Embodiments of the present disclosure relate to a semiconductor package, more particularly a stacked semiconductor package in which semiconductor chips having various sizes are stacked and a manufacturing method thereof.
In recent years, as for semiconductor components, due to the miniaturization of a processing technology and the diversification of functions, the size of chip is miniaturized and the number of input/output ports are increased so that an electrode pad pitch is miniaturized more and more. In addition, since the fusion of various functions is accelerated, a system level packaging technology, which is a plurality of elements are integrated in a single package, is on the rise. The system level packaging technology has been changed to be a three dimensional stacking technique, which can keep a short signal length in order to minimize a noise between operations and to improve a signal speed. On the other hand, because of the requirements of the improvement of these techniques, and the high productivity and the reduction of the manufacturing cost to control the rise in product prices, a stacked package that is formed by stacking a plurality of semiconductor chips have been introduced.
In order to implement the stacked package, it is desirable that semiconductor chips stacked in a single package have the same size. When the semiconductor chips stacked in the single package have different sizes to each other, particularly, a semiconductor chip disposed on the lower side have a smaller size than that of a semiconductor chip disposed on the upper side, it is not easy to stack semiconductor chips. Korean Patent Publication No. 2005-0048323, published May. 24, 2005, discloses a semiconductor package in which semiconductor chips having the same size are stacked. In the above patent, a semiconductor chip having a relatively small size is adjusted to the same size as that of the semiconductor chip having a relatively large size by adding a peripheral region to the semiconductor chip having a relatively small size. However, since the peripheral region thereof is provided by a wafer forming the semiconductor chip, the yield of semiconductor chips per wafer may be reduced, and there may be difficulties to apply to the semiconductor chips of various sizes.
Therefore, it is an aspect of the present disclosure to a stacked semiconductor package capable of staking easily semiconductor chips having various sizes.
It is another aspect of the present disclosure to provide a manufacturing method of the stacked semiconductor package.
Additional aspects of the present disclosure will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
In accordance with one aspect of the present disclosure, a stacked semiconductor package includes a first semiconductor chip structure provided with a first semiconductor chip, a first mold layer surrounding the first semiconductor chip, and a first penetration electrode passing through the first mold layer and electrically connected to the first semiconductor chip, and a second semiconductor chip structure vertically stacked on the first semiconductor chip structure and provided with a second semiconductor chip and a second penetration electrode electrically connected to the first penetration electrode, wherein the first semiconductor chip structure may have the same size as the second semiconductor chip structure.
At least one side of the first mold layer may have the same size as at least one side of the second semiconductor chip structure.
One side of the first semiconductor chip may have the same size as one side of the second semiconductor chip.
The first semiconductor chip structure may be stacked to be disposed on the upper side of the second semiconductor chip structure.
The second semiconductor chip structure may be stacked to be disposed on the upper side of the first semiconductor chip structure.
An active surface of the first semiconductor chip may be disposed to face the second semiconductor chip.
An active surface of the first semiconductor chip may be disposed to be opposite to the second semiconductor chip.
The first penetration electrode and the second penetration electrode may be disposed on the same position.
The first semiconductor chip may include a first chip pad, and the first semiconductor chip structure may further include a rerouting pattern configured to connect the first chip pad of the first semiconductor chip to the first penetration electrode and formed on the first mold layer.
The second semiconductor chip structure may further include a second mold layer surrounding the second semiconductor chip.
The stacked semiconductor package may further include a third semiconductor chip structure vertically stacked on the first semiconductor chip structure or the second semiconductor chip structure, wherein the third semiconductor chip structure may have the same size as the first semiconductor chip structure or the second semiconductor chip structure.
The third semiconductor chip structure may include a third semiconductor chip, a third mold layer surrounding the third semiconductor chip, and a third penetration electrode passing through the third mold layer.
The third semiconductor chip may have a different size from at least one of the first semiconductor chip and the second semiconductor chip.
