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Radiation imagery chemistry: process, composition, or product thereof
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Y10S430/00
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GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10
USPC classification
Y10S
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Current Industry
Y10S430/00
Radiation imagery chemistry: process, composition, or product thereof
Sub Industries
Y10S430/001
Electric or magnetic imagery, e.g., xerography, electrography, magnetography, etc. Process, composition, or product
Y10S430/10
Donor-acceptor complex photoconductor
Y10S430/101
Photoconductive powder
Y10S430/102
Electrically charging radiation-conductive surface
Y10S430/103
Radiation sensitive composition or product containing specified antioxidant
Y10S430/104
One component toner
Y10S430/105
Polymer in developer
Y10S430/1053
Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
Y10S430/1055
Radiation sensitive composition or product or process of making
Y10S430/106
Binder containing
Y10S430/107
Polyamide or polyurethane
Y10S430/108
Polyolefin or halogen containing
Y10S430/109
Polyester
Y10S430/11
Vinyl alcohol polymer or derivative
Y10S430/111
Polymer of unsaturated acid or ester
Y10S430/112
Cellulosic
Y10S430/113
with plasticizer
Y10S430/114
Initiator containing
Y10S430/115
Cationic or anionic
Y10S430/116
Redox or dye sensitizer
Y10S430/117
Free radical
Y10S430/118
with inhibitor or stabilizer
Y10S430/119
Hydroxyl or carbonyl group containing as sole functional groups
Y10S430/12
Nitrogen compound containing
Y10S430/121
Nitrogen in heterocyclic ring
Y10S430/122
Sulfur compound containing
Y10S430/123
Sulfur in heterocyclic ring
Y10S430/124
Carbonyl compound containing
Y10S430/125
Carbonyl in heterocyclic compound
Y10S430/126
Halogen compound containing
Y10S430/127
Spectral sensitizer containing
Y10S430/128
Radiation-activated cross-linking agent containing
Y10S430/129
Aerial films or processes specifically adapted for aerial radiaion imagery
Y10S430/13
Antibronze agent or process
Y10S430/131
Anticurl layer
Y10S430/132
Anti-ultraviolet fading
Y10S430/133
Binder-free emulsion
Y10S430/134
Brightener containing
Y10S430/135
Cine film
Y10S430/136
Coating process making radiation sensitive element
Y10S430/137
Cobalt complex containing
Y10S430/138
Corona discharge process
Y10S430/139
Defect coating
Y10S430/14
Dimensionally stable material
Y10S430/141
Direct positive material
Y10S430/142
Dye mordant
Y10S430/143
Electron beam
Y10S430/144
Hydrogen peroxide treatment
Y10S430/145
Infrared
Y10S430/146
Laser beam
Y10S430/147
Lenticular
Y10S430/148
Light sensitive titanium compound containing
Y10S430/149
Lippmann
Y10S430/15
Lithographic emulsion
Y10S430/151
Matting or other surface reflectivity altering material
Y10S430/152
Making camera copy
Y10S430/153
Multiple image producing on single receiver
Y10S430/154
Neutron beam
Y10S430/155
Nonresinous additive to promote interlayer adhesion in element
Y10S430/156
Precursor compound
Y10S430/157
interlayer correction coupler, ICC
Y10S430/158
Development inhibitor releaser, DIR
Y10S430/159
Development dye releaser, DDR
Y10S430/16
Blocked developers
Y10S430/161
Blocked restrainers
Y10S430/162
Protective or antiabrasion layer
Y10S430/163
Radiation-chromic compound
Y10S430/164
Rapid access processing
Y10S430/165
Thermal imaging composition
Y10S430/166
Toner containing
Y10S430/167
X-ray
Y10S430/168
X-ray exposure process
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Issue date
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Publication date
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Publication date
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Publication date
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Publication number
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Publication date
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Information
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Publication number
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Publication date
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Publication number
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Publication date
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H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
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Publication number
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Publication date
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Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Application
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Publication number
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Publication date
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Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
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Publication number
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Publication date
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Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Application
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Publication number
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Publication date
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C07 - ORGANIC CHEMISTRY
Information
Patent Application
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Publication number
20140175302
Publication date
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B82 - NANO-TECHNOLOGY
Information
Patent Application
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Publication number
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Publication date
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Information
Patent Application
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Publication number
20140170563
Publication date
Jun 19, 2014
Shin-Etsu Chemical Co., Ltd.
Jun HATAKEYAMA
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC