Semiconductor package with multiple molding routing layers and a method of manufacturing the same

Abstract

Embodiments of the present invention are directed to a method of manufacturing a semiconductor package with an internal routing circuit. The internal routing circuit is formed from multiple molding routing layers in a plated and etched copper terminal semiconductor package by using a laser to activate areas of each molding compound layer of the semiconductor package. Each compound filler in the molding compound layer has a metal interior and an insulating outermost shell. The activated molding compound areas in the molding compound layer become metallized in an electroless plating solution to build conductive paths on the molding compound surface, while properties of non-activated molding compound areas are not changed.

Description

FIELD OF INVENTION

The present invention is related to the field of semiconductor package manufacturing. More specifically, the present invention relates to a semiconductor package with an internal routing circuit formed from multiple molding routing layers in the package.

BACKGROUND OF THE INVENTION

There is a growing demand for high-performance semiconductor packages. However, increases in semiconductor circuit density pose interconnect challenges for a packaged chip's thermal, mechanical and electrical integrity. Thus, there is a need for a method of manufacturing a semiconductor package with improved routing capabilities.

BRIEF SUMMARY OF THE INVENTION

Embodiments of the present invention are directed to a method of manufacturing a semiconductor package with an internal routing circuit. The internal routing circuit is formed from multiple molding routing layers in a plated and etched copper terminal semiconductor package by using a laser to activate areas of each molding compound layer of the semiconductor package. Each compound filler in the molding compound layer has a metal interior and an insulating outermost shell. The activated molding compound areas in the molding compound layer become metallized in an electroless plating solution to build conductive paths on the molding compound surface, while properties of non-activated molding compound areas are not changed.

In one aspect, a semiconductor package is provided. The semiconductor package includes package terminals, and a copper leadframe routing layer that includes copper routing circuits. The copper routing circuits are formed on a first side of a copper leadframe and the package terminals are formed on a second side of the copper leadframe.

The semiconductor package also includes at least one metal plated routing layer. Each of the at least one metal plated routing layer includes a plurality of interconnections coupled with routing circuits associated with a previous routing layer that is directly beneath the current metal plated routing layer, and an intermediary insulation layer formed on top of the previous routing layer. The plurality of interconnections protrudes from a top surface of the intermediary insulation layer that has cavities and exposed metal fillers at boundaries of the cavities. Molding compound of the intermediary insulation layer is on top of the routing circuits associated with the previous routing layer. Each of the at least one metal plated routing layer also includes metal routing circuits adhered in the cavities of the intermediary insulation layer. The metal routing circuits includes a plurality of metal plated layers.

In some embodiments, the routing circuits associated with each routing layer is structured differently from the routing circuits associated with other routing layers. In some embodiments, the metal routing circuits associated with each of the at least one metal plated routing layer is structured differently from the metal routing circuits associated with other metal plated routing layers.

In some embodiments, the exposed metal fillers are fillers in the intermediary insulation layer that have sides of insulation outermost shells of the fillers that are removed. Metal at the nuclei of the fillers are exposed.

The semiconductor package includes an internal routing circuit from die terminals on the die to the package terminals. The internal routing circuit is formed by all the routing layers in the semiconductor package. The semiconductor package also includes a die coupled with a topmost metal plated routing layer, a topmost insulation layer encapsulating the die and the topmost metal routing layer, and a bottommost insulation layer encapsulating the copper routing circuits.

In another aspect, a method of manufacturing semiconductor devices that includes a plurality of conductive routing layers is provided. The method includes obtaining an etched and plated leadframe that includes a plurality of copper routing circuits and a plurality of package terminals, wherein the plurality of copper routing circuits forms a copper leadframe routing layer. In some embodiments, obtaining an etched and plated leadframe includes etching a copper substrate to form the plurality of copper routing circuits at a top surface of the copper substrate, and plating a plurality of areas on surfaces of the copper substrate, thereby resulting in the etched and plated leadframe. The plurality of areas includes bottom plated areas that eventually form the plurality of package terminals and includes top plated areas that are on the plurality of copper routing circuits.