In accordance with another aspect of the present disclosure, a manufacturing method for a stacked semiconductor package includes forming a first mold layer surrounding a first semiconductor chip, forming a first penetration electrode passing through the first mold layer, forming a stacked semiconductor package by forming a rerouting pattern on the first mold layer to connect the first penetration electrode to the first chip pad, stacking a second semiconductor chip structure having a second semiconductor chip and a second penetration electrode on the first semiconductor chip structure, and electrically connecting the first penetration electrode of the first semiconductor chip structure to the second penetration electrode of the second semiconductor chip structure, wherein the first semiconductor chip structure may have the same size as the second semiconductor chip structure.
As is apparent from the above description, according to the proposed stacked semiconductor package, it may be possible to adjust stacked semiconductor chips so that the stacked semiconductor chips have the same size by forming a semiconductor chip structure in which a small semiconductor chip has the same size as a big semiconductor chip by forming a mold layer surrounding the small semiconductor.
The mold layer is applied to separate semiconductor chips, so that the size of semiconductor chips having various sizes may be adjusted to facilitate.
A stacked semiconductor package may be realized without changing a wafer design for different kinds of semiconductor devices so that fusion of semiconductor devices of various applications is obtained.
The implementation at wafer level is possible so that the manufacturing cost may be reduced and the productivity may be improved. There is design flexibility in a stacked direction of an upper surface or a lower surface of a semiconductor chip device, the stacking structure with high reliability may be realized depending on the field of application of the package. Different kinds of semiconductor device are easily stacked by using a panel or a substrate as an interposer, that is, mediator, by using rearranging chip.
These and/or other aspects of the disclosure will become apparent and more readily appreciated from the following description of embodiments, taken in conjunction with the accompanying drawings of which:
Reference will now be made in detail to embodiments of the present disclosure, examples of which are illustrated in the accompanying drawings. Embodiments of the present disclosure are offered to illustrate more fully aspects of the present disclosure to person skilled in the art and the following embodiments may be modified in the form of a range of the aspect of the present disclosure, but is not limited to the following embodiments. Rather, these embodiments are provided to further enhance the present disclosure, and to illustrate completely the aspect of the present disclosure to those skilled in the art. As used herein, the term “and/or” includes any combination of one or more with any of the listed items. An Identical numeral refers to like elements throughout of the following embodiments. Further, various elements and regions in the drawings are schematically illustrated. Thus, the aspect of the present disclosure is not limited by the thickness and relative size illustrated in the accompanying drawings.
Referring to
The substrate 10 may include a printed circuit board (PCB), a flexible board, a tape board, and the like. The substrate 10 may include glass, ceramic, plastic or polymer. The substrate 10 may further include a substrate pad 12 in which the first semiconductor chip structure 20 and the second semiconductor chip structure 30 are electrically connected to. The substrate 10 may further include an external connection member 14 in which the first semiconductor chip structure 20 and the second semiconductor chip structure 30 electrically connect to the outside. The external connection member 14 may be electrically connected to the substrate pad 12. The external connection member 14 may adopt a solder ball.
The first semiconductor structure 20 may include a first semiconductor chip 21, a first mold layer 22 surrounding the first semiconductor chip 21 and a first penetration electrode 23 passing through the first mold layer 22 and being connected to the first semiconductor chip 21.
The second semiconductor structure 30 may include a second semiconductor chip 31, and a second penetration electrode 33 electrically connected to the first penetration electrode 23. According to one embodiment, the second semiconductor chip structure 30 may include the second semiconductor chip 31, and the second penetration electrode 33 may pass through the second semiconductor chip 31.
The second semiconductor structure 30 may be vertically stacked on the first semiconductor structure 20. According to one embodiment, the second semiconductor structure 30 may be vertically stacked on an upper side of the first semiconductor structure 20. In addition, the first semiconductor structure 20 and the second semiconductor structure 30 may have the same size. This will be described in detail with reference to
The first semiconductor chip 21 and the second semiconductor chip 31 may adopt the same type products or the different type products. For example, the first semiconductor chip 21 and the semiconductor chip 31 may be a memory chip or a logic chip. The memory chip may include a dynamic random access memory (DRAM), a static random access memory (SRAM), a flash, a phase change random access memory (PRAM), a resistive random access memory (ReRAM), a ferroelectric random access memory (FeRAM) or a magnetoresistive random access memory (MRAM). The logic chip may be a controller for controlling the memory chip. For example, the first semiconductor chip 21 may be the logic chip including a logic circuit, and the second semiconductor chip 31 may be the memory chip, or vice versa. The stacked semiconductor package 100 may be system on chip (SOC) or system in package (SIP).
The first mold layer 22 may surround the first semiconductor 21. The first mold layer 22 may include an insulating material, such as an epoxy mold compound (EMC). The first semiconductor chip 21 may be exposed from the first molding layer 21, and may include an active surface 21a in which devices (not shown) are formed, an inactive surface 21b embedded in the first molding layer 22, and a side surface 21c. Alternatively, the first mold layer 22 surrounds the side surface 21c of the first semiconductor chip 22, and exposes the active surface 21a and the inactive surface 21b. In the stacked semiconductor package 100, the first semiconductor chip 21 may be formed in face-up structure which the active surface 21a is exposed toward the upper side. The active surface 21a of the first semiconductor chip 21 may be disposed to face the second semiconductor chip 31.
The first semiconductor chip 21 may include a first chip pad 24 on the active surface 21a. The first chip pad 24 may be electrically connected to the elements (not shown) formed on the first semiconductor chip 21. The first chip pad 24 may be electrically connected to a first rerouting pattern 25 formed on the first mold layer 22. The first rerouting pattern 25 may include an electrical conductor, particularly, metal, such copper, copper alloy, aluminum, or aluminum alloy. The first rerouting pattern 25 may be electrically connected to the first penetration electrode 23 through a pad 26. That is, the first rerouting pattern 25 may electrically connect the first penetration electrode 23 to the first chip pad 24. Therefore, the first semiconductor chip 21 may be electrically connected to the substrate 10 through the first chip pad 24, the first rerouting pattern 25, the pad 26, and the first penetration electrode 23. The first semiconductor chip 21 is connected to the first rerouting pattern 25 so that the second semiconductor chip structure 30 may have a fan out structure.
The second semiconductor chip structure 30 may be electrically connected to the substrate 10 through a second chip pad 34 and a bump 80. Particularly, the second semiconductor chip 31 may be electrically connected to the pad 26 through the second chip pad 34 and the bump 80, and then may be electrically connected to the substrate 10 through the first penetration electrode 23, the pad 26, and the bump 80.
In addition, the second semiconductor chip structure 30 may be electrically connected to the first semiconductor chip structure 20 through the second chip pad 34 and the bump 80. Particularly, the second semiconductor chip 31 may be electrically connected to the pad 26 through the second chip pad 34 and the bump 80, and then may be electrically connected to the first semiconductor chip 21 through the first chip pad 24.
The second semiconductor chip 31 may include a first surface 31a and a second surface 31b, both of which are opposite to each other. In a case when the first surface 31a of the second semiconductor chip 31 is an active surface, the second semiconductor chip 31 may have an electrical connection, as mentioned above. Alternatively, in a case when the second surface 31b of the second semiconductor chip 31 is an active surface, elements (not shown) formed on the active surface may be electrically connected to the substrate 10 through the second penetration electrode 33.
The first penetration electrode 23 and the second penetration electrode 33 may be disposed at the same position to be connected to each other through the bump 80. Herein, being disposed at the same position may mean that the first penetration electrode 23 and the second penetration electrode 33 are disposed in a vertical line with respect to the substrate 10, and may mean to be two dimensionally disposed in the same coordinates. That is, a footprint of the first penetration electrode 23 and a footprint of the second penetration electrode 33 are the same.
Optionally, the stacked semiconductor package 100 may further include an external sealing member 90 sealing the first semiconductor chip structure 20 and the second semiconductor chip structure 30. The external sealing member 90 may include an insulating material, such as an epoxy molding compound. The external sealing member 90 may include a material identical to the first mold layer 22 or a material different from the first mold layer 22.
A case of a plurality of the second semiconductor chip structures 30 being stacked on the first semiconductor chip structures 20 is included in an aspect of the present disclosure.
