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Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces
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Industry
CPC
G03F9/00
This industry / category may be too specific. Please go to a parent level for more data
Parent Industries
G
PHYSICS
G03
Photography
G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
Current Industry
G03F9/00
Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces
Sub Industries
G03F9/70
for microlithography
G03F9/7003
Alignment type or strategy
G03F9/7007
Alignment other than original with workpiece
G03F9/7011
Pre-exposure scan; original with original holder alignment; Prealignment
G03F9/7015
Reference
G03F9/7019
Calibration
G03F9/7023
Aligning or positioning in direction perpendicular to substrate surface
G03F9/7026
Focusing
G03F9/703
Gap setting
G03F9/7034
Leveling
G03F9/7038
Alignment for proximity or contact printer
G03F9/7042
Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation
G03F9/7046
Strategy
G03F9/7049
Technique
G03F9/7053
Non-optical
G03F9/7057
Gas flow
G03F9/7061
Scanning probe microscopy
G03F9/7065
Production of alignment light
G03F9/7069
Alignment mark illumination
G03F9/7073
Alignment marks and their environment
G03F9/7076
Mark details
G03F9/708
Mark formation
G03F9/7084
Position of mark on substrate: i.e. position in (x, y, z) of mark
G03F9/7088
Alignment mark detection
G03F9/7092
Signal processing
G03F9/7096
Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus
Industries
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Information
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Patents Grants
last 30 patents
Information
Patent Grant
Wafer alignment using form birefringence of targets or product
Patent number
11,971,665
Issue date
Apr 30, 2024
ASML Holding N.V.
Joshua Adams
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Lithographic overlay correction and lithographic process
Patent number
11,966,170
Issue date
Apr 23, 2024
Taiwan Semiconductor Manufacturing Company Ltd.
Ai-Jen Hung
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Imprint apparatus, imprint method, and article manufacturing method
Patent number
11,966,157
Issue date
Apr 23, 2024
Canon Kabushiki Kaisha
Kengo Kamei
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Measurement apparatus and a method for determining a substrate grid
Patent number
11,966,166
Issue date
Apr 23, 2024
ASML Netherlands B.V.
Franciscus Godefridus Casper Bijnen
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Method for producing overlay results with absolute reference for se...
Patent number
11,966,171
Issue date
Apr 23, 2024
Tokyo Electron Limited
Anton J. deVilliers
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Invariable magnification multilevel optical device with telecentric...
Patent number
11,960,216
Issue date
Apr 16, 2024
ASML Holding N.V.
Lev Ryzhikov
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for controlling a manufacturing process and associated appar...
Patent number
11,947,266
Issue date
Apr 2, 2024
ASML Netherlands B.V.
Nicolaas Petrus Marcus Brantjes
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Autofocusing method for an imaging device
Patent number
11,947,185
Issue date
Apr 2, 2024
Carl Zeiss SMT GmbH
Dirk Seidel
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reticle processing system
Patent number
11,940,724
Issue date
Mar 26, 2024
Applied Materials, Inc.
Sanjay Bhat
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Methods and apparatus for obtaining diagnostic information relating...
Patent number
11,940,740
Issue date
Mar 26, 2024
ASML Netherlands B.V.
Alexander Ypma
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Overlay alignment mark and method for measuring overlay error
Patent number
11,934,109
Issue date
Mar 19, 2024
Zhongke Jingyuan Electron Limited, Beijing (CN)
Weimin Ma
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Detection apparatus, lithography apparatus, and article manufacturi...
Patent number
11,934,098
Issue date
Mar 19, 2024
Canon Kabushiki Kaisha
Tomokazu Taki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Extreme ultraviolet (EUV) photomask and method of manufacturing sem...
Patent number
11,927,879
Issue date
Mar 12, 2024
Samsung Electronics Co., Ltd.
Moosong Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Apparatus and methods for determining the position of a target stru...
Patent number
11,927,891
Issue date
Mar 12, 2024
ASML Netherlands B.V.
Nitesh Pandey
G01 - MEASURING TESTING
Information
Patent Grant
Alignment method and associated alignment and lithographic apparatuses
Patent number
11,927,892
Issue date
Mar 12, 2024
ASML Netherlands B.V.
Franciscus Godefridus Casper Bijnen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Substrate processing system and substrate processing method, and de...