The method also includes forming at least one metal plated routing layer on top of the copper leadframe routing layer. Each of the at least one metal plated routing layer is formed by coupling a plurality of interconnections with routing circuits associated with a previous routing layer that is directly beneath the current metal plated routing layer being formed, forming an intermediary insulation layer on top of the previous routing layer, wherein the plurality of interconnections protrudes from a top surface of the intermediary insulation layer, removing areas of the intermediary insulation layer, thereby forming cavities in the intermediary insulation layer and exposing metal at the nuclei of fillers that are located at boundaries of the cavities, and adhering a metal layer in the cavities of the intermediary insulation layer to form a plurality of metal routing circuits that is included in the current metal plated routing layer.

In some embodiments, material of the intermediary insulation layer is a laser direct structuring molding compound that has a transforming property when blasted by a laser.

In some embodiments, the exposed metal fillers are fillers in the intermediary insulation layer, wherein the fillers have portions of their insulation outermost shells removed. In some embodiments, metal at the nuclei of the fillers are exposed.

In some embodiments, each of the at least one metal plated routing layer is further formed by, after adhering a metal layer in the cavities of the intermediary insulation layer, obtaining a desired thickness of the metal routing circuits whereby metal is plated on metal. The desired thickness of the metal routing circuits can be obtained via an electroless plating process, wherein the electroless plating process includes repeating the adhering step in one or more loops.

The method also includes coupling a plurality of dies with a topmost metal plated routing layer, encapsulating the plurality of dies and the topmost metal routing layer with a topmost insulation layer, etching away exposed copper at the bottom of the leadframe, thereby isolating the plurality of package terminals and exposing the plurality of copper routing circuits at the bottom of the leadframe, encapsulating the plurality of exposed copper routing circuits at the bottom of the leadframe with a bottommost insulation layer, and performing a cut-through procedure to singulate the semiconductor packages from each other.

BRIEF DESCRIPTION OF THE DRAWINGS

The foregoing will be apparent from the following more particular description of example embodiments of the invention, as illustrated in the accompanying drawings in which like reference characters refer to the same parts throughout the different views. The drawings are not necessarily to scale, emphasis instead being placed upon illustrating embodiments of the present invention.

FIG. 1A illustrates an exemplary top view of a semiconductor die and an exemplary bottom view of a semiconductor package that shows package terminals.

FIG. 1B illustrates an exemplary external view of a final singulated semiconductor package in accordance with some embodiments.

FIG. 1C illustrates an exemplary internal view of the semiconductor package of FIG. 1B in accordance with some embodiments.

FIG. 2 illustrates an exemplary method of manufacturing a semiconductor package in accordance to some embodiments.

FIG. 3A-FIG. 3M illustrate an exemplary result produced at each step of the method of FIG. 2.

FIG. 4 illustrates an exemplary view of forming multi-printed layers in accordance to some embodiments.

FIG. 5A-FIG. 5B illustrate an exemplary method of manufacturing semiconductor devices that each includes a plurality of conductive routing layers accordance with some embodiments.

DETAILED DESCRIPTION OF THE INVENTION

In the following description, numerous details are set forth for purposes of explanation. However, one of ordinary skill in the art will realize that the invention can be practiced without the use of these specific details. Thus, the present invention is not intended to be limited to the embodiments shown but is to be accorded the widest scope consistent with the principles and features described herein.

FIG. 1A illustrates an exemplary top view of a semiconductor die and an exemplary bottom view of a semiconductor package that includes exposed package terminals. Although FIG. 1A illustrates the semiconductor die being electrically coupled therein using wire bonds, it is contemplated that the semiconductor die can instead be electrically coupled using flip-chip bonds, such as solder bumps. Regardless of how the semiconductor die is coupled therein, an internal routing circuit of the semiconductor (IC) package provides for internal routing from die terminals of the semiconductor die to the package terminals of the semiconductor package.

Embodiments of the present invention are directed to a method of manufacturing a semiconductor package with an internal routing circuit. The internal routing circuit is formed from multiple molding routing layers in a plated and etched copper terminal semiconductor package by using a laser to activate areas of each molding compound layer of the semiconductor package. Each compound filler in the molding compound layer has a metal interior and an insulating outermost shell. The activated molding compound areas in the molding compound layer become metallized in an electroless plating solution to build conductive paths on the molding compound surface, while properties of non-activated molding compound areas are not changed.

FIG. 1B illustrates an exemplary external view of a final singulated semiconductor package 100 in accordance with some embodiments, while FIG. 1C illustrates an exemplary internal view of the semiconductor package 100, without molding compounds to show the structure of the internal routing circuit, in accordance with some embodiments. The internal routing circuit is formed from multiple molding routing path layers in the package 100.

The semiconductor package 100, as shown, includes three conductive routing path layers 150, 160, 170 electrically coupled via interconnections 155, 165 that are disposed between the routing path layers 150, 160, 170. The conductive routing path layers 150, 160, 170 form at least partially the internal routing circuit of the semiconductor package 100. However, it is noted that by the concepts discussed herein, more or less conductive routing layers can be formed within a semiconductor package. Typically, the topmost conductive routing path layer (e.g., conductive routing path layer 170 in FIG. 1C) is physically and electrically coupled with the semiconductor die 175, while the bottommost conductive routing path layer (e.g., conductive routing path layer 150 in FIG. 1C) is physically and electrically coupled with the package terminals. Each of the conductive routing path layers 150, 160, 170 and the semiconductor die 175 corresponds to a distinct and separate molding compound layer 102, 104, 106, 108. Generally, if there are N routing path layers, where N is an integer greater or equal to 1, then there are N+1 molding compound layers. In some embodiments, N is greater or equal to 2. In some embodiments, each layer of the molding compound 102-108 is visually indistinguishable from the other layers of the molding compound 102-108. Alternatively, each layer of the molding compounds 102-108 is visually distinguishable from the other layers of the molding compound 102-108.

In some embodiments, the bottommost conductive routing path layer is a copper leadframe routing layer and each subsequent conductive routing path layer formed above the bottommost conductive routing path layer is a metal plated routing layer.

FIG. 2 illustrates an exemplary method 200 of manufacturing a semiconductor package in accordance with some embodiments. An exemplary result produced by each step of the method 200 is illustrated in FIGS. 3A-3M. Referring to FIGS. 2 and 3A-3M, the method 200 begins at a Step 201, where a plated and etched leadframe 300 is obtained. In some embodiments, the leadframe 300 is made of copper. A plurality of areas 302 on the bottom side of the leadframe 300 is plated to form package terminals. The top side of the leadframe 300 is etched away to form copper routing circuits 304, which are included in the bottommost conductive routing path layer 150 in FIG. 1C. A plurality of areas 306 on the top side of the leadframe 300 is also plated. In some embodiments, the top plated areas 306 are on the copper routing circuits 304. The number of bottom plated areas 302 is the same as the number of top plates areas 306, although the numbers can be different with the number of the bottom plated areas 302 being more or less than the number of the top plated areas 306. In some embodiments, the plating material is Ni+Pd+Au or any other suitable material(s).

At a Step 203, a plurality of interconnections 308 is formed on top of the leadframe 300. In some embodiments, the interconnections 308 are formed on the copper routing circuits 304 and coupled with the top plated areas 306. The material(s) of the interconnections 308 can be Cu, PdCu, AuPdCu wire, Ag wire, Ag allow wire and Au wire from a wire bond process, Ag alloy or the like, such as a soldering allow material. The process to apply this material(s) can be writing dispensing, printing (e.g., 3D inkjet printing), screen printing, electrical discharge coating, or any other suitable process.

At a Step 205, an insulation layer 310 is formed on top of the leadframe 300, resulting in a molded leadframe, to form a base of the second conductive routing path layer 160 in FIG. 1C. In some embodiments, the interconnections 308 protrude from the insulation layer 310. The material of this insulation layer 310 is a laser direct structuring molding compound, which has a transforming property when it is blasted by a laser. Briefly, when the molding compound is blasted, metal atoms in the molding compound are exposed, which act as nuclei for a subsequent metallization. A starting physical shape of the molding compound can be a powder, pellet or sheet. The process to apply the molding compound 310 can be injection mold, transfer mold, compression mold, lamination mold, or any other suitable process. The molding material 310 includes compound fillers 310a and compound resin 310b. A first magnified view is provided to illustrate a cross section of the molded compound focus at a surface area. A second magnified view is provided to illustrate insulation substance at the outermost shell 310a-2 of a filler 310a and metal substance at the nucleus 310a-1 of the filler 310a. The molding compound is on top of and surrounds the copper routing circuits 304.

At a Step 207, a removal process is performed to create a structure of conductive paths 322, which are also referred to as metal routing circuits, in the molding compound 310, resulting in a laser patterned leadframe. A laser is used to blast away areas 312 of the insulation layer 310 to form cavities. The compound resin 310b and the compound fillers 310a in these areas 312 are removed. The cavities form the structure of the metal routing circuits 322. The insulation layer 310 is transformed from non-electrical conductive material to electrical conductive material at the blasted areas 312. At the boundary of the these cavities 312, sides of insulation outermost shells of the fillers 310a, which have been blasted by laser, are also removed, exposing the metal at the nuclei of the fillers 310a. The cavities 312 become metallized in the following electroless plating process to build the conductive paths 322. Properties of non-activated molding compound areas 314 are not changed. The structure of the conductive paths 322 encompasses the interconnections 308 such that the conductive paths 322 eventually formed will be in electrical communication with the interconnections 308 and with all conductive paths in previous conductive routing layers.

At a Step 209, a plating process is performed to plate the laser patterned leadframe with a metal chemical solution 324, resulting in an electroless plated leadframe. The plating process is an electroless plating process. In some embodiments, the laser patterned leadframe is dipped in the metal chemical solution 324. An exemplary metal substance in the metal chemical solution is Cu, Ni or another suitable metal substance. The metal substance in the metal chemical solution reacts with the exposed metal fillers on the surface of the molding compound 310 but does not react with the surface of the molding compound 310 without the exposed metal fillers. Put differently, there is no chemical reaction at non-activated molding compound areas 314. The metal substance anchors on to the laser activated areas on the molding compound surface to form the conductive paths 322.

Multi-metal layers can be plated on top of each other to obtain a desired thickness of the conductive paths 322 in the cavities formed on the molding compound 310, as illustrated in FIG. 4. These metal routing circuits 322 on the molding compound 310 are included in the second conductive routing path layer 160 in FIG. 1C. One method is to perform the step of dipping the leadframe into the metal plating chemical (the Step 209) in one or more loops until a desired thickness of the conductive paths 332 is obtained. Each new metal substance anchors to the previous anchored metal on the molding compound surface or on a previous anchored metal on metal. The thickness of each multi-metal layer depends on reaction time. In some applications that require different metal plating layer types for the conductive path pattern, different metal chemical solutions can be used for each layer. An exemplary metal plating layer type is Ni+Pd+Au.

In the case additional routing path layers are required, returning to the method 200, at the Step 211, a plurality of interconnections 326 is formed on top of the leadframe 300. In some embodiments, the interconnections 326 are formed on the conductive metal routing circuits 322. The interconnections 326 are made of the same or different material as the interconnections 308. The process of applying the interconnections 326 can be the same as or different from the process of applying the interconnections 308.

At the Step 213, an insulation layer 330 is formed on top of the leadframe 300 to form a base of the next (e.g., third) conductive routing path layer 170 in FIG. 1C. In some embodiments, the interconnections 326 protrude from the insulation layer 330. The material of this insulation layer 330 can be the same as or different from the material of the insulation layer 310. The process of applying the molding compound 330 can be the same as or different from the process of applying the molding compound 310. The molding compound is on top of the metal routing circuits 322.

At the Step 215, conductive paths 332 on the molding compound 330 are formed from the process described above. The conductive paths 332 can have the same or different shape as the conductive paths in any of the previous routing layers (e.g., conductive paths 322) as long as the conductive paths 332 are directly over and in electrical communication with the interconnections 326. These metal routing circuits 332 on the molding compound 330 is included in the third conductive routing path layer 170 in FIG. 1C.

In the same manner, if the semiconductor package requires additional conductive routing path layers, the Steps 211 to 215 can be repeated until a number of conductive routing path layers are obtained.

At a Step 217, a plurality of semiconductor dies 334 is coupled on the conductive paths on the topmost conductive routing path layer (e.g., the topmost conductive routing path layer 170 in FIG. 1C) using epoxy, with at least one semiconductor die 334 in each IC packaging section. In some embodiments, wire bonds 336 electrically couple the electrical pads 340 on the dies 334 and the pads 338 on the molding compound 330 that is associated with the topmost routing path layer.

At a Step 219, at least the plurality of semiconductor dies 334 and the topmost conductive routing path layer are encapsulated with a molding compound 342, resulting in a molded leadframe strip 344.

At a Step 221, a chemical etching process, such as a copper chemical etching dip process or a copper chemical etching spray process, is performed on the molded leadframe strip 344. At the bottom of the molded leadframe strip 344, the copper surface that is covered with the pre-plated metal from the Step 201 is not etched away, while the copper surface that is not covered with the pre-plated metal from the Step 201 is etched away. The chemical etching process reacts with the copper until it reaches the molding compound 310. After the copper is removed, the package terminals are isolated from each other and the copper routing circuits 304 of the first routing path layer is revealed at the bottom of the molded leadframe strip 344.

At a Step 223, an insulation layer 346 is formed on bottom of the are exposed. In some embodiments, the package terminals are flush with the insulation layer 346. Alternatively, the package terminals protrude from the insulation layer 346. The insulation layer 346 protects the copper routing circuits 304 from causing issues with its environment, such as in a printed circuit board.

At a Step 225, a cut through procedure is performed to isolate semiconductor packages 350 from the leadframe 344. A tool 348, such as a saw, is used to fully cut the leadframe along the singulation paths. Each semiconductor package 350 is similarly configured as the semiconductor package 100.

A semiconductor package, such as the singulated semiconductor package 350, includes package terminals, and a copper leadframe routing layer that includes copper routing circuits. The copper routing circuits are formed on a first side of a copper leadframe and the package terminals are formed on a second side of the copper leadframe.

The semiconductor package also includes at least one metal plated routing layer. Each of the at least one metal plated routing layer includes a plurality of interconnections coupled with routing circuits associated with a previous routing layer that is directly beneath the current metal plated routing layer, and an intermediary insulation layer formed on top of the previous routing layer. The plurality of interconnections protrudes from a top surface of the intermediary insulation layer that has cavities and exposed metal fillers at boundaries of the cavities. Molding compound of the intermediary insulation layer is on top of the routing circuits associated with the previous routing layer. Each of the at least one metal plated routing layer also includes metal routing circuits adhered in the cavities of the intermediary insulation layer. The metal routing circuits includes a plurality of metal plated layers.

In some embodiments, the routing circuits associated with each routing layer is structured differently from the routing circuits associated with other routing layers. In some embodiments, the metal routing circuits associated with each of the at least one metal plated routing layer is structured differently from the metal routing circuits associated with other metal plated routing layers.

In some embodiments, the exposed metal fillers are fillers in the intermediary insulation layer that have sides of insulation outermost shells of the fillers that are removed. Metal at the nuclei of the fillers are exposed.

The semiconductor package includes an internal routing circuit from die terminals on the die to the package terminals. The internal routing circuit is formed by all the routing layers in the semiconductor package. The semiconductor package also includes a die coupled with a topmost metal plated routing layer, a topmost insulation layer encapsulating the die and the topmost metal routing layer, and a bottommost insulation layer encapsulating the copper routing circuits.

FIG. 5A illustrates an exemplary method 500 of manufacturing semiconductor devices that each includes a plurality of conductive routing layers in accordance with some embodiments. The method 500 begins at a Step 501, where an etched and plated leadframe is obtained. The etched and plated leadframe includes a plurality of copper routing circuits and a plurality of package terminals. The plurality of copper routing circuits forms a copper leadframe routing layer. In some embodiments, the etched and plated leadframe is obtained by etching a copper substrate to form the plurality of copper routing circuits at a top surface of the copper substrate, and plating a plurality of areas on surfaces of the copper substrate, thereby resulting in the etched and plated leadframe. The plurality of areas includes bottom plated areas that eventually form the plurality of package terminals and includes top plated areas that are on the plurality of copper routing circuits.

At a Step 503, at least one metal plated routing layer is formed on top of the copper leadframe routing layer. Each of the at least one metal plated routing layer is formed by the method 550 illustrated in FIG. 5B.

Referring to FIG. 5B, at a Step 515, a plurality of interconnections is coupled with routing circuits associated with a previous routing layer that is directly beneath the current metal plated routing layer being formed.

At a Step 517, an intermediary insulation layer is formed on top of the previous routing layer. The plurality of interconnections protrudes from a top surface of the intermediary insulation layer. In some embodiments, material of the intermediary insulation layer is a laser direct structuring molding compound that has a transforming property when blasted by a laser.

At a Step 519, areas of the intermediary insulation layer are removed to form cavities in the intermediary insulation layer and to expose metal at the nuclei of fillers that are located at boundaries of the cavities.

In some embodiments, the exposed metal fillers are fillers in the intermediary insulation layer, wherein these fillers have portions of their insulation outermost shells removed and metal at the nuclei exposed.

At a Step 521, a metal layer is adhered in the cavities of the intermediary insulation layer to form a plurality of metal routing circuits that is included in the current metal plated routing layer.

In some embodiments, a desired thickness of the metal routing circuits is obtained whereby metal is plated on metal. The desired thickness of the metal routing circuits is obtained via an electroless plating process, wherein the electroless plating process includes repeating the adhering step in one or more loops.

Returning to FIG. 5A, at a Step 505, a plurality of dies is coupled with a topmost metal plated routing layer.

At a Step 507, the plurality of dies and the topmost metal routing layer are encapsulated with a topmost insulation layer.

At a Step 509, exposed copper at the bottom of the leadframe is etched away, thereby isolating the plurality of package terminals and exposing the plurality of copper routing circuits at the bottom of the leadframe.

At a Step 511, the plurality of exposed copper routing circuits at the bottom of the leadframe is encapsulated with a bottommost insulation layer.

At a Step 513, a cut-through procedure is performed to singulate the semiconductor packages from each other.

It is noted that the demonstration discussed herein is on a semiconductor package with three conductive routing path layers. However, by the concept of this invention, it is possible to create more conductive routing layers to stack on each other such that a final semiconductor package can have more than three conductive routing path layers.

One of ordinary skill in the art will realize other uses and advantages also exist. While the invention has been described with reference to numerous specific details, one of ordinary skill in the art will recognize that the invention can be embodied in other specific forms without departing from the spirit of the invention. Thus, one of ordinary skill in the art will understand that the invention is not to be limited by the foregoing illustrative details, but rather is to be defined by the appended claims.

Claims

1. A method of manufacturing semiconductor devices that each includes a plurality of conductive routing layers, comprising: obtaining an etched and plated leadframe that includes a plurality of copper routing circuits and a plurality of package terminals, wherein the plurality of copper routing circuits forms a copper leadframe routing layer;forming at least one metal plated routing layer on top of the copper leadframe routing layer, wherein each of the at least one metal plated routing layer is formed by: coupling a plurality of interconnections with routing circuits associated with a previous routing layer that is directly beneath a current metal plated routing layer being formed;forming an intermediary insulation layer on top of the previous routing layer, wherein the plurality of interconnections protrudes from a top surface of the intermediary insulation layer;removing areas of the intermediary insulation layer, thereby forming cavities in the intermediary insulation layer and exposing metal at a nuclei of the fillers that are located at boundaries of the cavities; andadhering a metal layer in the cavities of the intermediary insulation layer to form a plurality of metal routing circuits that is included in the current metal plated routing layer;coupling a plurality of dies with a topmost metal plated routing layer;encapsulating the plurality of dies and the topmost metal routing layer with a topmost insulation layer;etching away exposed copper at a bottom of the leadframe, thereby isolating the plurality of package terminals and exposing the plurality of copper routing circuits at the bottom of the leadframe;encapsulating the plurality of exposed copper routing circuits at the bottom of the leadframe with a bottommost insulation layer; andperforming a cut-through procedure to singulate the semiconductor packages from each other.

