Since the invention of the integrated circuit (IC), the semiconductor industry has experienced rapid growth due to continuous improvements in the integration density of various electronic components (i.e., transistors, diodes, resistors, capacitors, etc.). For the most part, this improvement in integration density has resulted from repeated reductions in minimum feature size, which allows more components to be integrated into a given area. These smaller electronic components have led to smaller packages, which utilize less area than previous package types. Some smaller types of packages for semiconductor devices include quad flat pack (QFP), pin grid array (PGA), ball grid array (BGA), flip chips (FC), three dimensional integrated circuits (3D ICs), wafer level packages (WLPs), and package on package (PoP) devices. These package types are vulnerable to stresses or strains, which can degrade electrical connections between a package and a device to which the package is electrically coupled.
For a more complete understanding of the present embodiments, and the advantages thereof, reference is now made to the following descriptions taken in conjunction with the accompanying drawings, in which:
The making and using of the embodiments of the present disclosure are discussed in detail below. It should be appreciated, however, that the present disclosure provides many applicable inventive concepts that can be embodied in a wide variety of specific contexts. The specific embodiments discussed are merely illustrative of specific ways to make and use the disclosed subject matter, and do not limit the scope of the different embodiments. Throughout the various views and illustrative embodiments, like reference numbers are used to designate like elements.
The MUF 120 may be formed to encapsulate all or a selected number and/or group of the plurality of electrical connections 112 between the package component 110 and the device 130. In an embodiment, as shown in
The MUF 120 may provide reinforcement support against breaking, cracking, shearing, or other possible damage to the electrical connections 112, which could degrade electrical connectivity between the package component 110 and the device 130. The MUF 120, may, in effect, aid in minimizing lateral, horizontal, and/or torsional stresses or strains between the package component 110, the electrical connections 112, and/or the device 130 that may occur during or following manufacture through thermal fluctuations, physical manipulation, atmospheric pressure changes, etc. In the embodiment, as shown in
In various embodiments, the MUF 120 may be formed of reworkable or non-reworkable materials such as, for example, epoxy, deformable gel, silicon rubber, thermal plastic polymer, thermal set polymer, a combination thereof or the like. In various embodiments, the MUF 120 may include a filler material ranging in size from 10 μm to 50 μm. The MUF 120 may have a glass transition temperature, Tg, ranging from approximately 100° C. to approximately 150° C. In various embodiments, the MUF 120 may be formed using dispensing, injecting, and/or spraying techniques.
As shown in
In various embodiments, as discussed in further detail below, the package 100 may be formed without a molding compound applied to the second horizontal side 110b of the package component 110. In such embodiments (not shown in
In various embodiments, the package component 110 may be a wafer, a die, a substrate, an interposer or combinations thereof, such as may be used, for example, in stacked or 3D IC type devices (not shown) or in mico-electrical-mechanical system (“MEMS”) type devices (not shown). In various embodiments, the package component 110 may include one or more layers of dielectric materials, metal materials, and/or insulating materials which may be used to form interlayer dielectrics (“ILDs”), intermetal dielectrics (“IMDs”). In various embodiments, the package component 110 may include active devices such as, for example, transistors and/or sensors (not shown). In various embodiments, the package component 110 may include passive devices such resistors, capacitors, inductors or other like devices (none shown). In various embodiments, the package component 110 may be free from active and/or passive devices.
In various embodiments, the molding compound 114 may be formed of polymer, liquid epoxy, combinations thereof or the like. The molding compound 114 may include a filler material having a size of less than 10 μm. The molding compound 114 may have a glass transition temperature, Tg, ranging from approximately 130° C. to approximately 200° C. In various embodiments, the electrical connections 112 may be formed of solder, non-eutectic lead, tin, copper, gold, nickel, aluminum alloys, combinations thereof or the like. Although the electrical connections 112, as illustrated in
In various embodiments, the device 130 may be a printed circuit board (“PCB”), a wafer, a die, a substrate, an interposer, or combinations thereof, such as may be used, for example, 3D IC type devices (not shown) or MEMS type devices (not shown). In various embodiments, the device 130 may include conductive pads (not shown), which may provide for coupling the one or more electrical connections 112 thereto.