Patent number
11,921,436
Issue date
Mar 5, 2024
Nikon Corporation
Yuichi Shibazaki
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Inspection apparatus lithographic apparatus measurement method
Patent number
11,914,307
Issue date
Feb 27, 2024
ASML Netherlands B.V.
Bas Johannes Petrus Roset
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Lithographic apparatus
Patent number
11,914,308
Issue date
Feb 27, 2024
ASML Netherlands B.V.
Hans Butler
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method and apparatus for an imaging system
Patent number
11,915,909
Issue date
Feb 27, 2024
Frederick A. Flitsch
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Measurement system, substrate processing system, and device manufac...
Patent number
11,915,961
Issue date
Feb 27, 2024
Nikon Corporation
Go Ichinose
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Apparatus for and method of sensing alignment marks
Patent number
11,899,380
Issue date
Feb 13, 2024
ASML Holding N.V.
Krishanu Shome
G01 - MEASURING TESTING
Information
Patent Grant
Massive overlay metrology sampling with multiple measurement columns
Patent number
11,899,375
Issue date
Feb 13, 2024
KLA Corporation
Jonathan Madsen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Imprint apparatus, imprint method, and article manufacturing method
Patent number
11,899,362
Issue date
Feb 13, 2024
Canon Kabushiki Kaisha
Yosuke Murakami
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Methods for forming alignment marks
Patent number
11,899,376
Issue date
Feb 13, 2024
Applied Materials, Inc.
Prayudi Lianto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Bonding alignment marks at bonding interface
Patent number
11,876,049
Issue date
Jan 16, 2024
Yangtze Memory Technologies Co., Ltd.
Meng Yan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Alignment mark count acquiring method and device
Patent number
11,860,555
Issue date
Jan 2, 2024
CHANGXIN MEMORY TECHNOLOGIES, INC.
Heng Wang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Accuracy improvements in optical metrology
Patent number
11,862,522
Issue date
Jan 2, 2024
Barak Bringoltz
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Electron beam lithography with dynamic fin overlay correction
Patent number
11,852,975
Issue date
Dec 26, 2023
International Business Machines Corporation
Simon Dawes
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for calibrating alignment of wafer and lithography system
Patent number
11,854,854
Issue date
Dec 26, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Chang-Jen Chen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Imprint method, imprint apparatus, and film formation apparatus
Patent number
11,852,985
Issue date
Dec 26, 2023
Kioxia Corporation
Takeshi Higuchi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
MEASUREMENT DEVICE, LITHOGRAPHY SYSTEM AND EXPOSURE APPARATUS, AND...
Publication number
20240134294
Publication date
Apr 25, 2024
Nikon Corporation
Yuichi Shibazaki
G01 - MEASURING TESTING
Information
Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD, AND DE...
Publication number
20240134295
Publication date
Apr 25, 2024
Nikon Corporation
Yuichi Shibazaki
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED BROADBAND RADIATION GENERATOR
Publication number
20240118584
Publication date
Apr 11, 2024
ASML NETHERLANDS B.V.
Janneke Ravensbergen
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
METROLOGY TARGET SIMULATION
Publication number
20240118625
Publication date
Apr 11, 2024
ASML NETHERLANDS B.V.
Markus Gerardus Martinus Maria VAN KRAAIJ
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD, APPARATUS AND COMPUTER PROGRAM FOR PROCESSING A SURFACE OF...
Publication number
20240118632
Publication date
Apr 11, 2024
Carl Zeiss SMT GMBH
Stefan Friedrich Rohrlack
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS
Publication number
20240120332
Publication date
Apr 11, 2024
Monolithic 3D Inc.
Zvi Or-Bach
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES
Publication number
20240118631
Publication date
Apr 11, 2024
Nick Franciscus Wilhelmus THISSEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ALIGNMENT-OVERLAY MARK AND METHOD USING THE SAME
Publication number
20240096813
Publication date
Mar 21, 2024
Micron Technology, Inc.
KAZUKO YAMASHITA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PATTERN FORMATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD...
Publication number
20240094624
Publication date
Mar 21, 2024
KIOXIA Corporation
Masaki MITSUYASU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
BUTTRESSED FIELD TARGET DESIGN FOR OPTICAL AND E-BEAM BASED METROLO...