2. The method of claim 1, wherein obtaining an etched and plated leadframe includes: etching a copper substrate to form the plurality of copper routing circuits at a top surface of the copper substrate; andplating a plurality of areas on surfaces of the copper substrate, thereby resulting in the etched and plated leadframe, wherein the plurality of areas includes bottom plated areas that eventually form the plurality of package terminals and includes top plated areas that are on the plurality of copper routing circuits.

3. The method of claim 2, wherein material of the intermediary insulation layer is a laser direct structuring molding compound that has a transforming property when blasted by a laser.

4. The method of claim 3, wherein the exposed metal fillers are fillers in the intermediary insulation layer, wherein the fillers have portions of their insulation outermost shells removed.

5. The method of claim 4, wherein metal at the nuclei of the fillers are exposed.

6. The method of claim 5, wherein each of the at least one metal plated routing layer is further formed by, after adhering a metal layer in the cavities of the intermediary insulation layer, obtaining a desired thickness of the metal routing circuits whereby metal is plated on metal.

7. The method of claim 6, wherein the desired thickness of the metal routing circuits is obtained via an electroless plating process, wherein the electroless plating process includes repeating the adhering step in one or more loops.

8. A method of manufacturing semiconductor devices that each includes a plurality of conductive routing layers, comprising: obtaining an etched and plated leadframe that includes a plurality of copper routing circuits and a plurality of package terminals, wherein the plurality of copper routing circuits forms a copper leadframe routing layer;forming at least one metal plated routing layer on top of the copper leadframe routing layer, wherein each of the at least one metal plated routing layer is formed by: coupling a plurality of interconnections with routing circuits associated with a previous routing layer that is directly beneath a current metal plated routing layer being formed;forming an intermediary insulation layer on top of the previous routing layer, wherein the plurality of interconnections protrudes from a top surface of the intermediary insulation layer;removing areas of the intermediary insulation layer, thereby forming cavities in the intermediary insulation layer and exposing metal at a nuclei of the fillers that are located at boundaries of the cavities, wherein the exposed metal fillers are fillers in the intermediary insulation layer that have sides of insulation outmost shells of the fillers that are removed; andadhering a metal layer in the cavities of the intermediary insulation layer to form a plurality of metal routing circuits that is included in the current metal plated routing layer;coupling a plurality of dies with a topmost metal plated routing layer;encapsulating the plurality of dies and the topmost metal routing layer with a topmost insulation layer;etching away exposed copper at a bottom of the leadframe, thereby isolating the plurality of package terminals and exposing the plurality of copper routing circuits at the bottom of the leadframe;encapsulating the plurality of exposed copper routing circuits at the bottom of the leadframe with a bottommost insulation layer; andperforming a cut-through procedure to singulate the semiconductor packages from each other.

9. The method of claim 8, wherein material of the intermediary insulation layer is a laser direct structuring molding compound that has a transforming property when blasted by a laser.

10. The method of claim 8, wherein each of the at least one metal plated routing layer is further formed by, after adhering a metal layer in the cavities of the intermediary insulation layer, obtaining a desired thickness of the metal routing circuits whereby metal is plated on metal.

11. The method of claim 10, wherein the desired thickness of the metal routing circuits is obtained via an electroless plating process, wherein the electroless plating process includes repeating the adhering step in one or more loops.

12. The method of claim 8, wherein portions of the copper routing circuits are plated.

13. The method of claim 8, wherein exposed surfaces of the package terminals are flush with a bottom surface of the bottommost insulation layer.