As referring to
In the first semiconductor chip structure 20, the first chip pad 24 of the first semiconductor chip 21 may be electrically connected to the pad 26 on the first mold layer 22 through the first rerouting pattern 25. The first semiconductor chip 21 may have a length (L1) and a width (W1). The length (L1) and the width (W1) may be the same or different.
The first mold layer 22 may surround the first semiconductor chip 21. The first mole layer 22 may have a length (L2) and a width (W2), which the length (L2) is longer than the length (L1) of the first semiconductor chip 21 and the width (W2) is wider than the width (W1) of the first semiconductor chip 21. The length (L2) and the width (W2) may be the same or different.
The second semiconductor structure 30 may have a length (L3) and a width (W3). The length (L3) and the width (W3) may be the same or different. According to one embodiment of the present disclosure, the second semiconductor chip structure 30 may include the second semiconductor chip 31
The length (L2) of the first mold layer 22 may be same as the length (L3) of the second semiconductor chip structure 30, and the width (W2) of the first mold layer 22 may be same as the width (W3) of the second semiconductor chip structure 30. Therefore, the first semiconductor chip structure 20 may have the same size as the second semiconductor chip structure 30. That is, when the first semiconductor chip 21 is smaller than the second semiconductor chip 31, the first semiconductor chip structure 20 and the second semiconductor chip structure 30, both of which are stacked to each other, may have the same size by providing the first mold layer 22 surrounding the first semiconductor 21.
Referring to
The first semiconductor chip structure 20 may include the first semiconductor chip 21 having a length (L1) and the first mold layer 22 having a length (L2), which is longer than the length (L1). Alternatively, a width of the first semiconductor chip 21 and a width of the first mold layer 22 may be same as a width (W2). In addition, the second semiconductor chip structure 30 may have a length (L3) and a width (W3). The length (L2) of the first mold layer 22 may be the same as the length (L3) of the second semiconductor chip structure 30, and the width (W2) of the first mold layer 22 may be the same as the width (W3) of the second semiconductor chip structure 30.
Referring to
Referring to
Referring to
Referring
The second semiconductor chip structure 30a may include a second semiconductor chip 31aa and a second mold layer 32 surrounding the second semiconductor chip 31aa. The second mold layer 32 surrounds the second semiconductor chip 31aa and the first mold layer 22 surrounds the first semiconductor chip 21 so that the second semiconductor chip structure 30a may have the same size as that of the first semiconductor chip structure 20.
The second mold layer 32 may include an insulating material, such as an epoxy mold compound (EMC). The second mold layer 32 may include a material identical to the first mold layer 22 or a material different from the first mold layer 22.
The second semiconductor chip 31 as may include a second chip pad 34a. The second chip pad 34a may be electrically connected to the elements (not shown) formed on the second semiconductor chip 31aa. The second chip pad 34a may be electrically connected to a second rerouting pattern 35a formed on the second mold layer 32. The second rerouting pattern 35a may include a electrical conductor, particularly, metal, such copper, copper alloy, aluminum, or aluminum alloy. The second rerouting pattern 35a may be electrically connected to the second penetration electrode 33 through a pad 36. That is, the second rerouting pattern 35a may electrically connect the second penetration electrode 33 to the second chip pad 34a. The second penetration electrode 33 and the first penetration electrode 23 may be disposed the same position to be electrically connected to each other through a bump 80. The second semiconductor chip 31 as is connected to the second rerouting pattern 35a so that the second semiconductor chip structure 30a may have a fan out structure.
Similarly to the above-mentioned, the direction of the active surface of the first semiconductor chip 21 and the second semiconductor chip 31 as may be varied in many ways.
Referring to
Referring to
Referring to
The third semiconductor chip structure 50 may include a third semiconductor chip 51, a third mold layer 52 surrounding the third semiconductor chip 51, and a third penetration electrode 53 passing through the third mold layer 53 and being connected to the third semiconductor chip 51.
The third semiconductor chip 51 may be a memory chip or a logic chip. The third semiconductor chip 51 may adopt the same type products or the different type products as the first semiconductor chip 21 or the first semiconductor chip 31. The third semiconductor chip 51 may be larger, smaller, or same size as the first semiconductor chip 21. Alternatively, the third semiconductor chip 51 may be larger, smaller, or same as the second semiconductor chip 31.
The third mold layer 52 may include an insulating material, such as an epoxy mold compound (EMC). The third mold layer 52 may include a material identical to the first mold layer 22 or a material different from the first mold layer 22.
The third semiconductor chip 51 may include a second chip pad 54. The third chip pad 54 may be electrically connected to the elements (not shown) formed on the third semiconductor chip 51. The third chip pad 54 may be electrically connected to a third rerouting pattern 55 formed on the third mold layer 52. The third rerouting pattern 55 may include a electrical conductor, particularly, metal, such copper, copper alloy, aluminum, or aluminum alloy. The third rerouting pattern 55 may be electrically connected to the third penetration electrode 53 through a pad 56. That is, the third rerouting pattern 55 may electrically connect the third penetration electrode 53 to the third chip pad 53. The third penetration electrode 53 and the first penetration electrode 23 may be disposed the same position to be electrically connected to each other through a bump 80. The third semiconductor chip 51 is connected to the third rerouting pattern 55 so that the third semiconductor chip structure 50 may have a fan out structure.
In the stacked semiconductor package 800, the first semiconductor chip 21 may have a face-up structure, which the active surface 21a is exposed toward the upper side, and the third semiconductor chip 51 may have a face-up structure, which the active surface 51a is exposed toward the upper side
Referring to
Referring to
Referring to
Referring to
The fourth mold layer 62 may include a fourth penetration electrode 67 inside thereof, and the fourth penetration electrode 67 may be electrically connected to the first chip pad 24 of the first semiconductor chip 21. The fourth penetration electrode 67 may be electrically connected to a fourth rerouting pattern 65, and the fourth rerouting pattern 65 may be electrically connected to a fourth pad 66. The fourth rerouting pattern 65 may include a electrical conductor, particularly, metal, such copper, copper alloy, aluminum, or aluminum alloy. Therefore, the first semiconductor chip 21 may be electrically connected to the substrate 10 through the fourth penetration electrode 67, the fourth rerouting pattern 65, and the fourth pad 66. In addition, a fifth penetration electrode 63 may act as the second penetration electrode 33 of
According to one embodiment of the present disclosure, the first semiconductor chip 21 may have a face-down structure, which is the active surface 21a is toward the lower side and connected to the fourth penetration electrode 67. A top surface of the fourth mold layer 62 and a top surface of the first semiconductor chip 21 may be or be not on the same plane.
Alternatively, the first semiconductor chip 21 may be a dummy chip. In addition, the fourth mold layer 62 may redistribute the second semiconductor chip structure 30.
Referring to
The fourth mold layer 62 may include a fourth penetration electrode 67 inside thereof, and the fourth penetration electrode 67 may be electrically connected to the first chip pad 24 of the first semiconductor chip 21. Herein, the first semiconductor chip 21 may include a sixth penetration electrode 68 electrically connecting the fourth penetration electrode 67 to the first chip pad 24.
Therefore, the first semiconductor chip 21 may be electrically connected to the substrate 10 through the sixth penetration electrode 68, the fourth penetration electrode 67, the fourth rerouting pattern 65, and the fourth pad 66. In addition, the fifth penetration electrode 63 may act as the second penetration electrode 33 of
According to one embodiment of the present disclosure, the first semiconductor chip 21 may have a face-up structure, which is the active surface 21a is toward the upper side and connected to the fourth penetration electrode 67. A top surface of the fourth mold layer 62 and a top surface of the first semiconductor chip 21 may be or be not on the same plane.
Alternatively, the first semiconductor chip 21 may be a dummy chip. In addition, the fourth mold layer 62 may redistribute the second semiconductor chip structure 30.
The stacked semiconductor packages illustrated in
Referring to
Referring to
Referring to
Referring to
The stacking of the first semiconductor chip structure 20 and the second semiconductor chip structure 30 may be realized by a wafer level stack technology, which is stacked as a form of a wafer.
Referring to
Referring to
Although a few embodiments of the present disclosure have been shown and described, it would be appreciated by those skilled in the art that changes may be made in these embodiments without departing from the principles and spirit of the disclosure, the scope of which is defined in the claims and their equivalents.
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