion.
- 16. A semiconductor chip assembly as claimed in claim 15 wherein the circuit panel of each said unit is substantially planar and the protrusion of each said circuit panel projects vertically from the plane of the circuit panel.
- 17. A method of making semiconductor chip assembly comprising the steps of:
(a) stacking a plurality of units each including at least one semiconductor chip having at least one chip select contact and a plurality of other contacts and a circuit panel having a plurality of chip select terminals, a plurality of other terminals, and traces extending on or in the panel connected to said terminals, at least one trace of each said panel being a multi-branched trace associated with a plurality of chip select terminals, each such multi-branched trace including a common section and a plurality of branches connected to different ones of the chip select terminals, the contacts of the at least one chip in each unit being connected to traces of the circuit panel in that unit so that each chip select contact is connected to the common section of a multi-branched trace; (b) selectively interrupting the branches of said multi-branched traces so that the common section of each multi-branched trace is connected to less than all of the chip select terminals associated with such multi-branched trace; and (c) interconnecting terminals of different units to one another to form vertical buses, said selectively interrupting and interconnecting steps being performed so that the chip select terminals of chips in different units are connected to different ones of said vertical buses.
- 18. A method as claimed in claim 17 wherein said circuit panels, prior to said selectively interrupting step, are identical to one another.
- 19. A method as claimed in claim 18 wherein said stacking step includes aligning corresponding terminals of circuit panels in different units with one another.
- 20. A method as claimed in claim 17 wherein said selectively interrupting step is performed so that the common section of each said multi-branched trace is connected to only one select terminal of the circuit panel bearing such trace.
- 21. A method as claimed in claim 17 wherein further comprising the step of forming said units, said step of forming said units including connecting said chips to said traces using a tool, said step of selectively interrupting being performed by engaging said tool with the branches of said multi-branched traces.
- 22. A method as claimed in claim 17 further comprising the step of forming said units by connecting chips to circuit panels, wherein said selectively interrupting step is performed after said step of forming said units.
- 23. A method as claimed in claim 17 wherein said selectively interrupting step is performed in the same facility as said stacking step.
- 24. A method as claimed in claim 17 wherein, prior to said selectively interrupting step, said units include identical chips, identical terminals, and identical connections between contacts of the chips and terminals.
- 25. A method as claimed in claim 24 further comprising the step of handling and stocking said units as mutually interchangeable parts prior to said selectively interrupting step.
- 26. A method as claimed in claim 17 further comprising the steps of providing said units so that the circuit panels of a plurality of units are parts of a continuous or semi-continuous sheet and severing the circuit panels from the sheet, said selectively interrupting step being performed concomitantly with said severing step.
- 27. A method as claimed in claim 17 wherein, prior to said selectively interrupting step, said circuit panels have interruption openings extending through them and said branches of said multi-branched traces extend across said interruption openings, and wherein said selectively interrupting step includes breaking branches of multi-branched traces at said interruption openings.
- 28. A method as claimed in claim 17 wherein said selectively interrupting step includes severing branches of multi-branched traces by removing regions of such multi-branched traces and simultaneously removing portions of said circuit panels underlying said severance regions.
- 29. A method as claimed in claim 28 wherein said removing step includes removing portions of said circuit panels at edges thereof.
- 30. A semiconductor chip assembly comprising:
(a) a plurality of units, each unit including:
(i) a semiconductor chip having contacts on front surface; and (ii) a circuit panel having a central region and a peripheral region, the panel including a dielectric layer having first and second surfaces, at least one bond window extending between said first and second surfaces in said central region and a plurality of terminal apertures extending between the first and second surfaces in said peripheral region, each said panel including a single metallization layer defining a plurality of terminal pads aligned with said terminal apertures a plurality of traces extending in horizontal directions along the panel, the chip being disposed with the front surface of the chip facing toward a surface of the panel in said central region, the contacts of the chip being connected to the traces of the panel in said at least one bond window; said units being superposed on one another in a stack so that the rear surface of a chip in one unit faces toward a surface of the dielectric layer in a next adjacent unit, said units bearing on one another in at least those portions of the central regions occupied by said traces, the terminals of the units being aligned with one another; and (b) a plurality of conductive masses disposed between the terminals of the units and connecting terminals of adjacent units through the terminal apertures of said panels.