Publication number
20240069447
Publication date
Feb 29, 2024
Intel Corporation
Deepak SELVANATHAN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
DATA FILTER FOR SCANNING METROLOGY
Publication number
20240069454
Publication date
Feb 29, 2024
ASML NETHERLANDS B.V.
Cristina CARESIO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHODS FOR FORMING ALIGNMENT MARKS
Publication number
20240069448
Publication date
Feb 29, 2024
Applied Materials, Inc.
Prayudi LIANTO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
DETECTION DEVICE, DETECTION METHOD, LITHOGRAPHY APPARATUS, AND ARTI...
Publication number
20240069455
Publication date
Feb 29, 2024
Canon Kabushiki Kaisha
KOHEI SENSHU
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
SEMICONDUCTOR STRUCTURE WITH OVERLAY MARK, METHOD OF MANUFACTURING...
Publication number
20240071842
Publication date
Feb 29, 2024
NANYA TECHNOLOGY CORPORATION
Tsai-Wei LIN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SEMICONDUCTOR STRUCTURE WITH OVERLAY MARK AND SYSTEM FOR MANUFACTUR...
Publication number
20240071843
Publication date
Feb 29, 2024
NANYA TECHNOLOGY CORPORATION
Tsai-Wei LIN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF MANUFACTURING MASK, MASK AND METHOD OF MANUFACTURING MASK...
Publication number
20240060168
Publication date
Feb 22, 2024
DAI NIPPON PRINTING CO., LTD.
Hideyuki OKAMOTO
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
ELECTRON BEAM LITHOGRAPHY WITH DYNAMIC FIN OVERLAY CORRECTION
Publication number
20240061342
Publication date
Feb 22, 2024
International Business Machines Corporation
Simon DAWES
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SUPERCONTINUUM RADIATION SOURCE AND ASSOCIATED METROLOGY DEVICES
Publication number
20240061314
Publication date
Feb 22, 2024
ASML NETHERLANDS B.V.
Sebastian Thomas BAUERSCHMIDT
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD FOR DETERMINING A FOCUS ACTUATION PROFILE FOR ONE OR MORE AC...
Publication number
20240061353
Publication date
Feb 22, 2024
ASML NETHERLANDS B.V.
Simon Hendrik Celine VAN GORP
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ILLUMINATION APPARATUS, MEASUREMENT APPARATUS, SUBSTRATE PROCESSING...
Publication number
20240061349
Publication date
Feb 22, 2024
Canon Kabushiki Kaisha
Yuki Isaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR DETECTING COORDINATE OF MARK, COMPUTING SYSTEM FOR PERFO...
Publication number
20240061354
Publication date
Feb 22, 2024
Samsung Electronics Co., Ltd.
Seung Hak PARK
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
INVARIABLE MAGNIFICATION MULTILEVEL OPTICAL DEVICE WITH TELECENTRIC...
Publication number
20240053688
Publication date
Feb 15, 2024
ASML Holding N.V.
Lev Ryzhikov
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD
Publication number
20240053941
Publication date
Feb 15, 2024
Canon Kabushiki Kaisha
Naoki Miyata
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
IMPRINTING METHOD, IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD
Publication number
20240045347
Publication date
Feb 8, 2024
Canon Kabushiki Kaisha
YUJI SAKATA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ANALYZING METHOD, ANALYSIS APPARATUS, MEASURING METHOD, MEASUREMENT...
Publication number
20240045348
Publication date
Feb 8, 2024
Nikon Corporation
Ayako SUGIMOTO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR APPARATUS
Publication number
20240036486
Publication date
Feb 1, 2024
Fuji Electric Co., Ltd.
Kazuhiro KITAHARA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF
Publication number
20240036485
Publication date
Feb 1, 2024
ASML Netheriands B. V.
Arjan Johannes Anton BEUKMAN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF METROLOGY AND ASSOCIATED APPARATUSES
Publication number
20240036484
Publication date
Feb 1, 2024
ASML NETHERLANDS B.V.
Timothy Dugan DAVIS
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...
Publication number
20240036480
Publication date
Feb 1, 2024
ASML NETHERLANDS B.V.
Armand Eugene Albert KOOLEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM
Publication number
20240027918
Publication date
Jan 25, 2024
ASML NETHERLANDS B.V.
Simon Gijsbert Josephus MATHIJSSEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY