Semiconductor package with multiple molding routing layers and a method of manufacturing the same

Abstract

Embodiments of the present invention are directed to a method of manufacturing a semiconductor package with an internal routing circuit. The internal routing circuit is formed from multiple molding routing layers in a plated and etched copper terminal semiconductor package by using a laser to blast away un-designed conductive areas to create conductive paths on each molding compound layer of the semiconductor package.

Description

FIELD OF INVENTION

The present invention is related to the field of semiconductor package manufacturing. More specifically, the present invention relates to a semiconductor package with an internal routing circuit formed from multiple molding routing layers in the package.

BACKGROUND OF THE INVENTION

There is a growing demand for high-performance semiconductor packages. However, increases in semiconductor circuit density pose interconnect challenges for a packaged chip's thermal, mechanical and electrical integrity. Thus, there is a need for a method of manufacturing a semiconductor package with improved routing capabilities.

BRIEF SUMMARY OF THE INVENTION

Embodiments of the present invention are directed to a method of manufacturing a semiconductor package with an internal routing circuit. The internal routing circuit is formed from multiple molding routing layers in a plated and etched copper terminal semiconductor package by using a laser to blast away un-designed conductive areas to create conductive paths on each molding compound layer of the semiconductor package.

In one aspect, a semiconductor package is provided. The semiconductor package includes package terminals, and a copper leadframe routing layer that includes copper routing circuits. The copper routing circuits are formed on a first side of a copper leadframe and the package terminals are formed on a second side of the copper leadframe.

The semiconductor package also includes at least one metal plated routing layer. Each of the at least one metal plated routing layer includes a plurality of interconnections coupled with routing circuits associated with a previous routing layer that is directly beneath the current metal plated routing layer, and an intermediary insulation layer formed on top of the previous routing layer. The plurality of interconnections protrudes from a top surface of the intermediary insulation layer that has an unnatural surface roughness that is rougher than the natural surface roughness of the intermediary insulation layer. Molding compound of the intermediary insulation layer surrounds the routing circuits associated with the previous routing layer. Each of the at least one metal plated routing layer also includes metal routing circuits adhered on the unnaturally roughened top surface of the intermediary insulation layer. The metal routing circuits includes a plurality of metal plated layers.

In some embodiments, the routing circuits associated with each routing layer is structured differently from the routing circuits associated with other routing layers. In some embodiments, the metal routing circuits associated with each of the at least one metal plated routing layer is structured differently from the metal routing circuits associated with other metal plated routing layers.

In some embodiments, each of the at least one metal plated routing layer further includes bus lines extending from the metal routing circuits. The bus lines are not exposed at sides of the semiconductor package, although the bus lines can be exposed at the sides of the semiconductor package.

The semiconductor package includes an internal routing circuit from die terminals on the die to the package terminals. The internal routing circuit is formed by all the routing layers in the semiconductor package. The semiconductor package also includes a die coupled with a topmost metal plated routing layer, a topmost insulation layer encapsulating the die and the topmost metal routing layer, and a bottommost insulation layer encapsulating the copper routing circuits.

In another aspect, a method of manufacturing semiconductor devices that includes a plurality of conductive routing layers is provided. The method includes obtaining an etched and plated leadframe that includes a plurality of copper routing circuits and a plurality of package terminals, wherein the plurality of copper routing circuits forms a copper leadframe routing layer. In some embodiments, obtaining an etched and plated leadframe includes etching a copper substrate to form the plurality of copper routing circuits at a top surface of the copper substrate, and plating a plurality of areas on surfaces of the copper substrate, thereby resulting in the etched and plated leadframe. The plurality of areas includes bottom plated areas that eventually form the plurality of package terminals and includes top plated areas that are on the plurality of copper routing circuits.

The method also includes forming at least one metal plated routing layer on top of the copper leadframe routing layer. Each of the at least one metal plated routing layer is formed by coupling a plurality of interconnections with routing circuits associated with a previous routing layer that is directly beneath the current metal plated routing layer being formed, forming an intermediary insulation layer on top of the previous routing layer, wherein the plurality of interconnections protrudes from a top surface of the intermediary insulation layer that has the natural surface roughness, performing an abrasion procedure to roughen at least the top surface of the intermediary insulation layer such that, after the abrasion procedure, the top surface of the intermediary insulation layer has an unnatural surface roughness that is rougher than the natural surface roughness, and adhering a metal layer on the roughened top surface of the intermediary insulation layer to form a plurality of metal routing circuits that is included in the current metal plated routing layer.

In some embodiments, the abrasion procedure includes coating at least the top surface of the intermediary insulation layer with an adhesion promoter material, heating the leadframe such that the adhesion promoter material reacts with a portion of the intermediary insulation layer, and etching away a baked film, resulting in the top surface of the intermediary insulation layer having the unnatural surface roughness that is rougher than the natural surface roughness.

In some embodiments, each of the at least one metal plated routing layer is further formed by, after performing an abrasion procedure and before adhering a metal layer on the roughened top surface, depositing a catalyst material on the roughened top surface of the intermediary insulation layer, and removing unwanted areas of the catalyst material such that the remaining areas of the catalyst material form a structure of the plurality of metal routing circuits.

In some embodiments, adhering a metal layer on the roughened top surface includes using a metal chemical solution, wherein metal substance in the metal chemical solution reacts with the remaining areas of the catalyst material such that the adhesion of the metal layer with the intermediary insulation layer having the unnatural surface roughness is better than the adhesion of the metal layer with the intermediary insulation layer having the natural surface roughness.

In some embodiments, each of the at least one metal plated routing layer is further formed by, after adhering a metal layer on the roughened top surface, obtaining a desired thickness of the metal routing circuits whereby metal is plated on metal. The desired thickness of the metal routing circuits can be obtained via an electroless plating process, wherein the electroless plating process includes repeating the depositing step, the removing step and the adhering step in one or more loops. Alternatively, the desired thickness of the metal routing circuits is obtained via an electrolytic plating process.

In some embodiments, each of the at least one metal plated routing layer is further formed by, after obtaining a desired thickness of the metal routing circuits, removing at least a portion of bus lines.

The method also includes coupling a plurality of dies with a topmost metal plated routing layer, encapsulating the plurality of dies and the topmost metal routing layer with a topmost insulation layer, etching away exposed copper at the bottom of the leadframe, thereby isolating the plurality of package terminals and exposing the plurality of copper routing circuits at the bottom of the leadframe, encapsulating the plurality of exposed copper routing circuits at the bottom of the leadframe with a bottommost insulation layer, and performing a cut-through procedure to singulate the semiconductor packages from each other.

BRIEF DESCRIPTION OF THE DRAWINGS

The foregoing will be apparent from the following more particular description of example embodiments of the invention, as illustrated in the accompanying drawings in which like reference characters refer to the same parts throughout the different views. The drawings are not necessarily to scale, emphasis instead being placed upon illustrating embodiments of the present invention.

FIG. 1A illustrates an exemplary top view of a semiconductor die and an exemplary bottom view of a semiconductor package that shows package terminals.

FIG. 1B illustrates an exemplary external view of a final singulated semiconductor package in accordance with some embodiments.

FIG. 1C illustrates an exemplary internal view of the semiconductor package of FIG. 1B in accordance with some embodiments.

FIG. 2 illustrates an exemplary method of manufacturing a semiconductor package in accordance to some embodiments.

FIG. 3A-FIG. 3Q illustrate an exemplary result produced at each step of the method of FIG. 2.

FIG. 4A-FIG. 4D illustrate exemplary views of forming multi-electroless plated layers in accordance to some embodiments.

FIG. 5A illustrates an exemplary electric plating machine.

FIG. 5B-FIG. 5D illustrate exemplary views of trimming bus lines in accordance to some embodiments.

FIG. 6A-FIG. 6B illustrate an exemplary method of manufacturing semiconductor devices that each includes a plurality of conductive routing layers accordance with some embodiments.

DETAILED DESCRIPTION OF THE INVENTION

In the following description, numerous details are set forth for purposes of explanation. However, one of ordinary skill in the art will realize that the invention can be practiced without the use of these specific details. Thus, the present invention is not intended to be limited to the embodiments shown but is to be accorded the widest scope consistent with the principles and features described herein.

FIG. 1A illustrates an exemplary top view of a semiconductor die and an exemplary bottom view of a semiconductor package that includes exposed package terminals. Although FIG. 1A illustrates the semiconductor die being electrically coupled therein using wire bonds, it is contemplated that the semiconductor die can instead be electrically coupled using flip-chip bonds, such as solder bumps. Regardless of how the semiconductor die is coupled therein, an internal routing circuit of the semiconductor (IC) package provides for internal routing from die terminals of the semiconductor die to the package terminals of the semiconductor package.

Embodiments of the present invention are directed to a method of manufacturing a semiconductor package with an internal routing circuit. The internal routing circuit is formed from multiple molding routing layers in a plated and etched copper terminal semiconductor package by using a laser to blast away un-designed conductive areas to create conductive paths on each molding compound layer of the semiconductor package.

FIG. 1B illustrates an exemplary external view of a final singulated semiconductor package 100 in accordance with some embodiments, while FIG. 1C illustrates an exemplary internal view of the semiconductor package 100, without molding compounds to show the structure of the internal routing circuit, in accordance with some embodiments. The internal routing circuit is formed from multiple molding routing path layers in the package 100.

The semiconductor package 100, as shown, includes three conductive routing path layers 150, 160, 170 electrically coupled via interconnections 155, 165 that are disposed between the routing path layers 150, 160, 170. The conductive routing path layers 150, 160, 170 form at least partially the internal routing circuit of the semiconductor package 100. However, it is noted that by the concepts discussed herein, more or less conductive routing layers can be formed within a semiconductor package. Typically, the topmost conductive routing path layer (e.g., conductive routing path layer 170 in FIG. 1C) is physically and electrically coupled with the semiconductor die 175, while the bottommost conductive routing path layer (e.g., conductive routing path layer 150 in FIG. 1C) is physically and electrically coupled with the package terminals. Each of the conductive routing path layers 150, 160, 170 and the semiconductor die 175 corresponds to a distinct and separate molding compound layer 102, 104, 106, 108. Generally, if there are N routing path layers, where N is an integer greater or equal to 1, then there are N+1 molding compound layers. In some embodiments, N is greater or equal to 2. In some embodiments, each layer of the molding compound 102-108 is visually indistinguishable from the other layers of the molding compound 102-108. Alternatively, each layer of the molding compounds 102-108 is visually distinguishable from the other layers of the molding compound 102-108.

In some embodiments, the bottommost conductive routing path layer is a copper leadframe routing layer and each subsequent conductive routing path layer formed above the bottommost conductive routing path layer is a metal plated routing layer.

FIG. 2 illustrates an exemplary method 200 of manufacturing a semiconductor package in accordance with some embodiments. An exemplary result produced by each step of the method 200 is illustrated in FIGS. 3A-3Q. Referring to FIGS. 2 and 3A-3Q, the method 200 begins at a Step 201, where a plated and etched leadframe 300 is obtained. In some embodiments, the leadframe 300 is made of copper. A plurality of areas 302 on the bottom side of the leadframe 300 is plated to form package terminals. The top side of the leadframe 300 is etched away to form copper routing circuits 304, which are included in the bottommost conductive routing path layer 150 in FIG. 1C. A plurality of areas 306 on the top side of the leadframe 300 is also plated. In some embodiments, the top plated areas 306 are on the copper routing circuits 304. The number of bottom plated areas 302 is the same as the number of top plates areas 306, although the numbers can be different with the number of the bottom plated areas 302 being more or less than the number of the top plated areas 306. In some embodiments, the plating material is Ni+Pd+Au or any other suitable material(s).

At a Step 203, a plurality of interconnections 308 is formed on top of the leadframe 300. In some embodiments, the interconnections 308 are formed on the copper routing circuits 304 and coupled with the top plated areas 306. The material(s) of the interconnections 308 can be Cu, PdCu, AuPdCu wire, Ag wire, Ag allow wire and Au wire from a wire bond process, Ag alloy or the like, such as a soldering allow material. The process to apply this material(s) can be writing dispensing, printing (e.g., 3D inkjet printing), screen printing, electrical discharge coating, or any other suitable process.

At a Step 205, an insulation layer 310 is formed on top of the leadframe 300, resulting in a molded leadframe, to form a base of the second conductive routing path layer 160 in FIG. 1C. In some embodiments, the interconnections 308 protrude from the insulation layer 310. The material of this insulation layer 310 is a molding compound, which has a starting physical shape of a powder, pellet or sheet. The process to apply the molding compound 310 can be injection mold, transfer mold, compression mold, lamination mold, or any other suitable process. The molding material 310 includes compound fillers 310a and compound resin 310b. A magnified view is provided of the natural surface roughness 312 of a top surface of the insulation layer 310 before a surface treatment process (abrasion procedure). As discussed below, after the surface treatment process, the top surface of the insulation layer 310 has an unnatural surface roughness that is rougher than the natural surface roughness 312. The molding compound is on top of and surrounds the copper routing circuits 304.

To prepare the molding material 310 for better adhesion with a metal layer, the top surface of the molding material 310 is roughened so that the top surface has an unnatural surface roughness that is rougher than the natural surface roughness 312. At a Step 207, a coating process is performed to coat an “adhesion promoter” material 314 on at least the top surface of the insulation layer 310. The coating process can be either a spraying or dipping process. A magnified view is provided of the layer of adhesion promoter 314 directly on top of the molding compound 310.

At a Step 209, the molded leadframe with the adhesion promoter material 314 is heated. In some embodiments, the molded leadframe with the substrate adhesion promoter material 314 is heated to 90° C. to 150° C. for approximately 10 minutes, for example, in an oven. Other temperatures and other heating durations are contemplated. The adhesion promoter material 314 is activated with the heat, thereby reacting with a portion 316 of the molding compound 310, resulting in a baked film. In particular, the adhesion promoter material 314 reacts with the molding resin 310b in the portion 316 of the molding compound 310 but not with the compound filler 310a in the portion 316 of the molding compound 318.

At a Step 211, the baked film is etched away, leaving the surface of the molding compound 310 rougher 318 than the natural surface roughness 312 of the molding compound 310 (e.g., before the surface treatment process). Put differently, after the baked film is etched away, the surface of the molding compound 310 has an unnatural surface roughness 318. In some embodiments, a wet chemical permanganic acid is used to etch out the baked film, resulting in a roughened leadframe. The roughness 318 of the surface of the molding compound 310, which is created at least by the compound fillers 310a, provides anchor points for an activator chemical in a catalysis process. Other abrasion processes are contemplated to roughen the top surface of the molding compound 1008 to obtain an unnatural surface roughness.

At a Step 213, a depositing process is performed to coat a seed layer of the activator chemical 320 on the roughened leadframe. The depositing process can be either a spraying or dipping process. In some embodiments, the activator chemical 320 includes Pd (Palladium), which reacts as a catalyst substance. In some embodiments, the activator chemical 320 includes a catalyst substance other than Pd. In some embodiments, the activator chemical 320 includes additional additives. The catalyst substance anchors on to the roughened surface 318 of the molding compound 310, resulting in an active leadframe, which has an active molding compound surface. The seed layer allows for the subsequent electroless plating to occur faster. In some embodiments, the seed layer is optional for making conductive paths 322.

At a Step 215, a removal process is performed to create a structure of conductive paths 322, which are also referred to as metal routing circuits, on the molding compound 310, resulting in a seed patterned leadframe. A laser is used to blast away un-designed or unwanted conductive areas of the seed layer such that remaining areas of the seed layer form the structure of the metal routing circuits 322. The molding compound 310 is exposed at laser blasted areas 328a. The structure of the conductive paths 322 is directly over the interconnections 308 such that the conductive paths 322 eventually formed will be in electrical communication with the interconnections 308 and with all conductive paths in previous conductive routing layers. In some embodiments, the structure also includes bus lines. Bus lines are discussed below.

At a Step 217, a plating process is performed to plate the seed patterned leadframe with a metal chemical solution 324, resulting in an electroless plated leadframe. The plating process is an electroless plating process. In some embodiments, the seed patterned leadframe is dipped in the metal chemical solution 324. An exemplary metal substance in the metal chemical solution is Cu, Ni or another suitable metal substance. The metal substance in the metal chemical solution reacts with the Pd (seed material) on the active molding compound surface but does not react with the surface of the molding compound 310 without the seed material (e.g., blasted areas 328a). The metal substance anchors on to the active molding compound surface to form the conductive paths 322. The adhesion of the metal layer 324 with the molding compound 110 having the roughened surface 318 is better than the adhesion of the metal layer 324 with one having the natural surface roughness 312 prior to the surface treatment process.

Multi-metal layers can be plated on top of each other to obtain a desired thickness of the conductive paths 322 on the molding compound 310. These metal routing circuits 322 on the molding compound 310 are included in the second conductive routing path layer 160 in FIG. 1C. One method is to perform the steps of dipping the leadframe into the activator chemical (the Step 213), laser blasting to remove seed material from non-designed conductive areas (the Step 215), and dipping the leadframe into the metal plating chemical (the Steps 217) in one or more loops until a desired thickness of the conductive paths 322 is obtained. Each new metal substance anchors to the previous anchored metal on the molding compound surface or on a previous anchored metal on metal. The thickness of each multi-metal layer depends on reaction time. In some applications that require different metal plating layer types for the conductive path pattern, different metal chemical solutions can be used for each layer. An exemplary metal plating layer type is Ni+Pd+Au.

FIGS. 4A-4C illustrate an exemplary loop in accordance with some embodiments. At a Step 213-2, another coating process is performed to coat the activator chemical 320 on the previously electroless plated leadframe, such as from the Step 217. The activator chemical 320 is coated over previously blasted areas 328a and the metal routing circuit 322. The Step 213-2 helps the next electroless plating layer occur faster. At a Step 215-2, another removal process is performed to remove the seed material from unwanted surface areas such that remaining areas conform to the structure of the conductive paths 322 on the molding compound 310. The molding compound 310 is again exposed at laser blasted areas 328b, which corresponds to and directly over the previously blasted areas 328a. This removal process can be performed by using the same or similar laser blasting process as in the Step 215. At a Step 217-2, another plating process is performed to plate the substrate with the metal chemical solution 324. The metal substance reacts with the Pd on the surface of the previous metal plating (such as Cu). The final result is that the new metal substance anchors on to the surface of the previous metal plating. The new metal layer is stacked on the previous metal layer. This reaction can occur in a loop until a desired thickness of the conductive paths 322 is obtained, as illustrated in FIG. 4D. Although FIG. 4D shows the metal routing circuits 322 as having four electroless plating layers, more or less metal plating layers are contemplated.

It is possible to increase the metal plating layer thickness in a shorter amount of time than the time required by the electroless plating process. An alternative to looping or repeating the Steps 213 to 217, an electrolytic plating process can be performed after the first electroless layer is plated on the leadframe 300 (e.g., after the Step 217). FIG. 5A illustrates an exemplary electric plating machine 500. The electroless plated leadframe from the Step 217 is held at a cathode terminal of the electric plating machine 500, while the plating material is located in a basket at an anode terminal. Both the electroless plated leadframe and the plating material are immersed in a plating solution that is in a plating tank. When an electrical power source is operating in the plating tank, an electrical current brings particles of the plating material from the anode terminal to the cathode terminal via the plating solution. Because the electroless plated leadframe is held at the cathode terminal, the plating particles which come along with the electrical current are plated on the conductive paths (metal surfaces) of the electroless plated leadframe. The thickness of the new plating material 502 plated on the conductive paths of the electroless plated leadframe via the electrolytic plating process can be obtained faster than the above-described electroless plating process.

In the case of the electrolytic plating process, the molded leadframe requires conductive bus lines. The conductive bus lines are formed at the Steps 215-217. The bus lines are electrically coupled with the cathode of the electrolytic plating machine 500 such that the plating particles from the anode terminal can be deposited on the bus line and, thus, on the metal routing circuits 322. FIG. 5B illustrates an exemplary electrolytic plated leadframe 504 after the electrolytic plating process is performed on the electroless plated leadframe from the Step 217. The electrolytic plated leadframe 504 includes bus lines 506a, 506b (collectively, 506). The bus lines 506a are around the perimeter of each IC packaging section 508 of the leadframe, and are eventually removed from singulated semiconductor packages during a cut through procedure (e.g., at a Step 234). The bus lines 506b extend from bus lines 506a to the conductive paths 322 on the molding compound 310. The bus lines 506 and the conductive paths 322 are evenly plated by the electrolytic plating process.

In some applications, at least a portion of the bus lines 506b are removed before completing the IC assembly process because any remaining bus lines that are exposed in a final semiconductor package can be detrimental to the final IC package when it is used in the field. Any remaining bus lines 506 that are exposed on sides of a singulated semiconductor package, illustrated in FIG. 5C, can cause issues with its environment when operating in a system, issues such as short-circuiting the system. In order to avoid short circuiting issues and other problems by the exposed bus lines 506, at least a portion of the bus lines 506b are removed before completing the IC assembly process. For example, the same or similar laser blasting process used in the Step 215 is used to trim portions 510 of the bus lines 506b that are near the package singulation paths 506a that are around the internal package perimeter of each section 508, as illustrated in FIG. 5D. As a result, when a semiconductor package is completed and singulated, there are no bus lines that are exposed at the side of the singulated semiconductor package. It is noted that, however, in some applications, exposed bus lines on the sides of a singulated semiconductor package are desirable. In such applications, the exposed bus lines are not removed.

Accordingly, after the desired metal plating layer thickness of the conductive paths 322 is obtained, either via the electrolytic plating process or electroless plating process, any portions of the bus lines can be removed as described above, if necessary or desired, prior to optionally adding one or more additional routing layers (Steps 219 to 223) and prior to completing the IC assembly process (Steps 225 to 233). It should be noted that if the electrolytic plating process is not performed, then areas of the structure associated with the unwanted portions of the bus lines 506 can be removed at the Step 215 prior to the Step 217, instead of later in the IC assembly process.

In the case additional routing path layers are required, returning to the method 200, at the Step 219, a plurality of interconnections 326 is formed on top of the leadframe 300. In some embodiments, the interconnections 326 are formed on the conductive metal routing circuits 322. The interconnections 326 are made of the same or different material as the interconnections 308. The process of applying the interconnections 326 can be the same as or different from the process of applying the interconnections 308.

At the Step 221, an insulation layer 330 is formed on top of the leadframe 300 to form a base of the next (e.g., third) conductive routing path layer 170 in FIG. 1C. In some embodiments, the interconnections 326 protrude from the insulation layer 330. The material of this insulation layer 330 can be the same as or different from the material of the insulation layer 310. The process of applying the molding compound 330 can be the same as or different from the process of applying the molding compound 310. The molding compound is on top of and surrounds the metal routing circuits 322.

At the Step 223, conductive paths 332 on the molding compound 330 are formed from one of the possible various processes described above. The conductive paths 332 can have the same or different shape as the conductive paths in any of the previous routing layers (e.g., conductive paths 322) as long as the conductive paths 332 are directly over and in electrical communication with the interconnections 326. These metal routing circuits 332 on the molding compound 330 is included in the third conductive routing path layer 170 in FIG. 1C.

In the same manner, if the semiconductor package requires additional conductive routing path layers, the Steps 219 to 223 can be repeated until a number of conductive routing path layers are obtained.

At a Step 225, a plurality of semiconductor dies 334 is coupled on the conductive paths on the topmost conductive routing path layer (e.g., the topmost conductive routing path layer 170 in FIG. 1C) using epoxy, with at least one semiconductor die 334 in each IC packaging section. In some embodiments, wire bonds 336 electrically couple the electrical pads 340 on the dies 334 and the pads 338 on the molding compound 330 that is associated with the topmost routing path layer.

At a Step 227, at least the plurality of semiconductor dies 334 and the topmost conductive routing path layer are encapsulated with a molding compound 342, resulting in a molded leadframe strip 344.

At a Step 229, a chemical etching process, such as a copper chemical etching dip process or a copper chemical etching spray process, is performed on the molded leadframe strip 344. At the bottom of the molded leadframe strip 344, the copper surface that is covered with the pre-plated metal from the Step 201 is not etched away, while the copper surface that is not covered with the pre-plated metal from the Step 201 is etched away. The chemical etching process reacts with the copper until it reaches the molding compound 310. After the copper is removed, the package terminals are isolated from each other and the copper routing circuits 304 of the first routing path layer is revealed at the bottom of the molded leadframe strip 344.

At a Step 231, an insulation layer 346 is formed on bottom of the molded leadframe strip 344 such that the copper routing circuits 304 is covered but the package terminals are exposed. In some embodiments, the package terminals are flush with the insulation layer 346. Alternatively, the package terminals protrude from the insulation layer 346. The insulation layer 346 protects the copper routing circuits 304 from causing issues with its environment, such as in a printed circuit board.

At a Step 233, a cut through procedure is performed to isolate semiconductor packages 350 from the leadframe 344. A tool 348, such as a saw, is used to fully cut the leadframe along the singulation paths. Each semiconductor package 350 is similarly configured as the semiconductor package 100.

A semiconductor package, such as the singulated semiconductor package 350, includes package terminals, and a copper leadframe routing layer that includes copper routing circuits. The copper routing circuits are formed on a first side of a copper leadframe and the package terminals are formed on a second side of the copper leadframe.

The semiconductor package also includes at least one metal plated routing layer. Each of the at least one metal plated routing layer includes a plurality of interconnections coupled with routing circuits associated with a previous routing layer that is directly beneath the current metal plated routing layer, and an intermediary insulation layer formed on top of the previous routing layer. The plurality of interconnections protrudes from a top surface of the intermediary insulation layer that has an unnatural surface roughness that is rougher than the natural surface roughness of the intermediary insulation layer. Molding compound of the intermediary insulation layer surrounds the routing circuits associated with the previous routing layer. Each of the at least one metal plated routing layer also includes metal routing circuits adhered on the unnaturally roughened top surface of the intermediary insulation layer. The metal routing circuits includes a plurality of metal plated layers and laser blasted edges.

In some embodiments, the routing circuits associated with each routing layer is structured differently from the routing circuits associated with other routing layers. In some embodiments, the metal routing circuits associated with each of the at least one metal plated routing layer is structured differently from the metal routing circuits associated with other metal plated routing layers.

In some embodiments, each of the at least one metal plated routing layer further includes bus lines extending from the metal routing circuits. The bus lines are not exposed at sides of the semiconductor package, although the bus lines can be exposed at the sides of the semiconductor package.

The semiconductor package includes an internal routing circuit from die terminals on the die to the package terminals. The internal routing circuit is formed by all the routing layers in the semiconductor package. The semiconductor package also includes a die coupled with a topmost metal plated routing layer, a topmost insulation layer encapsulating the die and the topmost metal routing layer, and a bottommost insulation layer encapsulating the copper routing circuits.

FIG. 6A illustrates an exemplary method 600 of manufacturing semiconductor devices that each includes a plurality of conductive routing layers in accordance with some embodiments. The method 600 begins at a Step 601, where an etched and plated leadframe is obtained. The etched and plated leadframe includes a plurality of copper routing circuits and a plurality of package terminals. The plurality of copper routing circuits forms a copper leadframe routing layer. In some embodiments, the etched and plated leadframe is obtained by etching a copper substrate to form the plurality of copper routing circuits at a top surface of the copper substrate, and plating a plurality of areas on surfaces of the copper substrate, thereby resulting in the etched and plated leadframe. The plurality of areas includes bottom plated areas that eventually form the plurality of package terminals and includes top plated areas that are on the plurality of copper routing circuits.

At a Step 603, at least one metal plated routing layer is formed on top of the copper leadframe routing layer. Each of the at least one metal plated routing layer is formed by the method 650 illustrated in FIG. 6B.

Referring to FIG. 6B, at a Step 615, a plurality of interconnections is coupled with routing circuits associated with a previous routing layer that is directly beneath the current metal plated routing layer being formed.

At a Step 617, an intermediary insulation layer is formed on top of the previous routing layer. The plurality of interconnections protrudes from a top surface of the intermediary insulation layer that has a natural surface roughness.

At a Step 619, an abrasion procedure is performed to roughen at least the top surface of the intermediary insulation layer such that, after the abrasion procedure, the top surface of the intermediary insulation layer has an unnatural surface roughness that is rougher than the natural surface roughness.

In some embodiments, the abrasion procedure includes coating at least the top surface of the intermediary insulation layer with an adhesion promoter material, heating the leadframe such that the adhesion promoter material reacts with a portion of the intermediary insulation layer, and etching away a baked film, resulting in the top surface of the intermediary insulation layer having the unnatural surface roughness that is rougher than the natural surface roughness.

In some embodiments, a catalyst material is deposited on the roughened top surface of the intermediary insulation layer, and unwanted areas of the catalyst material are removed such that the remaining areas of the catalyst material form a structure of the plurality of metal routing circuits.

At a Step 621, a metal layer is adhered on the roughened top surface of the intermediary insulation layer to form a plurality of metal routing circuits that is included in the current metal plated routing layer. The metal layer can be adhered on the roughened top surface includes using a metal chemical solution. In some embodiments, metal substance in the metal chemical solution reacts with the remaining areas of the catalyst material such that the adhesion of the metal layer with the intermediary insulation layer having the unnatural surface roughness is better than the adhesion of the metal layer with the intermediary insulation layer having the natural surface roughness.

In some embodiments, a desired thickness of the metal routing circuits is obtained whereby metal is plated on metal. The desired thickness of the metal routing circuits is obtained via an electroless plating process, wherein the electroless plating process includes repeating the depositing step, the removing step and the adhering step in one or more loops. Alternatively, the desired thickness of the metal routing circuits is obtained via an electrolytic plating process. In some embodiments, after the desired thickness of the metal routing circuits is obtained, at least a portion of bus lines is removed.

Returning to FIG. 6A, at a Step 605, a plurality of dies is coupled with a topmost metal plated routing layer.

At a Step 607, the plurality of dies and the topmost metal routing layer are encapsulated with a topmost insulation layer.

At a Step 609, exposed copper at the bottom of the leadframe is etched away, thereby isolating the plurality of package terminals and exposing the plurality of copper routing circuits at the bottom of the leadframe.

At a Step 611, the plurality of exposed copper routing circuits at the bottom of the leadframe is encapsulated with a bottommost insulation layer.

At a Step 613, a cut-through procedure is performed to singulate the semiconductor packages from each other.

It is noted that the demonstration discussed herein is on a semiconductor package with three conductive routing path layers. However, by the concept of this invention, it is possible to create more conductive routing layers to stack on each other such that a final semiconductor package can have more than three conductive routing path layers.

One of ordinary skill in the art will realize other uses and advantages also exist. While the invention has been described with reference to numerous specific details, one of ordinary skill in the art will recognize that the invention can be embodied in other specific forms without departing from the spirit of the invention. Thus, one of ordinary skill in the art will understand that the invention is not to be limited by the foregoing illustrative details, but rather is to be defined by the appended claims.

Claims

1. A method of manufacturing semiconductor devices that each includes a plurality of conductive routing layers, comprising: obtaining an etched and plated leadframe that includes a plurality of copper routing circuits and a plurality of package terminals, wherein the plurality of copper routing circuits forms a copper leadframe routing layer;forming at least one metal plated routing layer on top of the copper leadframe routing layer, wherein each of the at least one metal plated routing layer is formed by: coupling a plurality of interconnections with routing circuits associated with a previous routing layer that is directly beneath a current metal plated routing layer being formed;forming an intermediary insulation layer on top of the previous routing layer, wherein the plurality of interconnections protrudes from a top surface of the intermediary insulation layer that has the natural surface roughness;performing an abrasion procedure to roughen at least the top surface of the intermediary insulation layer such that, after the abrasion procedure, the top surface of the intermediary insulation layer has an unnatural surface roughness that is rougher than the natural surface roughness; andadhering a metal layer on the roughened top surface of the intermediary insulation layer to form a plurality of metal routing circuits that is included in the current metal plated routing layer;coupling a plurality of dies with a topmost metal plated routing layer;encapsulating the plurality of dies and the topmost metal routing layer with a topmost insulation layer;etching away exposed copper at the bottom of the leadframe, thereby isolating the plurality of package terminals and exposing the plurality of copper routing circuits at the bottom of the leadframe;encapsulating the plurality of exposed copper routing circuits at the bottom of the leadframe with a bottommost insulation layer; andperforming a cut-through procedure to singulate the semiconductor packages from each other.

2. The method of claim 1, wherein obtaining an etched and plated leadframe includes: etching a copper substrate to form the plurality of copper routing circuits at a top surface of the copper substrate; andplating a plurality of areas on surfaces of the copper substrate, thereby resulting in the etched and plated leadframe, wherein the plurality of areas includes bottom plated areas that eventually form the plurality of package terminals and includes top plated areas that are on the plurality of copper routing circuits.

3. The method of claim 2, wherein the abrasion procedure includes: coating at least the top surface of the intermediary insulation layer with an adhesion promoter material;heating the leadframe such that the adhesion promoter material reacts with a portion of the intermediary insulation layer; andetching away a baked film, resulting in the top surface of the intermediary insulation layer having the unnatural surface roughness that is rougher than the natural surface roughness.

4. The method of claim 3, wherein each of the at least one metal plated routing layer is further formed by, after performing an abrasion procedure and before adhering a metal layer on the roughened top surface: depositing a catalyst material on the roughened top surface of the intermediary insulation layer; andremoving unwanted areas of the catalyst material such that the remaining areas of the catalyst material form a structure of the plurality of metal routing circuits.

5. The method of claim 4, wherein adhering a metal layer on the roughened top surface includes using a metal chemical solution, wherein metal substance in the metal chemical solution reacts with the remaining areas of the catalyst material such that the adhesion of the metal layer with the intermediary insulation layer having the unnatural surface roughness is better than the adhesion of the metal layer with the intermediary insulation layer having the natural surface roughness.

6. The method of claim 5, wherein each of the at least one metal plated routing layer is further formed by, after adhering a metal layer on the roughened top surface, obtaining a desired thickness of the metal routing circuits whereby metal is plated on metal.

7. The method of claim 6, wherein the desired thickness of the metal routing circuits is obtained via an electroless plating process, wherein the electroless plating process includes repeating the depositing step, the removing step and the adhering step in one or more loops.

8. The method of claim 6, wherein the desired thickness of the metal routing circuits is obtained via an electrolytic plating process.

9. The method of claim 6, wherein each of the at least one metal plated routing layer is further formed by, after obtaining a desired thickness of the metal routing circuits, removing at least a portion of bus lines.

10. A method of manufacturing semiconductor devices that each includes a plurality of conductive routing layers, comprising: obtaining an etched and plated leadframe that includes a plurality of copper routing circuits and a plurality of package terminals, wherein the plurality of copper routing circuits forms a copper leadframe routing layer;forming at least one metal plated routing layer on top of the copper leadframe routing layer, wherein each of the at least one metal plated routing layer is formed by: coupling a plurality of interconnections with routing circuits associated with a previous routing layer that is directly beneath a current metal plated routing layer being formed;forming an intermediary insulation layer on top of the previous routing layer, wherein the plurality of interconnections protrudes from a top surface of the intermediary insulation layer that has the natural surface roughness;performing an abrasion procedure to roughen at least the top surface of the intermediary insulation layer such that, after the abrasion procedure, the top surface of the intermediary insulation layer has an unnatural surface roughness that is rougher than the natural surface roughness;adhering a metal layer on the roughened top surface of the intermediary insulation layer to form a plurality of metal routing circuits that is included in the current metal plated routing layer; andremoving portions of bus lines extending from the plurality of metal routing circuits such that the bus lines are not exposed at sides of the semiconductor packages after singulation, wherein the portions are near package singulation paths;coupling a plurality of dies with a topmost metal plated routing layer;encapsulating the plurality of dies and the topmost metal routing layer with a topmost insulation layer;etching away exposed copper at the bottom of the leadframe, thereby isolating the plurality of package terminals and exposing the plurality of copper routing circuits at the bottom of the leadframe;encapsulating the plurality of exposed copper routing circuits at the bottom of the leadframe with a bottommost insulation layer; andperforming a cut-through procedure along the singulation paths to singulate the semiconductor packages from each other.

11. The method of claim 10, wherein the unnatural surface roughness is formed by compound fillers in the intermediary insulation layer protruding beyond compound resin in the intermediary insulation layer.

12. The method of claim 11, wherein the abrasion procedure includes: coating at least the top surface of the intermediary insulation layer with an adhesion promoter material;heating the leadframe such that the adhesion promoter material reacts with a portion of the intermediary insulation layer; andetching away a baked film, resulting in the top surface of the intermediary insulation layer having the unnatural surface roughness that is rougher than the natural surface roughness.

13. The method of claim 11, wherein each of the at least one metal plated routing layer is further formed by, after performing an abrasion procedure and before adhering a metal layer on the roughened top surface: depositing a catalyst material on the roughened top surface of the intermediary insulation layer; andremoving unwanted areas of the catalyst material such that the remaining areas of the catalyst material form a structure of the plurality of metal routing circuits.

14. The method of claim 13, wherein adhering a metal layer on the roughened top surface includes using a metal chemical solution, wherein metal substance in the metal chemical solution reacts with the remaining areas of the catalyst material such that the adhesion of the metal layer with the intermediary insulation layer having the unnatural surface roughness is better than the adhesion of the metal layer with the intermediary insulation layer having the natural surface roughness.

15. The method of claim 11, wherein each of the at least one metal plated routing layer is further formed by, after adhering a metal layer on the roughened top surface, obtaining a desired thickness of the metal routing circuits whereby metal is plated on metal.

16. The method of claim 11, wherein exposed surfaces of the package terminals are flush with a bottom surface of the bottommost insulation layer.