The size, shape, type, composition, and/or location of the package component 110, the one or more electrical connections 112, the molding compound 114, and or the device 130 are provided for illustrative purposes only and are not meant to limit the scope of the embodiments discussed herein.
In an embodiment, as shown in
In various embodiments, the MUF 220 may be formed of reworkable or non-reworkable materials such as, for example, epoxy, deformable gel, silicon rubber, thermal plastic polymer, thermal set polymer, a combination thereof or the like. In various embodiments, the MUF 220 may include a filler material ranging in size from 10 μm to 50 μm. The MUF 220 may have a glass transition temperature, Tg, ranging from approximately 100° C. to approximately 150° C. The package component 210, electrical connections 212, molding compound 214 and device 230 may have characteristics and/or compositions similar as those described for the various embodiments discussed above with regard to
The configuration of the MUF 220 of
Each of the subsets 240 shown in
In an embodiment, as shown in
In various embodiments, the MUF 320 may be formed of reworkable or non-reworkable materials such as, for example, epoxy, deformable gel, silicon rubber, a combination thereof or the like. In various embodiments, the MUF 320 may include a filler material ranging in size from 10 μm to 50 μm. The MUF 320 may have a glass transition temperature, Tg, ranging from approximately 100° C. to approximately 150° C. The package component 310, electrical connections 312, molding compound 314 and device 330 may have similar characteristics and/or compositions as those described for the various embodiments discussed above with regard to
The configuration of the MUF 320 of
As illustrated in
Through the plurality of electrical connections 420, the package component 410 may be electrically coupled to a device 440. The device 440 may include one or more conductive pad(s) 442, each of which may provide a location for coupling one of the corresponding electrical connections 420 of the package 400. A single electrical connection 420, interconnect pad 412, PPI 415, and conductive pad 442 are shown in
As illustrated in
In various embodiments, the MUF 430 may be formed of reworkable or non-reworkable materials such as, for example, epoxy, deformable gel, silicon rubber, thermal plastic polymer, thermal set polymer, combinations thereof or the like. The MUF 430 may include a filler material ranging in size from approximately 10 μm to approximately 50 μm and may have a glass transition temperature, Tg, ranging from approximately 100° C. to approximately 150° C. In various embodiments, the MUF 430 may be formed using dispensing, injecting, and/or spraying techniques.
In various embodiments, the substrate 411 may be a wafer, a die, an interposer or combinations thereof, such as may be used, for example, in stacked or 3D IC type devices (not shown) or in MEMS type devices (not shown). In various embodiments, one or more layers of dielectric materials, metal materials, and/or insulating materials which may be used to form interlayer dielectrics (“ILDs”), intermetal dielectrics (“IMDs”), and/or passivation layers (none shown) within the substrate. In various embodiments, the substrate 411 may include active devices such as, for example, transistors and/or sensors (both not shown). In various embodiments, the substrate 411 may include passive devices such resistors, capacitors, inductors or other like devices (none shown). In various embodiments, the substrate 411 may be free from active and/or passive devices.
In various embodiments, the interconnect pad(s) 412 may be formed of copper, zinc, nickel, gold, silver, platinum, palladium, aluminum, alloys thereof or the like. In various embodiments, interconnect pad(s) may be formed by thermal chemical vapor deposition (“CVD”), physical vapor deposition (“PVD”) such as sputtering or evaporation, electron gun, ion beam, energy beam, plating, one or more subtractive etch processes, single Damascene techniques, and/or dual-Damascene techniques, the like or other acceptable methods.
In various embodiments, the first and/or second passivation layers 413, 414 may be formed of, for example, a polyimide, polybenzoxazole (“PBO”), benzocyclobutene (“BCB”), a non-photosensitive polymer, and in alternative embodiments, may be formed of nitride, carbide, silicon oxide, silicon nitride, low-k dielectrics such as carbon doped oxides, extremely low-k dielectrics such as porous carbon doped silicon dioxide combinations thereof, and/or other like material.
In various embodiments, the plurality of electrical connections 420 may be formed of solder, non-eutectic lead, tin, copper, gold, nickel, aluminum alloys, combinations thereof or the like. Although the electrical connection 420, as illustrated in
In various embodiments, the PPI(s) 415 copper, zinc, nickel, gold, silver, platinum, palladium, aluminum, alloys thereof or the like. In various embodiments, interconnect pad(s) may be formed by thermal chemical vapor deposition (“CVD”), physical vapor deposition (“PVD”) such as sputtering or evaporation, electron gun, ion beam, energy beam, plating, one or more subtractive etch processes, single Damascene techniques, and/or dual-Damascene techniques, the like or other acceptable methods.
The method 500 couples the package component to a substrate using the plurality of electrical connections (block 520). The method 500 forms a molding underfill between the package component and the substrate (block 530). The molding underfill encapsulates one or more of the plurality of electrical connections between the package component and the substrate. In an embodiment, the molding underfill may be formed to a second height along vertical sides of the package component. If a molding compound is used on the first horizontal side of the package component, the method 500 forms the molding underfill between the molding compound of the package component and the substrate.
The molding underfill may be formed to encapsulate a subset of the electrical connections. For example, the molding underfill may encapsulate a subset of X-rows and Y-columns of the plurality of electrical connections along a perimeter of the package component. The number of X rows may less than (N/2)−1 of the total number of N rows and the number of Y columns may be less than (M/2)−1 of the M columns of the electrical connections.
The volume of the molding underfill injected between the package component and the substrate along the perimeter may be varied to adjust the number of X rows and Y columns of electrical connections that are fully encapsulated by the molding underfill. For example, the volume of the molding underfill injected may be increased to fully encapsulate more of the X rows and Y columns of electrical connections along the perimeter and may be decreased to encapsulate less of the X rows and Y columns of electrical connections along the perimeter of the package component. Further, some of the electrical connections at the interior of the package component may be contacted by the molding underfill but may not be fully encapsulated by the molding underfill. Again, the volume of the molding underfill applied between the package component and the substrate will determine the number of electrical connections that are fully encapsulated by the molding underfill or are contacted but not fully encapsulated.
In another example, the molding underfill may encapsulate a plurality of subsets of the plurality of electrical connections at a plurality of corners of the package component. In such an embodiment, each of the plurality of sets may comprise an X-rows by Y-columns set of the plurality of electrical connections at a corner of the package component, wherein X may range from 2 to (N/2)−1 of the total number N rows and Y may range from 2 to (M/2)−1 of the total number of M columns of the electrical connections. Again, the volume of the molding underfill injected between the package component and the substrate at a particular corner may be varied to adjust the number of X rows and Y columns of electrical connections that are fully encapsulated by the molding underfill.
In an embodiment, an apparatus is provided. The apparatus includes a package component, the package component having a first side and a second side; a plurality of electrical connections on the second side of the package component; a device electrically coupled to the plurality of electrical connections; a molding compound formed on the second side of the package component to a first height, wherein the plurality of electrical connections extend through the molding compound; and a molding underfill between the molding compound and the device, wherein the molding underfill encapsulates a subset of the plurality of electrical connections.
In another embodiment, another apparatus is provided. The apparatus a first substrate having a first side and a second side; a plurality of electrical connections formed on the second side of the first substrate; a second substrate electrically coupled to the one or more electrical connections; and a molding underfill interposed directly between the first substrate and the second substrate, wherein the molding underfill encapsulates at least one interconnect formed over the second side of the first substrate.
In another embodiment, a method is provided. The method includes providing a package component, the package component having a plurality of electrical connections and a molding compound on a first side, the molding compound extending to a first height; coupling the package component to a substrate using the plurality of electrical connections; and forming a molding underfill to encapsulate a subset of the plurality of electrical connections between the package component and the substrate.
Although the present embodiments and their advantages have been described in detail, it should be understood that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the disclosure as defined by the appended claims. For example, it will be readily understood by those skilled in the art that the structures and ordering of steps as described above may be varied while remaining within the scope of the present disclosure.
Moreover, the scope of the present application is not intended to be limited to the particular embodiments of the process, machine, manufacture, composition of matter, means, methods and steps described in the specification. As one of ordinary skill in the art will readily appreciate from the disclosure, processes, machines, manufacture, compositions of matter, means, methods, or steps, presently existing or later to be developed, that perform substantially the same function or achieve substantially the same result as the corresponding embodiments described herein may be utilized according to the present disclosure. Accordingly, the appended claims are intended to include within their scope such processes, machines, manufacture, compositions of matter, means, methods, or steps.
This application claims priority to U.S. Provisional Application No. 61/776,282, filed on Mar. 11, 2013, and entitled “Apparatus and Method for Package Reinforcement,” which application is incorporated herein by reference in its entirety. This application is a continuation-in-part of U.S. patent application Ser. No. 13/349,405, filed on Jan. 12, 2012, and entitled “Package on Package Interconnect Structure,” (Docket No. TSM11-1284) which application is incorporated herein by reference in its entirety. This application is a continuation-in-part of U.S. patent application Ser. No. 13/751,289, filed on Jan. 28, 2013, and entitled “System and Method for an Improved Fine Pitch Joint,” (Docket No. TSM12-0970) which application further claims priority to U.S. Provisional Application No. 61/746,687, filed on Dec. 28, 2012, and entitled “System and Method for an Improved Fine Pitch Joint,” (Docket No. TSM12-0970P) which applications are incorporated herein by reference in their entirety. This application is a continuation-in-part of U.S. patent application Ser. No. 13/913,599, filed on Jun. 10, 2013, and entitled “Interconnect Joint Protective Layer Apparatus and Method,” (Docket No. TSM13-0082) which application further claims priority to U.S. Provisional Application No. 61/765,322, filed on Feb. 15, 2013, and entitled “Interconnect Joint Protective Layer Apparatus and Method,” (Docket No. TSM13-0082P) which applications are incorporated herein by reference in their entirety. This application is a continuation-in-part of U.S. patent application Ser. No. 13/914,426, filed on Jun. 10, 2013, and entitled “Interconnect Structures and Methods of Forming Same,” (Docket No. TSM13-0083) which application further claims priority to U.S. Provisional Application No. 61/776,714, filed on Mar. 11, 2013, and entitled “Interconnect Structures and Methods of Forming Same,” (Docket No. TSM13-0083P) which applications are incorporated herein by reference in their entirety. This application is a continuation-in-part of U.S. patent application Ser. No. 13/838,748, filed on Mar. 15, 2013, and entitled “Interconnect Structures and Methods of Forming Same,” (Docket No. TSM13-0084) which application further claims priority to U.S. Provisional Application No. 61/776,684, filed on Mar. 11, 2013, and entitled “Interconnect Structures and Methods of Forming Same,” (Docket No. TSM13-0084P) which applications are incorporated herein by reference in their entirety. This application is a continuation-in-part of U.S. patent application Ser. No. 13/868,554, filed on Apr. 23, 2013, and entitled “Apparatus and Method for Wafer Separation,” (Docket No. TSM13-0085) which application further claims priority to U.S. Provisional Application No. 61/778,341, filed on Mar. 12, 2013, and entitled “Apparatus and Method for Wafer Separation,” (Docket No. TSM13-0085P) which applications are incorporated herein by reference in their entirety. This application is a continuation-in-part of U.S. patent application Ser. No. 13/934,562, filed on Jul. 3, 2013, and entitled “Packaging Devices, Methods of Manufacture Thereof, and Packaging Methods,” (Docket No. TSM13-0091) which application further claims priority to U.S. Provisional Application No. 61/777,709, filed on Mar. 12, 2013, and entitled “Packaging Devices, Methods of Manufacture Thereof, and Packaging Device Design Methods,” (Docket No. TSM13-0091P) which applications are incorporated herein by reference in their entirety.
Number | Date | Country | |
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61776282 | Mar 2013 | US | |
61746687 | Dec 2012 | US | |
61765322 | Feb 2013 | US | |
61776714 | Mar 2013 | US | |
61776684 | Mar 2013 | US | |
61778341 | Mar 2013 | US | |
61777709 | Mar 2013 | US |
Number | Date | Country | |
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Parent | 13349405 | Jan 2012 | US |
Child | 13939966 | US | |
Parent | 13751289 | Jan 2013 | US |
Child | 13349405 | US | |
Parent | 13913599 | Jun 2013 | US |
Child | 13751289 | US | |
Parent | 13914426 | Jun 2013 | US |
Child | 13913599 | US | |
Parent | 13838748 | Mar 2013 | US |
Child | 13914426 | US | |
Parent | 13868554 | Apr 2013 | US |
Child | 13838748 | US | |
Parent | 13934562 | Jul 2013 | US |
Child | 13868554 | US |