- 31. A semiconductor chip assembly as claimed in claim 30 wherein said traces in each unit extend along the first surface of the dielectric layer in that unit and the front surface of the chip of in each unit faces toward the second surface of the dielectric layer in that unit.
- 32. A semiconductor chip assembly as claimed in claim 31 wherein at least some of said units include heat transfer layers overlying the traces of such unit, said units bearing on one another through said heat transfer layers.
- 33. A semiconductor chip assembly as claimed in claim 32 wherein at least some of said heat transfer layers extend across said bond windows and are substantially flat in the region extending across said bond windows.
- 34. A semiconductor chip assembly as claimed in claim 33 further comprising an encapsulant at least partially filling said bond windows.
- 35. A semiconductor chip assembly as claimed in claim 30 wherein each of said circuit panels includes a plurality of leads formed integrally with said traces, said leads extending into said at least one bond window of the circuit panel.
- 36. A semiconductor chip assembly comprising:
(a) a plurality of units, each unit including:
(i) a semiconductor chip having contacts on front surface; and (ii) a circuit panel having a central region and a peripheral region, the panel including a dielectric layer having first and second surfaces, at least one bond window extending between said first and second surfaces in said central region, a plurality of terminal pads exposed at the first and second surfaces in said peripheral region and a plurality of including traces extending in horizontal directions along the panel, the chip being disposed with the front surface of the chip facing toward the second surface of the dielectric layer in said central region, the contacts of the chip being connected to the traces of the panel in said at least one bond window; and (iii) an encapsulant in said at least one bond window, said encapsulant defining a surface substantially flush with the first surface of the dielectric layer, said units being superposed on one another in a stack so that the rear surface of a chip in one unit faces toward a surface of the dielectric layer in a next adjacent unit, said units bearing on one another in at least those portions of the central region occupied by said traces, the terminals of the units being aligned with one another; and (b) a plurality of conductive masses disposed between the terminals of the units and connecting terminals of adjacent units to one another.
- 37. A semiconductor chip assembly as claimed in claim 36 wherein each said dielectric layer is less than about 100 μm thick.
- 38. A semiconductor chip assembly as claimed in claim 36 wherein the chip of one said unit is disposed between the dielectric layer that unit and the dielectric layer of an adjacent one of said units, and wherein the vertical distance between corresponding surfaces of such dielectric layers is no more than 250 μm greater than the thickness of the semiconductor chip in such unit.
- 39. A semiconductor chip assembly as claimed in claim 36 wherein a vertical spacing distance between corresponding features in adjacent ones of said units is no more than 250 μm greater than the thickness of each chip.
- 40. A semiconductor chip assembly as claimed in claim 36 wherein each said unit further includes a substantially planar heat transfer layer overlying said at least one bond window and said encapsulant of such unit.
- 41. An in-process assemblage of interchangeable semi-finished units, each said unit including at least one semiconductor chip having at least one chip select contact and a plurality of other contacts and a circuit panel having a plurality of chip select terminals, a plurality of other terminals, and traces extending on or in the panel connected to said terminals, at least one trace of each said panel being a multi-branched trace including a common section and a plurality of branches connected to different ones of the chip select terminals, the contacts of the at least one chip in each unit being connected to traces of the circuit panel in that unit so that each chip select contact is connected to the common section of a multi-branched trace, said units including identical chips, identical terminals, and identical connections between contacts of the chips and terminals, said individual units being adapted for stacking one above the other with corresponding terminals of said units connected to one another.
- 42. An in-process collection of units as claimed in claim 41 wherein the circuit panels of a plurality of said units are portions of a common sheet.
- 43. An in-process collection of units as claimed in claim 41 wherein said sheet includes only a single layer of metallic features defining said traces and said terminals.
- 44. An in-process collection of units as claimed in claim 43 wherein each said circuit panel includes a dielectric layer less than 100 μm thick.
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] The present application claims benefit of U.S. Provisional Patent Application No. 60/328,038, filed Oct. 9, 2001, the disclosure of which is hereby incorporated by reference herein.
Provisional Applications (1)
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Number |
Date |
Country |
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60328038 |
Oct 2001 |
US |